Patents Assigned to ASML Netherlands
  • Patent number: 11694821
    Abstract: A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.
    Type: Grant
    Filed: August 23, 2021
    Date of Patent: July 4, 2023
    Assignee: ASML Netherlands B.V.
    Inventor: Ferry Zijp
  • Publication number: 20230204352
    Abstract: Systems, apparatuses, and methods are provided for generating level data. An example method can include receiving first level data for a first region of a substrate. The first region can include a first subregion having a first surface level, and a second subregion having a second surface level. The example method can further include generating, based on the first level data, measurement control map data. The example method can further include generating, based on the measurement control map data, second level data for a second region of the substrate. The second region can include a plurality of third subregions each having a third surface level equal to about the first surface level, and, optionally, no region having a surface level equal to about the second surface level.
    Type: Application
    Filed: March 29, 2021
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Arjan GIJSBERTSEN, Viktor TROGRLIC, Peter Fernand William Jos DENDAS, Mihaita POPINCIUC, Andrey Valerievich ROGACHEVSKIY
  • Publication number: 20230205097
    Abstract: Disclosed is a method for determining a focus parameter value used to expose at least one structure on a substrate. The method comprises obtaining measurement data relating to a measurement of said at least one structure, wherein the at least one structure comprises a single periodic structure per measurement location and decomposing said measurement data into component data comprising one or more components of said measurement data. At least one of said components is processed to extract processed component data having a reduced dependence on non-focus related effects and a value for the focus parameter is determined from said processed component data. Associated apparatuses and patterning devices are also disclosed.
    Type: Application
    Filed: May 10, 2021
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Mattia MARELLI, Mohammadreza HAJIAHMADI
  • Publication number: 20230205102
    Abstract: The present invention provides a fluid purging system (100) for an optical element (30), comprising a ring and a fluid supply system (40). The ring being formed of a body entirely surrounding the optical element, the ring defining a space (5) radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion (10) and at least one second wall portion (20A;20B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.
    Type: Application
    Filed: April 30, 2021
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: José Nilton FONSECA JUNIOR, Franciscus Johannes Leonardus HEUTZ, Zhuangxiong HUANG, Ferdy MIGCHELBRINK
  • Publication number: 20230207255
    Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.
    Type: Application
    Filed: March 3, 2023
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Vincent Claude BEUGIN, Stijn Wilem Herman Karel STEENBRINK, Martin EBERT, Diego MARTINEZ NEGRETE GASQUE, Hindrik Willem MOOK, Albertus Victor Gerardus MANGNUS
  • Publication number: 20230207253
    Abstract: Electron-optical devices and associated methods are disclosed. In one arrangement, an electron-optical device projects a multi-beam of sub-beams of charged particles to a sample. A plurality of plates are provided in which are defined respective aperture arrays. The plates comprise an objective lens array configured to project the sub-beams towards the sample. The aperture arrays defined in at least two of the plates each have a geometrical characteristic configured to apply a perturbation to a corresponding target property of the sub-beams. A controller controls potentials applied to the plates having the geometrical characteristics such that the applied perturbations together substantially compensate for a variation in the target property over a range of a parameter of the device.
    Type: Application
    Filed: December 23, 2022
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • Publication number: 20230207259
    Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.
    Type: Application
    Filed: December 23, 2022
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Erwin SLOT, Niels VERGEER, Vincent Sylvester KUIPER
  • Publication number: 20230208269
    Abstract: The invention provides a magnet assembly for a planar electromagnetic motor, the magnet assembly comprising:—a first plurality of superconductive (SC) coils, inside an outer circumference and arranged in a planar pattern such as a rectangular pattern,—a second plurality of SC coils, arranged along an outer boundary of the planar pattern, a coil of the first plurality of SC coils having a first in-plane shape and a coil of the second plurality of SC coils having a second in-plane shape, different from the first in-plane shape, wherein the second plurality of SC coils is arranged at least partly inside the outer circumference.
    Type: Application
    Filed: April 18, 2021
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Gudrun Ghilaine Agnes DE GERSEM, Roger Franciscus Mattheus Maria HAMELINCK, Jeroen VAN DUIVENBODE
  • Publication number: 20230207256
    Abstract: A method of determining a number of charged particles incident on a detector within a period may include generating a first signal that is based on a charged particle impacting a sensing element of the detector, performing processing using the first signal based on a predetermined characteristic of a charged particle arrival event on the detector, and outputting a count signal based on the processing.
    Type: Application
    Filed: February 28, 2023
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Mohammed SUBHI MOHAMMED AL DISI, Qinwen FAN, Stoyan NIHTIANOV
  • Publication number: 20230207252
    Abstract: Disclosed herein is an actuator arrangement comprising: a wall defining a cavity; a casing protruding from the wall and defining an interior in fluid communication with the cavity; an actuator comprising: a force imparter configured to impart force on a component in the cavity; and an actuation mechanism configured to drive the force imparter, wherein at least part of the actuation mechanism is within said interior of the casing and exposed to the cavity; and a control element configured to control the actuation mechanism, wherein the control element extends through the casing via a seal.
    Type: Application
    Filed: February 13, 2023
    Publication date: June 29, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Derk Ferdinand WALVOORT, Marc SMITS, Teunis VAN DE PEUT
  • Patent number: 11688694
    Abstract: An electronic device comprising a semiconductor chip which comprises a plurality of structures formed in the semiconductor chip, wherein the semiconductor chip is a member of a set of semiconductor chips, the set of semiconductor chips comprises a plurality of subsets of semiconductor chips, and the semiconductor chip is a member of only one of the subsets. The plurality of structures of the semiconductor chip includes a set of common structures which is the same for all of the semiconductor chips of the set, and a set of non-common structures, wherein the non-common structures of the semiconductor chip of the subset is different from a non-common circuit of the semiconductor chips in every other subset. At least a first portion of the non-common structures and a first portion of the common structures form a first non-common circuit, wherein the first non-common circuit of the semiconductor chips of each subset is different from a non-common circuit of the semiconductor chips in every other subset.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: June 27, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Cornelis Jacobus De Langen, Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper
  • Patent number: 11688579
    Abstract: Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.
    Type: Grant
    Filed: December 13, 2021
    Date of Patent: June 27, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Juying Dou, Zheng Fan, Tzu-Yi Kuo, Zhong-wei Chen
  • Patent number: 11690159
    Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: June 27, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Rollinger, Georgiy Olegovich Vaschenko, Chirag Rajyaguru, Alexander Igorevich Ershov, Joshua Mark Lukens, Mathew Cheeran Abraham
  • Patent number: 11686951
    Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
    Type: Grant
    Filed: April 26, 2021
    Date of Patent: June 27, 2023
    Assignees: Cymer, LLC, ASML Netherlands B.V.
    Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
  • Patent number: 11688580
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: June 21, 2021
    Date of Patent: June 27, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Patent number: 11681279
    Abstract: Embodiments of the present disclosure provide systems and methods for enhancing the semiconductor manufacturing yield. Embodiments of the present disclosure provide a yield improvement system. The system comprises a training tool configured to generate training data based on receipt of one or more verified results of an inspection of a first substrate. The system also comprises a point determination tool configured to determine one or more regions on a second substrate to inspect based on the training data, weak point information for the second substrate, and an exposure recipe for a scanner of the second substrate.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: June 20, 2023
    Assignee: ASML Netherlands B.V.
    Inventor: Wei Fang
  • Patent number: 11681229
    Abstract: A process of selecting a measurement location, the process including: obtaining pattern data describing a pattern to be applied to substrates in a patterning process; obtaining a process characteristic measured during or following processing of a substrate, the process characteristic characterizing the processing of the substrate; determining a simulated result of the patterning process based on the pattern data and the process characteristic; and selecting a measurement location for the substrate based on the simulated result.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: June 20, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Van Der Laan, Wim Tjibbo Tel, Marinus Jochemsen, Stefan Hunsche
  • Patent number: 11682538
    Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: June 20, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Jian Zhang, Zhiwen Kang, Yixiang Wang
  • Patent number: 11675276
    Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: June 13, 2023
    Assignee: ASML Netherlands B.V.
    Inventor: Nitesh Pandey
  • Patent number: 11676792
    Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: June 13, 2023
    Assignee: ASML Netherlands, B.V
    Inventors: Xuedong Liu, Qingpo Xi, Youfei Jiang, Weiming Ren, Xuerang Hu, Zhongwei Chen