Patents Assigned to Materious, LLC
  • Photoresist pattern trimming methods
    Patent number: 9209035
    Abstract: Provided are methods of trimming photoresist patterns. The methods involve coating a photoresist trimming composition over a photoresist pattern, wherein the trimming composition includes a matrix polymer, a thermal acid generator and a solvent, the trimming composition being free of cross-linking agents. The coated semiconductor substrate is heated to generate an acid in the trimming composition from the thermal acid generator, thereby causing a change in polarity of the matrix polymer in a surface region of the photoresist pattern. The photoresist pattern is contacted with a developing solution to remove the surface region of the photoresist pattern. The methods find particular applicability in the formation of very fine lithographic features in the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 31, 2012
    Date of Patent: December 8, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Cheng-Bai Xu
  • Gap-fill methods
    Patent number: 9209067
    Abstract: Provided are gap-fill methods. The methods comprise: (a) providing a semiconductor substrate having a relief image on a surface of the substrate, the relief image comprising a plurality of gaps to be filled; (b) applying a gap-fill composition over the relief image, wherein the gap-fill composition comprises a self-crosslinkable polymer and a solvent, wherein the self-crosslinkable polymer comprises a first unit comprising a polymerized backbone and a crosslinkable group pendant to the backbone; and (c) heating the gap-fill composition at a temperature to cause the polymer to self-crosslink. The methods find particular applicability in the manufacture of semiconductor devices for the filling of high aspect ratio gaps.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: December 8, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Jong Keun Park, Cheng-Bai Xu, Phillip D. Hustad, Mingqi Li
  • Ion implantation methods
    Patent number: 9209028
    Abstract: Provided are methods of forming an ion implanted region in a semiconductor device.
    Type: Grant
    Filed: December 31, 2013
    Date of Patent: December 8, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cheng-Bai Xu, Cheng Han Wu, Dong Won Chung, Yoshihiro Yamamoto, George G. Barclay, Gerhard Pohlers
  • Photoresist compositions and methods of forming photolithographic patterns
    Patent number: 9188864
    Abstract: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: November 17, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Deyan Wang, Thomas Cardolaccia, Seokho Kang, Rosemary Bell
  • Hardmask surface treatment
    Patent number: 9171720
    Abstract: Methods of treating the surface of a metal-containing hardmask used in the manufacture of semiconductors by contacting the hardmask surface with a composition capable of adjusting the water contact angle so as to substantially match that of subsequently applied organic coatings are provided.
    Type: Grant
    Filed: January 19, 2013
    Date of Patent: October 27, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Peter Trefonas, III, Jieqian Zhang, Peng-Wei Chuang
  • Low-friction surface coatings and methods for producing same
    Patent number: 9162424
    Abstract: A coated article system includes a substrate and a surface coating on the substrate. The surface coating is formed by depositing individual particles of a composite metal powder with sufficient energy to cause the composite metal powder to bond with the substrate and form the surface coating. The composite metal powder includes a substantially homogeneous dispersion of molybdenum and molybdenum disulfide sub-particles that are fused together to form the individual particles of the composite metal powder.
    Type: Grant
    Filed: January 28, 2013
    Date of Patent: October 20, 2015
    Assignee: Climax Engineered Materials, LLC
    Inventors: Carl V. Cox, Matthew C. Shaw, Yakov Epshteyn
  • Base reactive photoacid generators and photoresists comprising same
    Patent number: 9156785
    Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: October 13, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Mingqi Li, Cheng-Bai Xu, Deyan Wang, Cong Liu, Joon Seok Oh, Shintaro Yamada
  • Photoresist compositions and methods of forming photolithographic patterns
    Patent number: 9158198
    Abstract: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist compositions include one or more polymer additive that contains a basic moiety and which is substantially non-miscible with a resin component of the resist. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: July 31, 2013
    Date of Patent: October 13, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Jong Keun Park, Christopher Nam Lee, Cecily Andes, Deyan Wang
  • Adhesion promoter
    Patent number: 9153357
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed amino-alkoxysilane having a protected amino moiety. These compositions are useful in methods of improving the adhesion of coating compositions to a substrate, such as an electronic device substrate.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: October 6, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. Gallagher, Joseph F. Lachowski, Gregory P. Prokopowicz, Zidong Wang
  • BRAKE PAD ASSEMBLY WITH UNIVERSAL SHIM
    Publication number: 20150275994
    Abstract: A brake pad assembly includes a backing plate having a first surface and a second surface opposite the first surface, a brake liner coupled to the first surface of the backing plate and configured to engage a braking surface, and a shim coupled to the second surface of the backing plate, the shim including a planar body portion and a plurality of tabs integrally formed with and extending from the planar body portion. A first tab of the plurality of tabs is configured to secure the shim to the backing plate and to engage the braking surface when the brake liner is worn a predetermined amount.
    Type: Application
    Filed: March 25, 2014
    Publication date: October 1, 2015
    Applicant: Wolverine Advanced Materials, LLC
    Inventors: Abdul-Hafiz Ahmed Afaneh, Irfan A. Bhatti
  • ADHESION PROMOTER
    Publication number: 20150279511
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed amino-alkoxysilane having a protected amino moiety. These compositions are useful in methods of improving the adhesion of coating compositions to a substrate, such as an electronic device substrate.
    Type: Application
    Filed: March 27, 2014
    Publication date: October 1, 2015
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. GALLAGHER, Joseph F. LACHOWSKI, Gregory P. PROKOPOWICZ, Zidong WANG
  • Method of manufacturing high aspect ratio silver nanowires
    Patent number: 9148969
    Abstract: A process for manufacturing silver nanowires is provided, comprising: providing a silver ink core component containing ?60 wt % silver nanoparticles dispersed in a silver carrier; providing a shell component containing a film forming polymer dispersed in a shell carrier; providing a substrate; coelectrospinning the silver ink core component and the shell component depositing on the substrate a core shell fiber having a core and a shell surrounding the core, wherein the silver nanoparticles are in the core; and, treating the silver nanoparticles to form a population of silver nanowires, wherein the population of silver nanowires exhibit an average length, L, of ?60 ?m.
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: September 29, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Jerome Claracq, Garo Khanarian, Lujia Bu, Jaebum Joo, Peter Trefonas
  • Variable data printing for security purposes using ceramic sub-micron infrared-luminescent particles in inkjet ink
    Patent number: 9139768
    Abstract: Methods and apparatus for variable data printing for security purposes using ceramic sub-micron infrared-luminescent particles in inkjet ink. An example apparatus includes an inkjet printer containing marked ink, the marked ink containing particles consisting of rare earth doped ceramics, wherein the particles are less than one micron in size, the particles are suspended in the marked ink, and the particles have luminescent properties such that when the particles are illuminated by first electromagnetic radiation having a first wavelength, the particles emit infrared light having a peak wavelength at a second wavelength.
    Type: Grant
    Filed: February 11, 2014
    Date of Patent: September 22, 2015
    Assignee: Stardust Materials, LLC
    Inventors: Vitaly Talyansky, Edward Talyanaksy, Jose Gasque
  • Hardmask surface treatment
    Patent number: 9136123
    Abstract: Compositions suitable for forming oxymetal hardmask layers are provided. Methods of forming oxymetal hardmask layers using such compositions are also provided, where the surface of the oxymetal hardmask layer formed has a water contact angle substantially matched to that of subsequently applied organic coatings.
    Type: Grant
    Filed: January 19, 2013
    Date of Patent: September 15, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Peter Trefonas, III, Shintaro Yamada, Kathleen M. O'Connell
  • Adhesion promoter
    Patent number: 9136037
    Abstract: Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed amino-alkoxysilane having a protected amino moiety. These compositions are useful in methods of improving the adhesion of coating compositions to a substrate, such as an electronic device substrate.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: September 15, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. Gallagher, Joseph F. Lachowski, Gregory P. Prokopowicz, Zidong Wang
  • Electrode for oxide semiconductor, method of forming the same, and oxide semiconductor device provided with the electrode
    Patent number: 9123821
    Abstract: To make it possible to form a metal electrode of low electrical contact resistance on a conductive indium-containing oxide semiconductor layer constituting a device active layer of a thin-film transistor or the like. Between an indium-containing oxide semiconductor layer and a metal electrode layer provided above this layer for passing device operating current, which can reduce indium oxide or the like of the oxide semiconductor layer. A metallic oxide layer and a metal layer are formed using as material a metal film including an easily oxidable metal, and further an indium-rich layer in which reduced indium is accumulated is formed at a boundary between the metallic oxide layer and the metal layer.
    Type: Grant
    Filed: September 5, 2013
    Date of Patent: September 1, 2015
    Assignee: Advanced Interconnect Materials, LLC
    Inventors: Junichi Koike, Mayumi Naito, Pilsang Yun, Hideaki Kawakami
  • Multi-heterojunction nanoparticles, methods of manufacture thereof and articles comprising the same
    Patent number: 9123638
    Abstract: Disclosed herein is a semiconducting nanoparticle comprising a one-dimensional semiconducting nanoparticle having a first end and a second end; where the second end is opposed to the first end; a first node that comprises a first semiconductor; where the first node contacts a radial surface of the one-dimensional semiconducting nanoparticle producing a first heterojunction at the point of contact; and a second node that comprises a second semiconductor; where the second node contacts the radial surface of the one-dimensional semiconducting nanoparticle producing a second heterojunction at the point of contact; where the first heterojunction is compositionally different from the second heterojunction.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 1, 2015
    Assignees: Rohm and Haas Electronic Materials, LLC, The University of Illinois, The Office of Technology Management, Dow Global Technologies LLC
    Inventors: Moonsub Shim, Nuri Oh, You Zhai, Sooji Nam, Peter Trefonas, Kishori Deshpande, Jake Joo
  • Methods and compositions for removal of metal hardmasks
    Patent number: 9102901
    Abstract: The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, and wherein the composition comprises at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR4HF2 (Formula 1), wherein R?H, alkyl, substituted alkyl, ii) NR4F (Formula 2), wherein R?H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H2SiF6 (hexafluorosilicic acid), or v) combinations thereof. The invention also provides a composition comprising at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR4HF2 (Formula 1), wherein R?H, alkyl, substituted alkyl, ii) NR4F (Formula 2), wherein R?H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H2SiF6 (hexafluorosilicic acid), or v) combinations thereof.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: August 11, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Martin W. Bayes, Peter Trefonas, Kathleen M. O'connell
  • Sodium / molybdenum metal articles and powder compacts
    Patent number: 9103024
    Abstract: A metal article formed by compacting a sodium/molybdenum composite metal powder under sufficient pressure to form a preformed article; placing the preformed article in a sealed container; raising the temperature of the sealed container to a temperature that is lower than a sintering temperature of molybdenum; and subjecting the sealed container to an isostatic pressure for a time sufficient to increase the density of the metal article to at least about 90% of theoretical density.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: August 11, 2015
    Assignee: Climax Engineered Materials, LLC
    Inventors: Dave Honecker, Christopher Michaluk, Carl Cox, James Cole
  • Nanostructured catalyst supports
    Patent number: RE45703
    Abstract: The present invention relates to SiC nanostructures, including SiC nanopowder, SiC nanowires, and composites of SiC nanopowder and nanowires, which can be used as catalyst supports in membrane electrode assemblies and in fuel cells. The present invention also relates to composite catalyst supports comprising nanopowder and one or more inorganic nanowires for a membrane electrode assembly.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: September 29, 2015
    Assignee: OneD Material LLC
    Inventors: Yimin Zhu, Jay L. Goldman, Baixin Qian, Ionel C. Stefan