Abstract: A method and system are presented for use in optical processing of an article by VUV radiation. The method comprises: localizing incident VUV radiation propagation from an optical head assembly towards a processing site on the article outside the optical head assembly and localizing reflected VUV radiation propagation from said processing site towards the optical head assembly by localizing a medium, non-absorbing with respect to VUV radiation, in within the light propagation path in the vicinity of said site outside the optical head assembly.

Abstract: The present invention provides a Ziegler-Natta catalyst useful in solution processes for the polymerization of olefins having a low amount of aluminum and magnesium. The catalysts of the present invention contain an alkyl silanol and have a molar ratio of Si:Ti from 0.25:1 to 4:1. The catalysts are effective for the solution polymerization of olefins at high temperatures.

Abstract: A method and system are provided for use in positioning an article, from a group of similar articles, with respect to a processing tool to be applied to the article while the article is located on a stage. A first one of the articles is located on the stage at a predetermined registration of the first article with the stage corresponding to a certain angular orientation of the first article relative to the processing tool. An image of at least a part of the first article is acquired to determine, by image processing, the relative position of at least one site of interest on the first article with respect to the processing tool, thereby enabling to bring said at least one site of interest to the processing position. Data indicative of the relative position of said at least one site of interest of the first article is stored.

Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model based on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.

Abstract: By controlling the hold up times and temperatures for mixing the components of aluminum, titanium and magnesium based catalyst for solution polymerization it is possible to prepare a catalyst having a high activity, which prepares high molecular weight polyolefins. Generally, catalyst loses activity and produces lower molecular weight polymer at higher temperatures. The catalyst of the present invention permits comparable polymers to be produced at higher reaction temperatures.

Abstract: Novel microporous latex membranes having advantageous properties are disclosed as are methods for making and using the microporous latex membranes. Disclosed processes for making such membranes include those processes comprising applying a latex suspension to a surface to result in a latex coated surface and subjecting the latex coated surface to a first temperature less than about ?2° C., and subsequent thereto, heating the latex coated surface at a second temperature to result in a microporous latex membrane. Moreover, it is disclosed that certain properties of the microporous membranes may be manipulated through judicious selection of first and second temperatures.

Abstract: An apparatus is provided for supporting semiconductor wafer in a wafer processing system. The apparatus comprises at least two wafer support assemblies, defining respectively at least two wafer support levels and being mounted between opposing support beams; one or more supporting bases connected to or integral with each of the wafer support assemblies; and a motion unit coupled to the support beams.

Abstract: A solution polymerization process in a series or parallel of two or more reactors at different temperatures is used to prepare a multimodal polyolefin resin of narrow molecular weight distribution. This resin is used to manufacture melt extruded pipe that has an improved performance at elevated temperatures and an improved hydrostatic design.

Abstract: The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.

Abstract: A method for in process monitoring of the parameters of a substrate undergoing a processing within a photolithography tools arrangement which includes substrate loading and unloading stations, and substrate coating, exposure and developing stations. The method includes the step of supplying the substrate after being developed to a monitoring station and analyzing the monitoring data to estimate the photolithography process to be used for controlling thereof.

Abstract: A walker having a detachable backrest is described. The walker contains a seat, and a person may sit in the walker, and rest his or her back against the detachable backrest.

Abstract: A disposable biosensor for testing a fluid sample including a laminated strip with a first and second end, a reference electrode embedded in the laminated strip proximate to the first end, at least one working electrode embedded in the laminated strip proximate to the first end and the reference electrode, an open path for receiving a fluid sample beginning from the first end and connecting to a vent spaced from the first end, the open path being sufficiently long to expose the reference electrode and the working electrode to the fluid sample, and conductive contacts located at the second end of the laminated strip. The laminated strip has a base layer with a conductive coating, a reagent holding layer, a channel forming layer and a cover having an inlet notch at the first end. The working electrode contains a reagent having an enzyme.

Abstract: A composite surface having a thickness from 10 to 5,000 microns comprising a spinel of the formula MnxCr3-xO4 wherein x is from 0.5 to 2 and oxides of Mn, Si selected from the group consisting of MnO, MnSiO3, Mn2SiO4 and mixtures thereof which are not prone to coking and are suitable for hydrocarbyl reactions such as furnace tubes for cracking.

Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.

Abstract: A processing apparatus is presented for applying to a substantially flat workpiece contained in a cassette, and a processing tool coupled to the housing. The processing tool is displaceable along three mutually perpendicular axes relative to the cassette for inserting the tool into the gap and moving the tool inside the gap relative to the workpiece. The processing apparatus can be utilized in chemical mechanical polishing arrangement, photolithography arrangement, and CVD arrangement.

Abstract: The present invention is applied to an ion implanter provided with a vacuum pressure compensation mechanism. The pressure compensation mechanism samples measured beam currents and vacuum pressures in the vicinity of wafers in preliminary implantation and stores function parameters in a memory unit which are obtained by calculating parameters of a predetermined function by fitting the relationship between the measured beam currents and the vacuum pressures. In actual implantation, the pressure compensation mechanism corrects the measured beam current using the function parameters stored as a function of the vacuum pressure, and based on the corrected beam current, the dosage control is performed. In the present invention, an actual beam loss is compensated for based on the estimation from a pressure in the vicinity of the wafers in a region downstream of a mass analysis slit.

Abstract: The ion source apparatus of the present invention includes at least one pair of antenna-opposed magnets sandwiching an antenna element and moveable to magnetic element and the antenna element both in horizontal and vertical directions in a plasma chamber, and a control means performing a positional adjustment over the antenna-opposed magnets to the antenna element in the plasma chamber. An electrons-generated region of high-concentration is formed around the antenna element through electric fields based on outputs of the antenna element and magnetic fields of the antenna-opposed magnets crossing the antenna element.

Abstract: A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predetermined value of a desired parameter of the article being processed. The article is processed with the processing tool. Upon completing the processing in response to the end-point signal generated by an end-point detector continuously operating during the processing of the article, integrated monitoring is applied to the processed article to measure the value of the desired parameter. The measured value of the desired parameter is analyzed to determine a correction value thereof to be used for adjusting the end-point signal corresponding to the predetermined value of the desired parameter for terminating the processing of the next article in the stream.

Abstract: A new and distinct cultivar of Tiarella plant characterized by its large size, upright habit and very large deeply palmately lobed leaves with a dark stripe down the veins.

Abstract: A new and distinct cultivar of Athyrium niponicum var. pictum plant characterized by the pewter tone to the leaves, silver over grey green, with a pink rachis. This coloring persists from new growth to mature.