Patents Assigned to MKS Instruments
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Patent number: 8736377Abstract: A radio frequency (RF) generation module includes a power control module that receives first and second desired amplitudes of an output of the RF generation module in first and second respective states, and that outputs, based on the first and second desired amplitudes, input power setpoints corresponding to a transition from the first state to the second state. A frequency control module receives the input power setpoints and outputs frequency setpoints corresponding to the input power setpoints. A pulse shaping module receives the input power setpoints, the frequency setpoints, and an indication of when to transition from the first state to the second state, and transitions the output of the RF generation module from the first state to the second state based on the input power setpoints, the frequency setpoints, and the indication.Type: GrantFiled: October 30, 2012Date of Patent: May 27, 2014Assignee: MKS Instruments, Inc.Inventors: Amish Rughoonundon, Larry J. Fisk, II, Aaron T. Radomski
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Patent number: 8738187Abstract: A mass flow controller includes a thermal mass flow sensor in combination with a pressure sensor to provide a mass flow controller that is relatively insensitive to fluctuations in input pressure. The pressure sensor and thermal sensor respectively provide signals to an electronic controller indicating the measured inlet flow rate and the pressure within the dead volume. The electronic controller employs the measured pressure to compensate the measured inlet flow rate and to thereby produce a compensated measure of the outlet flow rate, which may be used to operate a mass flow controller control valve.Type: GrantFiled: March 21, 2012Date of Patent: May 27, 2014Assignee: MKS Instruments, Inc.Inventors: Ali Shajii, Nicholas Kottenstette, Jesse Ambrosina
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Patent number: 8727323Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: GrantFiled: April 26, 2013Date of Patent: May 20, 2014Assignee: MKS Instruments, Inc.Inventors: Johannes Seiwart, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Publication number: 20140136146Abstract: A method and system for predicting prospective behavior of a manufacturing process are described. Measured values of multiple variables, including at least one dependent variable, are received. A partial least squares (PLS) regression approach is used to estimate an unknown future value of the at least one dependent variable at a future point in time in a current batch run.Type: ApplicationFiled: January 20, 2014Publication date: May 15, 2014Applicant: MKS Instruments, Inc.Inventor: Chris Peter McCready
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Patent number: 8725469Abstract: Described are computer-based methods and apparatuses, including computer program products, for optimizing data processing parameters. A data set is received that represents a plurality of samples. The data set is processed using a data processing algorithm that includes one or more processing stages, each stage using a respective first set of data processing parameters to generate processed data. A design of experiment model is generated for the data processing algorithm based on the processed data and a set of response values. For each stage of the data processing algorithm, a second set of data processing parameters is calculated based on at least the design of experiment model.Type: GrantFiled: March 3, 2011Date of Patent: May 13, 2014Assignee: MKS Instruments, Inc.Inventors: Erik Axel Johansson, Nils Johan Trygg, Mattias Alexander Eliasson
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Patent number: 8710926Abstract: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.Type: GrantFiled: February 8, 2012Date of Patent: April 29, 2014Assignee: MKS Instruments, Inc.Inventors: Siddharth P. Nagarkatti, Yevgeniy Barskiy, Feng Tian, Ilya Bystryak
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Patent number: 8704171Abstract: A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system.Type: GrantFiled: November 20, 2012Date of Patent: April 22, 2014Assignee: MKS Instruments, Inc.Inventors: Timothy Roger Robinson, Mark Attwood, Xing Chen, William M. Holber, Mark Philip Longson, Jonathan Henry Palk, Ali Shajii, John A. Smith
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Patent number: 8704538Abstract: A sensor assembly includes a housing assembly, an electrode arrangement and a diaphragm having a fixed portion secured to the housing assembly and an active portion movable relative to the electrode arrangement in response to a differential pressure applied to opposite sides of the diaphragm. The fixed portion of the diaphragm is secured at one or more locations relative to at least a portion of the housing assembly; and at least one groove is formed in the fixed portion of the diaphragm between the locations at which the diaphragm is fixed relative to the housing assembly and the active portion so as to relieve any stress on the active portion of the diaphragm. A method of making the sensor assembly is also disclosed.Type: GrantFiled: July 1, 2010Date of Patent: April 22, 2014Assignee: MKS Instruments, Inc.Inventor: Chrisy Grudzien
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Patent number: 8692466Abstract: Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.Type: GrantFiled: February 27, 2009Date of Patent: April 8, 2014Assignee: MKS Instruments Inc.Inventors: Souheil Benzerrouk, Siddharth P. Nagarkatti, Andrew Cowe, Ali Shajii, Jesse E. Ambrosina, Ken Tran, Xing Chen
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Patent number: 8689822Abstract: A pressure control system remotely controls pressure within one or more remote zones, each respectively connected to an enclosure through a conduit, by controlling flow of a fluid into and out of each enclosure. The pressure of the fluid is measured within each enclosure. An estimated pressure within each zone is computed, as a function of the measured pressure in the enclosure and known characteristics of the conduit and the zone. For each zone, an inlet proportional valve and an outlet proportional valve of each enclosure is operated so as to control the input flow rate of the fluid into the respective enclosure and the output flow rate of the fluid out of the enclosure as a function of a pressure set point and the estimated pressure, thereby regulating pressure within the zone in accordance with the pressure set point.Type: GrantFiled: October 12, 2011Date of Patent: April 8, 2014Assignee: MKS Instruments, Inc.Inventors: Ali Shajii, Siddharth P. Nagarkatti, Gordon Hill
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Patent number: 8679287Abstract: A secondary reaction chamber with a mesh reactor element and a heater assembly are positioned in a foreline between a CVD reaction chamber and a vacuum pump to mix and react all previously unreacted precursor reactants to remove them from the effluent before they can reach and damage the vacuum pump.Type: GrantFiled: May 23, 2005Date of Patent: March 25, 2014Assignee: MKS Instruments, Inc.Inventors: Youfan Gu, David Neumeister
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Patent number: 8680777Abstract: A power system for a dielectric barrier discharge system, such as used for generating ozone, can include a full bridge inverter stage and parallel resonant tank outputting a signal for powering a dielectric barrier discharge cell stack. The inverter stage is controlled using a combination of pulse width modulation (PWM) and frequency modulation (FM) to enable soft switching through all load conditions—from full load to light load. A current control loop error amplifier compensator can provide a duty cycle adjustment signal to a phase shift PWM controller chip that generates the switching signals for the inverter stage. A feedback signal is also used to adjust a clock frequency time constant of the PWM controller chip to provide the FM. In one embodiment, the feedback signal is an output of an inverting amplifier connected at an output of the current control loop error amplifier compensator.Type: GrantFiled: March 27, 2012Date of Patent: March 25, 2014Assignee: MKS Instruments, Inc.Inventors: Ken Tran, Xing Chen, Russell L. Newman, Franklin Lee
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Patent number: 8671987Abstract: A two-stage, slow-start valve includes a minor valve assembly inside a major valve closure member of a major valve closure assembly so that fluid can flow through the valve at a higher rate by opening the major valve assembly or at a lower rate by opening the minor valve assembly while the major valve closure assembly is closed in order to allow fluid to flow in an alternate flow path through the major valve closure member. The example minor valve closure assembly has a minor valve closure member that is actuated to open by a minor valve piston on which minor valve actuating fluid is applied to the minor piston via a diaphragm seal positioned between the minor piston and the minor valve actuating fluid. Both the major valve closure assembly and the minor valve closure assembly can be pneumatically actuated to open.Type: GrantFiled: December 15, 2010Date of Patent: March 18, 2014Assignee: MKS Instruments, Inc.Inventors: Youfan Gu, David Neumeister, Kevin Grout
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Publication number: 20140062285Abstract: A plasma source for providing dissociated gas to semiconductor process chamber is provided. The plasma chamber can have at least one gas inlet and at least one chamber wall for containing the gas, a plurality of magnetic cores disposed relative to the plasma chamber such that the plasma chamber passes through each of the plurality of magnetic cores. A primary winding can be coupled to the plurality of magnetic cores. The plasma chamber can generate a toroidal plasma along a plane extending through the plasma chamber and which is at least substantially parallel to a top surface of a sample holder disposed within the semiconductor process chamber.Type: ApplicationFiled: August 29, 2012Publication date: March 6, 2014Applicant: MKS Instruments, Inc.Inventor: Xing Chen
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Patent number: 8659335Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.Type: GrantFiled: June 25, 2009Date of Patent: February 25, 2014Assignee: MKS Instruments, Inc.Inventors: Siddharth Nagarkatti, Feng Tian, David Lam, Abdul Rashid, Souheil Benzerrouk, Ilya Bystryak, David Menzer, Jack J. Schuss, Jesse E. Ambrosina
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Patent number: 8658936Abstract: A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.Type: GrantFiled: December 23, 2011Date of Patent: February 25, 2014Assignee: MKS Instruments Inc.Inventors: William M. Holber, John A. Smith, Xing Chen, Donald K. Smith
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Publication number: 20140049250Abstract: A radio frequency sensor system includes a printed circuit board (PCB). The PCB includes a first exterior layer, a second exterior layer, a first interior layer, a second interior layer, and an inner perimeter that defines an aperture through the PCB. The PCB also includes a first loop. The first loop includes a first plurality of sensor pads coupled to a first plurality of vias by a first plurality of traces. The first plurality of sensor pads is arranged on the inner perimeter. The PCB also includes a second loop. The second loop includes a second plurality of sensor pads coupled to a second plurality of vias by a second plurality of traces. The second plurality of sensor pads is arranged on the inner perimeter. A core ring is embedded within the first interior layer proximal to the first plurality of sensor pads, the first plurality of vias, and the first plurality of traces. A center conductor, for carrying RF current, extends through the aperture.Type: ApplicationFiled: March 14, 2013Publication date: February 20, 2014Applicant: MKS Instruments, Inc.Inventors: Dennis M. BROWN, David J. COUMOU, Raymond BROOKS
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Patent number: 8641978Abstract: A transformer-less power supply is provided for ozone generation. The power supply advantageously reduces costs and increases reliability of ozone generators. The power supply provides a first AC voltage from a power source to a resonant circuit and the resonant circuit provides a second AC voltage to the ozone generating unit, the second AC voltage being greater than the first AC voltage. A controller for the power supply that adapts to the resonance of the circuit to provide control with a wide tolerance for the high Q circuit component values of the circuit.Type: GrantFiled: June 20, 2012Date of Patent: February 4, 2014Assignee: MKS Instruments, Inc.Inventors: Igor Elkin, Alan Millner, Ken Tran, Madhuwanti Joshi
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Patent number: 8645082Abstract: Described are computer-based methods and apparatuses, including computer program products, for monitoring, detecting, and quantifying chemical compounds in a sample. A sample measurement comprising a digitized spectroscopic profile is received. A multivariate multistage background model comprising a first model that models a first time effect, a second model that models a second time effect that is different than the first time effect, or both is calculated. A background corrected sample measurement based on the sample measurement and the multivariate multistage background model is generated. A multivariate multistage library search, fault detection, and quantification algorithm is executed to identify one or more primary chemicals in the background corrected sample measurement.Type: GrantFiled: September 13, 2010Date of Patent: February 4, 2014Assignee: MKS Instruments, Inc.Inventors: Huwei Tan, Svante Bjarne Wold
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Publication number: 20140028389Abstract: A radio frequency system includes a power amplifier that outputs a radio frequency signal to a matching network via a transmission line between the power amplifier and the matching network. A sensor monitors the radio frequency signal and generates first sensor signals based on the radio frequency signal. A distortion module determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals and (ii) a cross-correlation function of the first sensor signals. A first correction circuit (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network including outputting the first impedance tuning value to one of the power amplifier and the matching network.Type: ApplicationFiled: October 2, 2013Publication date: January 30, 2014Applicant: MKS Instruments, Inc.Inventor: David J. COUMOU