Abstract: A power amplifier (PA) adjustably operable between two classes of operation. The range of operation lies in a range of operation between a conventional, linear, conjugately matched Class AB characteristic amplifier and a higher efficiency switching Class E characteristic amplifier. A circuit topology having a push-pull configuration that allows a Class E characteristic of operation.

Abstract: An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute.

Abstract: A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system.

Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Abstract: An improved capacitive manometer includes a diaphragm including a common electrode and an electrode structure including a center electrode and ring electrode. The diaphragm is movable between (i) a zero position when the pressure on each side of the diaphragm is the same and (ii) a maximum differential position when the maximum measurable differential pressure is applied to the diaphragm. A support structure is arranged to support the diaphragm so that the diaphragm is constrained relative to the electrode structure. The common electrode is spaced from and axially aligned with the center and ring electrodes. The electrode structure is secured relative to the diaphragm at at least three clamping locations. The angle defined within each right plane containing a point of constraint of the diaphragm and the point of each clamping location relative to the plane of the diaphragm in the zero position is between 60° and 90°.

Abstract: Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.

Abstract: Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.

Abstract: Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.

Abstract: A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described.

Abstract: A multi-channel radio frequency (RF) generator module includes N power amplifiers, M drivers, a power supply module, and a control module. The N power amplifiers generate N RF outputs, respectively. The M drivers drive the N power amplifiers based on M driver control signals, respectively. The power supply module receives alternating current (AC) input power and applies L rail voltages to the N power amplifiers based on L rail voltage setpoints, respectively. The control module sets the L rail voltage setpoints and the M driver control signals. N is an integer greater than one, L and M are integers greater than zero, and M and L are less than or equal to N.

Abstract: A switching apparatus includes a first transistor, a second transistor, a first circuit module, a first current sensor and a control circuit. The first transistor includes first, second and third terminals. The first terminal of the first transistor is coupled to a first power terminal. The third terminal of the first transistor includes a gate or base of the first transistor. The second transistor includes first, second and third terminals. The first terminal of the second transistor is coupled to a second power terminal. The second terminal of the second transistor is coupled to the second terminal of the first transistor. The third terminal of the second transistor includes a gate or base of the second transistor. The first circuit module includes an inductor in parallel with a diode. The first circuit module is connected between the first terminal of the second transistor and the second power terminal.

Abstract: A system to purge dissolved gases selectively from liquids can include a first contactor having two first contactor inlets and two first contactor outlets. The first contactor can receive liquid from a liquid source at a first inlet of the first contactor and an inert gas source at a second inlet of the first contactor, the inert gas can purge a first portion of gas from the liquid source. The first portion of purged gas exits the first contactor at a first outlet of the first contactor. The second contactor can receive input from the second outlet of the first contactor and the inert gas, the inert gas purges a second portion of the gas from the liquid source. The second portion of purged gas can exit the second contactor at a first outlet of the second contactor.

Abstract: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Abstract: A method and apparatus for measuring current includes sensing a first voltage at the output of an amplifier and computing a current based on the first voltage and the resistance of a first resistive element, which is electrically coupled between an inverting input of the amplifier and the output of the amplifier, if the first voltage is below a predetermined level. The method also includes sensing a second voltage at the output of a buffer and computing a current based on the first and second voltages and the resistances of the first resistive element and a second resistive element, which is electrically coupled between the inverting input of the amplifier and an input of the buffer and is also electrically coupled to the output of the amplifier through a at least one diode, if the voltage output from the amplifier is above the predetermined level.

Abstract: A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described.

Abstract: A method for monitoring a manufacturing tool features acquiring metrology data (“Step a”). Data is acquired for process variables for a first process step performed by the manufacturing tool (“Step b”). A mathematical model of the first process step based on the metrology data and the acquired data is created (“Step c”). Steps b and c are repeated for at least a second process step (“Step d”). An nth mathematical model is created based on the metrology data and the data for the process variables for each of the n process steps (“Step e”). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (“Step f”). A multivariate metric is calculated based on the top level model of step f and data from subsequent runs of the manufacturing tool. Service is performed if the metric satisfies a condition.

Abstract: A calibration method for performing open circuit and closed circuit calibrations of a voltage/current (VI) probe. In one implementation the method may involve inserting a VI probe into a circuit including a first known load (Load 1) and a applying a first signal to the circuit. A first raw impedance (ZRAW1) may be measured using the Load 1. The VI probe may then be inserted into the circuit along with a second known load (Load 2) in place of the Load 1, and a second signal may be applied to the circuit. A second raw impedance (ZRAW2) may then be measured using the Load 2. A fixed reference impedance (ZR50) may then be defined. The first and second raw impedances, and the fixed reference impedance, may then be used in determining an open circuit impedance (ZOC) and a short circuit impedance (ZSC). The ZOC and ZSC impedances may then be used to determine a plurality of calibration coefficients for the VI probe.

Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Abstract: Described are computer-based methods and apparatuses, including computer program products, for optimizing data processing parameters. A data set is received that represents a plurality of samples. The data set is processed using a data processing algorithm that includes one or more processing stages, each stage using a respective first set of data processing parameters to generate processed data. A design of experiment model is generated for the data processing algorithm based on the processed data and a set of response values. For each stage of the data processing algorithm, a second set of data processing parameters is calculated based on at least the design of experiment model.