Abstract: A gas inlet (3), a substrate holder (10) with a substrate (11) and a gas outlet (5) are located on a common axis (4) in the vacuum casing (I) of a cathode sputtering system. This results in a symmetrical flow inside the cathode station (2) and a concentric uniformity of the gas pressure. These conditions result in a particularly even coating of the substrate (11) by means of sputtering.

Abstract: Apparatus for reducing the sagging of essentially planar outside walls (3, 13) on a vacuum tank (1) under operating conditions, and for preventing displacements, resulting therefrom, of components fastened to these outside walls (3, 13), such as rollers (7, 8) of a winding apparatus (2) which is movable with respect to the vacuum tank (1) in a vacuum tape coating apparatus, wherein spacers (12, 14) are provided between two opposite outside walls (3, 13).

Abstract: For the evacuation of a low-vacuum chamber (4) and of a high-vacuum chamber (5), two pump trains (6, 7) are provided, each consisting of a vacuum pump unit (8, 9) and a forepump unit (10, 11). The forepump unit (11) of the pump train (7) of the high-vacuum chamber (5) can draw selectively from the vacuum pump unit (9) of the high-vacuum chamber (5) or from a high-vacuum pump unit (12) connected likewise to the high-vacuum chamber (5). The vacuum pump unit (9) can aspirate either from the highvacuum chamber (5) or from the low-vacuum chamber (4) and discharge to the forepump unit (10) of pump train (6) or to the forepump unit (11) of pump train (7).

Abstract: One piece hollow members 6, 7 supported at the wall of the vacuum chamber 1 are provided parallel to the plane of the cathode 12 and in the area between the cathode 12 and the anode 4, 5. These members have axis-parallel conduits 6a, 6b, 6d, 7a, 7b, 7d passed through by both the temperature-regulating medium and the process gas. The hollow members 6, 7 have openings 6e, 6e', . . . , 7e, 7e', . . . which run transversely to the longitudinal axis of the conduits for the process gas to emerge into the vacuum chamber 1.

Abstract: A heated evaporator housing is provided at its inlet with an ultrasonic atomizer for reducing monomer to small droplets and a permeable porous body completely occupying a cross section of the housing between the inlet and the outlet. A vacuum pump and a reaction chamber for coating substrates are provided downstream of the outlet.

Abstract: The invention relates to an ion sputtering pump having a housing with at least one getter module located in the housing. The getter module has a heating device. In order to reduce the amount of time required for the activation and regeneration of the getter module, the heating device is in direct, intimate thermal contact with the getter module.

Abstract: An induction furnace (1) for melting and casting purposes has a closed crucible pot (2) with a pot bottom (3) and a cover (4), a crucible (6) housed in the crucible pot and surrounded by an induction coil (7), and an ascending tube (9) reaching into the crucible, through which the crucible can be emptied into a casting apparatus by means of gas pressure. To permit continuous operation and measurements and analyses during operation, the ascending tube (9) is fastened exclusively to the pot bottom (3) and connected with a horizontal delivery tube (11) which is brought through a side wall of the pot bottom (3). Furthermore, above a separation seam (24) between pot bottom (3) and cover (4) a turret (39) with a vertical axis of rotation is disposed, which has a charging air lock (26) for charging the crucible (6) with melt material (27) and a measuring chamber (36). The charging air lock and measuring chamber can be connected alternately with an air lock valve (25) which is disposed on the top of the cover (4).

Abstract: A coating, composed of an optically effective layer system for substrates, whereby the layer system has a high antireflective effect. On a front side of the substrate, facing the observer, in sequence from the front side to the observer, a first layer is arranged on the substrate, functioning as dielectric and comprising metal oxide. Thereupon follows a second layer comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A third layer follows functioning as dielectric and comprising metal oxide. Thereupon a fourth layer follows comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A fifth layer follows functioning as dielectric comprising metal oxide. On a backside of the substrate a TiN.sub.x -layer (x.gtoreq.1, preferably x=1.05) is arranged.

Abstract: Transformers (5, 6) are bolted underneath power feeders (4) and each directly connected by a mounting piece (16, 16a) against an outside wall (19) of a tank (1) containing evaporator boats for metal vapor deposition. These mounting pieces (16, 16a) are electrically connected each to a pole of the secondary winding of each transformer (5, 6) so that a direct contacting of the tank with this pole achieved.

Abstract: Tubular target (1) has a magnet system (2) provided in the cavity (H) formed by the target (1) for the formation of a first plasma (6) for the coating of planar substrates (4) which are movable past the cathode (3), by means of a cathode sputtering process. A second plasma (9) is produced by a second magnet system (7) in the cavity (H) in an area between the cathode (3) and a plate (10) opposite the substrate (4).

Abstract: A high-vacuum coating apparatus for coating films has beneath its coating cylinder (7) a pivoting unit (8) which can turn on a pivot shaft (25). It has an adjustable mask (29) and thereunder a shutter (28) which can run from a position covering an evaporator to a position releasing it. Due to its ability to turn, the pivoting unit (8) together with its parts can easily be cleaned.

Abstract: A crucible (9) of a nonmetallic material with an elongated cavity (42) to contain the material to be evaporated has on top a vapor emission slot (45) which is defined at its longitudinal edges (43, 44) by two elongated plates (40, 41) of a likewise nonmetallic material. In the cavity (42) two heating rods (46, 47) are disposed in a mirror-symmetrical relationship to a plane of symmetry (S) through the vapor emission slot (45), one under each of the plates (40, 41) defining the vapor emission slot (45). Additional heating means are provided outside of the crucible and inside of a thermal barrier system.

Abstract: An apparatus is presented, with a rotating target (18, 15), which is tubularly configured, with a stationary magnet unit (2) disposed within the tube, of a magnetron cathode, which produces a stationary plasma hose provided essentially with two long straight lines in front of the surface of the rotating target, which exercises an erosive action on the surface of the rotating target (18, 15), whereby the formation occurs of a narrowing of the diameter of the tubular rotating target (18, 15) in the middle portion of the tubular rotating target and the formation of margins at the two ends (14, 15) of the tubular rotating target be provided each with a dark-space shield (16, 17) which cover the margins of the tubular rotating target.

Abstract: A melting and casting plant for operation at least under a vacuum and having a vacuum chamber. A wall of the vacuum chamber of the plant is angularly fashioned and is composed of a stationary part and of a swivellable part, the swivellable part being hinged to the stationary part. A door (ingot mold door) is provided in the swivellable part. The shape of the chamber wall and a linking axis of the swivellable part are fashioned or arranged, such that, when the chamber is opened, articles situated in the interior of the chamber are readily accessible. In comparison to the prior art, improved operations of the system, particularly regarding the chamber, is possible.

Abstract: The invention relates to an arrangement for measuring the light radiation of a plasma with sputter cathodes. Herein a light-sensitive sensor (15) is acted upon by the light from an optical fiber or from a bundle of optical fibers (14) which is (are) guided through an opening (13) of the sputter cathode (8). In this way the light intensity of the sputter plasma in the region of the sputtering crater of a target (9) can be measured. Moreover, it is possible to measure in simple manner the light intensities of several regions of the plasma.

Abstract: Target for reactive sputtering in a vacuum coating apparatus consists of at least one of tin and lead doped with 20 to 200 ppm gallium and 2 to 20 ppm phosphorus.

Abstract: The invention concerns apparatus and a process for the non-destructive measurement of the ohmic resistance of thin layers according to the eddy-current principle. Here an inductor (2) is fed with a high frequency voltage (U.sub.osz) and the magnetic field of this inductor (2) is directed at the thin layer to be measured, whereby an eddy current flows in this layer the magnetic field of which weakens the magnetic field of the inductor (2). The inductor (2) is here part of an oscillating circuit (3) which is held always at resonance by means of a phase-correcting arrangement (14). Under these resonance conditions the reactive values of the oscillating circuit (3) may be neglected so that the current flowing into the oscillating circuit (3) depends solely on the ohmic resistance of this oscillating circuit (3), which in turn is determined by the ohmic resistance of the layer to be measured.

Abstract: A cathode sputtering apparatus for the coating of substrates in a vacuum chamber is presented which accommodates a rotating substrate carrier, and which comprises at least one gripper which includes a hub and at least one arm with a gripper with the hub rotating around a horizontal axis; during the sputtering, two annular closing elements separate a segment in front of the station from the remaining portion of the vacuum chamber and a cathode vacuum chamber is thus formed which is separate from the vacuum chamber of the apparatus.

Abstract: In a pivoting air lock for the entry and/or exit of a substrate from one treatment chamber into an adjacent one or from atmospheric space into a chamber of lesser pressure, especially a slot air lock for a pass-through vacuum coating apparatus, with a flap-like valve plate (2) held in stationary bearings (11, 11a) and two closing motors (10, 10a) in active connection with the valve plate, the valve plate (2) is, with the interposition of two spring rods (5, 5a), linked to a valve beam (1) which in turn has two diametrically opposite journals (12, 12a) which are coupled for rotation with the shafts (18, 18a) of the motors (10, 10a), the shafts (18, 18a) of the motors (10, 10a) being brought in a pressure-proof manner through the wall (13, 13a) of the chamber (3).

Abstract: Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.