Abstract: An adjustable assembly comprises a base (mount ring 1), an adjustable part (inner ring 3), a lever (tilting lever 5) and a drive (drive element 6). The lever (tilting lever 5) is connected to the base (mount ring 1) and to the adjustable part (inner ring 3) via two elastic solid pivoting joints (7, 8) oriented in parallel. One of the two solid pivoting joints (7) is divided into two pivoting joint parts (7a, 7b), which are arranged such that along their pivoting axis (9) they are offset sideways on either side of the second solid pivoting joint (8).

Abstract: The invention is directed to a support (1) for an apparatus (3) which is to be suspended so as to be movable. The support (1) includes a holding arm (17) and an adjusting unit (19) mounted on the holding arm (17). The adjusting device (19) includes a slidingly displaceable sliding disc (25).

Abstract: A light intensity measurement system in an illumination system of a projection illumination system for microlithography. The light intensity measurement system includes an adjustable diaphragm that reflects light back into a light-mixing glass rod. The light-mixing glass rod includes a deflecting mirror that transmits a fraction of the light intensity and an energy sensor that senses the transmitted fraction of light intensity. An adjustable diaphragm is arranged following the glass rod in the direction of light flow. The reflected light, in part, also reaches the energy sensor. A compensation detector containing a photodetector is arranged at the deflecting mirror in the main direction of the light reflected by the adjustable diaphragm.

Abstract: An optical system with at least one optical element that causes a disturbance of the distribution of polarization over the cross section of a light beam wherein at least one birefringent optical element is provided, with a thickness which varies irregularly over the cross section, such that the disturbance of the distribution of polarization is at least partially compensated.

Abstract: A reduction objective, a projection exposure apparatus with a reduction objective, and a method of use thereof are disclosed. The reduction objective comprises four (primary, secondary, tertiary, and quaternary) mirrors in centered arrangement with respect to an optical axis. The primary mirror is a convex mirror and the second mirror has a positive angular magnification. The reduction objective has an obscuration-free light path and is suitable for annular field scanning operation, such as is used in soft X-ray, i.e. and EUV and UV, lithography.

Abstract: The invention is directed to an infrared Kepler telescope which includes an objective defining an optical axis and including a positive front group and a negative rear group all arranged on the optical axis. The objective further includes an interchangeable optic interposed between the positive front group and the negative rear group with the interchangeable optic being configured to operate as a magnification changer. An ocular is mounted on the optical axis rearward of the negative rear group and the rear group and the ocular are fixedly pregiven. The positive front group is a first positive front group and is exchangeable with at least a second positive front group. The interchangeable optic is a first interchangeable optic and is exchangeable with at least a second interchangeable optic.

Abstract: An illuminating system for the vacuum ultraviolet (VUV) microlithography (at 157 nm) is disclosed and has a VUV light source (1), refractive optical elements of fluoride, at least one microlens array (3, 5) functioning as an element for increasing the light conductance value, and at least one honeycomb condenser (7a, 7b). The honeycomb condenser is preferably configured of crossed cylinder lens arrays.

Abstract: A process for guiding an instrument in space, in which the instrument is arranged at the free end of an articulated arm whose arm sections are caused to pivot and/or travel with respect to each other by drive units. The instrument is caused to travel in a limited movement region under the control of a control device. For predetermination of the movement region for points that are situated in the movement region, a respective pivot angle and/or travel position between the respective arm sections is set. The respective position and attitude of the instrument is sensed by at least a first measuring device. For hand-controlled guiding of the instrument, an actuating force exerted on the instrument and/or the articulated arm is sensed by a second measuring device.

Abstract: The invention relates to a composite body which is assembled from at least two bodies. The first body is made of a first material and the second body of a second material and each of the two bodies has at least one joining surface. The joining surfaces lie opposite each other and the bodies are joined to each other by at least one adhesive connection. At least one recess for a compensating body made of a third material is introduced into at least one of the two joining surfaces. This compensating body is connected with at least one adhesive location or gluing gap to both bodies. An adhesive ensures an adhesive connection between the compensating body and the two bodies at the adhesive location.

Abstract: Assembly of an optical element and a mount, in which the optical element is coupled by means of numerous lugs to a rigid intermediate ring, which itself is coupled by adjusting members or passive decouplers to the mount for connection to a housing and/or to a further mount.

Abstract: A laser adapter 2 for mounting on a surgical microscope 4 includes a compactly configured laser 9 which supplies a therapeutic laser beam 10 at a suitable wavelength. In addition, a pulse energy monitoring device is provided in the laser adapter 4 which is used for the on-line energy measurement of the emitted laser pulses and whose output signals are applied as parameters for controlling the pulse energy emitted by the laser 9.

Abstract: The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system.

Abstract: In a process for the correction of non-rotationally-symmetrical image errors in an assembly, e.g., an objective with optical elements, particularly lenses, several Peltier elements are arranged on at least one of the optical elements, distributed over its periphery, and are differently driven electrically in order to act on the temperature distribution in the optical element. A respective temperature-conducting connection is provided between the Peltier elements and the optical element. The invention also relates to an objective with optical elements, particularly lenses, and Peltier elements.

Abstract: The invention relates to a compact microscope 4 especially for medical routine applications. The microscope is configured as a closed housing 8 wherein the specimen 30 to be microscoped is drawn in via an input opening 25. All optical components of the microscope are mounted within the housing. Alternatively, the microscope can be mounted in a standard drive bay of a personal computer 3. All movable components of the microscope are motorically driven and controlled by software via the computer. The specimen can be moved in two mutually perpendicular directions within the microscope to select the object detail of interest. An overview diagram of the specimen is produced with a line sensor when the specimen is drawn in.

Abstract: An active mirror has a reflectively coated diaphragm, a mount, and at least one actuator, in which a second diaphragm is connected to the mount, and the actuator is operatively connected to the two diaphragms. The active mirror is symmetrical with respect to a midplane.

Abstract: An optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21′. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.

Abstract: An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.

Abstract: A material irradiation apparatus with a beam source produces a processing beam. The apparatus has a beam splitting device following the beam source, by which the processing beam is divided into several partial beams. Each partial beam can be deflected by a deflecting device discretely associated with it to different places on at least one workpiece to be processed, independently of the other partial beams. The workpiece to be processed is situated on a workpiece movement device that is movable in at least one axis. The machining beam is successively incident on a plurality of beam splitter devices that are movably arranged in the axis of the machining beam that is incident on them. The partial beams emerging from the beam splitter devices are simultaneously incident on the workpiece movement device. The workpiece movement device is arranged to be movable in at least one coordinate direction that deviates from the movement axis of the beam splitter devices.

Abstract: The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.

Abstract: The invention is directed to a catadioptric microlithographic reduction objective having two concave mirrors (21, 23) facing toward each other. The concave mirrors have a symmetrical configuration and a central bore. Lenses (24 to 60) are mounted downstream of the mirrors (21, 23) on the light path toward the image plane (61). Preferably, lenses (15 to 20) are moved at the object end forward into the intermediate space between the mirrors (21, 23) in the region of the central bore. The light path between the concave mirrors can then preferably be free of lenses. The formation of an intermediate image (Z) downstream of the mirrors (21, 23) affords especially good correction possibilities.