Abstract: An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
Type:
Grant
Filed:
April 21, 2010
Date of Patent:
November 18, 2014
Assignee:
MKS Instruments, Inc.
Inventors:
John Valcore, Jr., Yufeng Han, Jonathan Smyka, Salvatore Polizzo, Aaron T. Radomski
Abstract: A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer.
Type:
Grant
Filed:
June 4, 2010
Date of Patent:
November 18, 2014
Assignee:
MKS Instruments Inc.
Inventors:
Xing Chen, Chengxiang Ji, Chiu-Ying Tai
Abstract: A system to purge dissolved gases selectively from liquids can include a first contactor having two first contactor inlets and two first contactor outlets. The first contactor can receive liquid from a liquid source at a first inlet of the first contactor and an inert gas source at a second inlet of the first contactor, the inert gas can purge a first portion of gas from the liquid source. The first portion of purged gas exits the first contactor at a first outlet of the first contactor. The second contactor can receive input from the second outlet of the first contactor and the inert gas, the inert gas purges a second portion of the gas from the liquid source. The second portion of purged gas can exit the second contactor at a first outlet of the second contactor.
Type:
Grant
Filed:
March 15, 2012
Date of Patent:
November 11, 2014
Assignee:
MKS Instruments, Inc.
Inventors:
Ulrich Brammer, Johannes Seiwert, Christiane Gottschalk
Abstract: A pressure sensor system may sense the pressure of a gas or liquid. The system may include a housing that has an entry port for the gas or liquid; a pressure sensor within the housing; and a baffle positioned between the entry port and the pressure sensor. The baffle may have one or more inlets oriented to receive gas or liquid that enters the entry port; one or more outlets oriented to deliver the received gas or liquid to the pressure sensor; and one or more sealed flow channels that prevent the gas or liquid from escaping from the baffle, other than through the one or more outlets. At least one of the outlets may be located within no more than one millimeter of a location on the pressure sensor. The pressure sensor and baffle may be made at the same time during a process of depositing, pattering, etching, wafer bonding, and/or wafer thinning a series of layers using microelectromechanical systems (MEMS) technology.
Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.
Type:
Application
Filed:
January 9, 2014
Publication date:
October 16, 2014
Applicant:
MKS Instruments, Inc.
Inventors:
David Menzer, Jack J. Schuss, Jesse E. Ambrosina
Abstract: A self-calibrating pressure sensor system may measure the pressure of a gas or liquid. The system may include a pressure sensor, a reference sensor, and a drift compensation system. The pressure sensor may include a pressure-sensing flexible diaphragm with one side exposed to the gas or liquid and another side forming a wall of a sealed chamber. The reference sensor may include a reference flexible diaphragm that has two sides that are both within or exposed to the same sealed chamber. The drift compensation system may produce information that is indicative of the pressure of the gas or liquid based on the signal from the pressure sensor, and compensate for drift in this signal based on changes in the signal from the reference sensor. The pressure-sensing flexible diaphragm and the reference flexible diaphragm may be made at substantially the same time by depositing or growing a single layer of material in a single continuous step.
Type:
Application
Filed:
December 9, 2013
Publication date:
October 9, 2014
Applicant:
MKS Instruments, Inc.
Inventors:
Leonid Mindlin, Stephen F. Bart, Lei Gu
Abstract: Described are methods, systems, and a computer-readable storage medium for controlling a discrete-type manufacturing process (e.g., an injection molding process) with a multivariate model. Data representing process parameters, operating parameters, or both of the manufacturing process are received. The received data is compared with a multivariate model that approximates the manufacturing process to provide a result. Upon the result of the comparing satisfying a condition, one or more values for a set of operating parameters for the manufacturing process are determined. When the one or more determined values for the set of operating parameters satisfies a criterion, at least one operating parameter of the manufacturing process is updated.
Type:
Grant
Filed:
November 16, 2010
Date of Patent:
October 7, 2014
Assignee:
MKS Instruments, Inc.
Inventors:
Daniel Robert Hazen, Christopher Paul Ambrozic, Christopher Peter McCready
Abstract: A four channel gas delivery system comprising: an inlet channel; four outlet channels; four flow sensors; four control valves, each valve being arranged so as to control the flow from the inlet channel through a corresponding one of the outlet channels; a flow ratio control system configured so as to control the flow from the inlet channel through the corresponding outlet channels so that the following flow ratios are controlled: (a) a first ratio of flows between the outlet channels of a first pair; (b) a second ratio of flows between the outlet channels of a second pair; and (c) a third ratio of flows between the first pair of outlet channels relative to the second pair of outlet channels; wherein the third ratio is controlled by generating at least one bias signal respectively applied to at least one pair of valves, the bias signal being a function of a predetermined set point of the third ratio and measured values of the third ratio.
Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.
Type:
Application
Filed:
March 14, 2014
Publication date:
September 18, 2014
Applicant:
MKS Instruments, Inc.
Inventors:
Xing Chen, IIya Pokidov, Arthur Tian, Ken Tran, David Lam, Kevin W. Wenzel
Abstract: A system and method are configured to deliver pulses of desired mass of gases. The system delivers a plurality of sequences of pulses of a desired mass of gas through at least two flow channels. The system comprises: a multi-channel fast pulse gas delivery system including (a) a plurality of flow channels, each channel comprising a flow sensor and a control valve, and (b) a dedicated controller configured and arranged to receive a recipe of one or more sequences of steps for opening and closing at least some of the control valves so as to deliver as a sequence of pulses of at least one gas through each of the corresponding channels as a function of the recipe.
Abstract: Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.
Abstract: Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.
Abstract: This disclosure relates to mass flow verification systems for and methods of measuring and verifying the mass flow through a mass flow delivery/measurement device such as a mass flow controller. A mass flow verification system includes a preset volume, a temperature sensor, and a pressure sensor. The measured verified flow determined by the mass flow verification system can be adjusted to compensate for errors resulting from a dead volume within the mass flow measurement device.
Abstract: A mole delivery system and method provide pulses of known molar quantities as a function of the time duration of each pulse, which in turn is derived as a function of the ideal gas law. In one embodiment of the system, the system comprises: a chamber of known volume and controlled and known temperature; a pressure sensor to measure the pressure in the chamber; an outlet valve to a process tool; an inlet valve to charge the chamber with the delivery gas; and a control system configured and arranged so as to control the operation of the outlet valve, control the amount of each gas pulse by controlling the timing of the valve to the process tool.
Abstract: A combiner includes N coaxial cables each configured to connect to a respective output of N radio frequency power amplifiers, where N is an integer greater than one. Each of the N coaxial cables is configured to receive an amplified radio frequency signal from a respective one of the N radio frequency power amplifiers. A board includes capacitances and is configured to connect to each of the N coaxial cables and combine the radio frequency signals. The N coaxial cables and the capacitances provide N inductance and capacitance combinations. A connector is configured to connect an output of the board to a load.
Abstract: A distortion module includes a first module, at least one module and a correction module. The first module is configured to (i) receive radio frequency signals from radio frequency sensors of a power amplifier, and (ii) generate a distortion signal indicating distortion values for the radio frequency signals. The radio frequency signals are indicative of radio frequency power out of the power amplifier and received by a transmission line. At least one module is configured to estimate a phase of the distortion signal. The phase of the distortion signal is indicative of a phase of the transmission line. The correction module is configured to generate a distortion correction signal based on the phase to correct at least one of the distortion values of the radio frequency signals.
Abstract: A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
Type:
Grant
Filed:
December 23, 2011
Date of Patent:
July 15, 2014
Assignee:
MKS Instruments Inc.
Inventors:
William M. Holber, John A. Smith, Xing Chen, Donald K. Smith
Abstract: A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.
Abstract: A butterfly valve comprises: a body including a valve opening; and a flapper rotatably mounted about a rotation axis so as to be movable relative to the valve opening. The flapper is rotatable at least 180° about the rotation axis so that the flapper is movable to at least one fully opened position, at least one fully closed position 90° apart from the fully opened position, and a third position, either fully opened or fully closed, 180° from the other like position. In one embodiment the flapper is rotatable at least 360° about the rotation axis so that the flapper is movable to each of two opened positions 180° apart, and two closed positions 180° apart from each other and 90° and 270° apart from each of the fully opened positions. The valve can be easily calibrated and controlled, and cleaned to extend the useful service life between cleanings.
Type:
Grant
Filed:
November 3, 2009
Date of Patent:
July 1, 2014
Assignee:
MKS Instruments, Inc.
Inventors:
Jaroslaw W. Pisera, David B. Chamberlain, Robert Krmpotich, Paul D. Lucas
Abstract: A switching apparatus includes a first transistor, a second transistor, a first circuit module, a first current sensor and a control circuit. The first transistor includes first, second and third terminals. The first terminal of the first transistor is coupled to a first power terminal. The third terminal of the first transistor includes a gate or base of the first transistor. The second transistor includes first, second and third terminals. The first terminal of the second transistor is coupled to a second power terminal. The second terminal of the second transistor is coupled to the second terminal of the first transistor. The third terminal of the second transistor includes a gate or base of the second transistor. The first circuit module includes an inductor in parallel with a diode. The first circuit module is connected between the first terminal of the second transistor and the second power terminal.