Patents Assigned to MKS Instruments
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Publication number: 20090095901Abstract: A system and methods are described for generating reagent ions and product ions for use in a quadrupole mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadrupole mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system.Type: ApplicationFiled: October 10, 2007Publication date: April 16, 2009Applicant: MKS Instruments, Inc.Inventors: Timothy Roger Robinson, Mark Attwood, Xing Chen, William M. Holber, Mark Philip Longson, Jonathan Henry Palk, Ali Shajii, John A. Smith
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Publication number: 20090095902Abstract: A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing.Type: ApplicationFiled: October 10, 2007Publication date: April 16, 2009Applicant: MKS Instruments, Inc.Inventors: TIMOTHY ROGER ROBINSON, Mark Attwood, Xing Chen, William M. Holber, Mark Philip Longson, Jonathan Henry Palk, Ali Shajii, John A. Smith
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Patent number: 7502114Abstract: An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute.Type: GrantFiled: March 12, 2004Date of Patent: March 10, 2009Assignee: MKS Instruments, Inc.Inventors: Stephan Levine, Johannes Seiwert, Joachim Lohr, Ulrich Brammer, Jens Fittkau
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Patent number: 7501600Abstract: Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.Type: GrantFiled: February 15, 2005Date of Patent: March 10, 2009Assignee: MKS Instruments, Inc.Inventors: William M. Holber, Xing Chen, Andrew B. Cowe, Matthew M. Besen, Ronald W. Collins, Jr., Susan C. Trulli, Shouqian Shao
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Publication number: 20090039934Abstract: Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships.Type: ApplicationFiled: October 9, 2008Publication date: February 12, 2009Applicant: MKS Instruments, Inc.Inventors: Robert M. Carangelo, Paul C. Jette, Jack Kisslinger
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Publication number: 20090037013Abstract: A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described.Type: ApplicationFiled: May 1, 2008Publication date: February 5, 2009Applicant: MKS Instruments, Inc.Inventors: Lawrence Hendler, Stela Diamant Lazarovich, Ron Hadar, Nouna Kettaneh, Uzi Levami, Dmitry Perlroizen
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Patent number: 7479615Abstract: Static neutralization of a charged object is provided by generating, in an ionizing cell or module, an ion cloud having a mix of positively and negatively charged ions, and reshaping the ion cloud by redistributing the ions into two regions of opposite polarity by using a second voltage. The second voltage creates an electrical field, which is preferably located in the vicinity of the ion cloud. The redistribution of the ions increases the effective range in which available ions may be displaced or directed towards the charged object. The electrical field redistributes ions that form the ion cloud. Ion redistribution within the ion cloud occurs because ions having a polarity corresponding to the polarity of the second voltage are repelled from the electrical field, and ions having a polarity opposite from that of the electrical field are attracted to electrical field.Type: GrantFiled: May 25, 2005Date of Patent: January 20, 2009Assignee: MKS Instruments, Inc.Inventors: Peter Gefter, Scott Gehlke, Alexandre Ignatenko
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Patent number: 7477996Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide a continuous absolute pressure profile over a wide range of pressures on a single integrated scale. The absolute pressure measurements and differential pressure measurements are obtained, and a correlation factor between the absolute pressure measurements and the differential pressure measurements is determined. The correlation factor is used to normalize the differential pressure measurements to virtual absolute pressure values on a common absolute pressure scale with the absolute pressure measurements. An absolute pressure profile over a wide pressure range includes the absolute pressure measurements in a portion of the range where the absolute pressure measurements are accurate, and it includes the virtual absolute pressure values in another portion of the range where the differential pressure measurements are accurate.Type: GrantFiled: June 6, 2007Date of Patent: January 13, 2009Assignee: MKS Instruments, Inc.Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
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Patent number: 7477711Abstract: A power source may generate signals (RF or microwave), when driven by a drive signal from a controller. A sensor may measure the voltage and current of the signals generated by the power source, and may generate sensor signals representative of the measured voltage and current. A sampler may be configured to undersample the sensor signals, synchronously with the drive signal that drives the power source. The sampling frequency may be a scalar multiple of the fundamental frequency of the sensor signals. At RF frequencies, either synchronous undersampling or synchronous oversampling may be performed. At microwave frequencies, synchronous undersampling may be performed.Type: GrantFiled: May 19, 2005Date of Patent: January 13, 2009Assignee: MKS Instruments, Inc.Inventors: Tim Kalvaitis, Siddharth P. Nagarkatti
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Patent number: 7474968Abstract: A flow verifier for verifying measurement by a fluid delivery device under test (DUT) includes a chamber configured to receive a flow of the fluid from the DUT, at least one temperature sensor to provide gas temperature in the chamber, at least one pressure transducer to provide gas pressure in the chamber, and a critical flow nozzle located upstream of the chamber along a flow path of the fluid from the DUT to the chamber. The critical flow nozzle and the flow verification process are configured to maintain the flow rate of the fluid through the nozzle at the critical flow condition such that the flow rate through the nozzle is substantially constant and substantially insensitive to any variation in pressure within the chamber downstream of the nozzle.Type: GrantFiled: June 30, 2006Date of Patent: January 6, 2009Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Kaveh Zarkar, Ali Shajii, Daniel Smith
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Publication number: 20080316773Abstract: A high voltage power supply for a static neutralizer is disclosed. The high voltage power supply includes a resonant converter and a load with an emitter module having an emitter, reference electrode, and a capacitance value. The resonant converter is disposed to have a resonant frequency and an output coupled to the load. The resonant converter generates an output waveform with an amplitude sufficient for generating to ions by corona discharge when the load receives the output waveform. The load is predominantly capacitive when the resonant converter is operating at the resonant frequency.Type: ApplicationFiled: June 22, 2007Publication date: December 25, 2008Applicant: MKS Instruments, Inc.Inventors: Stuart Neubarth, Michael A. Lehr, Scott Gehlke, Peter Gefter
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Patent number: 7467027Abstract: A thermal mass flow controller for controlling flow rate of a fluid includes a conduit configured to receive the fluid, a pressure sensor that measures the pressure of the fluid as the fluid flows within the conduit, a temperature sensor that measures the ambient temperature of the fluid, and a thermal sensor that generates an output representative of the flow rate of the fluid. The thermal mass flow controller further includes a control system configured to monitor the output from the thermal sensor, the pressure measured by the pressure sensor, and the ambient temperature measured by the temperature sensor, to regulate flow of the fluid within the conduit so as to compensate for a shift in the thermal sensor output caused by thermal siphoning.Type: GrantFiled: January 26, 2006Date of Patent: December 16, 2008Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Kaveh H. Zarkar
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Publication number: 20080302652Abstract: A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.Type: ApplicationFiled: June 3, 2008Publication date: December 11, 2008Applicant: MKS Instruments, Inc.Inventors: William Robert Entley, Xing Chen, Ali Shajii, Kaveh Bakhtari, Andrew Cowe
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Patent number: 7463991Abstract: A flow verifier for verifying measurement of a flow rate of a fluid by a device includes a flow restrictor that renders the flow rate verification substantially insensitive to elements upstream of the flow restrictor. The flow verifier includes a vessel that receives a flow of the fluid from the device, and a pressure sensor that measures pressure of the fluid within the vessel. An outlet valve regulates flow of the fluid out of the vessel. The flow restrictor is located adjacent to and upstream of the vessel, along a flow path of the fluid. The flow restrictor restricts the flow of the fluid so as to induce a shock in the flow path of the fluid, and sustains the shock during a time period sufficient to render the flow rate verification substantially insensitive to the elements upstream of the flow restrictor.Type: GrantFiled: March 3, 2006Date of Patent: December 9, 2008Assignee: MKS Instruments, Inc.Inventors: Ali Shajii, Daniel Smith
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Patent number: 7461549Abstract: Embodiments of the present disclosure are directed to systems, methods, and apparatus, including software implementation, useful for high-precision measurement of mass flow rate over a large range of flows by using multiple volumes, each having a different and selected size. Use of a single manometer can facilitate reduced cost, and the use of multiple chamber volumes that are sized according to sub-flow ranges within the overall range of the mass flow verifier, or a related device under test, can provide high accuracy while reducing deleterious effects of noise in the flow measurement.Type: GrantFiled: June 27, 2007Date of Patent: December 9, 2008Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Kaveh H. Zarkar
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Patent number: 7455720Abstract: In a deposition system, such as a TiN deposition system where TiCl4 and NH3 are reacted in a process chamber to produce TiN thin film coatings, a second reactor is included between the process chamber and the vacuum pump to react enough of the theretofore unreacted feed gases to consume substantially all of at least one of them so that further reactions that could otherwise produce solids, which cause excessive vacuum pump wear, are presented. The second reactor is preferably positioned between a cooled condensation trap downstream from the process chamber and vacuum pump, and it is also applicable in atomic layer deposition (ALD) systems for TiN, WN, and other materials as well as in chemical vapor deposition (CVD) systems for those and other materials.Type: GrantFiled: February 16, 2005Date of Patent: November 25, 2008Assignee: MKS Instruments, Inc.Inventor: Youfan Gu
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Patent number: 7451654Abstract: A system and method are described for maintaining power dissipation substantially constant across the sensor interface board of a capacitance pressure transducer. A shorted diaphragm level detector detects a shorting of the diaphragm onto one or more reference electrodes. A power dissipating resistor is placed near the oscillator that drives the capacitance detecting circuit in the capacitance pressure transducer. The resistor is switched across a power supply when the shorting is detected, causing current to flow through the resistor so that power can be added in an amount sufficient to maintain power dissipation by the oscillator substantially constant when the diaphragm shorts.Type: GrantFiled: August 9, 2007Date of Patent: November 18, 2008Assignee: MKS Instruments, Inc.Inventors: Philip J. Maiorana, Santhi E. Mathew
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Publication number: 20080257738Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: ApplicationFiled: October 17, 2007Publication date: October 23, 2008Applicant: MKS Instruments, Inc.Inventors: Johannes Seiwert, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Publication number: 20080251727Abstract: A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices.Type: ApplicationFiled: May 12, 2008Publication date: October 16, 2008Applicant: MKS Instruments, Inc.Inventors: Martin L. Spartz, Vidi Saptari
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Patent number: 7436234Abstract: Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships.Type: GrantFiled: February 25, 1994Date of Patent: October 14, 2008Assignee: MKS Instruments, Inc.Inventors: Robert M. Carangelo, Paul C. Jette, Jack Kisslinger