Patents Assigned to ASML Netherlands
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Patent number: 11740565Abstract: Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.Type: GrantFiled: December 9, 2020Date of Patent: August 29, 2023Assignee: ASML Netherlands B.V.Inventors: Taylor John Hartung, Yue Ma, Marc Guy Langlois, Jeremy Burke, Esteban Joseph Sandoval Johnson
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Patent number: 11740561Abstract: A lithographic apparatus includes an illumination system to produce a beam of radiation, a support to support a patterning device to impart a pattern on the beam, a projection system to project the patterned beam onto a substrate, and a metrology system that includes a radiation source to generate radiation, an optical element to direct the radiation toward a target, a detector to receive a first and second radiation scattered by the target and produce a first and second measurement respectively based on the received first and second radiation, and a controller. The controller determines a correction for the first measurement, an error between the correction for the first measurement and the first measurement, and a correction for the second measurement based on the correction for the first measurement, the second measurement, and the error. The lithographic apparatus uses the correction to adjust a position of a substrate.Type: GrantFiled: January 28, 2020Date of Patent: August 29, 2023Assignee: ASML Netherlands B.VInventors: Nikhil Mehta, Piotr Jan Meyer
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Publication number: 20230266255Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.Type: ApplicationFiled: June 9, 2021Publication date: August 24, 2023Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Ilse VAN WEPEREN, Arjan Johannes Anton BEUKMAN, Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX
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Patent number: 11733617Abstract: An apparatus for receiving input radiation and broadening a frequency range of the input radiation to provide broadband output radiation. The apparatus includes a chamber, a fiber, a gas generating apparatus, and a radical generating apparatus. The fiber includes a hollow core configured to guide radiation propagating through the fiber, the hollow core in fluid communication with the chamber. The gas generating apparatus is configured to provide a gas within the chamber. The radical generating apparatus is configured to provide free radicals within the chamber to reduce contaminants in the gas. The apparatus may be included in a radiation source.Type: GrantFiled: January 11, 2022Date of Patent: August 22, 2023Assignee: ASML Netherlands B.V.Inventors: Patrick Sebastian Uebel, Sebastian Thomas Bauerschmidt, Paul William Scholtes-Van Eijk
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Patent number: 11733614Abstract: Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.Type: GrantFiled: September 6, 2021Date of Patent: August 22, 2023Assignee: ASML Netherlands B.V.Inventors: Thomas Jarik Huisman, Ruben Cornelis Maas, Hermanus Adrianus Dillen
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Patent number: 11733615Abstract: Disclosed is a method for selecting a structure for focus monitoring. The method comprises: simulating a Bossung response with focus of a focus dependent parameter, for one or more different structures; and selecting a structure for focus monitoring in a manufacturing process based on the results of said simulating step. The simulating step may be performed using a computational lithography simulation.Type: GrantFiled: December 5, 2019Date of Patent: August 22, 2023Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Christoph Rene Konrad Cebulla Hennerkes
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Patent number: 11728123Abstract: The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.Type: GrantFiled: August 23, 2021Date of Patent: August 15, 2023Assignee: ASML Netherlands B.V.Inventors: Alexander Hendrik Vincent Van Veen, Derk Ferdinand Walvoort
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Patent number: 11728129Abstract: A method of determining a distortion of a field of view of a scanning electron microscope is described. The method may include: providing a sample including substantially parallel lines extending in a first direction; performing scans across the field of view of the sample along respective scan-trajectories extending in a scan direction; the scan direction being substantially perpendicular to the first direction; detecting a response signal of the sample caused by the scanning of the sample; determining a distance between a first line segment of a line and a second line segment of the line, whereby each of the first line segment and the second line segment are crossed by scan trajectories, based on the response signal; performing the previous step for multiple locations within the field of view; and determining the distortion across the field of view, based on the determined distances at the multiple locations.Type: GrantFiled: February 9, 2022Date of Patent: August 15, 2023Assignee: ASML Netherlands B.V.Inventor: Peter Christianus Johannes Maria De Loijer
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Patent number: 11728131Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.Type: GrantFiled: December 16, 2021Date of Patent: August 15, 2023Assignee: ASML Netherlands B.V.Inventors: Ning Ye, Jun Jiang, Jian Zhang, Yixiang Wang
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Publication number: 20230251407Abstract: A transmissive diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises an absorbing layer. The diffraction grating is for use with radiation having a first wavelength (for example (EUV radiation). The absorbing layer is provided with a two-dimensional array of through-apertures. The absorbing layer is formed from a material which has a refractive index for the radiation having the first wavelength in the range 0.% to 1.04.Type: ApplicationFiled: June 17, 2021Publication date: August 10, 2023Applicant: ASML Netherlands B.V.Inventors: Derick Yun Chek Chong, Wouter Joep ENGELEN, Vyacheslav KACHKANOV, Vahid MOHAMMADI, Pieter Cristiaan DE GROOT
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Publication number: 20230251583Abstract: The present invention relates to a stage system (130), which comprises a pre-exposure element (134), and to a method employing the pre-exposure element for conditioning an optical system (100). The pre-exposure element comprises a radiation receiving area at a surface of the stage system, wherein the radiation receiving area comprises at least one pre-exposure plate configured to receive radiation. The stage system comprises further a controller (140), wherein the controller is capable to control an optical parameter of the pre-exposure element, herewith controlling a portion of received radiation reflected by the pre-exposure element.Type: ApplicationFiled: May 31, 2021Publication date: August 10, 2023Applicant: ASML Netherlands B.V.Inventors: Oleg Viacheslavovich VOZNYI, Bearrach MOEST
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Patent number: 11720030Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.Type: GrantFiled: October 26, 2021Date of Patent: August 8, 2023Assignee: ASML Netherlands B.V.Inventors: Fei Wang, Wei Fang, Kuo-Shih Liu
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Patent number: 11721521Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.Type: GrantFiled: March 17, 2022Date of Patent: August 8, 2023Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
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Patent number: 11720034Abstract: A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component.Type: GrantFiled: January 31, 2018Date of Patent: August 8, 2023Assignee: ASML Netherlands B.V.Inventors: Gosse Charles De Vries, Nicolaas Ten Kate
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Publication number: 20230245849Abstract: Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respective sub-beam of a multi-beam onto a sample. The control lens array is associated with the objective lens array and positioned up-beam of the objective lens array. The control lenses pre-focus the sub-beams.Type: ApplicationFiled: March 17, 2023Publication date: August 3, 2023Applicant: ASML Netherlands B.V.Inventor: Marco Jan-Jaco WIELAND
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Publication number: 20230244153Abstract: The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.Type: ApplicationFiled: April 19, 2021Publication date: August 3, 2023Applicant: ASML Netherlands B.V.Inventors: Andrey Valerievich ROGACHEVSKIY, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Doru Cristian TORUMBA, Arjan GIJSBERTSEN, Cristina CARESIO, Raymund CENTENO, Tabitha Wangari KINYANJUI, Jan Arie DEN BOER
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Publication number: 20230246568Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.Type: ApplicationFiled: April 10, 2023Publication date: August 3, 2023Applicant: ASML Netherlands B.V.Inventors: Jan-Gerard Cornelis VAN DER TOORN, Jeroen Gertruda Antonius HUINCK, Han Willem Hendrik SEVERT, Allard Eelco KOOIKER, Michael Johannes Christiaan RONDE, Arno Maria WELLINK, Shibing LIU, Ying LUO, Yixiang WANG, Chia-Yao CHEN, Bohang ZHU, Jurgen VAN SOEST
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Publication number: 20230245851Abstract: A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.Type: ApplicationFiled: March 24, 2023Publication date: August 3, 2023Applicant: ASML Netherlands B.V.Inventors: Hermanus Adrianus DILLEN, Wim Tjibbo TEL, Willem Louis VAN MIERLO
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Patent number: 11715619Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.Type: GrantFiled: April 4, 2022Date of Patent: August 1, 2023Assignee: ASML Netherlands B.V.Inventors: Yongxin Wang, Weiming Ren, Zhonghua Dong, Zhongwei Chen
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Patent number: RE49602Abstract: Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.Type: GrantFiled: September 2, 2020Date of Patent: August 8, 2023Assignee: ASML Netherlands B.V.Inventors: Pieter Kruit, Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink