Patents Assigned to Carl-Zeiss-Stiftung
  • Assembly comprising an optical element and a mount
    Patent number: 6369959
    Abstract: An assembly comprising an optical element and a mount has a fastening flange 2, an intermediate element 3 in at least approximately the form of a funnel and an inner ring 4. The optical element 1 is mounted in the inner ring 4, which is connected to the fastening flange 2 via the intermediate element 3. The intermediate element 3 is connected on the side with the smaller diameter to the inner ring 4 and on the side with the greater diameter to the fastening flange 2.
    Type: Grant
    Filed: June 6, 2000
    Date of Patent: April 9, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Michael Trunz, Bernhard Dipl.-Ing Gellrich, Roland Dipl.-Ing Gischa, Hubert Holderer, Cornelia Rösch
  • Projection exposure apparatus and exposure method
    Publication number: 20020039180
    Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).
    Type: Application
    Filed: April 16, 2001
    Publication date: April 4, 2002
    Applicant: Carl-Zeiss-Stiftung
    Inventor: Gerd Furter
  • Method of straightening the supporting surfaces of supporting elements for optical elements
    Patent number: 6366413
    Abstract: In a method of straightening the supporting surfaces (5) of supporting elements (3) for optical elements (1), in particular in lens systems of microlithography projection exposure equipment, the supporting elements (3) and/or at least one bearing part (2, 6) connected to the supporting elements (3) for the optical elements (1) are deformed by a laser beam (A, B, C, D) produced by a laser (7) in such a way that the supporting surfaces (5) are at least approximately aligned with a common supporting plane or some other prescribed distribution.
    Type: Grant
    Filed: October 19, 2000
    Date of Patent: April 2, 2002
    Assignee: Carl-Zeiss Stiftung
    Inventors: Michael Trunz, Bernhard Gellrich
  • Reticular objective for microlithography-projection exposure installations
    Patent number: 6366410
    Abstract: A REMA objective is realized by introduction of a few (1 to 5 units) aspherical surfaces of high-quality correction with a low number of lenses (no more than 10), and low path in glass (maximum 25% to 30%) of the object-reticle distance, thus enhancing efficiency.
    Type: Grant
    Filed: August 12, 1999
    Date of Patent: April 2, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Jörg Schultz, Johannes Wangler, Karl-Heinz Schuster
  • Method for heating a workpiece
    Publication number: 20020030042
    Abstract: In a method for heating workpieces, in particular optical elements such as lenses, in particular lenses made from calcium fluoride material, which are optically transparent over a large IR wavelength region of up to approximately 9 &mgr;m, the heating by thermal radiation takes place in the transition region of the optical element between optical transparency and an optically absorbing region in a wavelength region from 9 to 12 &mgr;m.
    Type: Application
    Filed: September 4, 2001
    Publication date: March 14, 2002
    Applicant: Carl-Zeiss-Stiftung trading as Carl Zeiss
    Inventors: Jens Ullmann, Ralf Kuschnereit
  • Microlithographic reduction objective, projection exposure equipment and process
    Patent number: 6349005
    Abstract: A microlithographic projection objective with a lens arrangement, has a a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power. The system diaphragm (AS) is situated in the fifth lens group, and at least two lenses of this lens group are situated before the system diaphragm (AS). The numerical aperture on the image side is greater than 0.65 (in examples, up to 0.8), or this lens group has at least 13 lenses, or the system diaphragm (AS) is arranged in the region of the lens at which the pencil of rays assumes the greatest diameter, and its two adjacent lenses.
    Type: Grant
    Filed: October 12, 1999
    Date of Patent: February 19, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Karl-Heinz Schuster, Helmut Beierl
  • Adaptronic mirror
    Publication number: 20020009178
    Abstract: The invention concerns an optical device for radiation with a wavelength ≦160 nm, preferably EUV radiation with
    Type: Application
    Filed: January 11, 2001
    Publication date: January 24, 2002
    Applicant: Carl-Zeiss-Stiftung trading as Carl Zeiss
    Inventors: Udo Dinger, Martin Ross-Messemer
  • Lens system, in particular projection lens system in semiconductor lithography
    Publication number: 20020001142
    Abstract: In the case of a lens system, in particular a projection lens system in semiconductor lithography, with a plurality of optical elements, such as lenses, which are mounted in mounts, the mounts being connected to one another, if appropriate by means of adjusting rings, at least one inner mount of an optical element which is intended for removal and/or later fitting is connected to an outer mount by means of a three-point mounting.
    Type: Application
    Filed: June 5, 2001
    Publication date: January 3, 2002
    Applicant: Carl-Zeiss-Stiftung
    Inventor: Karlfrid Osterried
  • Workpiece irradiation system
    Patent number: 6329634
    Abstract: The invention relates to a workpiece irradiation system which has several individually adjustable deflecting devices, and in which several spatially mutually separated individual processing beam pencils are respectively deflected separately, by means of the deflecting devices arranged in the optical beam path, to at least one workpiece to be irradiated, to variable points or surfaces on the workpiece.
    Type: Grant
    Filed: July 17, 2000
    Date of Patent: December 11, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Jürgen Schweizer
  • Optical system, in particular projection-illumination unit used in microlithography
    Patent number: 6307688
    Abstract: An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and actuators 8a, 8b and 9a, 9b. A plurality of actuators 8a, 8b and 9a, 9b act on the deformable inner ring 2 via a radial force-displacement transmission 12, 13 in order to generate tensile and/or compressive forces.
    Type: Grant
    Filed: November 22, 1999
    Date of Patent: October 23, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Erich Merz, Jochen Becker
  • Method and device for mutually aligning a mask pattern formed in a mask and a substrate
    Patent number: 6294296
    Abstract: In a method for mutually aligning a mask pattern formed in a mask 1 and a substrate 2, on which the mask pattern is to be imaged, by using setting marks 12a, 12b and 13a or 13b in the mask 1 and in the substrate 2, the alignment is performed with the aid of an imaging system and a light beam with polarized light 9. A phase shift for the first diffraction orders 20 is undertaken in the beam path 9a, 9b. Higher diffraction orders 21 and unwanted light are filtered out after the phase shift, and after the filtering out the light beams of the first diffraction orders 20 are detected, and the result is evaluated for the purpose of alignment.
    Type: Grant
    Filed: February 22, 2000
    Date of Patent: September 25, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Bernhard Weigl
  • Illuminating arrangement for a projection microlithographic apparatus
    Patent number: 6285443
    Abstract: The invention is directed to an illuminating arrangement for a projection microlithographic apparatus having a laser 1 and an objective 2. Diffractive optical raster elements (8, 9) having a two-dimensional raster structure are mounted in the exit pupil and the object plane, respectively, of the objective 2 or in planes equivalent thereto. The illuminating arrangement provides an adapted increase of the light-conductance value and shapes the light beam, for example, into a circular shape, an annular shape or a quadrupole shape. The illuminating arrangement is suitable for combining with a zoom lens or an axicon objective 2 as well as with a glass rod 5.
    Type: Grant
    Filed: May 20, 1999
    Date of Patent: September 4, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Johannes Wangler, Gerhard Ittner
  • Optical mount with UV adhesive and protective layer
    Patent number: 6285496
    Abstract: An assembly includes a holder made of material selected from metal and ceramic/glass ceramic, a transparent optical component that is transparent in the ultraviolet (UV) wavelength region of light, which has functional faces serving for transmission, and adhesive that is hardenable by UV light of a given long wavelength region, a layer applied by thin film technology and fixed to the holder by the adhesive. The layer is provided only outside said functional faces and to a high degree at least reflects or absorbs radiated light in a predetermined UV wavelength region within the UV wavelength region transmitted by the transparent optical component, and is transparent in the given long wavelength region to harden the adhesive by UV light irradiation that passes through the transparent optical component and the layer.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: September 4, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Harry Bauer, Sascha Kraus, Hans G Keck, Jörg Endler, Hans-Joachim Weippert
  • Computer supported video microscope including a linear sensor for generating an overview image
    Patent number: 6282019
    Abstract: The invention relates to a compact microscope 4 especially for medical routine applications. The microscope is configured as a closed housing 8 wherein the specimen 30 to be microscoped is drawn in via an input opening 25. All optical components of the microscope are mounted within the housing. Alternatively, the microscope can be mounted in a standard drive bay of a personal computer 3. All movable components of the microscope are motorically driven and controlled by software via the computer. The specimen can be moved in two mutually perpendicular directions within the microscope to select the object detail of interest. An overview diagram of the specimen is produced with a line sensor when the specimen is drawn in.
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: August 28, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Hans-Georg Kapitza
  • Positioning device
    Patent number: 6276066
    Abstract: A positioning device is provided with a spindle and a spindle nut cooperating therewith for the conversion of a rotary motion into a linear motion for a coarse adjustment, and a piezoelectric linear positioning element arranged in series with the spindle and spindle nut for fine adjustment. The piezoelectric linear positioning element is relieved of transverse forces and moments by a cardan joint that is arranged between an object seating and the spindle.
    Type: Grant
    Filed: July 15, 1999
    Date of Patent: August 21, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Lothar Scheibl, Albrecht Hof
  • Damping device for a coordinate measuring equipment
    Patent number: 6272760
    Abstract: A damping device for vibration damping of components of a coordinate measuring equipment has a damping component which is frictionally connected to the component to be damped. The characteristic frequency of the damping component deviates from the characteristic frequency of the component to be damped.
    Type: Grant
    Filed: July 21, 1998
    Date of Patent: August 14, 2001
    Assignee: Carl-Zeiss-Stiftung trading as Carl Zeiss
    Inventors: Wolfgang Wiedmann, Carsten Würfel, Eugen Aubele
  • Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement
    Publication number: 20010012154
    Abstract: An optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21′. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.
    Type: Application
    Filed: December 7, 2000
    Publication date: August 9, 2001
    Applicant: Carl-Zeiss-Stiftung
    Inventor: Karl-Heinz Schuster
  • Apparatus for tilting an object about at least one axis, in particular an optical element
    Patent number: 6271976
    Abstract: In the case of an apparatus for tilting an object about at least one axis, in particular an optical element, such as a lens (9), the object in the case of an optical element is supported by an inner ring (7) and connected via at least three bearing points to a mount or an outer ring (8). Tilting of the object (9) is adjustable by means of adjusting elements. A plurality of links (1-6) are provided as adjusting elements, some of which, as supporting links (1-4), bear the inner ring (7) with respect to the outer ring (8) in such a way that the inner ring (7) can rotate only about two mutually perpendicular tilting axes (x, y axis). Two further links, as adjusting links (5, 6), support torsional moments about the mutually perpendicular tilting axes. The tilting angles are adjustable by adjusting the adjusting links (5, 6).
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: August 7, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Ulrich Weber
  • Surveying system with an inertial measuring device
    Patent number: 6266628
    Abstract: A surveying system has a sighting device and a position measuring unit. The position measuring unit includes an inertial measuring device.
    Type: Grant
    Filed: November 13, 1998
    Date of Patent: July 24, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Wolfgang Huep, Ernst Michelbacher
  • Hydraulic support cell assembly
    Patent number: 6265654
    Abstract: The invention relates to a thermal compensation device having a thermal compensation cell for a hydraulic support cell that has a working chamber and a compensation chamber. According to the invention, each of the chambers of the support cell is connected to a chamber in the thermal compensation cell. Two tightly interconnected pistons with identical working surfaces press on both chambers in the thermal compensation cell. For this purpose, a lateral support system with a reversing lever having at least one hydraulic cell, which has a work cell and a compensation cell, is used. According to the invention, the rotating axis of the reversing lever is arranged at least in one axis running through a hydraulic cell. Each work chamber and the compensation chamber of the hydraulic cell lie opposite each other.
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: July 24, 2001
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Hans-Jürgen Meier