Abstract: The invention relates to a device for the generation of a plasma by means of circularly polarized high frequency waves. These high frequency waves are generated by means of voltages having a phase rotation of 90.degree..

Abstract: Particle source, especially for reactive ion etching and plasma-enhanced CVD processes in pass-through apparatus for the treatment of large-area substrates (4) having a container completely enveloping a first plasma (19), a magnetic field generator (8, 9, 10) which fulfills the electron-cyclotron resonance, a waveguide (15) connected to the container for the delivery of electromagnetic waves, preferably microwaves (17), for the production of the plasma (19), a coupling window (16) as well as a gas feeding system for supplying the plasma process with reactive, and, for example, inert gas, the first plasma (19) being enveloped by a plasma chamber (7), the interior spaces of the plasma chamber (7) and of the adjacent vacuum chamber (2) are connected to one another, an additional guard window (12) is situated in the plasma chamber (7) directly in front of the coupling window and has an approximately constant gap (13) between it and the chamber walls (7c, 7d), a separate feeding is performed of for example inert g

Abstract: A circuit for adjusting the impedance of a plasma section to a high-frequency generator wherein three capacitors are connected in series between the high-frequency generator and an electrode of the plasma section; located between the generator and the electrode are two parallel oscillatory circuits.

Abstract: The invention described here is concerning a power supply device of a thermionic emitting cathode, an electron source in an electron vapor deposition plant. This device is provided with a transmitter whose secondary feeds the thermionic emitting cathode and whose primary is supplied with pulse width modulated and controlled heater current (I.sub.HC). The control of this heater current (I.sub.HC) is provided directly by introducing the heater current nominal value (I.sub.HC nominal) from the outside or in a manner that the current emitted (I.sub.EC) from the thermionic emitting cathode is monitored and fed galvanically decoupled to the controller. Here the galvanic decoupled connection is achieved by a pulse width modulated, optical signal.

Abstract: Cathode base (1) has a hollow target (8) disposed thereon with at least one planar sputtering surface (8a), of circular shape for example, which is encompassed by at least two concentric, continuous projections (8b, 8c), and with a magnet system (6) with pole faces (6c, 6d) of opposite polarity lying on both sides of the target (8) for the production of magnetic lines of force (11, 11', . . . ) running substantially parallel to the sputtering surface (16a), the wall surfaces (8d, 8e) of the projections (8b, 8c) of the target (8), adjoining the sputtering surface (8a) being disposed at an angle (.alpha.) to the perpendicular, is preferably in a range between 30 and 70 degrees.

Abstract: Apparatus for transporting substrates 22, 23 in vacuum deposition systems with several stations, comprising plate-like substrate holders 16 which are moved across the stations in a vertical position along a given path and have two rails which interact with two rows of rollers provided underneath the substrate holders. The side of the first rail 13 facing away from the substrate holder 16 has a longitudinal groove 13a which interacts with rollers 7, 7', 7", . . . which are rotatably disposed at the frame 4 of the apparatus and disposed in a first row where they are spaced apart. The second rail 14 runs parallel to the first one and has a planar bearing surface 14a the plane E.sub.2 of which intersects the rotating axes V.sub.a of the first row at a right angle and approximately traverses the center of gravity S of the substrate holder 16. The bearing surface 14a interacts with S rollers 8, 8', . . . which are disposed in a second row and at the bottom of the frame 4 where they rotate around vertical axes 1.

Abstract: A mold table is linearly moved into a pouring position or a resting position in a vacuum casting unit and rotates around its vertical axis so that the ingot molds disposed on the mold table can be individually positioned in front of the pouring nose of a crucible. A flexible belt-type roller device, for example a roller chain 15 as used in the chain drive of a crawler, is guided around a rod-like carrier 13 disposed in direction F in the mold chamber, and a catch 16 is integrated into this flexible, belt-type device. A separate drive, preferably a rope drive, is provided for moving the apparatus 10, this drive being connected to the rotatable catch 16 generating the rotation of the mold table. All motors for linearly moving and rotating the mold table are disposed outside the vacuum chamber.

Abstract: A simple, compact and reliable quadrupole mass spectrometer head gauge is shown in which an ion source and flange are mounted on one end of a one-piece quadrupole separating system and a detector is mounted on the other end with the flange end being adapted to be connected to a vacuum chamber.

Abstract: The invention relates to a power supply for the electric drying of transformer parts, particularly paper insulation of the windings. For this purpose, a converter is selected as a voltage source which converts an alternating voltage, e.g. alternating supply voltage of 50 Hz, into a variable frequency in the range of 0 and 25 Hz.

Abstract: The invention relates to a method for the operation of a multi-stage, dry compression vacuum pump (1) with an inlet (7) and an outlet (9), in which the aspirated gases contain gaseous components which endanger the operation of the vacuum pump; in order to render the gas components harmless it is proposed that the gases aspirated from the vacuum chamber (8) and flowing through the vacuum pump be carried through a reaction chamber (14) in which the components endangering the vacuum pump are chemically or physically treated at a pressure between the aspiration pressure and the outlet pressure of the vacuum pump.

Abstract: A method and apparatus for loading and unloading freeze-drying apparatus including at least one placement surface adapted to receive containers holding a product to be freeze-dried. The containers are placed on a table top of a transfer table, and the transfer table is brought into proximity with the placement surface in a chamber of a freeze-drying apparatus. A retractable frame assembly, movably secured to the transfer table, is used to transfer the containers from the transfer table top to the placement surfaces. The frame assembly is retracted from the chamber, and the freeze-drying process may then be implemented. Upon completion of freeze-drying, the frame assembly is introduced into the chamber, and is actuated to transfer the containers from the placement surfaces to the transfer table.

Abstract: Rotatable high-current connector consisting of a coaxial arrangement of an electrically conductive inner tube (2) and of an outer tube (3), whose hollow interiors (4, 5) serve for carrying a coolant, and which are joined, at their extremities connected to a stationary power line, each with a metal flange (8, 9) from which flexible current bridges, such as stranded wires example (12, 12', . . . ; 13, 13'. . . ,), lead each to a corresponding metal counter-flange (14, 15) on the stationary power line, the counter-flanges (14, 15) being equipped with a coaxial current carrying device, preferably with current carrying tubes (19, 20, 22, 23) of different diameters disposed coaxially with one another, and these tubes (19, 20, 22, 23) are of not less than a minimum length.

Abstract: An apparatus for the reactive coating of a substrate 1 with an electrically insultive material, silicon dioxide SiO.sub.2, for example, comprises a power supply 10 connected to a cathode 5 which is disposed in an evacuable coating chamber 15, 15a and surrounds the magnets 7, 8, 9. This cathode electrically interacts with the target 3 which is sputtered and the sputtered particles thereof are deposited on the substrate 1. A process gas and a reactive gas, e.g. argon with oxygen, are introduced into the coating chamber 15, 15a. The apparatus comprises two electrodes 44, 5 which are electrically insulated from one another and from the sputtering chamber 25. The one electrode is a magnetron cathode 5 where the cathode base 11 and the material of the target 3 are electrically connected to each other and the other electrode functions as an anode 44 in the plasma discharge.

Abstract: An apparatus for the reactive coating of a substrate 1 with an electrically insulative material, for example silicon dioxide SiO.sub.2, comprises a power supply source 10 connected to a cathode 5 which is disposed in an evacuable coating chamber 15, 15a and surrounds the magnets 7, 8, 9. This cathode electrically interacts with the target 3 which is sputtered and the sputtered particles thereof are deposited on the substrate 1. A process gas and a reactive gas, e.g. argon with oxygen, are introduced into the coating chamber 15, 15a. The apparatus comprises two electrodes 44, 5 which are electrically insulated from one another and from the sputtering chamber 26, wherein the one electrode is a magnetron cathode 5 where the cathode base 11 and the material of the target 3 are electrically connected to each other and the other electrode functions as an anode 44 in the plasma discharge.

Abstract: A lens holder, particularly for eyeglass lenses to be coated in a high-vacuum vapor deposition or sputtering system, is formed as a ring pair. The ring pair is connectable to a substrate holder that is mounted in the process chamber of the high-vacuum system in the proximity of a coating source. The lens can be placed between the rings of the ring pair, which are secured to one another by resilient wires. An outer surface of a first ring is provided with ramps that interact with resilient wires that are secured to the outer surface of a second ring. One of the rings includes two diametrically opposite pegs which serve to pivotably mount the lens holder in bearing forks mounted on the substrate holder. The lens holder is capable of 180.degree. of rotation.

Abstract: An apparatus for the generation of an inductively excited ion or plasma source includes an amplification system and a high frequency excitation coil which are coupled to form a self-starting free-running excitation oscillator.

Abstract: A device for heating up a substrate to be coated in a vacuum coating system, for example a plasma sputtering system, has a heating device 23 disposed on a substrate carriage 20 which can be moved across the process chamber transversely to the coating source. This heating device has an independent voltage generator, for example a rechargeable accumulator, disposed in a special chamber of the heating device. The chamber for the accumulators can be hermetically sealed by way of a cover such that this chamber is under atmospheric pressure even when the substrate carraige 20, together with the heating device 23, enters the process chamber of the system which contains the vacuum. The accumulators are recharged via plug couplings 14,14' after the heating device has heated up the substrate 8 which is clamped thereto and the device has exited the process chamber via a sluiceway.

Abstract: The invention relates to an arrangement for the vapor deposition of thin layers on a substrate. This arrangement comprises a magnetron cathode with a target disposed opposite the substrate. With the aid of a particle generator ions of a reactive gas are generated and accelerated toward the substrate where a reaction takes place between target particles and reactive gas particles.

Abstract: The invention relates to an induction melting furnace 1 for metals which are difficult to melt including an induction coil 2 surrounding the crucible 3 and a mold receptacle 4 surrounded by an annular chamber 5 to hold the cooling agent. The crucible 3 is disposed in a housing 7 provided with a vacuum connection 6. In order to improve the microporous nature, the melt contained in the mold receptacle 4 is compressed by means of a pressure which is build up in the mold receptacle 4 prior to the cooling.

Abstract: An optical recording medium for an audio-video or ROM compact disc comprises a pitted translucent base material and a layer of a corrosion resistant metal or combination of metals from the group consisting of tantalum, chromium, cobalt, and nickel. For example, TaNi or CrCo can be applied to the surface, providing good adhesion, reflecting light, providing a printable surface, and not requiring any further coating such as a protective lacquer.