Patents Assigned to Research Corporation
  • Patent number: 12046890
    Abstract: An electrical receptacle contains a plug outlet that has a pair of contacts for electrical connection to respective hot and neutral power lines. A controlled switch, such as a TRIAC, is connected in series relationship between the outlet contact and the hot power line. Sensors in the receptacle outputs signals to a processor having an output coupled to the control terminal of the controlled switch. The processor outputs an activation signal or a deactivation signal to the controlled switch in response to received sensor signals that are indicative of conditions relative to the first and second contacts.
    Type: Grant
    Filed: August 24, 2023
    Date of Patent: July 23, 2024
    Assignee: Brainwave Research Corporation
    Inventors: John Eriksen, Jean-Guy Gagne, Rene K. Pardo
  • Patent number: 12045681
    Abstract: Systems and methods for radiolocation using backscatter RFID tags and a special-purpose reader that produces a SFCW RF interrogation signal comprising N carrier frequencies. A backscattered interrogation signal from a backscatter RFID tag is down-converted using at least a portion of the generated SFCW RF interrogation signal. RSP corresponding to the N carrier frequencies are determined. RSS may be determined to improve performance. A distance between the RFID reader and the backscatter RFID tag may be estimated based on at least a summation of differences between RSPs corresponding to adjacent carrier frequencies.
    Type: Grant
    Filed: October 10, 2023
    Date of Patent: July 23, 2024
    Assignees: Georgia Tech Research Corporation, University of Rome Tor Vergata
    Inventors: Cheng Qi, Francesco Amato, Gregory David Durgin
  • Patent number: 12042761
    Abstract: Methods of designing zeolite materials for adsorption of CO2. Zeolite materials and processes for CO2 adsorption using zeolite materials.
    Type: Grant
    Filed: March 31, 2023
    Date of Patent: July 23, 2024
    Assignees: ExxonMobil Technology and Engineering Company, Georgia Tech Research Corporation
    Inventors: Peter I. Ravikovitch, David Sholl, Charanjit Paur, Karl G. Strohmaier, Hanjun Fang, Ambarish R. Kulkarni, Rohan V. Awati, Preeti Kamakoti
  • Patent number: 12046450
    Abstract: Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.
    Type: Grant
    Filed: September 24, 2021
    Date of Patent: July 23, 2024
    Assignee: Lam Research Corporation
    Inventors: Ying Wu, John Stephen Drewery, Alexander Miller Paterson, Xiang Zhou, Zhuoxian Wang, Yoshie Kimura
  • Patent number: 12040181
    Abstract: Methods and apparatuses for depositing thin films using long and short conversion times during alternating cycles of atomic layer deposition (ALD) are provided herein. Embodiments involve alternating conversion duration of an ALD cycle in one or more cycles of a multi-cycle ALD process. Some embodiments involve modulation of dose, purge, pressure, plasma power or plasma energy in two or more ALD cycles.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: July 16, 2024
    Assignee: Lam Research Corporation
    Inventors: Chan Myae Myae Soe, Chloe Baldasseroni, Shiva Sharan Bhandari, Pulkit Agarwal, Adrien LaVoie, Bart J. van Schravendijk
  • Patent number: 12040193
    Abstract: A method for treating a substrate includes arranging a substrate in a processing chamber. At least one of a vaporized solvent and a gas mixture including the solvent is supplied to the processing chamber to form a conformal liquid layer of the solvent on exposed surfaces of the substrate. The at least one of the vaporized solvent and the gas mixture is removed from the processing chamber. A reactive gas including a halogen species is supplied to the processing chamber. The conformal liquid layer adsorbs the reactive gas to form a reactive liquid layer that etches the exposed surfaces of the substrate.
    Type: Grant
    Filed: October 11, 2022
    Date of Patent: July 16, 2024
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Ji Zhu, Mark Kawaguchi, Nathan Musselwhite
  • Patent number: 12040770
    Abstract: A matching module includes an input terminal connected to an input node, a variable load capacitor, and a plurality of RF signal delivery branches. The input terminal is connected to receive RF signals from one or more RF generators. The load capacitor is connected between the input node and a reference ground potential. Each of the plurality of RF signal delivery branches has a respective ingress terminal connected to the input node and a respective egress terminal connected to a respective one of a plurality of output terminals. Each of the plurality of output terminals of the matching module is connected to deliver RF signals to a different one of a plurality of plasma processing stations/chambers. Each of the plurality of RF signal delivery branches includes a corresponding inductor and a corresponding variable tuning capacitor electrically connected in a serial manner between its ingress terminal and its egress terminal.
    Type: Grant
    Filed: June 15, 2021
    Date of Patent: July 16, 2024
    Assignee: Lam Research Corporation
    Inventors: Karl Leeser, Sunil Kapoor, Bradford J. Lyndaker
  • Patent number: 12040605
    Abstract: A voltage transient detector includes circuitry for transmitting electrical current through a light emitting diode and a fuse that is serially connected between the light emitting diode and a reference potential, such that the light emitting diode is illuminated when the fuse is not blown. The voltage transient detector also includes circuitry for transmitting a controlled amount of electrical current through the fuse in conjunction with an occurrence of a voltage transient at a voltage measurement location, where the voltage transient exceeds a set transient threshold voltage. The controlled amount of electrical current transmitted through the fuse causing the fuse to blow and the light emitting diode to turn off, thereby indicating occurrence of the voltage transient at the voltage measurement location.
    Type: Grant
    Filed: September 29, 2021
    Date of Patent: July 16, 2024
    Assignee: Lam Research Corporation
    Inventors: John Pease, John Drewery
  • Patent number: 12040180
    Abstract: A method for depositing a nitride layer over an oxide layer to form an oxide-nitride stack is provided. The method includes supplying an inert gas to a plasma enhanced chemical vapor deposition (PECVD) reactor that supports a substrate having said oxide layer. Then, providing power to an electrode of the PECVD reactor, where the power is configured to strike a plasma. Then, flowing reactant gases into the PECVD reactor. The reactant gases include a first percentage by volume of ammonia (NH3), a second percentage by volume of nitrogen (N2), a third percentage by volume of silane (SiH4) and a fourth percentage by volume of an oxidizer. The fourth percentage by volume of said oxidizer is at least 0.5 percent by volume and less than about 8 percent by volume. Then, continuing to flow the reactant gases into the PECVD reactor until the nitride layer is determined to achieve a target thickness over the oxide layer.
    Type: Grant
    Filed: October 8, 2019
    Date of Patent: July 16, 2024
    Assignee: Lam Research Corporation
    Inventors: Pramod Subramonium, Nagraj Shankar, Malay Milan Samantaray, Katsunori Yoshizawa, Bart J. VanSchravendijk
  • Patent number: 12037686
    Abstract: A method for depositing carbon on a substrate in a processing chamber includes arranging the substrate on a substrate support in the processing chamber. The substrate includes a carbon film having a first thickness formed on at least one underlying layer of the substrate. The method further includes performing a first etching step to etch the substrate to form features on the substrate, remove portions of the carbon film, and decrease the first thickness of the carbon film, selectively depositing carbon onto remaining portions of the carbon film, and performing at least one second etching step to etch the substrate to complete the forming of the features on the substrate.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: July 16, 2024
    Assignee: Lam Research Corporation
    Inventors: Awnish Gupta, Adrien Lavoie, Bart J. Van Schravendijk, Samantha SiamHwa Tan
  • Patent number: 12030981
    Abstract: The invention relates to an anion-exchange membrane (AEM) having a multiblock copolymer including a hydrophilic norbornene-based monomer and a hydrophobic alkene-based or norbornene-based monomer. The hydrophilic norbornene-based monomers include one or more cationic head groups such as a quaternary ammonium ion, which can optionally be crosslinked with a crosslinking agent to increase the structural stability of the polymer. These AEMs can be employed in electrochemical devices such as fuel cells.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: July 9, 2024
    Assignee: Georgia Tech Research Corporation
    Inventors: Paul A. Kohl, Garrett Huang, Mrinmay Mandal
  • Patent number: 12029822
    Abstract: Lipid nanoparticles and compositions thereof are disclosed herein. An exemplary nanoparticle composition includes an ionizable lipid, a phospholipid, a PEG-lipid, and a cholesterol modified with a hydroxyl group near the D-sterol ring. The disclosed nanoparticle compositions can target liver Kupffer cells and endothelial cells more preferentially than hepatocytes which should be beneficial in treating liver diseases in which dysfunctional Kupffer cells and endothelial cells are involved in disease pathogenesis.
    Type: Grant
    Filed: September 2, 2021
    Date of Patent: July 9, 2024
    Assignee: Georgia Tech Research Corporation
    Inventors: James Dahlman, Kalina Paunovska
  • Publication number: 20240223697
    Abstract: Various embodiments of the invention are detection systems and methods for detecting call provenance based on call audio. An exemplary embodiment of the detection system can comprise a characterization unit, a labeling unit, and an identification unit. The characterization unit can extract various characteristics of networks through which a call traversed, based on call audio. The labeling unit can be trained on prior call data and can identify one or more codecs used to encode the call, based on the call audio. The identification unit can utilize the characteristics of traversed networks and the identified codecs, and based on this information, the identification unit can provide a provenance fingerprint for the call. Based on the call provenance fingerprint, the detection system can identify, verify, or provide forensic information about a call audio source.
    Type: Application
    Filed: February 8, 2024
    Publication date: July 4, 2024
    Applicant: GEORGIA TECH RESEARCH CORPORATION
    Inventors: Vijay BALASUBRAMANIYAN, Mustaque AHAMAD, Patrick Traynor, Michael Thomas HUNTER, Aamir POONAWALLA
  • Patent number: 12027488
    Abstract: Methods of bonding and structures with such bonding are disclosed. One such method includes providing a first substrate with a first electrical contact; providing a second substrate with a second electrical contact above the first electrical contact, wherein an upper surface of the first electrical contact is spaced apart from a lower surface of the second electrical contact by a gap; and depositing a layer of selective metal on the lower surface of the second electrical contact and on the upper surface of the first electrical contact by a thermal Atomic Layer Deposition (ALD) process until the gap is filled to create a bond between the first electrical contact and the second electrical contact.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: July 2, 2024
    Assignees: The Regents of the University of California, Wayne State University, Georgia Tech Research Corporation
    Inventors: Mike Breeden, Victor Wang, Andrew Kummel, Ming-Jui Li, Muhannad Bakir, Jonathan Hollin, Nyi Myat Khine Linn, Charles H. Winter
  • Patent number: 12027411
    Abstract: Semiconductor processing tools are provided that include a support framework, semiconductor processing chambers arranged along an axis, an attachment point connected to the support framework, and a detachable hoist system. Each chamber includes a base portion fixedly mounted relative to the support framework and a removable top cover including one or more hoisting features. The detachable hoist system includes a vertical member including a top end including a complementary attachment point and a bottom end including a movement mechanism supported by a floor. The complementary attachment point is detachably connected to the attachment point. The detachable hoist system further includes a hoist arm connected to the vertical member. The hoist arm is configured to pivot about a vertical axis substantially perpendicular to the axis, and includes one or more links and a hoist feature engagement interface configured to engage with the hoisting features of any of the removable top covers.
    Type: Grant
    Filed: October 5, 2022
    Date of Patent: July 2, 2024
    Assignee: Lam Research Corporation
    Inventors: Paul Albert Avanzino, Jerrel K. Antolik, Daniel Arthur Brown, Jason Lee Treadwell
  • Patent number: 12027410
    Abstract: An edge ring arrangement for a processing chamber includes a first ring configured to surround and overlap a radially outer edge of an upper plate of a pedestal arranged in the processing chamber, a second ring arranged below the first moveable ring, wherein a portion of the first ring overlaps the second ring, a first actuator configured to actuate a first pillar to selectively move the first ring to a raised position and a lowered position relative to the pedestal, and a second actuator configured to actuate a second pillar to selectively move the second ring to a raised position and a lowered position relative to the pedestal.
    Type: Grant
    Filed: February 22, 2021
    Date of Patent: July 2, 2024
    Assignee: Lam Research Corporation
    Inventors: Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon Mcchesney, Alex Paterson
  • Patent number: 12029133
    Abstract: Patterned magnetoresistive random access memory (MRAM) stacks are formed by performing a main etch through a plurality of MRAM layers disposed on a substrate, where the main etch includes using ion beam etching (IBE). After the main etch, gapfill dielectric material is deposited in spaces between the patterned MRAM stacks, and the gapfill dielectric material is selectively etched or otherwise formed to an etch depth that is above a depth of an underlayer. After the gapfill dielectric material is formed, at least some of the gapfill dielectric material and any electrically conductive materials deposited on sidewalls of the patterned MRAM stacks are removed by performing an IBE trim etch.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: July 2, 2024
    Assignee: Lam Research Corporation
    Inventors: Thorsten Lill, Ivan L. Berry, III
  • Patent number: 12027409
    Abstract: Some examples provide a vacuum wafer chuck assembly for supporting a wafer. An example chuck assembly comprises a chuck hub and a centering hub disposed within the chuck hub. Chuck arms are mounted to the chuck hub, with each chuck arm extending radially between a proximal end adjacent the chuck hub, and a distal end remote therefrom. At least one vacuum pad is provided for supporting the wafer during a wafer centering or wafer processing operation. A vacuum sensor detects a presence or absence of a vacuum pressure at the vacuum pad during the wafer centering or processing operation, a detection indicative of a presence or absence of the wafer in the chuck assembly, or a presence of a defective wafer.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: July 2, 2024
    Assignee: Lam Research Corporation
    Inventors: Aaron Louis LaBrie, Claudiu Valentin Puha
  • Patent number: 12027375
    Abstract: A method for selectively etching a silicon oxide region with respect to a lower oxygen silicon containing region is provided. A sacrificial mask selectively deposited on the lower oxygen silicon containing region with respect to the silicon oxide region. An atomic layer etch selectively etches the silicon oxide region with respect to the sacrificial mask on the lower oxygen silicon containing region.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: July 2, 2024
    Assignee: Lam Research Corporation
    Inventors: Daniel Peter, Da Li, Jengyi Yu, Alexander Kabansky, Katie Nardi, Samantha SiamHwa Tan, Younghee Lee
  • Patent number: 12027453
    Abstract: The present disclosure describes semiconductor packages and, more particularly, chip-embedded semiconductor packages. The packages include core panels with apertures extending through the core panel. Semiconductor chips are embedded within chip apertures. A molding compound can be positioned along one side of the core panel. In some examples, the semiconductor chips are embedded within the molding compound. In other examples, the semiconductor chips are adhered to the molding compound. The coefficient of thermal expansion (CTE) values of the core panels described herein can be tailored to decrease warpage of the package as the semiconductor chip heats during use.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: July 2, 2024
    Assignee: Georgia Tech Research Corporation
    Inventors: Nobuo Ogura, Siddharth Ravichandran, Venkatesh V. Sundaram, Rao R. Tummala