Patents Assigned to Materious, LLC
  • Patent number: 9012545
    Abstract: A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: April 21, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Xinyu Gu, Shih-Wei Chang, Rahul Sharma, Valeriy Ginzburg, Phillip Hustad, Jeffrey Weinhold, Peter Trefonas
  • Patent number: 9012128
    Abstract: A polymer includes the polymerized product of monomers including a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a, L1, LN, Ra, Rb, Rc, and X are defined herein. The polymer is a useful component of a photoresist composition.
    Type: Grant
    Filed: November 11, 2013
    Date of Patent: April 21, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-bai Xu, George G. Barclay
  • Patent number: 9011591
    Abstract: Compositions for use in microelectronic applications: Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and R1, R2, R3 are independently selected from alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene; and R4, R5, R6 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; and R7, R8, R9 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and R10, R11, R12, R13 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: April 21, 2015
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Yuanqiao Rao, Robert L. Auger, John D. Weaver, Paul J. Popa, Roxanne M. Jenkins, Christopher P. Sullivan, Jessica P. Evans, Cecilia W. Kiarie, Yasmin N. Srivastava, Jeffrey L. Fenton, Jr.
  • Publication number: 20150105346
    Abstract: A tissue adhesive formed by reacting an aminodextran containing primary amine groups with an oxidized dextran containing aldehyde groups is described. The dextran-based polymer tissue adhesive is particularly useful in medical applications where low swell and slow degradation are needed, for example sealing the dura, ophthalmic procedures, tissue repair, antiadhesive applications, drug delivery, and as a plug to seal a fistula or the punctum.
    Type: Application
    Filed: August 21, 2014
    Publication date: April 16, 2015
    Applicant: Actamax Surgical Materials, LLC
    Inventor: Helen S.M Lu
  • Patent number: 9006475
    Abstract: A method of continuously manufacturing organometallic compounds is provided where two or more reactants are conveyed to a reactor having a laminar flow contacting zone, a heat transfer zone, and a mixing zone having a turbulence-promoting device; and causing the reactants to form the organometallic compound.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: April 14, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Ravindra S. Dixit, Hua Bai, Curtis D. Modtland, Robert A. Ware, John G. Pendergast, Jr., Christopher P. Christenson, Deodatta Vinayak Shenai-Khatkhate, Artashes Amamchyan, Kenneth M. Crouch, Robert F. Polcari
  • Patent number: 9005562
    Abstract: A method of purifying ammonia borane is provided whereby crude ammonia borane is dissolved in a basic aqueous solution, the solution is heated to decompose and precipitate impurities found in the crude ammonia borane, and the impurities are separated by filtration. The aqueous solution containing dissolved ammonia borane is then cooled to a temperature of from 10° C. to ?10° C., to precipitate the ammonia borane, which is recovered and dried to yield a high-purity product.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: April 14, 2015
    Assignees: BoroScience International, Inc., WeylChem Sustainable Materials, LLC
    Inventors: Bernard Franklin Spielvogel, Kevin Joel Drost
  • Patent number: 9005880
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: April 14, 2015
    Assignee: Rohm and Haas Electronic Materials, LLC
    Inventors: Deyan Wang, Chunyi Wu, George G. Barclay, Cheng-Bai Xu
  • Patent number: 9006133
    Abstract: The present invention relates to electrochemical catalyst particles, including nanoparticles, which can be used membrane electrode assemblies and in fuel cells. In exemplary embodiments, the present invention provides electrochemical catalysts supported by various materials. Suitably the catalysts have an atomic ratio of oxygen to a metal in the nanoparticle of about 3 to about 6.
    Type: Grant
    Filed: October 22, 2009
    Date of Patent: April 14, 2015
    Assignees: OneD Material LLC, Sharp Kabushiki Kaisha
    Inventors: Yimin Zhu, Jay L. Goldman, Baixin Qian, Ionel C. Stefan, Mutsuko Komoda, Hirotaka Mizuhata, Takenori Onishi
  • Patent number: 8999851
    Abstract: The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: April 7, 2015
    Assignee: OneD Material LLC
    Inventors: Francisco Leon, Francesco Lemmi, Jeffrey Miller, David Dutton, David P. Stumbo
  • Patent number: 8997775
    Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: April 7, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
  • Patent number: 8980077
    Abstract: Silver electroplating baths having certain sulfide compounds and methods of electrodepositing a silver-containing layer using these baths are disclosed. Such electroplating baths are useful to provide silver-containing solder deposits having reduced void formation and improved within-die uniformity.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: March 17, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Duane R. Romer, Elissei Iagodkine, Inho Lee
  • Patent number: 8980536
    Abstract: Provided are photoresist developer compositions that include a mixture of organic solvents. Also provided are methods of forming photolithographic patterns using negative tone development, coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: March 17, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Seung-Hyun Lee
  • Patent number: 8975001
    Abstract: Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: March 10, 2015
    Assignee: Rohm and Haas Electronics Materials LLC
    Inventors: Young Cheol Bae, Rosemary Bell, Thomas Cardolaccia, Seung-Hyun Lee, Yi Liu, Jong Keun Park
  • Patent number: 8975008
    Abstract: Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 10, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Paul J. Ciccolo, Brian D. Amos, Stephen McCammon
  • Publication number: 20150056793
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a dopant-containing polymer and a non-polar solvent on a substrate; and annealing the substrate at a temperature of 750 to 1300° C. for 1 second to 24 hours to diffuse the dopant into the substrate; wherein the dopant-containing polymer is a polymer having a covalently bound dopant atom; wherein the dopant-containing polymer is free of nitrogen and silicon; and wherein the method is free of a step of forming an oxide capping layer over the coating prior to the annealing step.
    Type: Application
    Filed: August 21, 2013
    Publication date: February 26, 2015
    Applicants: Rohm and Haas Electronic Materials LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Rachel A. Segalman, Megan L. Hoarfrost, Ali Javey, Kuniharu Takei, Peter Trefonas, III
  • Patent number: 8962893
    Abstract: Methods of purifying crude cyclopentadienyl magnesium compounds using a scavenging agent are provided. The purified cyclopentadienyl magnesium compounds have very low levels of metallic impurities.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: February 24, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deodatta Vinayak Shenai-Khatkhate, Stephen J. Manzik
  • Patent number: 8961918
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: February 24, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Shih-Wei Chang, Jeffrey D. Weinhold, Phillip D. Hustad, Peter Trefonas
  • Patent number: 8961669
    Abstract: Stable zero-valent metal compositions and methods of making and using these compositions are provided. Such compositions are useful as catalysts for subsequent metallization of non-conductive substrates, and are particularly useful in the manufacture of electronic devices.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: February 24, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Feng Liu, Maria Anna Rzeznik
  • Patent number: 8961678
    Abstract: An organic solderability preservative solution includes pyrazine derivatives which inhibit corrosion of metal. The solution is applied to metal surfaces of components for electronic apparatus to improve solderability of electrical connections between the components in the electronic apparatus.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: February 24, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Qin Tang, Kit Ho Tong, Chit Yiu Chan, Martin W. Bayes
  • Patent number: 8956724
    Abstract: Molybdenum disulfide powders include substantially spherically-shaped particles of molybdenum disulfide that are formed from agglomerations of generally flake-shaped sub-particles. The molybdenum disulfide powders are flowable and exhibit uniform densities. Methods for producing a molybdenum disulfide powder may include the steps of: Providing a supply of molybdenum disulfide precursor material; providing a supply of a liquid; providing a supply of a binder; combining the molybdenum disulfide precursor material with the liquid and the binder to form a slurry; feeding the slurry into a stream of hot gas; and recovering the molybdenum disulfide powder, the molybdenum disulfide powder including substantially spherically-shaped particles of molybdenum disulfide formed from agglomerations of generally flake-shaped sub-particles.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: February 17, 2015
    Assignee: Climax Engineered Materials, LLC
    Inventors: Matthew C. Shaw, Carl V. Cox, Yakov Epshteyn