Abstract: A TFT (Thin Film Transistor) is provided in which a hydrogen feeding layer is able to be formed in a position where diffusing distance of hydrogen can be made short without causing an increase in photolithography processes. In the TFT, the hydrogen feeding layer to diffuse hydrogen into a dangling bond existing at an interface between a polycrystalline silicon thin film and a gate insulating film is formed in a position between the gate insulating film and a gate electrode. According to this configuration, diffusing distance of hydrogen at a period of time during hydrogenation can be made short and the hydrogenation process can be sufficiently performed without taking time in heat treatment.

Abstract: A liquid crystal display and a method for manufacturing the liquid crystal display which are capable of an inhibiting occurrence of strong flicker even when only pixels each having a same polarity are displayed on a screen, without causing a decrease in an aperture rate. In the above liquid crystal display, first and second data lines each feeding a pixel voltage being different in polarity to each of first and second pixel electrodes through first and second thin film transistors are formed in such a manner that the first data line is overlaid by the second data line with an insulating film being interposed between the first and second data lines.

Abstract: A liquid crystal display panel capable of avoiding display unevenness. The liquid crystal display panel is manufactured by a method comprising: preparing a pair of polarizer films each having at least a polyvinyl alcohol layer and a triacetyle cellulose layer; preparing a liquid crystal substrate assembly which comprises a first glass substrate and a second glass substrate and a liquid crystal material disposed between said first glass substrate and said second glass substrate; heating said polarizer films at a predetermined temperature for a predetermined time in a first heat treatment process; and sticking the polarizer films on the first and second glass substrates, after the first heat treatment process. The method may further comprises, after sticking the polarizer films on the first and second glass substrates, heating the liquid crystal substrate assembly in a second heat treatment process.

Abstract: A method of deforming a pattern comprising the steps of: forming, over a substrate, a layered-structure with an upper surface including at least one selected region and at least a re-flow stopper groove, wherein the re-flow stopper groove extends outside the selected region and separate from the selected region; selectively forming at least one pattern on the selected region; and causing a re-flow of the pattern, wherein a part of an outwardly re-flowed pattern is flowed into the re-flow stopper groove, and then an outward re-flow of the pattern is restricted by the re-flow stopper groove extending outside of the pattern, thereby to form a deformed pattern with at least an outside edge part defined by an outside edge of the re-flow stopper groove.

Abstract: In an active matrix type liquid crystal display device in which a common electrode and a second pixel electrode have portions opposing each other, and an electric field parallel to substrates is formed between the two electrodes, Y direction extending portions of the common electrode are provided above data lines via a second interlayer insulation film. Slits are opened in the Y direction extending portions of the common electrode along the data lines. Portions of a black matrix which are set to a common electric potential with the common electrode are provided on an opposing substrate at positions opposing the slits.

Abstract: Alignment marks are formed when source and drain electrodes of a TFT are formed and thereon a thick red filter in formed. So that, the following respective color layers can be made thin on the red filter. Also, the exposure alignment laser permeates in an exposure step, and thereby the alignment marks can be accurately detected.

Abstract: A display apparatus is composed of a pseudo gray level data processor generating pseudo gray level data having m bits based on input gray level data having n bits. The pseudo gray level data processor includes a state variable generator generating a state variable data having n−m bits, based on lower n−m bits of the input gray level data, an adder calculating a sum of the lower n−m bits of the input gray level data and the state variable data to output a carry bit representative of carry-over of the sum, and a pseudo gray level data calculator generating the pseudo gray level data based on the input gray level data and the carry bit.

Abstract: A method for fabricating an active matrix LCD panel for use in an active matrix LCD device includes the step of forming a passivation layer acting as a channel protection layer for protecting an amorphous silicon active layer, thereby reducing the number of photolithographic steps. A transparent conductive film is used for forming a gate electrode and a pixel electrode before formation of an amorphous silicon film for the TFTs.

Abstract: The present invention provides a reflective liquid crystal display (LCD) apparatus including a glass substrate 53, a transparent electrode 55 arranged on the glass substrate, a glass substrate 40, a thin film transistor (TFT) 44 arranged on the glass substrate 40, an insulation film 45 arranged on the TFT 44 and having a convex/concave structure 45a on its surface, a reflection electrode 48 arranged along the convex/concave structure 45a and connected to the TFT 44, and a liquid crystal layer 56 sandwiched between the transparent electrode 55 and the reflection electrode 48. The insulation film 48 protects the TFT transistor 44 after being formed and has the convex/concave structure 45a formed irregular arrangement of regions having different film thickness values. Thus, it is possible to prevent deterioration of the switching element during the production as well as to reduce the number of production steps.

Abstract: Pixels of a liquid crystal display are laid on a delta pattern, and short-circuit is liable to take place between a source layer and a drain layer and/or between a gate layer and a storage electrode layer, wherein a contact slit is formed in a gate insulating layer intervening between the gate/storage electrode layers and the source/drain layers in such a manner as to break a piece of residual amorphous silicon and make a piece of residual metal exposed thereto, and the piece of residual metal is broken during a patterning step for the source/drain layers.

Abstract: An active matrix LCD device includes a pixel element for defining a pixel area and having a TFT and a pixel electrode disposed in association with a portion of a common electrode. The common electrode encircles the pixel area for shielding the electric field from the black matrix, thereby preventing a stray electric field from entering the pixel area and degrading the image quality.

Abstract: In an active matrix liquid crystal display device having a thin film transistor array substrate (250) comprising a plurality of scan lines formed on an insulating substrate (100), a plurality of signal lines formed to cross the scan lines, thin film transistors formed near intersections between the scan lines and signal lines, respectively, pixel electrodes connected to one electrodes of the thin film transistors, respectively, and additional capacity portions connected to pixel electrodes (5) connected to source electrodes (4) of the thin film transistors, respectively; in order to provide a higher contrast and to allow driving at a lower voltage, a part of the additional capacity portion is formed, via insulating film (115) and semiconductor (120), between the pixel electrode (5) and that scan line (11) which is connected to a gate electrode (1) of the thin film transistor for switching the pixel electrode (5).

Abstract: A method of deforming a pattern comprising the steps of: forming, over a substrate, a layered-structure with an upper surface including at least one selected region and at least a re-flow stopper groove, wherein the re-flow stopper groove extends outside the selected region and separate from the selected region; selectively forming at least one pattern on the selected region; and causing a re-flow of the pattern, wherein a part of an outwardly re-flowed pattern is flowed into the re-flow stopper groove, and then an outward re-flow of the pattern is restricted by the re-flow stopper groove extending outside of the pattern, thereby to form a deformed pattern with at least an outside edge part defined by an outside edge of the re-flow stopper groove.

Abstract: A method of deforming a pattern comprising the steps of: forming, over a substrate, a layered-structure with an upper surface including at least one selected region and at least a re-flow stopper groove, wherein the re-flow stopper groove extends outside the selected region and separate from the selected region; selectively forming at least one pattern on the selected region; and causing a re-flow of the pattern, wherein a part of an outwardly re-flowed pattern is flowed into the re-flow stopper groove, and then an outward re-flow of the pattern is restricted by the re-flow stopper groove extending outside of the pattern, thereby to form a deformed pattern with at least an outside edge part defined by an outside edge of the re-flow stopper groove.

Abstract: A method of deforming a pattern comprising the steps of: forming, over a substrate, a layered-structure with an upper surface including at least one selected region and at least a re-flow stopper groove, wherein the re-flow stopper groove extends outside the selected region and separate from the selected region; selectively forming at least one pattern on the selected region; and causing a re-flow of the pattern, wherein a part of an outwardly re-flowed pattern is flowed into the re-flow stopper groove, and then an outward re-flow of the pattern is restricted by the re-flow stopper groove extending outside of the pattern, thereby to form a deformed pattern with at least an outside edge part defined by an outside edge of the re-flow stopper groove.

Abstract: Pixels of a liquid crystal display are laid on a delta pattern, and short-circuit is liable to take place between a source layer and a drain layer and/or between a gate layer and a storage electrode layer, wherein a contact slit is formed in a gate insulating layer intervening between the gate/storage electrode layers and the source/drain layers in such a manner as to break a piece of residual amorphous silicon and make a piece of residual metal exposed thereto, and the piece of residual metal is broken during a patterning step for the source/drain layers.

Abstract: A LCD device includes a housing including a front housing member and a rear housing member coupled by a coupling member, a panel unit mounted on the front housing member, a backlight having a plurality of optical components consecutively mounted on the panel unit. The coupling member is bent at a right angle for allowing the rear housing member to oppose the front housing member and to cover the lateral and rear sides of the panel unit and the backlight as a whole.

Abstract: A method of deforming a pattern comprising the steps of: forming, over a substrate, a layered-structure with an upper surface including at least one selected region and at least a re-flow stopper groove, wherein the re-flow stopper groove extends outside the selected region and separate from the selected region; selectively forming at least one pattern on the selected region; and causing a re-flow of the pattern, wherein a part of an outwardly re-flowed pattern is flowed into the re-flow stopper groove, and then an outward re-flow of the pattern is restricted by the re-flow stopper groove extending outside of the pattern, thereby to form a deformed pattern with at least an outside edge part defined by an outside edge of the re-flow stopper groove.

Abstract: In a liquid-crystal display element each individual liquid-crystal injection area surrounded by a seal, and the overall liquid-crystal injection area is surrounded by an array substrate and an opposing substrate surrounded by an outer peripheral seal having an aperture and are adhered together, the aperture of the outer peripheral seal being sealed by a hole sealant, and the surface of at least one of the array substrate and the opposing substrate being polished with a polishing material, which is then removed, after which cutting along the aperture is done to separate the individual liquid-crystal injection areas, thereby facilitating the achievement of a thin liquid-crystal display element, while improving the quality and yield thereof.

Abstract: In a step for forming a contact through hole in a protective film that covers a Thin Film Transistor (TFT) to connect a source electrode of the TFT and a pixel electrode to each other, location of a later-formed contact through hole is designed to be apart not less than 2.0 &mgr;m from location of the opening of an overcoat layer, which opening is formed on the protective film. This construction forces the opening of a novolac type photosensitive resist to be positioned inside the location of the opening of the overcoat layer and therefore, the contact through hole formed in the protective film is able to have a tapered cross sectional profile that is never affected by the opening of the overcoat layer, allowing for stable connection between the source electrode and the pixel electrode.