Abstract: A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

Abstract: A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process (“Step a”). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers (“Step b”). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step (“Step c”). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers (“Step d”). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps (“Step e”). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (“Step f”).

Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.

Abstract: The antisymmetric optimal control algorithm is disclosed for a gas delivery system including a flow ratio controller for dividing a single mass flow into at least two flow lines. Each flow line includes a flow meter and a valve. Both valves of the flow ratio controller are controlled through a ratio feedback loop by the antisymmetric optimal controller which includes a single input single output SISO controller, an inverter and two linear saturators. The output of the SISO controller is split and modified before being applied to the two valves. The two valve control commands are virtually antisymmetric to the maximum allowable valve conductance position.

Abstract: The present invention relates to process I/O controllers for semiconductor manufacturing to which a tool host can delegate data collection, monitoring and control tasks. In particular, it relates to process I/O controllers that can perform more than one of data collection, monitoring, control and response to commands from a tool host with statistically repeatable performance and precision. Embodiments described use prioritized real time operating systems to control of semiconductor manufacturing tools and data collection from tool associated with the sensors. Statistically repeatable responsiveness to selected commands and to sensor inputs during selected recipe steps effectively reduces jitter.

Abstract: A control circuit for a switching power supply reacts to an over current condition in the switching power supply to bring its operating point to a safe condition. The control circuit senses both the direction and the magnitude of the load current in the switching power supply, and then uses this sensed information to control the active power switches in the switching power supply. In an over current condition, the switches are controlled to actively drive the load current toward zero, even if the sensed information is delayed or heavily filtered, or the switch signals from the control circuit are delayed in reaching the switches. The resulting operation of the switching power supply is more resistant to abnormal load conditions and is maintained in the presence of transient short circuits or arcs. The switching power supply hardware is also better protected.

Abstract: A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.

Abstract: A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor.

Abstract: A capacitance manometer comprises: a flexible diaphragm including a first electrode structure; an electrode structure including second and third spaced-apart electrode structures secured relative to the diaphragm so as to establish a capacitance between the first electrode structure and the second electrode structure and a capacitance between the first electrode structure and the third spaced-apart electrode structure, wherein the capacitances between the first electrode structure and each of the second and third electrode structures change with changes in differential pressure placed on opposite sides of the flexible diaphragm; and a thick film dielectric material disposed between the first electrode and each of the second and third spaced-apart electrode structures so as to increase the gain in capacitance of the manometer without decreasing the distance between the first electrode structure and each of the second and third electrode structures and without increasing the stroke of the flexible diaphragm, wh

Abstract: Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.

Abstract: A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices.

Abstract: A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process (“Step a”). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers (“Step b”). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step (“Step c”). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers (“Step d”). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps (“Step e”). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (“Step f”).

Abstract: A system and method is provided for computerized sorting irregular objects. The method includes receiving a representative set of irregular objects comprising at least two types of user-specified qualities. The method also includes receiving at least two types of measured data for the representative set of irregular objects. The method also includes generating at least one of a PCA model or a PLS model based on at least two user-specified qualities of the irregular objects and the at least two types of measured data for the representative set of irregular objects, and sorting a second set of irregular objects based on the at least one of the PCA model or the PLS model.

Abstract: A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

Abstract: A method and system for partitioning (clustering) large amounts of data in a relatively short processing time. The method involves providing a first data matrix and a second data matrix where each of the first and second data matrices includes one or more variables, and a plurality of data points. The method also involves determining a first score from the first data matrix using a partial least squares (PLS) analysis or orthogonal PLS (OPLS) analysis and partitioning the first and second data matrices (e.g., row-wise) into a first group and a second group based on the sorted first score, the variance of the first data matrix, and a variance of the first and second groups relative to the variances of the first and second data matrices.

Abstract: A mass flow controller includes a pressure sensor that senses pressure within the mass flow controller and displays the pressure. The pressure display may be local, mounted directly to the mass flow controller, or it may be connected through a link to the mass flow controller for remote display.

Abstract: A power generation system including a RF power generator which provides a RF output power. The power distribution system includes a phase-magnitude detector module having a dual logarithmic amplifier phase-magnitude detector. The dual logarithmic amplifier phase-magnitude detector receives current and voltage signals. The dual logarithmic amplifier phase-magnitude detector generates a phase signal that varies in accordance with the phase between the voltage signal and the current signal and a magnitude signal that varies in accordance with the magnitude between the voltage and current signals. A controller receives the phase and magnitude signal and communicates control signals to the matching network.

Abstract: A method and apparatus is disclosed for signal spectrometry using an improved apodization function. Such method and apparatus involve (i) obtaining sample and reference time domain waveforms; (ii) applying sample and reference apodization waveforms to the sample and reference time domain waveforms, such that substantially same weight is applied to corresponding substantially coextensive regions of the sample and reference time domain waveforms, (iii) transforming the sample and reference apodized waveforms from the time domain into the frequency domain; and (iv) generating referenced spectral analysis waveform for signal analysis from a ratio of the transformed sample and reference frequency spectra, the spectral analysis waveform substantially excluding frequencies associated with the corresponding substantially coextensive regions of the apodized sample and reference time domain waveforms.

Abstract: Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding.

Abstract: A pressure control system that controls the pressure of a fluid in a plurality of zones includes a distribution manifold, at least one main manifold connected to the distribution manifold, and at least one disposable manifold connected to the distribution manifold and the main manifold. The disposable manifold is adapted to be replaced independent of the distribution manifold and the main manifold, and is connected to each zone and to at least one vacuum source. The distribution manifold distributes the fluid to the plurality of zones, so as to cause flow of the fluid into and out of a measurement chamber located within each zone. The main manifold includes, for each zone, a pressure sensor configured to measure pressure in the measurement chamber in that zone, and a control valve configured to regulate the flow of the fluid through that zone.