Abstract: A method for fabricating a semiconductor device includes forming a hard mask pattern over a substrate, forming an isolation layer for defining an active region by using the hard mask pattern, forming a buried gate in and across the active region and the isolation layer over the substrate, forming an inter-layer dielectric layer over the substrate, forming a storage node contact hole that exposes the hard mask pattern by selectively etching the inter-layer dielectric layer, extending the storage node contact hole to expose the active region by removing the hard mask pattern exposed under the storage node contact hole, and forming a storage node contact plug that fills the extended storage node contact hole.

Abstract: A non-volatile memory device for measuring a read current of a unit cell is provided. The non-volatile memory device includes a unit cell configured to read or write data, a column switching unit configured to select the unit cell in response to a column selection signal, a sense amplifier controlled by a sense-amplifier enable signal, configured to sense and amplify data that is received from the unit cell through the column switching unit, a first latch unit configured to latch the sense-amplifier enable signal for a predetermined time when a test code signal received from an external part is activated, a column controller configured to output a latch control signal in response to a combination of a column switch-off signal and a column control signal, and a second latch unit configured to control whether or not the column selection signal is latched in response to an activation state of the latch control signal.

Abstract: A semiconductor memory apparatus includes a phase comparator configured to compare phases of rising and falling feedback clocks with that of a reference clock, a delay circuit configured to delay the reference clock by a predetermined time based on a comparison result of the phase comparator to thereby generate rising and falling delayed clocks, a clock transmission block configured to invert the rising delayed clock outputted from the delay circuit when the rising and falling feedback clocks have substantially different phases, a duty compensator configured to compensate a duty ratio from outputs of the clock transmitting block to generate a delay locked clock having a compensated duty ratio, and a delay model configured to delay an output and an inverse output of the duty compensator by a modeled delay time respectively to generate the rising and falling feedback clocks.

Abstract: A semiconductor memory device includes a first plane and a second plane each configured to include a plurality of memory cells, and a data transfer circuit configured to transfer first data, stored in the memory cells of the first plane, to the second plane and transfer second data, stored in the memory cells of the second plane, to the first plane when a copyback operation is performed and to transfer the first data or the second data to an I/O circuit when a read operation is performed.

Abstract: A temperature detection circuit of a semiconductor memory apparatus includes a fixed period oscillator, a temperature variable signal generating unit and a counting unit. The oscillator is configured to generate a fixed period oscillator signal when an enable signal is enabled. The temperature variable signal generating unit is configured to generate a temperature variable signal whose enable interval varies based on temperature variations, when the enable signal is enabled. The counting unit is configured to count the oscillator signal during the enable interval of the temperature variable signal to generate a temperature information signal.

Abstract: A semiconductor device includes a first gate electrode buried within a semiconductor substrate, a second gate electrode buried within a silicon growth layer disposed on the semiconductor substrate, and a bit line disposed on an interlayer insulating layer disposed on the semiconductor substrate between the first gate electrode and a second gate electrode. Therefore, the number of gates disposed in an active region is increased so that a total memory capacity of the semiconductor device, thereby reducing fabrication cost and improving productivity.

Abstract: Disclosed herein is a fabrication method of a semiconductor device to order to increase an operation liability of the semiconductor device. A method for fabricating a semiconductor device comprises forming a recess in a semiconductor substrate, forming a word line in a lower part of the recess, oxidizing a top portion of the word line, and depositing an insulating material in a remained part of the recess.

Abstract: A semiconductor package includes a semiconductor chip having a plurality of bonding pads. Through-electrodes are formed in the semiconductor chip and are electrically connected to the bonding pads. The through electrodes comprise a plurality of conductors and a plurality of voids that are defined by the conductors. Each conductor may include a plurality of nanowires grouped into a spherical shape having a plurality of voids, a plurality of nanowires grouped into a polygonal shape having a plurality of voids, or the conductors may include a plurality of micro solder balls. The voids of the through electrode absorb stress caused when head is generated during the driving of the semiconductor package.

Abstract: A semiconductor device and a method for manufacturing the same are disclosed. A dummy pattern is formed between a fuse pattern and a semiconductor substrate so as to prevent the semiconductor substrate from being damaged, and a buffer pattern is formed between the dummy pattern and the semiconductor substrate, so that a dummy metal pattern primarily absorbs or reflects laser energy transferred to the semiconductor substrate during the blowing of the fuse pattern, and the buffer pattern secondarily reduces stress generated between the dummy pattern and the semiconductor substrate, resulting in the prevention of a defect such as a crack.

Abstract: A semiconductor memory apparatus includes a memory block including memory strings having respective channel layers coupled between respective bit lines and a source line, an operation circuit group configured to supply hot holes to the channel layers and to perform an erase operation on memory cells of the memory strings, an erase operation determination circuit configured to generate a block erase enable signal when hot holes of at least a target number are supplied to a first channel layer of the channel layers, and a control circuit configured to perform the erase operation in response to the block erase enable signal.

Abstract: A flexible semiconductor package apparatus having a responsive bendable conductive wire member is presented. The apparatus includes a flexible substrate, semiconductor chips, and conductive wires. The semiconductor chips are disposed on the flexible substrate and spaced apart from each other on the flexible substrate. Each semiconductor chip has bonding pads. The conductive wires are electrically connected to the bonding pads of the semiconductor chip. Each conductive wire has at least one elastic portion. One preferred configuration is that part of the conductive wire is wound to form a coil spring shape so that the coil spring shape of the conductive wire aid in preventing the conductive wire from being separated from the corresponding bonding pad of the semiconductor chip when the flexible substrate on which the semiconductor chips are mounted are bent, expanded or twisted.

Abstract: A semiconductor device and a method for fabricating the same are provided which can increase the effective channel area and maintain a transistor characteristic. Since the semiconductor device comprises a recess filled with a gate spacer, a gate threshold voltage can be maintained even though the ion-implanting concentration of the active region is not uniform. The semiconductor device comprises: a device isolation film that defines an active region formed over a semiconductor substrate; a line-type recess with a given depth formed to be extended along a first direction to intersect at the active region; and a gate formed to be extended along a second direction to intersect at the active region, wherein a spacer including a high K material is disposed at sidewalls.

Abstract: An error code pattern generation circuit includes a first storage unit configured to store at least one bit of an error code, and output error data for a first time period; and a second storage unit configured to store at least one remaining bit of the error code and output the error data for a second time period which is different from the first time period.

Abstract: The manufacturing of a phase change memory device that includes a switching device, a bottom electrode contact in contact with the switching device and a porous spacer formed on the bottom electrode contact. The formed bottom electrode contact exposes a switching device on a semiconductor substrate which the switching device is formed in, forming an insulating layer on a resultant structure of the semiconductor substrate including the bottom electrode contact by using an insulating compound having materials with different atomic sizes, and forming an insulating spacer within the bottom electrode contact hole by selectively etching the insulating layer.

Abstract: A stacked semiconductor package having through electrodes that exhibit a reduced leakage current and a method of making the same are presented. The stacked semiconductor package includes a semiconductor chip, through-holes, and a current leakage prevention layer. The semiconductor chip has opposing first and second surfaces. The through-holes pass entirely through the semiconductor chip and are exposed at the first and second surfaces. A polarized part is formed on at least one of the first and second surfaces of the semiconductor chip. The through-electrodes are disposed within the through-holes. The current leakage prevention layer covers the polarized part and exposes ends of the through-electrodes.

Abstract: A vertical channel type non-volatile memory device having a plurality of memory cells stacked along a channel includes the channel configured to be protruded from a substrate, a tunnel insulation layer configured to surround the channel, a plurality of floating gate electrodes and a plurality of control gate electrodes configured to be alternately stacked along the channel, and a charge blocking layer interposed between the plurality of the floating gate electrodes and the plurality of the control gate electrodes alternately stacked.

Abstract: A method for fabricating a semiconductor device, comprising forming a first photoresist pattern having a hole on a first layer, forming a surface curing layer in the hole and curing the first photoresist pattern on an inner sidewall of the hole to form a first curing pattern, removing the surface curing layer, forming a second photoresist pattern in the hole and curing the second photoresist pattern that contacts with the first curing pattern to form a second curing pattern, removing the first and second photoresist patterns, and etching the first layer using the first and second curing patterns as an etch barrier.

Abstract: A method for fabricating a semiconductor device includes providing a substrate having a first and a second region, forming an etch target layer over the substrate, forming a hard mask layer over the etch target layer to have different thicknesses over the first and the second regions, forming a hard mask pattern by etching the hard mask layer, and etching the etch target layer using the hard mask pattern as an etch mask to form a target pattern having different densities over the first and the second regions.

Abstract: A semiconductor memory device includes a plurality of banks, each including a plurality of first memory cells and a plurality of second memory cells, a first input/output unit configured to transfer first data between the first memory cells and a plurality of first data pads; a second input/output unit configured to transfer second data between the second memory cells and a plurality of second data pads, a path selection unit configured to transfer the first data, which are input through the first data pads, to both the first and second memory cells, during a test mode, and a test mode control unit configured to compare the first data of the first and second memory cells, and to control at least one of the first data pads to denote a fail status based on a comparison result, during the test mode.

Abstract: An integrated circuit includes a delay locked loop configured to delay a reference clock signal by a delay time for delay locking and generate a delay locked clock signal, a clock transmission circuit configured to transmit the delay locked clock signal in response to a clock transmission signal, a duty correction circuit configured to perform duty correction operation on an output clock signal of the clock transmission circuit, and a clock transmission signal generation circuit configured to generate the clock transmission signal in response to a command and burst length information.