Patents Assigned to ASML Netherlands
  • Patent number: 11789373
    Abstract: The invention relates to an object positioning system including an actuator system and a measurement system. The actuator system includes an actuator made of a material with predominantly electrostrictive properties and substantially no net polarization in absence of an electric field. The actuator system is configured to apply an electric field to the actuator, which electric field includes a bias electric field and an actuation electric field superimposed on the bias electric field, a field strength of the actuation electric field being equal to or smaller than a field strength of the bias electric field. The measurement system is configured to measure an electrical property of the actuator which is representative for a mechanical state of the actuator. The measurement system includes a bridge circuit including an actuator and a reference element having electrical properties matched to the electrical properties of the actuator.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: October 17, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Bas Jansen, Samer Abdelmoeti Abuzeid Abdelmoeti, Hans Butler, Koen Johan Frederik Loonen, Aditya Singh, Ruben Etienne Johan Rinus Vandervelden
  • Patent number: 11791127
    Abstract: A wafer inspection system includes a controller in communication with an electron-beam inspection tool. The controller includes circuitry to: acquire, via an optical imaging tool, coordinates of defects on a sample; set a Field of View (FoV) of the electron-beam inspection tool to a first size to locate a subset of the defects; determine a position of each defect of the subset of the defects based on inspection data generated by the electron-beam inspection tool during a scanning of the sample; adjust the coordinates of the defects based on the determined positions of the subset of the defects; and set the FoV of the electron-beam inspection tool to a second size to locate additional defects based on the adjusted coordinates.
    Type: Grant
    Filed: August 9, 2021
    Date of Patent: October 17, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Wei Fang, Joe Wang
  • Patent number: 11791132
    Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: October 17, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Albertus Victor Gerardus Mangnus, Maikel Robert Goosen, Erwin Paul Smakman
  • Publication number: 20230326706
    Abstract: A charged particle beam apparatus for directing a charged particle beam to preselected locations of a sample surface is provided. The charged particle beam has a field of view of the sample surface. A charged-particle-optical arrangement is configured to direct a charged particle beam along a beam path towards the sample surface and to detect charged particles generated in the sample in response to the charged particle beam. A stage is configured to support and move the sample relative to the beam path. A controller is configured to control the charged particle beam apparatus so that the charged particle beam scans over a preselected location of the sample simultaneously with the stage moving the sample relative to the charged-particle-optical column along a route, the scan over the preselected location of the sample covering a part of an area of the field of view.
    Type: Application
    Filed: June 8, 2023
    Publication date: October 12, 2023
    Applicant: ASML Netherlands B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • Publication number: 20230324318
    Abstract: A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.
    Type: Application
    Filed: June 1, 2023
    Publication date: October 12, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Yan REN, Erwin SLOT, Albertus Victor, Gerardus MANGNUS, Marijke SCOTUZZI, Erwin Paul SMAKMAN
  • Publication number: 20230326715
    Abstract: Charged particle systems and methods for processing a sample using a multi-beam of charged particles are disclosed. In one arrangement, a column directs a multi-beam of sub-beams of charged particles onto a sample surface of a sample. A sample is moved in a direction parallel to a first direction while the column is used to repeatedly scan the multi-beam over the sample surface in a direction parallel to a second direction. An elongate region on the sample surface is thus processed with each sub-beam. The sample is displaced in a direction oblique or perpendicular to the first direction. The process is repeated to process further elongate regions with each sub-beam. The resulting plurality of processed elongate regions define a sub-beam processed area for each sub-beam.
    Type: Application
    Filed: June 13, 2023
    Publication date: October 12, 2023
    Applicant: ASML Netherlands B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • Patent number: 11782351
    Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: October 10, 2023
    Assignee: ASML Netherlands B.V.
    Inventor: Nitesh Pandey
  • Patent number: 11784024
    Abstract: A multi-cell detector may include a first layer having a region of a first conductivity type and a second layer including a plurality of regions of a second conductivity type. The second layer may also include one or more regions of the first conductivity type. The plurality of regions of the second conductivity type may be partitioned from one another, preferably by the one or more regions of the first conductivity type of the second layer. The plurality of regions of the second conductivity type may be spaced apart from one or more regions of the first conductivity type in the second layer. The detector may further include an intrinsic layer between the first and second layers.
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: October 10, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Joe Wang, Yongxin Wang, Zhongwei Chen, Xuerang Hu
  • Publication number: 20230314964
    Abstract: The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface (122) of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit (110) for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion (102) and at least a second wall portion (104), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit (112).
    Type: Application
    Filed: May 10, 2021
    Publication date: October 5, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: José Nilton FONSECA JUNIOR, Zhuangxiong HUANG, Franciscus Johannes Leonardus HEUTZ, Ferdy MIGCHELBRINK, Henricus Anita Jozef Wilhelmus VAN DE VEN, Ramo OMEROVIC, Emericus Antoon Theodorus VAN DEN AKKER
  • Publication number: 20230317402
    Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.
    Type: Application
    Filed: March 7, 2023
    Publication date: October 5, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Derk Ferdinand WALVOORT, Dmitry MUDRETSOV, Xuerang HU, Qingpo XI, Jurgen VAN SOEST, Marco Jan-Jaco WIELAND
  • Patent number: 11774861
    Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.
    Type: Grant
    Filed: October 12, 2020
    Date of Patent: October 3, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelis Melchior Brouwer, Chung-Hsun Li
  • Patent number: 11774867
    Abstract: A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: October 3, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Herman Philip Godfried, Wilhelmus Patrick Elisabeth Maria Op 'T Root
  • Patent number: 11774012
    Abstract: A conduit suitable for use in a high temperature, high pressure environment, the conduit having an elongate portion made of a first refractory metal and a fitting portion made of a second refractory metal attached to an axial end of the elongate portion. The attachment may be made by welding and the second refractory metal may have a greater yield strength than the first refractory metal.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: October 3, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Jon David Tedrow, David Bessems, Wei-Hsun Chen
  • Patent number: 11774865
    Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.
    Type: Grant
    Filed: July 24, 2020
    Date of Patent: October 3, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Thijs Adriaan Cornelis Van Keulen, Hendrikus Herman Marie Cox, Ramidin Izair Kamidi, Willem Herman Gertruda Anna Koenen
  • Publication number: 20230304949
    Abstract: A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: an objective lens array assembly comprising a plurality of objective lenses, each configured to project one of a plurality of charged-particle beams onto a sample; a detector array associated with the objective lens array assembly and configured to detect charged-particles emitted from the sample; and a circuit comprising an amplifier in data communication with the detector array; wherein the amplifier is configured to be tunable in order to tune amplification of signals from the detector array.
    Type: Application
    Filed: May 24, 2023
    Publication date: September 28, 2023
    Applicant: ASML Netherlands B.V.
    Inventor: Roy Ramon VEENSTRA
  • Publication number: 20230305407
    Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.
    Type: Application
    Filed: July 6, 2021
    Publication date: September 28, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Fei LIU, Jin LIAN, Zhuangxiong HUANG, Laurentius Cornelius DE WINTER, Frank STAALS
  • Patent number: 11769317
    Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: September 26, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Wentian Zhou, Liangjiang Yu, Teng Wang, Lingling Pu, Wei Fang
  • Publication number: 20230298850
    Abstract: Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.
    Type: Application
    Filed: May 18, 2023
    Publication date: September 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Marijke SCOTUZZI, Roy Ramon VEENSTRA, Antoine Gaston Marie KIERS
  • Publication number: 20230298851
    Abstract: A charged particle beam apparatus for inspecting a sample is provided. The apparatus includes a pixelized electron detector to receive signal electrons generated in response to an incidence of an emitted charged particle beam onto the sample. The pixelized electron detector includes multiple pixels arranged in a grid pattern. The multiple pixels may be configured to generate multiple detection signals, wherein each detection signal corresponds to the signal electrons received by a corresponding pixel of the pixelized electron detector. The apparatus further includes a controller includes circuitry configured to determine a topographical characteristic of a structure within the sample based on the detection signals generated by the multiple pixels, and identifying a defect within the sample based on the topographical characteristic of the structure of the sample.
    Type: Application
    Filed: July 26, 2021
    Publication date: September 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Chih-Yu JEN, Chien-Hung CHEN, Long MA, Bruno LA FONTAINE, Datong ZHANG
  • Publication number: 20230298852
    Abstract: A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.
    Type: Application
    Filed: March 10, 2023
    Publication date: September 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Benoit Herve GAURY, Jasper Frans Mathijs VAN RENS