Patents Assigned to Nissan Chemical Industries, Ltd.
  • Patent number: 10232335
    Abstract: The ?-eucryptite fine particle production method of the invention includes spraying, into an atmosphere at 50° C. to a temperature lower than 300° C., a solution containing a water-soluble lithium salt, a water-soluble aluminum salt, and colloidal silica, in such amounts that the mole proportions among lithium atoms, aluminum atoms, and silicon atoms (Li:Al:Si) are adjusted to 1:1:1, to thereby dry the solution, and, subsequently, firing the dried product in air at 600 to 1,300° C.
    Type: Grant
    Filed: December 16, 2015
    Date of Patent: March 19, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hirokazu Kato, Tadayuki Isaji, Yoshiyuki Kashima, Jun-ichi Nakajima
  • Patent number: 10233337
    Abstract: A charge-transporting thin film having excellent flatness can be obtained with good repeatability using the charge-transporting varnish of the present invention, which contains: a charge transportation substance comprising a charge-transporting monomer or a charge-transporting oligomer or polymer having a number-average molecular weight of 200-50,000, or a charge transporting material comprising the charge transportation substance and a dopant substance; and a mixed solvent including at least one type of good solvent and at least one type of poor solvent; the absolute value of the boiling point difference ?T° C. of the good solvent and the poor solvent satisfying the relation |?T|<20° C.; the viscosity at 25° C. being 7.5 mPa·s or less; the surface tension at 23° C. being 30.0-40.0 mN/m; and the charge-transporting material being dissolved or uniformly dispersed in the mixed solvent.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: March 19, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kayo Takeda, Takuji Yoshimoto
  • Patent number: 10227457
    Abstract: It is an object to provide a compound that can provide a molded article and a coating film excellent not only in solubility in an organic solvent, but also in miscibility with/dispersibility in a matrix resin, causing no aggregation in a matrix resin, excellent in surface modification property, and having high transparency. A fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof with a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof in the presence of a polymerization initiator C in a content of 5% by mol or more and 200% by mol or less, based on the total molar amount of the monomer A and the monomer B; and a resin composition comprising the polymer.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: March 12, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Masayuki Haraguchi, Motonobu Matsuyama, Masaaki Ozawa, Misao Miyamoto
  • Patent number: 10228620
    Abstract: For example, a thin film which has a high refractive index and which it is possible to form a fine pattern can be obtained by using a composition that contains a triazine-ring-containing polymer that includes a repeating unit structure represented by formula [5].
    Type: Grant
    Filed: January 14, 2016
    Date of Patent: March 12, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naoya Nishimura, Takahiro Kaseyama
  • Patent number: 10222697
    Abstract: The invention provides a fiber containing (A) a polymer compound containing a structural unit having, in a side chain, at least one kind of organic group selected from a hydroxy group, a hydroxymethyl group and an alkoxymethyl group having 1-5 carbon atoms, and (B) a photoacid generator.
    Type: Grant
    Filed: October 17, 2014
    Date of Patent: March 5, 2019
    Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., TOYAMA PREFECTURE
    Inventors: Takahiro Kishioka, Yoshiyuki Yokoyama
  • Publication number: 20190062491
    Abstract: An epoxy resin composition in a liquid or solid state having excellent solubility and having high preservation stability. A modified epoxy resin composition including: Compound A containing tris-(2,3-epoxypropyl)-isocyanurate having 1 to 3 glycidyl group(s) in a molecule substituted with a functional group(s) of Formula (1): in which R1 and R2 are each independently an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an aralkyl group, a heterocyclic group; or a halogenated derivative, an aminated derivative, or a nitrated derivative of these groups; and Compound B containing tris-(2,3-epoxypropyl)-isocyanurate, wherein tris-(2,3-epoxypropyl)-isocyanurate of Compound A before the substitution and tris-(2,3-epoxypropyl)-isocyanurate of Compound B comprise 2% by mass to 15% by mass of ?-type tris-(2,3-epoxypropyl)-isocyanurate and a remaining percentage of ?-type tris-(2,3-epoxypropyl)-isocyanurate based on a total mass of Compound A before the substitution and Compound B.
    Type: Application
    Filed: October 31, 2018
    Publication date: February 28, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yuki ENDO, Motohiko HIDAKA, Mikio KASAI, Takashi ODA, Nobuyuki KAKIUCHI
  • Patent number: 10217938
    Abstract: A composition comprising: at least one compound comprising a hole transporting core, wherein the core is covalently bonded to a first arylamine group and also covalently bonded to a second arylamine group different from the first, and wherein the compound is covalently bonded to at least one intractability group, wherein the intractability group is covalently bonded to the hole transporting core, the first arylamine group, the second arylamine group, or a combination thereof, and wherein the compound has a molecular weight of about 5,000 g/mole or less. Blended mixtures of arylamine compounds, including fluorene core compounds, can provide good film formation and stability when coated onto hole injection layers. Solution processing of OLEDs is a particularly important application.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: February 26, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Christopher T. Brown, Neetu Chopra, Christopher R. Knittel, Mathew Mathai, Venkataramanan Seshadri, Jing Wang, Brian Woodworth
  • Publication number: 20190055359
    Abstract: A resin composition capable of forming a cured film having a high refractive index, high transparency and high heat resistance, and a polymer which is used for the resin composition. A polymer having a structural unit of Formula (1): wherein A1 and A2 are each independently an —O— group or a —C(?O)O— group; X is a divalent organic group having at least one aromatic ring or heterocyclic ring, wherein, when the X has two or more aromatic rings or heterocyclic rings, the rings are optionally bonded to each other via a single bond, are optionally bonded to each other via a heteroatom, or optionally form a condensed ring; and Y is a divalent organic group having at least one aromatic ring or condensed ring. A resin composition, includes: the polymer; a cross-linking agent; and a solvent.
    Type: Application
    Filed: October 4, 2016
    Publication date: February 21, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yuki SUGAWARA, Takahiro SAKAGUCHI, Isao ADACHI
  • Publication number: 20190055466
    Abstract: Provided is a production method for a carbon-based light-emitting material that generates light having a wavelength of 500 to 700 nm when exposed to excitation light having a wavelength of 300 to 600 nm. The production method comprises a step for mixing and heating a starting material containing ascorbic acid, an acid catalyst containing an inorganic acid, and a solvent.
    Type: Application
    Filed: January 25, 2017
    Publication date: February 21, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tadayuki ISAJI, Naoki OTANI, Shinichi MAEDA, Masahiro UEDA, Takayoshi KAWASAKI
  • Publication number: 20190055131
    Abstract: There is provided a method for obtaining a purified aqueous solution of silicic acid containing less metal impurities such as Cu and Ni using water glass as a raw material with less number of purification steps than that in conventional methods without using any unnecessary additives. The method for producing a purified aqueous solution of silicic acid, the method comprising the steps of: (a) passing an aqueous solution of alkaline silicate having a silica concentration of 0.5% by mass or more and 10% by mass or less through a column filled with a polyamine-, iminodiacetic acid-, or aminophosphoric acid-type chelating resin, and (b) passing the aqueous solution passed in the step (a) through a column filled with a hydrogen-type cation exchange resin.
    Type: Application
    Filed: October 14, 2016
    Publication date: February 21, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroaki SAKAIDA, Eiichiro ISHIMIZU
  • Publication number: 20190055206
    Abstract: A polyester resin composition containing 100 parts by mass of a polyester resin and 0.01 to 10 parts by mass of a 2-amino-1,3,5-triazine derivative of Formula [1]: a polyester resin molded body obtained by the composition, and a crystal nucleating agent including the triazine derivative. A polyester resin composition containing a crystal nucleating agent that makes it possible to produce, with high productivity, a polyester resin molded product that promotes polyester resin crystallization and maintains high transparency after crystallization and is applicable for a wide variety of uses can be provided.
    Type: Application
    Filed: October 24, 2018
    Publication date: February 21, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takuma NAGAHAMA, Takeshi SUWA
  • Patent number: 10208184
    Abstract: A photosensitive resin composition comprises a polymer having a repeating structural unit of the following Formula (1): (wherein R1 and R2 are each independently a single bond, a methylene group, or an ethylene group, Y is an alkylene group of Formula (2) or a combination of the alkylene group of Formula (2) with an alkylene group of Formula (3), n is an integer of 1 to 110, and X is a divalent aliphatic hydrocarbon group, a divalent alicyclic hydrocarbon group, or a divalent aromatic hydrocarbon group) and a (meth)acryloyl group at both ends, a bifunctional (meth)acrylate compound, a polyfunctional thiol compound, a photo-radical generator and an organic solvent, and then the bifunctional (meth)acrylate compound contained in an amount of 5% to 50% by mass and the polyfunctional thiol compound is contained in an amount of 0.1% to 10% by mass, relative to the content of the polymer.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: February 19, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takuya Ohashi, Tetsuo Sato, Mamoru Tamura, Tomoyuki Enomoto
  • Patent number: 10211412
    Abstract: The invention provides a charge-transporting varnish, containing a charge-transporting substance formed of an indolocarbazole represented by the following formula (1), a dopant substance, and an organic solvent.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: February 19, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Taichi Nakazawa, Shoji Moriyama
  • Patent number: 10202528
    Abstract: There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: February 12, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Mamoru Tamura, Takuya Ohashi, Takahiro Kishioka, Tomoyuki Enomoto
  • Publication number: 20190040207
    Abstract: A composition applied over a resist pattern includes a modified polysiloxane in which some of silanol groups of a polysiloxane containing a hydrolysis condensate of a hydrolyzable silane are capped, and a solvent, wherein a ratio of silanol groups to all Si atoms contained in the modified polysiloxane is 40 mol % or less. The modified polysiloxane ratio of the silanol groups is adjusted to a desired ratio by reacting the silanol groups of the polysiloxane with an alcohol. A method for producing a semiconductor device having the steps of forming a resist film on a substrate, forming a resist pattern by exposing and developing the resist film, applying the composition over the resist pattern during or after development, and reversing a pattern by removing the resist pattern by etching.
    Type: Application
    Filed: August 26, 2016
    Publication date: February 7, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Shuhei SHIGAKI, Hiroaki YAGUCHI, Makoto NAKAJIMA
  • Publication number: 20190044132
    Abstract: Provided is an electrode for energy storage devices, which is provided with a collector substrate, an undercoat layer that is formed on at least one surface of the collector substrate and contains carbon nanotubes, and an active material layer that is formed on the surface of the undercoat layer, and wherein the active material layer does not contain a conductive assistant.
    Type: Application
    Filed: December 21, 2016
    Publication date: February 7, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yuki SHIBANO, Tatsuya HATANAKA, Takuji YOSHIMOTO
  • Patent number: 10196525
    Abstract: A method produces a basic zinc cyanurate powder, the amount of a portion thereof which remains in a sieve having a mesh size of 1,000 ?m being less than 1 mass %. The method includes heating, at 30 to 300° C., a powder-form mixture which is composed of zinc oxide, cyanuric acid, and water, which has a ratio by mole of zinc oxide to cyanuric acid of 2 to 3, and which has a water content of 9 to 18 mass %, in a closed or unclosed state.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: February 5, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Isao Oota, Shigeo Hattori
  • Patent number: 10199578
    Abstract: Provided are a fluorine-atom-containing polymer that is a condensation polymer of a fluorine-atom-containing triphenylamine derivative giving a repeating unit represented by formula (1) and a fluorine derivative giving a repeating unit represented by formula (2) and the use of this fluorine-atom-containing polymer. (In the formulas, A represents a fluoroalkanediyl group, at least one of R1 and R2 represents any of an alkoxyl group, an alkenyloxy group, an alkynyloxy group, an aryloxy group, a heteroaryloxy group, and an alkyl group including at least one ether structure, R3-R6 represent prescribed substituents, m1 and m2 each independently represent an integer of 0-4, n1 and n2 represent an integer of 0-3.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: February 5, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naoki Otani, Hirofumi Ota
  • Patent number: 10197917
    Abstract: The present invention provides a resist underlayer film-forming composition for lithography for forming a resist underlayer film that can be used as a hard mask with use of hydrolysis-condensation product of a hydrolyzable silane which also absorbs KrF laser. A resist underlayer film-forming composition for lithography comprising, as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): and is bonded to a silicon atom through a Si?C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: February 5, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makoto Nakajima, Wataru Shibayama, Satoshi Takeda, Kenji Takase
  • Publication number: 20190031600
    Abstract: Provided is a fluorine atom-containing compound represented by formula (1) below (In the formula, Z represents a predetermined divalent group, each Ar independently represents a predetermined aromatic ring-containing group, and each ArF independently represents a predetermined fluorine atom-containing aryl group).
    Type: Application
    Filed: January 11, 2017
    Publication date: January 31, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Taichi NAKAZAWA, Toshiyuki ENDO