Patents Assigned to MKS Instruments
  • Patent number: 7697258
    Abstract: At least one orifice is added to an AC ionizer with nozzles and ionizing electrodes that are used to remove static charge. The orifice is placed in a location where electrostatic forces are weak and where gas ions can be easily extracted from the ionizer. Ionizer effectiveness is enhanced by recovering gas ions that are normally trapped between the nozzles and under a portion of the ionizer from which the nozzles project. Without the orifice properly positioned, the trapped gas ions are lost by recombination or grounding. With the orifice positioned in an area of weak electrostatic forces, more gas ions are available for discharging the charged object. The combined air consumption of nozzles plus at least one orifice is the same or less than nozzles alone would consume for a given discharge time.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: April 13, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: Grigoriy N. Vernitskiy, Peter Gefter, Lawrence Levit
  • Patent number: 7693687
    Abstract: The present invention relates to control of and data collection from sensors associated with tools. In particular, it relates to using a controller to mediate communications among a tool, sensors associated with the tool and data users, such as a host system or distributed processors. Particular aspects of the present invention are described in the claims, specification and drawings.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: April 6, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: Uzi Lev-Ami, Guenter Sifnatsch, Mark Attwood
  • Publication number: 20100079764
    Abstract: A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices.
    Type: Application
    Filed: September 28, 2009
    Publication date: April 1, 2010
    Applicant: MKS Instruments, Inc.
    Inventors: Martin L. Spartz, Vidi Saptari
  • Patent number: 7685481
    Abstract: A system and method for defect analysis are disclosed wherein a defect data set is input into the system. A radius value is selected by a user, which is the maximum number of bits that bit failures can be separated from one another to be considered a bit cluster. When a defect data set is received, the system and method start with a fail bit and search for neighboring fail bits. The specified radius is used to qualify the found fail bits to be part of the bit cluster or not. If a minimum count of fail bits is not met, the system and method will stop searching and move to the next fail bit. If a minimum count of fail bits is met, the search continues for the next fail bit until the maximum fail bit count specified by the user is reached. Aggregation is provided such that once bit clusters have been classified, the number of clusters that have the exact match or partial match to each other is counted. The user may set the partial match as a threshold count to establish a match.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: March 23, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: Tom T. Ho, Jonathan B. Buckheit, Weidong Wang, Xin Sun
  • Patent number: 7679413
    Abstract: Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships.
    Type: Grant
    Filed: October 9, 2008
    Date of Patent: March 16, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: Robert M. Carangelo, Paul C. Jette, Jack Kisslinger
  • Patent number: 7679026
    Abstract: Efficient static neutralization of an electrostatically charged object that has a varying distance from an ion generating source, a varying velocity, a large dimension or any these is achieved by using an ionizing cell or bar having a first electrode and a second electrode. The first electrode for receiving a multi-frequency voltage that has a waveform, and the second electrode separated from the first electrode by a first distance and for use as a reference electrode. The waveform is adjusted during neutralization of a moving object based on at least one attribute of the object.
    Type: Grant
    Filed: January 15, 2007
    Date of Patent: March 16, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: Peter Gefter, Scott Gehlke
  • Publication number: 20100063614
    Abstract: The present invention relates to process I/O controllers for semiconductor manufacturing to which a tool host can delegate data collection, monitoring and control tasks. In particular, it relates to process I/O controllers that can perform more than one of data collection, monitoring, control and response to commands from a tool host with statistically repeatable performance and precision. Embodiments described use prioritized real time operating systems to control of semiconductor manufacturing tools and data collection from tool associated with the sensors. Statistically repeatable responsiveness to selected commands and to sensor inputs during selected recipe steps effectively reduces jitter.
    Type: Application
    Filed: November 16, 2009
    Publication date: March 11, 2010
    Applicant: MKS Instruments, Inc.
    Inventors: Leonid Rosenboim, David Michael Gosch
  • Patent number: 7673645
    Abstract: The multiple antisymmetric optimal (MAO) control algorithm is disclosed for a gas delivery system including a flow ratio controller for dividing a single mass flow into multiple flow lines. In the MAO control algorithm, each flow line is provided with a flow sensor and a valve actively controlled by a SISO feedback controller combined with a linear saturator to achieve the targeted flow ratio set point. For optimal control performance, these SISO controller and linear saturators are substantial identical. It is proved that each valve control command is multiple antisymmetric to the summation of all other valve control commands. Therefore, the MAO control algorithm guarantees that there exists at least one valve at the allowable maximum open position at any moment, which achieves the optimal solution in terms of the maximum total valve conductance for a given set of flow ratio set points.
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: March 9, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: Junhua Ding, Kaveh H. Zarkar
  • Publication number: 20100057237
    Abstract: A method for creating a new model of a manufacturing process according to a multivariate analysis including selecting a set of data representative of multidimensional data measured during a step or phase of a manufacturing process. The method also includes determining a set of model generation conditions based on the set of data and generating the new model specifying intervals for the multidimensional data measured during a future manufacturing process based on the set of model generation conditions.
    Type: Application
    Filed: September 2, 2008
    Publication date: March 4, 2010
    Applicant: MKS Instruments, Inc.
    Inventors: Nouna KETTANEH, Svante Bjarne WOLD
  • Patent number: 7659489
    Abstract: Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: February 9, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: William M. Holber, Xing Chen, Andrew B. Cowe, Matthew M. Besen, Ronald W. Collins, Jr., Susan C. Trulli, Shouquian Shao
  • Publication number: 20100027017
    Abstract: An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute.
    Type: Application
    Filed: March 3, 2009
    Publication date: February 4, 2010
    Applicant: MKS Instruments, Inc.
    Inventors: Stephan Levine, Johannes Seiwert, Joachim Lohr, Ulrich Brammer, Jens Fittkau
  • Publication number: 20100012482
    Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.
    Type: Application
    Filed: July 17, 2008
    Publication date: January 21, 2010
    Applicant: MKS Instruments, Inc.
    Inventors: Jesse N. Klein, David C. Halstead, Michael R. Gilbert
  • Publication number: 20100001796
    Abstract: A radio frequency (RF) power generator includes a first switch-mode amplifier that generates a first RF signal in accordance with a first control signal and a second switch-mode amplifier that generates a second RF signal in accordance with a second control signal. The first and second control signals determine a phase difference between the first and second RF signals. An output signal envelope is based on the first and second RF signals and the phase difference. The first control and second control signals alternate phases of the first and second RF signals.
    Type: Application
    Filed: July 1, 2008
    Publication date: January 7, 2010
    Applicant: MKS Instruments, Inc.
    Inventors: Seshadri Sivakumar, Abdullah Eroglu
  • Patent number: 7643909
    Abstract: A master valve and at least one slave valve are connected via a network, wherein upon broadcast of a position setpoint of the master valve the at least one slave valve achieves a corresponding position within a shortened period of time, such network being a dedicated network or high speed shared network with position setpoint priority.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: January 5, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: David J. Goldman, Martin Ryan, Vladislav Davidkovich, Gordon Hill
  • Publication number: 20090320677
    Abstract: A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
    Type: Application
    Filed: June 26, 2008
    Publication date: December 31, 2009
    Applicant: MKS Instruments, Inc.
    Inventors: Ali Shajii, Xing Chen, Andrew Cowe, David Burtner, William Robert Entley, ShouQian Shao
  • Patent number: 7639015
    Abstract: The invention generally relates to stabilizing an MRI power delivery system. In one aspect, a stabilization module that is in electrical communication with the MRI power delivery system is provided. The stabilization module includes a closed loop control system. The closed loop control system is used to modify the at least one characteristic of the input signal. The modified input signal is provided to the MRI power delivery system.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: December 29, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Daniel Joseph Thuringer, Jake Otis Deem, James Richard Carpenter
  • Patent number: 7630786
    Abstract: A method for identifying a predetermined state of a manufacturing process by monitoring the process which involves, monitoring a plurality of variables that vary in value during the manufacturing process. The method also involves mapping as points in a hyperspace the values of each variable at a plurality of times, where the hyperspace has a number of dimensions equal to the number of variables and the number of points is equal to the plurality of times. The method also involves identifying that a manufacturing process has reached the predetermined state when one of the points reaches a closed volume in the hyperspace that is located within a predefined distance from a predefined location in the hyperspace.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: December 8, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Lawrence Hendler, Matthew Richter
  • Patent number: 7628860
    Abstract: A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.
    Type: Grant
    Filed: April 12, 2004
    Date of Patent: December 8, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Ali Shajii, Siddharth P. Nagarkatti, Matthew Mark Besen, William R. Clark, Daniel Alexander Smith, Bora Akgerman
  • Patent number: 7628861
    Abstract: A system for delivering pulses of a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber. A controller is programmed to receive the desired mass for each pulse through an input interface, close the second valve and open the first valve, receive chamber pressure measurements from a pressure transducer, and close the first valve when pressure within the chamber rises to a predetermined upper level. The controller is also programmed to deliver pulses of gas using just the second valve, wherein, for each pulse, the second valve is opened until a calculated mass for the pulse equals the desired mass for the pulse. The first valve is not required to be opened and closed for each pulse and is, therefore, used less frequently and has an extended life.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: December 8, 2009
    Assignee: MKS Instruments, Inc.
    Inventor: William R. Clark
  • Patent number: 7624643
    Abstract: The present invention is directed at methods and apparatuses for facilitating the establishment of a reference pressure within a reference chamber of a pressure transducer. The transducer has a housing and a cover, the housing defining a reference chamber and an aperture. A meltable sealing material is disposed on at least one of the cover and the housing. The apparatus includes a pressure chamber that is rotatable between a first position and a second position, a pressure source that is connected to the pressure chamber, a guide that is attachable to the transducer near the aperture, and a heater for selectively heating the pressure chamber to a temperature sufficiently high to melt the sealing material. The cover is positioned in an internal space of the guide. The guide is attached to the transducer near the aperture.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: December 1, 2009
    Assignee: MKS Instruments, Inc.
    Inventor: Chris P. Grudzien