Patents Assigned to FEI Company
  • Publication number: 20230035267
    Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.
    Type: Application
    Filed: October 12, 2022
    Publication date: February 2, 2023
    Applicant: FEI Company
    Inventors: Pavel POTOCEK, Remco SCHOENMAKERS, Maurice PEEMEN, Bert Henning FREITAG
  • Patent number: 11569056
    Abstract: Methods and apparatuses are disclosed herein for parameter estimation for metrology. An example method at least includes optimizing, using a parameter estimation network, a parameter set to fit a feature in an image based on one or more models of the feature, the parameter set defining the one or more models, and providing metrology data of the feature in the image based on the optimized parameter set.
    Type: Grant
    Filed: October 29, 2019
    Date of Patent: January 31, 2023
    Assignee: FEI Company
    Inventors: Brad Larson, John Flanagan, Maurice Peemen
  • Patent number: 11562877
    Abstract: A method of producing a compensation signal to compensate for misalignment of a drive unit clamp element can include applying a clamp element drive signal to a drive unit clamp element to engage a mover element. A first displacement of the mover element can be determined. A first compensation signal to be applied to one or more drive unit shear elements can be determined based at least in part on the first displacement. The first compensation signal can be applied to the one or more drive unit shear elements and the clamp element drive signal can be applied to the drive unit clamp element. A second displacement can be determined in response to the application of the first compensation signal and the clamp element drive signal. The second displacement can then be compared to a preselected threshold.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: January 24, 2023
    Assignee: FEI Company
    Inventors: Edwin Verschueren, Paul Tacx
  • Publication number: 20230020957
    Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 19, 2023
    Applicant: FEI Company
    Inventors: Bart BUIJSSE, Bart Jozef JANSSEN
  • Publication number: 20230011267
    Abstract: A charged particle beam source, such as for use in an electron microscope, can include a mounting member defining a first opening at a free end of the mounting member and a bore extending from the first opening into the mounting member along a longitudinal axis of the mounting member. A second opening can be defined in a side wall of the mounting member and can extend between an outer surface of the mounting member and the bore, the second opening being spaced apart from the first opening along the longitudinal axis of the mounting member. An emitter member can be received in the bore and aligned along the longitudinal axis of the mounting member. A fixative material can be received in the bore and in the second opening to retain the emitter member in the bore.
    Type: Application
    Filed: June 9, 2022
    Publication date: January 12, 2023
    Applicant: FEI Company
    Inventors: Kun Liu, Steven J. Randolph
  • Patent number: 11551906
    Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected within a predetermined time window.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: January 10, 2023
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
  • Publication number: 20230005733
    Abstract: An energy spectrometer with dynamic focus for a transmission electron microscope (TEM) is disclosed herein. An example energy spectrometer and TEM at least includes a charged particle column including a projection system arranged after a sample plane, the projection system is operated in a first configuration; an energy spectrometer coupled to the charged particle column to acquire one or more energy loss spectra. The energy spectrometer including a dispersive element, a bias tube, optics for magnifying the energy loss spectrum and for correcting aberrations, and a detector arranged conjugate to a spectrum plane of the energy spectrometer, wherein the energy spectrometer further includes an optical element electrically biased to refocus at least a portion of a spectrum onto the detector, and wherein the value of the electrical bias is at least partially based on the first configuration of the charged particle column.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Arthur Reinout HARTONG, Alexander HENSTRA, Sorin LAZAR, Peter Christiaan TIEMEIJER
  • Publication number: 20230005702
    Abstract: Disclosed herein are methods, apparatuses, systems, and computer-readable media related to defective pixel management in charged particle microscopy. For example, in some embodiments, a charged particle microscope support apparatus may include: first logic to identify a defective pixel region of a charged particle camera, wherein the charged particle camera cannot detect charged particle events in the defective pixel region; second logic to generate a first charged particle event indicator that identifies a first time and a first location of a first charged particle event outside the defective pixel region, wherein the first charged particle event is detected by the charged particle camera; third logic to generate a second charged particle event indicator that identifies a second time and a second location in the defective pixel region; and fourth logic to output data representative of the charged particle event indicators.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Erik Michiel FRANKEN, Bart Jozef JANSSEN
  • Publication number: 20230005703
    Abstract: The invention relates to a sample holder for a microscopy system comprising a material with a low thermal conductivity for reducing a drift of the sample holder when inserted into a microscope. The invention also relates to a cold trap for a microscopy system comprising a sample holder, wherein the cold trap comprises a coating with a high thermal emissivity to increase a heat load between the sample holder and the cold trap. The invention also relates to a microscopy system comprising a first element configured to have a first temperature, a second element configured to have a second temperature, and a third element configured to have a third temperature, wherein the third element is configured to be located at a plurality of different distances from the first element, wherein the microscopy system is configured to image a sample and to reduce a drift of the image.
    Type: Application
    Filed: June 29, 2022
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Nick Van Gestel, Nick Verwimp, Ruud Krijnen
  • Publication number: 20230005705
    Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected withing a predetermined time window.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
  • Publication number: 20230003672
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Application
    Filed: August 31, 2022
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Publication number: 20230005710
    Abstract: The disclosure relates to a method for examining a sample in a scanning transmission charged particle microscope. The method comprises the steps of providing a scanning transmission charged particle microscope, having an illuminator and a scanning unit. The method comprises the steps of providing a desired dose for at least a first sample location of the plurality of sample locations; and determining, using a controller of the microscope, a first set of parameter settings for the illuminator and the scanning unit for substantially achieving the desired dose at the first sample location.
    Type: Application
    Filed: June 29, 2022
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Maarten Bischoff, Bert Freitag
  • Publication number: 20230003699
    Abstract: Disclosed herein are chromatography instrument support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a chromatography instrument support apparatus may include: first logic to generate one or more peak locations for a chromatogram data set and to generate one or more baselines for the chromatogram data set, wherein an individual peak has an associated baseline, and wherein the first logic includes a machine-learning computational model that outputs estimated peak locations and estimated baselines; second logic to cause the display of the one or more peak locations and the one or more baselines concurrently with the display of the chromatogram data set; and third logic to, for individual peaks, generate an associated integrated value representing an area above the associated baseline and under a portion of the chromatogram data set corresponding to the individual peak.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Fabrice LACOUT, Peter SAUTER
  • Publication number: 20230003675
    Abstract: Method and system are disclosed for determining sample composition from spectral data acquired by a charged particle microscopy system. Chemical elements in a sample are identified by processing the spectral data with a trained neural network (NN). If the identified chemical elements not matching with a known elemental composition of the sample, the trained NN is retrained with the spectral data and the known elemental composition of the sample. The retrained NN can then be used to identify chemical elements within other samples.
    Type: Application
    Filed: July 1, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Oleksii KAPLENKO, Jan KLUSCÁEK, Tomás TÛMA, Mykola KAPLENKO, Ondrej MACHEK
  • Publication number: 20230005697
    Abstract: Disclosed herein are apparatuses and systems for reentrant fluid delivery techniques. An example system includes at least a fluid delivery conduit extending between first and second electrical potentials, wherein the fluid delivery conduit is formed into a tilted helical so that a fluid flowing through the fluid delivery conduit experiences an electric field reversal through each winding of the fluid delivery conduit.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventor: James B MCGINN
  • Publication number: 20220410615
    Abstract: The present invention describes a blotting material comprising a profiled region that has a portion configured to protrude at least partially into a space created within a boundary formed by the rim of a holder for a sample grid. Also described are methods for making such profiles and components used to make said profiles. There are also provided methods for removing excess liquid from a sample grid by bringing the profiled blotting material into association with the sample grid past the sample grid holder. Systems comprises means to hold a sample grid holder, means to hold the blotting paper, and means to bring the two together are also described.
    Type: Application
    Filed: June 27, 2022
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Ivanka Spee, Jeroen Bresser, Adrian Koh, Maarten Kuijper, Mathijs Petrus Wilhelmus van den Boogaard
  • Publication number: 20220414855
    Abstract: Disclosed herein are apparatuses, systems, methods, and computer-readable media relating to area selection in charged particle microscope (CPM) imaging. For example, in some embodiments, a CPM support apparatus may include: first logic to generate a first data set associated with an area of a specimen by processing data from a first imaging round of the area by a CPM; second logic to generate predicted parameters of the area; and third logic to determine whether a second imaging round of the area is to be performed by the CPM based on the predicted parameters of the area; wherein the first logic is to, in response to a determination by the third logic that a second imaging round of the area is to be performed, generate a second data set, including measured parameters, associated with the area by processing data from a second imaging round of the area by the CPM.
    Type: Application
    Filed: June 25, 2021
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Yuchen DENG, Holger KOHR, Maurice PEEMEN
  • Publication number: 20220412900
    Abstract: Methods and apparatus determine offcut angle of a crystalline sample using electron channeling patterns (ECPs), wherein backscattered electron intensity exhibits angular variation dependent on crystal orientation. A zone axis normal to a given crystal plane follows a circle as the sample is azimuthally rotated. On an ECP image presented with tilt angles as axes, the radius of the circle is the offcut angle of the sample. Large offcut angles are determined by a tilt technique that brings the zone axis into the ECP field of view. ECPs are produced with a scanning electron beam and a monolithic backscattered electron detector; or alternatively with a stationary electron beam and a pixelated electron backscatter diffraction detector. Applications include strain engineering, process monitoring, detecting spatial variations, and incoming wafer inspection. Methods are 40× faster than X-ray diffraction. 0.01-0.1° accuracy enables semiconductor applications.
    Type: Application
    Filed: June 24, 2021
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Han Han, Libor Strakos, Thomas Hantschel, Tomas Vystavel, Clement Porret
  • Publication number: 20220414361
    Abstract: Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.
    Type: Application
    Filed: June 24, 2021
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Pavel POTOCEK, Maurice PEEMEN, Bert Henning FREITAG
  • Patent number: 11538652
    Abstract: To compensate for hysteresis in an actuator, a path between a first position and a second position can be selected, and a drive signal can be applied to an actuator element that includes a hysteresis-compensated portion to move an object along the selected path.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: December 27, 2022
    Assignee: FEI Company
    Inventors: Edwin Verschueren, Paul Tacx