Patents Assigned to ASML Netherlands
  • Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus
    Patent number: 11143969
    Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Giovanni Luca Gattobigio, Nirupam Banerjee, Johan Franciscus Maria Beckers, Erik Henricus Egidius Catharina Eummelen, Ronald Frank Kox, Theodorus Wilhelmus Polet, Cornelius Maria Rops, Mike Paulus Johannes Van Gils, Wouterus Jozephus Johannes Van Sluisveld, Rik Vangheluwe
  • Control based on probability density function of parameter
    Patent number: 11143971
    Abstract: A method for determining adjustment to a patterning process. The method includes obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter, determining an asymmetry of the probability density function, and determining an adjustment to the patterning process based on the asymmetry of the probability density function of the parameter so as to reduce a probability of the feature having a parameter value that falls outside a range between threshold values of the parameter.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Marc Jurian Kea, Roy Anunciado
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 11143968
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 12, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • Method and apparatus to determine a patterning process parameter
    Patent number: 11143972
    Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
  • Method and apparatus to determine a patterning process parameter
    Patent number: 11145557
    Abstract: A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
  • Lithographic apparatus comprising an object with an upper layer having improved resistance to peeling off
    Patent number: 11143975
    Abstract: A lithographic apparatus has an object, the object includes: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer is greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Nikipelov, Vadim Yevgenyevich Banine, Joost André Klugkist, Maxim Aleksandrovich Nasalevich, Roland Johannes Wilhelmus Stas, Sando Wricke
  • Reflector and method of manufacturing a reflector
    Patent number: 11145428
    Abstract: Some embodiment describe a reflector comprising a hollow body having an interior surface defining a passage. The interior surface has an optical surface part configured to reflect radiation and a supporter surface part. The optical surface part has a predetermined optical power and the supporter surface part does not. The reflector can be made by providing an axially symmetric mandrel, shaping a part of the circumferential surface of the mandrel to form an inverse optical surface part that is not rotationally symmetric about the axis of the mandrel, forming a reflector body around the mandrel and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.
    Type: Grant
    Filed: June 13, 2019
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventor: Ferry Zijp
  • STAGE APPARATUS AND METHOD FOR CALIBRATING AN OBJECT LOADING PROCESS
    Publication number: 20210311403
    Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.
    Type: Application
    Filed: July 22, 2019
    Publication date: October 7, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Gijs KRAMER, Theodorus marcus NAGTEGAAL, André SCHREUDER, Anna Catharina VERKAIK
  • METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY
    Publication number: 20210311385
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Application
    Filed: June 15, 2021
    Publication date: October 7, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Hendrik Klootwijk, Wilhelmus Theodorus Anthonius Johannes Van Den Einden
  • MEASUREMENT METHOD AND APPARATUS
    Publication number: 20210311384
    Abstract: A method of controlling an imaging process uses a qualified optical proximity correction (OPC) model, the process including obtaining an OPC model that is configured to model the behavior of OPC modifications to a pre-OPC design in a process for forming a pattern on a substrate using a post-OPC design in a patterning process, using the patterning process in a manufacturing environment, collecting process control data in substrates patterned using the patterning process in the manufacturing environment, storing the collected process control data in a database, analyzing, by a hardware computer system, the stored, collected process control data to verify that the OPC model is correcting pattern features within a selected threshold, and for pattern features falling outside the selected threshold, determining a modification to the imaging process to correct imaging errors.
    Type: Application
    Filed: August 12, 2019
    Publication date: October 7, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Christopher Alan SPENCE
  • METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES
    Publication number: 20210311400
    Abstract: A method for controlling a manufacturing process for manufacturing semiconductor devices, the method including: obtaining performance data indicative of the performance of the manufacturing process, the performance data including values for a performance parameter across a substrate subject to the manufacturing process; and determining a process correction for the manufacturing process based on the performance data and at least one control characteristic related to a dynamic behavior of one or more control parameters of the manufacturing process, wherein the determining is further based on an expected stability of the manufacturing process when applying the process correction.
    Type: Application
    Filed: July 3, 2019
    Publication date: October 7, 2021
    Applicant: ASML NETHERLANDS B,V.
    Inventors: Mohammad Reza KAMALI, Brennad PETERSON
  • Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus
    Patent number: 11139141
    Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
    Type: Grant
    Filed: November 5, 2019
    Date of Patent: October 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Martijn Petrus Christianus Van Heumen, Jeroen Gerard Gosen
  • Flows of optimization for patterning processes
    Patent number: 11137690
    Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventor: Duan-Fu Stephen Hsu
  • Method of determining a height profile, a measurement system and a computer readable medium
    Patent number: 11137695
    Abstract: Method of measuring a height profile of one or more substrates is provided comprising measuring a first height profile of one or more fields on a substrate using a first sensor arrangement, the first height profile being the sum of a first interfield part and a first intrafield part, measuring a second height profile of one or more further fields on the substrate or on a further substrate using a second sensor arrangement, the second height profile being the sum of a second interfield part and a second intrafield part, determining from the measurements with the first sensor arrangement an average first intrafield part, and determining the height profile of the further fields from the second interfield part and the average first intrafield part thereby correcting the measurements of the second sensor arrangement.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: October 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Arend Johannes Donkerbroek, Jeroen Cottaar, Thomas Theeuwes, Erik Johan Koop
  • Substrate holder for use in a lithographic apparatus
    Patent number: 11139196
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
  • Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system
    Patent number: 11137689
    Abstract: A method of creating electronic devices such as semiconductor chips using a maskless lithographic exposure system such as a charged particle multi-beamlet lithography system (301A-301D). The maskless lithographic exposure system comprises a lithography subsystem (316) including a maskless pattern writer such as a charged particle multi-beamlet lithography machine (1) or ebeam machine. The method comprises introducing unique chip design data (430) or information related thereto into pattern data comprising common chip design data before streaming the pattern data to the maskless pattern writer.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: October 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Nicolaas Jacobus Van Kervinck, Vincent Sylvester Kuiper
  • Particle suppression systems and methods
    Patent number: 11137694
    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: October 5, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N V.
    Inventors: Yang-Shan Huang, Marcel Joseph Louis Boonen, Han-Kwang Nienhuys, Jacob Brinkert, Richard Joseph Bruls, Peter Conrad Kochersperger
  • Radiation source
    Patent number: 11140765
    Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Rilpho Ludovicus Donker, Han-Kwang Nienhuys
  • MATCHING PUPIL DETERMINATION
    Publication number: 20210302844
    Abstract: A method for reducing apparatus performance variation. The method includes obtaining (i) a reference performance (e.g., CD) of a reference apparatus (e.g., a reference scanner), (ii) a set of initial leading degrees of freedom selected from a plurality of degrees of freedom of a plurality of pupil facet mirrors of an apparatus (e.g., to be matched scanner) that is selected to reproduce the reference performance, and (iii) exposure data related to one or more parameters (e.g., CD, overlay, focus, etc.) of the patterning process indicating a performance of the apparatus based on the set of initial leading degrees of freedom; and determining a matching pupil of the apparatus based on the set of initial leading degrees of freedom and the exposure data such that the matching pupil reduces a difference between the performance of the apparatus and the reference performance.
    Type: Application
    Filed: August 12, 2019
    Publication date: September 30, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Anton Bernhard VAN OOSTEN
  • METHOD AND APPARATUS FOR CONFIGURING SPATIAL DIMENSIONS OF A BEAM DURING A SCAN
    Publication number: 20210302843
    Abstract: A method of configuring a step of scanning a beam of photons or particles across a patterning device for exposing a pattern onto a substrate, wherein the method includes determining a spatial resolution of a patterning correction configured to improve quality of the exposing, and determining a spatial dimension of the beam based on the determined spatial resolution of the patterning correction.
    Type: Application
    Filed: August 1, 2019
    Publication date: September 30, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daan Maurits SLOTBOOM, Hermannes Theodorus HEIJMERIKX, Javier Augusto LOAIZA RIVAS, Jeroen COTTAAR