Abstract: First and second transport chambers are joined to one another through a common opening (5), and house respective substrate carriers (6, 7) mounted for rotation about parallel axes. In at least one position the carriers may be superposed, plungers (14 and 15) being disposed in the area of this superposition on opposite sides of the carriers, both carriers being longitudinally displaceable parallel to the pivot axes (a and b, respectively). After a coating operation in the second transport chamber, the second plunger releases the mask from the second carrier, moves it back to the first carrier where the substrate is peripherally engaged, then moves the mask still further in order to release it from the substrate. The second plunger then retreats, and the coated substrate can be rotated in the first chamber.

Abstract: The invention relates to an arrangement for coating or etching substrates. In this arrangement an HF substrate bias voltage is generated without contact. For this purpose plasma sources are equipped with a bias pot which is disposed at the dark space distance from a substrate carrier and acted upon by HF. Depending on the source used, the bias pot can be constructed as an independent unit or as a component part of the source connected so as to be conducting-for example as an HF magnetron. Via this coupled-in HF power the dc potential on the carrier, and consequently the ion bombardment on the substrate, can be set specifically.

Abstract: In a process and a device for the controlled feeding of a melting crucible (13) with doped particles (2, 2a) during the drawing of a crystal (16) by the Czochralski method by the control of a flow of particles (2, 2a) from a source (1) to the melting crucible (13), the source (1) is equipped with a conveying device (4) for discharging the particles (2, 2a) at adjustable rates per unit time. A crystal (16), formed from the particles, is withdrawn from the melting crucible (13) at a predetermined rate per unit time. So that the control process can be conducted smoothly over prolonged periods of time with precise doping, the particles (2, 2a) are separated into individuals on their way to the melting crucible (13) and counted by at least one sensor (21, 22). The sequence of count pulses is sent to a counter (25) and compared there with a corresponding sequence of reference input pulses.

Abstract: A crucible is situated in a vacuum chamber and provided with a feeder for granulate material, heating elements for melting the material, and a crystal puller above the crucible. Measuring elements provide signals for a controller including a fuzzy processor utilizing an empirically determined data field to output a signal for the material feeder.

Abstract: In a cathode system for coating a substrate (46), having a cathode which is connected to a direct-current and/or alternating-current source (high-frequency source) and is disposed in an evacuable coating chamber (2), and is electrically connected to a target (29) which is sputtered and whose sputtered particles deposit themselves on the substrate, a process gas is brought into the coating chamber. The cathode is formed from a substantially pot-like housing (3) whose solid bottom (39) is fixedly joined to the target (29) and whose open end facing away from the target (29) is sealingly held in an opening (49) in the outer wall (30) of the coating chamber such that the interior (49) of the housing (3) is exposed to atmospheric pressure, while the target (29) and the outer surface of the shell-like part of the housing (3) joined thereto are affected by the pressure prevailing in the coating chamber.

Abstract: In a mask (7) for covering the outer marginal area of a disk-shaped substrate surface during a coating process, for example a vacuum sputtering or vapor depositing process, the mask (7) is made of an elastic material in the form of a planar plate with an essentially circular opening. To center and lock it onto the substrate (1) an inwardly extending annular flange is provided which assumes the actual masking function and extends in a plane parallel to the plane of the plate. The substrate (1) is laid on this flange and retained by projections extending radially inward. Prior to positioning the substrate it is bowed axially to spread apart the projections.

Abstract: A microwave ring resonator surrounds a cathode target and feeds microwaves to a plasma volume over the target through a slit system in such a way that the waves do not pass through the cathode dark space.

Abstract: A vacuum chamber houses a rotatable substrate holder next to a door having a cathode target mounted therein. A plate-like mask is movable to a position between the substrate holder and the door so that the target can be cleaned without contaminating the substrate. The mask is preferably moved by a screw jack including a tube driven through a sealed hole in the chamber wall.

Abstract: The invention relates to a cryopump operated with a refrigerator, having a housing, having an inlet valve, having heatable pumping surfaces and having a backing pump connected to the pump interior; to be able to regenerate the cryopump quickly by executing the removal of the condensed gases at a high pressure, it is proposed that it is equipped with a line for the precipitates to be removed and that is provided with a regeneration valve.

Abstract: A first turntable (4) has a plurality of posts (6) equidistantly distributed and arranged in a circle on the turntable (4), wherein a plurality of substrates (7) can be stacked on each post (6). Stationary loading (9) and unloading stations (10 11) are provided and the distance between each pair of adjacent stations (9, 10, 11) corresponds to the distance between each pair of adjacent posts (6), the first turntable being rotated stepwise so that each post can be stopped successively at adjacent stations. A second turntable (12) is rotated stepwise through a loading station (15), a transfer station (16) and an unloading station (17). A loading arm transfers substrates from the loading station of the first turntable to the loading station of the second turntable, a transfer arm transfers the substrates from the transfer station to a coating station, and an unloading arm transfers coated substrates from the unloading station of the second turntable to either of the two unloading stations of the first turntable.

Abstract: In a device for locking a flat, discoid substrate 9 provided with a central opening 38 onto a substrate plate 22 provided with a centering post 35 projecting above the substrate bearing surface 42 of a vacuum coating apparatus for transporting the substrate from one to the other treatment station and/or for putting the substrate into or taking it out of the treatment chamber or transport chamber 13, 14 through an airlock, the centering post 35 has a cross-sectional area enabling the centering post 35 to pass through the central opening 38 and it is provided with an annular groove which runs approximately at the level of the upper surface of the substrate remote from the plane of the substrate bearing surface 42, while an endless slantingly wound coil spring 37 is placed into the annular groove 40, and upon the action of a force (P) directed radially toward the spring flattens the outer torus surface enveloping the spring 39, and thus locks the substrate pushed over the spring 37 at the upper edge of the openi

Abstract: Apparatus for the coating and etching of substrates in a vacuum chamber (4), includes a cathode (17, 17') having a target (18, 18'), and a rotatable structure (8) shaped as an essentially cylindrical hollow body having circular disk-shaped end faces provided with pivot shafts (10, 10') held for rotation about a horizontal axis (r) in bearings (11, 11') disposed on the side walls (12, 12') of the vacuum chamber (4). Mountings (19, 19') for holding the substrates in place are provided on the circumference of the hollow body, the cathode (17, 17') and the etching anode (16) being disposed opposite the rotatable structure (8) in a plane (E) running horizontally and approximately in the plane of the axis of rotation (r).

Abstract: An apparatus for the reactive coating of a substrate 1, with silicon dioxide (SiO.sub.2) for example, comprises a power source 10, 37 connected to an electrode 5 which is disposed in an evacuable coating chamber 15, 15a and interacts with a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1, wherein argon and oxygen, for example, are supplied to the coating chamber 15, 15a. The target to be sputtered is composed of several parts, for example. A center part 3a of the target 3 opposite the substrate 1 is made of silicon (Si) and the part 3b surrounding this center portion is made of zinc (Sn), for example. Provision is made for a diaphragm 24 between the substrate 1 on the one hand, and the target 3, on the other hand. The shape of the magnetic field of the electrode 5 during the sputtering generates a sputtering of the more reactive target material 3a in the oxidic mode and of the less reactive target material 3b in the metallic mode.

Abstract: The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.

Abstract: Cathode sputtering apparatus includes a target, a cooling channel, and a flexible diaphragm therebetween. The target is fixed to a base independently of the diaphragm, so that the target can be replaced with disturbing the cooling channel. In a preferred embodiment, the diaphragm and the target are fixed by respective sets of cleats retained by screws received from respective opposite directions.

Abstract: The invention relates to an arrangement for generating a plasma by means of cathode sputtering. This arrangement comprises a magnetron and a target with shielding metal sheets. About these shielding metal sheets are wound two coils with a common center axis of which the one coil is connected to a dc power source and the other coil to a high-frequency source. Through the cooperation of the fields of both coils result helicon or whistler waves.

Abstract: Method and an apparatus for coating a substrate from electrically conductive targets (3, 4) in a reactive atmosphere, comprising a power source (12, 13, 14) which is connected to cathodes (1, 2) disposed in an evacuable coating chamber (15) and cooperating electrically with the targets (3, 4), two anodes (5, 6) electrically separated from one another and from the sputtering chamber (15) being provided, which lie in a plane between the cathodes (1, 2) and the substrate (7), the two output terminals (12a, 12b) of the secondary winding of a transformer (12) connected, with interposition of a choke coil (14), to a medium frequency generator (13) being connected each to a cathode (1 and 2, respectively) via two supply lines (20, 21) and the two supply lines (20, 21) being connected via a branch line (22) into which a resonant circuit is inserted, and each of the two supply lines (20, 21) being coupled both via a first network (16 and 17, respectively) to the coating chamber and via a corresponding second network (

Abstract: The invention concerns a process for coating a substrate 1 of little or no corrosion resistance, especially a metal substrate having an alloy consisting at least of Ni, Cr and Fe, in an evacuable coating chamber 15, 15a. It comprises making an electrode that can be connected to a current supply 10, this electrode being electrically connected to a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1. Reactive process gases are, for this purpose, supplied to the coating chamber 15, 15a, so that an amorphously depositing layer 2 is applied onto the substrate.

Abstract: Apparatus for loading and unloading disk-shaped substrates into and out of a vacuum coating chamber and for transporting the substrates within this chamber, having a first station for loading and unloading substrates, a second station where substrates are coated, a rotatable substrate holder for transferring substrates stepwise between stations, and first and second lifters for lifting substrates from the rotatable holder at respective first and second stations. A rotating cylinder has timing grooves in its cylindrical surface which guide pins on the bottom of a shaft fixed to the substrate holder in order to move it stepwise between stations. Timing grooves in opposed ends of the cylinder guide pins which move the lifters vertically during pauses between stepwise movements. A single motor thus controls all movements in the coating chamber.

Abstract: A DC source 10 connected to an electrode 5 is disposed in a coating chamber which can be evacuated. The electrode is electrically connected to a target 3 which is sputtered and the sputtered particles are deposited on the substrate, while a process gas is introduced in the coating chamber 15, 15a. The target is made of an aluminum-silicon alloy which may contain 0.5 to 2.0 percent silicon and 99.5 to 98.0 percent aluminum in order to improve the adhesive strength and the service life of the layer 2. The substrate may be made of polycarbonate.