Patents Assigned to Nanotechnologies, Inc.
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Publication number: 20080139812Abstract: NLO chromophores of the form of Formula I and the commercially acceptable salts, solvates and hydrates thereof, wherein Z1-4, X1-4, ?1-2, D and A have the definitions provided herein.Type: ApplicationFiled: October 26, 2005Publication date: June 12, 2008Applicant: Third-Order Nanotechnologies, Inc.Inventors: Frederick J. Goetz, Fred J. Goetz
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Publication number: 20080131700Abstract: A method for joining component bodies of material over bonding regions of large dimensions by disposing a plurality of substantially contiguous sheets of reactive composite materials between the bodies and adjacent sheets of fusible material. The contiguous sheets of the reactive composite material are operatively connected by an ignitable bridging material so that an igniting reaction in one sheet will cause an igniting reaction in the other. An application of uniform pressure and an ignition of one or more of the contiguous sheets of reactive composite material causes an exothermic thermal reaction to propagate through the bonding region, fusing any adjacent sheets of fusible material and forming a bond between the component bodies.Type: ApplicationFiled: February 11, 2008Publication date: June 5, 2008Applicant: Reactive NanoTechnologies, IncInventors: Alan Duckham, Jesse E. Newson, Michael V. Brown, Timothy Ryan Rude, Omar Knio, Ellen M. Heian, Jai S. Subramanian
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Patent number: 7378654Abstract: A processing probe for repairing a defective portion in a sample has a cantilever and a probe separate and independent from the cantilever and integrally connected to an end portion of the cantilever for scratch-processing a defective portion of a sample. The cantilever and the probe are conductive for preventing the generation of electrostatic charges by friction of the probe against the sample during scratch-processing of the defective portion of the sample.Type: GrantFiled: February 25, 2005Date of Patent: May 27, 2008Assignee: SII NanoTechnology Inc.Inventors: Shigeru Wakiyama, Osamu Takaoka, Masatoshi Yasutake
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Patent number: 7373806Abstract: A scanning probe microscope has a probe tip for undergoing a scanning operation to scan a sample surface in X- and Y-directions parallel to the sample surface and for undergoing movement in a Z-direction vertical to the sample surface. A vibration unit vibrates the probe tip at a vibration frequency that resonates with of forcedly vibrates the probe tip. An observation unit collects observational data from the sample surface when the probe tip is in proximity or contact with the sample surface. A detection unit detects a variation in the state of vibration of the probe tip when the probe tip is in proximity or contact with the sample surface during a scanning operation.Type: GrantFiled: August 24, 2004Date of Patent: May 20, 2008Assignee: SII NanoTechnology Inc.Inventors: Itaru Kitajima, Kazutoshi Watanabe, Shigeru Wakiyama, Masatoshi Yasutake, Akira Inoue
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Patent number: 7375322Abstract: To prevent an influence from effecting on an oscillating state of a cantilever by firmly fixing a main body portion, there is provided a cantilever holder for attachably and detachably fixing a cantilever which is provided with a stylus at a front end thereof and a base end side of which is supported by a main body portion in a single-supported state, the cantilever holder including a base member having a mounting portion for mounting the main body portion in a state of being positioned at a predetermined position, a holding member made to be able to be brought into contact with at least a surface of the main body portion in a state of mounting the main body portion on the mounting portion and extended in a direction substantially orthogonal to a longitudinal direction (axis line A direction) of the cantilever, and pressing means for pressing both ends of the holding member to the base member by a predetermined pressure, fixing the main body portion to the mounting portion by way of the holding member and capType: GrantFiled: March 14, 2006Date of Patent: May 20, 2008Assignee: SII NanoTechnology Inc.Inventors: Itaru Kitajima, Masatsugu Shigeno
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Patent number: 7375352Abstract: In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in a shorter period of time in the event of overcutting by AFM scratch processing, throughput of AFM scratch processing is increased by maximizing high-resolution of the electron beam device and minimizing the time taken in observations using a device incorporating both an electro-optical system and an AFM head in a vacuum, correcting small clear defects with high precision by eliminating portions left over from AFM scratch processing after applying a clear defect correction film using an electron beam while providing light-blocking film raw material, and correction in a short time is made possible by eliminating portions remaining using AFM scratch processing after applying a clear defect correction film using an electron beam while providing light-blocking film raw material also in cases of overcutting in AFM scratcType: GrantFiled: May 25, 2005Date of Patent: May 20, 2008Assignee: SII NanoTechnology Inc.Inventors: Osamu Takaoka, Ryoji Hagiwara
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Publication number: 20080112891Abstract: An encapsulated chelate dendritic polymer and an encapsulated ligand dendritic polymer are disclosed which have unique properties. These encapsulated chelate dendritic polymers may have associated with its dendritic polymer surface target directors, proteins, DNA, RNA (including single strands) or any other moieties that will assist in diagnosis, therapy or delivery of this encapsulated chelate dendritic polymer. These encapsulated dendritic polymers are suitable as contrast agents for use in imaging in an animal, for other imaging techniques, for EPR, and as scavenger agents for chelant therapy. Formulations for these uses are also included within the scope of this invention.Type: ApplicationFiled: February 15, 2006Publication date: May 15, 2008Applicant: Dendritic Nanotechnologies, Inc.Inventors: Donald A. Tomalia, Baohua Huang
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Patent number: 7356900Abstract: In a manipulator needle portion defect repairing method, the existence of an abrasion or a fracture in a needle portion for holding a sample at an end of a manipulator disposed in an FIB device is confirmed using a microscope function of the FIB device. The abrasion or the fracture in the needle portion is then repaired by chemical vapor deposition using a focused ion beam of the FIB device.Type: GrantFiled: October 26, 2004Date of Patent: April 15, 2008Assignee: SII NanoTechnology Inc.Inventor: Masanao Munekane
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Patent number: 7354659Abstract: A method for joining component bodies of material over bonding regions of large dimensions by disposing a plurality of substantially contiguous sheets of reactive composite materials between the bodies and adjacent sheets of fusible material. The contiguous sheets of the reactive composite material are operatively connected by an ignitable bridging material so that an igniting reaction in one sheet will cause an igniting reaction in the other. An application of uniform pressure and an ignition of one or more of the contiguous sheets of reactive composite material causes an exothermic thermal reaction to propagate through the bonding region, fusing any adjacent sheets of fusible material and forming a bond between the component bodies.Type: GrantFiled: March 30, 2006Date of Patent: April 8, 2008Assignee: Reactive Nanotechnologies, Inc.Inventors: Alan Duckham, Jesse E. Newson, Michael V. Brown, Timothy Ryan Rude, Omar Knio, Ellen M. Heian, Jai S. Subramanian
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Patent number: 7345289Abstract: A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 ?m or less is prepared using a semiconductor silicon process technique. The sample support of the present invention is adhered to a partially-cut mesh in a state that a sample portion is not adhered. Further, a plurality of portions where the samples are mounted is arranged on the same substrate.Type: GrantFiled: February 17, 2006Date of Patent: March 18, 2008Assignee: SII NanoTechnology Inc.Inventors: Kouji Iwasaki, Masanso Munekane
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Patent number: 7337656Abstract: In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.Type: GrantFiled: September 20, 2005Date of Patent: March 4, 2008Assignee: SII NanoTechnology Inc.Inventors: Yoshiharu Shirakawabe, Hiroshi Takahashi, Tadashi Arai
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Publication number: 20080028922Abstract: This invention generally relates to a method and apparatus to neutralize ordnance, more specifically improvised explosive devices (IEDs) and unexploded ordnance (UXOs). The current invention provides a simple method to neutralize the ordnance by taking advantage of a new class of energetic materials that includes nano-thermites, binary thermites and additionally powdered thermites. In the invention, a projectile is loaded with the new class of energetic materials and fired into the ordnance. The impact causes the energetic materials to react in such a fashion that the explosive compound or other material within the IED or UXO is burned in a self-propagating mode without exploding. Hence, the ordnance is neutralized.Type: ApplicationFiled: November 6, 2006Publication date: February 7, 2008Applicant: NovaCentrix (formerly Nanotechnologies, Inc.)Inventors: Dennis Wilson, Kurt Schroder
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Patent number: 7326445Abstract: A method is adopted for deposition technology using a focused ion beam device, characterized by enabling structures to be formed by using phenanthrene as a source gas and using ions of gallium or gold, silicon or beryllium etc. of energies of 5 to 100 keV from a liquid-metal ion source as ions so as to give a gas blowing density of five to ten times greater than the case of deposition in the related art, with directionality of the gas blowing being both isotropic and symmetrical.Type: GrantFiled: November 27, 2001Date of Patent: February 5, 2008Assignee: SII NanoTechnology Inc.Inventor: Takashi Kaito
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Publication number: 20080006521Abstract: A nanopowder synthesis system having an autofuser device which obviates the need for external power switches, and which accommodates repeated discharges (of the order of 107) between ablating electrodes of precursor material at a high repetition rate (?1 Hz).Type: ApplicationFiled: July 22, 2005Publication date: January 10, 2008Applicant: Nanotechnologies, Inc.Inventors: Kurt Schroder, Douglas Jackson, Stephen Schmidt
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Publication number: 20070298006Abstract: Dendritic polymers with enhanced amplification and interior functionality are disclosed. These dendritic polymers are made by use of fast, reactive ring-opening chemistry (or other fast reactions) combined with the use of branch cell reagents in a controlled way to rapidly and precisely build dendritic structures, generation by generation, with cleaner chemistry, often single products, lower excesses of reagents, lower levels of dilution, higher capacity method, more easily scaled to commercial dimensions, new ranges of materials, and lower cost. The dendritic compositions prepared have novel internal functionality, greater stability (e.g., thermal stability and less or no reverse Michael's reaction), and reach encapsulation surface densities at lower generations. Unexpectedly, these reactions of polyfunctional branch cell reagents with polyfunctional cores do not create cross-linked materials.Type: ApplicationFiled: December 21, 2005Publication date: December 27, 2007Applicant: Dendritic Nanotechnologies, Inc.Inventors: Donald Tomalia, Douglas Swanson, Baohua Huang, Veera Pulgam, Sonke Svenson, Lori Reyna, Michael Zhuravel, Abhay Chauhan, Cordell DeMattei, Joseph Heinzelmann
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Patent number: 7301159Abstract: A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.Type: GrantFiled: August 3, 2005Date of Patent: November 27, 2007Assignee: Riken & SII NanoTechnology Inc.Inventors: Toshiaki Fujii, Masao Abe, Kunji Shigeto, Minuru Kawamura, Alekber Yu Kasumov, Kazuhito Tsukagoshi, Yoshinobu Aoyagi
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Patent number: 7297944Abstract: An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle ? to the normal L with respect to the cross section (4).Type: GrantFiled: July 9, 2003Date of Patent: November 20, 2007Assignee: SII NanoTechnology Inc.Inventors: Toshio Kodama, Masakatsu Hasuda, Toshiaki Fuji, Kouji Iwasaki, Yasuhiko Sugiyama, Yasuyuki Takagi
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Patent number: 7289597Abstract: An optical axis adjusting mechanism for an X-ray lens, an X-ray analytical instrument and a method of adjusting an optical axis of an X-ray lens, capable of enhancing detection efficiency of an X-ray while preventing degradation of the device performance are provided. An optical axis adjusting mechanism for an X-ray lens to be implemented in an X-ray analytical instrument, includes an exit side adjusting mechanism for adjusting an exit side focal point of the X-ray lens to focus on an X-ray detector, and an entrance side adjusting mechanism for adjusting an entrance side focal point of the X-ray lens to focus on an analytical point of a sample, and the entrance side adjusting mechanism is disposed with a greater distance from the X-ray lens than a distance between the exit side adjusting mechanism and the X-ray lens.Type: GrantFiled: March 24, 2006Date of Patent: October 30, 2007Assignee: SII NanoTechnology Inc.Inventors: Norio Sasayama, Akikazu Okawara, Satoshi Nakayama
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Patent number: 7288762Abstract: The invention provides a fine-adjustment mechanism for a scanning probe microscopy with high rigidity and high degree of measurement accuracy wherein a strain gauge displacement sensor which can be installed in a small space is arranged so that temperature compensation is achieved. The fine-adjustment mechanism composed of a piezoelectric device is provided with at least two-piece electrode. One of the electrodes is configured as a dummy electrode, to which no voltage is applied, and the other electrode is configured as an active electrode which generates strain when voltage is applied. One or two resistors are provided on each of the active electrode and dummy electrode, and a bridge circuit is configured by the resistors.Type: GrantFiled: January 28, 2005Date of Patent: October 30, 2007Assignee: SII NanoTechnology Inc.Inventors: Masato Iyoki, Akihiko Hidaka, Kazutoshi Watanabe
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Patent number: 7284415Abstract: A scanning probe microscope has a cantilever having a minute probe on a distal end thereof and a displacement detecting device for detecting displacement of the cantilever. A Z-axis controlling amount calculating mechanism calculates a controlling amount for keeping constant a displacement amount of the cantilever. A Z-axis driving mechanism drives in a Z direction the cantilever or a sample in accordance with the controlling amount from the Z-axis controlling amount calculating mechanism. An XY scanning mechanism relatively moves the probe in a direction of an XY plane with respect to the sample to measure an uneven shape and/or a physical characteristic of the surface of the sample. A controlling range limiting device limits a driving range of the Z-axis driving mechanism. A controlling range setting device optionally sets the driving range of the Z-axis driving mechanism.Type: GrantFiled: March 9, 2005Date of Patent: October 23, 2007Assignee: SII NanoTechnology Inc.Inventors: Yoshiteru Shikakura, Kazutoshi Watanabe