Patents Assigned to Nova
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Patent number: 7345315Abstract: A manufacturing method and a thus produced light-emitting structure for a white colored light-emitting device (LED) and the LED itself are disclosed. The white colored LED includes a resonant cavity structure, producing and mixing lights which may mix into a white colored light in the resonant cavity structure, so that the white colored LED may be more accurately controlled in its generated white colored light, which efficiently reduces deficiency, generates natural white colored light and aids in luminous efficiency promotion. In addition to the resonant cavity structure, the light-emitting structure also includes a contact layer, an n-type metal electrode and a p-type metal electrode.Type: GrantFiled: February 13, 2006Date of Patent: March 18, 2008Assignee: Super Nova Optoelectronics Corp.Inventors: Schang-Jing Hon, Jenn-Bin Huang
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Publication number: 20080065339Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.Type: ApplicationFiled: October 31, 2007Publication date: March 13, 2008Applicant: NOVA MEASURING INSTRUMENTSInventors: Moshe Finarov, Boaz Brill
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Publication number: 20080064772Abstract: Process for preparing polymer, e.g. polystyrene, particles that may not or may contain a water-retaining agent and that require only a one-step process for incorporating the water-retaining agent. The polymer particles may be prepared via an extrusion process, or a bulk polymerization process wherein a water-retaining agent is blended into the polymer melt. Water is incorporated into the particles by soaking them in hot or cold water or treating the particles with steam for a predetermined time depending on the desired water content in the particles. The water-retaining agent may be starch, zeolite, silica dioxide or poly (N-isopropyl acrylamide) ranging from 0.1% to 10.0% by weight. The particles can be expanded via appropriate means to form pre-expanded or expanded particles in a conventional manner.Type: ApplicationFiled: August 20, 2007Publication date: March 13, 2008Applicant: NOVA Chemicals Inc.Inventors: Karel Cornelis Bleijenberg, Michel F.J. Berghmans, Hugo A.A. Berghmans
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Publication number: 20080063826Abstract: A styrenic copolymer composition comprising 55% to 94% by weight of one or more styrenic monomers; 2% to 25% by weight of one or more maleate-type monomers; and 4% to 20% by weight of an elastomer composition comprising a first a first high molecular weight elastomer polymer having a number average molecular weight of greater than 12,000, a particle size ranging from about 0.05 micron to about 1.0 micron, and ranging from 50 to 99% by weight based on the weight of the elastomer composition, and a second high molecular weight elastomer polymer having a number average molecular weight of greater than 12,000, a particle size ranging from about 0.50 to about 3.0 microns, and ranging from 1.0% to 50% by weight based on the weight of the elastomer composition. The styrenic copolymer composition optionally further comprises from about 0.1 to about 8.0% by weight. The styrenic copolymer composition is formed via polymerizing methods.Type: ApplicationFiled: August 20, 2007Publication date: March 13, 2008Applicant: NOVA Chemicals Inc.Inventor: Thomas J. Styranec
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Publication number: 20080062406Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.Type: ApplicationFiled: October 31, 2007Publication date: March 13, 2008Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Moshe FINAROV, Boaz BRILL
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Publication number: 20080055609Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.Type: ApplicationFiled: October 31, 2007Publication date: March 6, 2008Applicant: NOVA MEASURING INSTRUMENTS LTD. of Weizmann Scientific ParkInventors: Moshe Finarov, Boaz Brill
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Publication number: 20080057290Abstract: A lightweight cementitious composition containing from 22 to 90 volume percent of a cement composition and from 10 to 78 volume percent of particles having an average particle diameter of from 0.2 mm to 8 mm, a bulk density of from 0.03 g/cc to 0.64 g/cc, an aspect ratio of from 1 to 3, where after the lightweight cementitious composition is set it has a compressive strength of at least 1700 psi as tested according to ASTM C39. The cementitious composition can be used to make concrete masonry units, construction panels, road beds and other articles and can be included as a layer on wall panels and floor panels and can be used in insulated concrete forms. Aspects of the lightweight cementitious composition can be used to make lightweight structural units.Type: ApplicationFiled: October 31, 2007Publication date: March 6, 2008Applicant: NOVA CHEMICALS INC.Inventors: Tricia Guevara, Michael Williams, David Cowan, John Madish, Kolapo Adewale, Roger Moore, Jay Bowman
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Publication number: 20080058446Abstract: A lightweight ready-mix concrete composition that contains 8-20 volume percent cement, 11-50 volume percent sand, 10-31 volume percent prepuff particles, 9-40 volume percent coarse aggregate, and 10-22 volume percent water, where the sum of components used does not exceed 100 volume percent. The prepuff particles have an average particle diameter of from 0.2 mm to 8 mm, a bulk density of from 0.02 g/cc to 0.64 g/cc, an aspect ratio of from 1 to 3. The slump value of the composition measured according to ASTM C 143 is from 2 to 8 inches. After the lightweight ready-mix concrete composition is set for 28 days, it has a compressive strength of at least 1400 psi as tested according to ASTM C39.Type: ApplicationFiled: October 31, 2007Publication date: March 6, 2008Applicant: NOVA CHEMICALS INC.Inventors: Tricia Guevara, Michael Williams, Rick Hughes, Michael Kelley, John Madish, Kristen Van Buskirk
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Publication number: 20080059129Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.Type: ApplicationFiled: October 31, 2007Publication date: March 6, 2008Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Moshe Finarov, Boaz Brill
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Publication number: 20080059141Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.Type: ApplicationFiled: October 31, 2007Publication date: March 6, 2008Applicant: NOVA MEASURING INSTRUMENTSInventors: Moshe Finarov, Boaz Brill
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Patent number: 7337918Abstract: A strip dispenser has a strip magazine, a magazine spring, a strip vial component, and a cover. The strip magazine has a magazine open end and an outer magazine casing surrounding the strip magazine adjacent the open end for a predefined distance along the strip magazine where the magazine has a magazine volume with an open magazine top. The magazine spring is contained within the strip magazine. The strip vial component has a magazine receiving end, a closed end and a vial recess for slidably receiving the strip magazine between a first position and a second position where the vial recess has a shoulder portion spaced from the closed end and adjacent to and aligned with the open magazine top. The cover encloses the magazine open end and has a slit spaced a predefined distance from an edge of the cover where the slit is in communication with the magazine volume and the open magazine top and in spatial alignment with the shoulder portion.Type: GrantFiled: December 3, 2004Date of Patent: March 4, 2008Assignee: Nova Biomedical CorporationInventors: James Fowler, Robert Daggett
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Publication number: 20080043229Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.Type: ApplicationFiled: October 25, 2007Publication date: February 21, 2008Applicant: Nova Measuring Instruments Ltd.Inventors: Giora DISHON, Moshe Finarov, Zvi Nirel, Yoel Cohen
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Patent number: 7333701Abstract: An apparatus including a microchannel plate having a structure that defines multiple microchannels. The structure includes multiple claddings that form the walls of the microchannels, each of the claddings including a semiconducting layer. The claddings are surrounded by a glass having a lower percentage of materials having atomic numbers higher than 34 as compared to the cladding. The glass has a higher percentage of neutron absorbing material than the cladding, the neutron absorbing material capable of capturing neutrons in reactions that result in secondary electron emissions in the microchannels.Type: GrantFiled: September 18, 2006Date of Patent: February 19, 2008Assignee: Nova Scientific, Inc.Inventors: W. Bruce Feller, Paul L. White, P. Brian White, R. Gregory Downing
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Patent number: 7330259Abstract: A method and system are presented for use in measuring/inspecting a patterned article. Optical measurements are applied to a measurement site on the article by illuminating the measurement site with a plurality of wavelengths at substantially normal incidence of the illuminating light, detecting light returned from the illuminated site, and generating measured data indicative thereof. The measurements are applied to the measurement site through a polarizer rotatable between its different orientations selected from a number of pre-calibrated orientations.Type: GrantFiled: December 3, 2004Date of Patent: February 12, 2008Assignee: Nova Measuring Instruments Ltd.Inventors: Moshe Finarov, Shahar Gov
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Patent number: 7327476Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d?) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d?1 or d?2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.Type: GrantFiled: June 26, 2003Date of Patent: February 5, 2008Assignee: Nova Measuring Instruments Ltd.Inventors: Yoel Cohen, Moshe Finarov, Klara Vinokur
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Patent number: PP18475Abstract: A new and distinct Coreopsis plant named ‘RP #5’ characterized by very free flowering rust orange colored, daisy-like flowers, a low mounding habit, and excellent vigor.Type: GrantFiled: November 1, 2006Date of Patent: February 5, 2008Assignees: The Ivy Farm, Terra Nova Nurseries, Inc.Inventor: Harini Korlipara
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Patent number: PP18502Abstract: A new and distinct Coreopsis plant named ‘RP #1’, characterized by numerous, small, free flowering, copper-colored daisy-like flowers, a pincushion habit and excellent vigor.Type: GrantFiled: November 3, 2006Date of Patent: February 19, 2008Assignee: Terra Nova Nurseries, Inc.Inventor: Harini Korlipara
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Patent number: PP18551Abstract: A new and distinct hybrid of Heuchera plant characterized by almost black colored leaves with pink spots that expand as the leaf grows larger. In summer the spots on the older leaves lighten to cream and pink.Type: GrantFiled: October 3, 2006Date of Patent: March 4, 2008Assignee: Terra Nova Nurseries, Inc.Inventor: Terri C. Poindexter
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Patent number: PP18557Abstract: A new and distinct hybrid of Heuchera plant characterized by strong pink variegation on an almost black leaf. In summer the color on the older leaves lightens to cream and pink.Type: GrantFiled: November 1, 2006Date of Patent: March 4, 2008Assignees: Terra Nova Nurseries, Inc., The Behnke Nurseries Co.Inventor: Harini Korlipara
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Patent number: PP18560Abstract: A new and distinct Coreopsis plant named ‘Snowberry’ characterized by large, daisy-type flowers that are about 4.5 cm in diameter; unique primrose yellow and maroon bi-colored ray florets; grass green foliage; very free branching; very free flowering; and mounding habit.Type: GrantFiled: June 23, 2006Date of Patent: March 4, 2008Assignee: Terra Nova Nurseries, Inc.Inventor: Harini Korlipara