Patents Assigned to Research Corporation
  • Publication number: 20210229030
    Abstract: The invention is an improved method of making an improved carbon molecular sieve (CMS) membrane in which a precursor polymer (e.g., polyimide) is pyrolyzed at a pyrolysis temperature to form a CMS membrane that is cooled to ambient temperature (about 40° C. or 30° C. to about 20° C.). The CMS membrane is then reheated to a reheating temperature less than the pyrolysis temperature to form the improved CMS membrane. The improved CMS membranes have shown an improved combination of selectivity and permeance as well as stability for separating hydrogen from gas molecules (e.g., methane, ethane, propane, ethylene, propylene, butane, carbon dioxide, nitrogen, butylene, and combinations thereof).
    Type: Application
    Filed: April 3, 2019
    Publication date: July 29, 2021
    Applicants: Dow Global Technologies LLC, Georgia Tech Research Corporation
    Inventors: Justin T. Vaughn, Wulin Qiu, William J. Koros, Liren Xu, Mark K. Brayden, Marcos V. Martinez
  • Patent number: 11071494
    Abstract: Multi-modal sensing relating to joint acoustic emission and joint bioimpedance. Custom-design analog electronics and electrodes provide high resolution sensing of bioimpedance, microphones and their front-end electronics for capturing sound signals from the joints, rate sensors for identifying joint motions (linear and rotational), and a processor unit for interpretation of the signals. These components are packed into a wearable form factor, which also encapsulates the hardware required to minimize the negative effects of motion artifacts on the signals.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: July 27, 2021
    Assignee: Georgia Tech Research Corporation
    Inventors: Omer T. Inan, Michael N. Sawka, Jennifer O. Hasler, Hakan Toreyin, Mindy L. Millard-Stafford, Geza Kogler, Sinan Hersek, Caitlin Teague, Hyeon Ki Jeong, Maziyar Baran Pouyan
  • Patent number: 11072860
    Abstract: Methods and apparatus for use of a fill on demand ampoule are disclosed. The fill on demand ampoule may refill an ampoule with precursor concurrent with the performance of other deposition processes. The fill on demand may keep the level of precursor within the ampoule at a relatively constant level. The level may be calculated to result in an optimum head volume. The fill on demand may also keep the precursor at a temperature near that of an optimum precursor temperature. The fill on demand may occur during parts of the deposition process where the agitation of the precursor due to the filling of the ampoule with the precursor minimally effects the substrate deposition. Substrate throughput may be increased through the use of fill on demand.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: July 27, 2021
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni, Ramesh Chandrasekharan, Frank L. Pasquale, Jennifer L. Petraglia
  • Patent number: 11075383
    Abstract: Material compositions are provided that may comprise, for example, a vertically aligned carbon nanotube (VACNT) array, a conductive layer, and a carbon interlayer coupling the VACNT array to the conductive layer. Methods of manufacturing are provided. Such methods may comprise, for example, providing a VACNT array, providing a conductive layer, and bonding the VACNT array to the conductive layer via a carbon interlayer.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: July 27, 2021
    Assignee: GEORGIA TECH RESEARCH CORPORATION
    Inventors: Gleb Nikolayevich Yushin, Kara Linn Evanoff
  • Patent number: 11072817
    Abstract: In a first aspect, the invention concerns a method for detecting or quantifying DNA methylation at a locus. In one embodiment, a methylation-sensitive endonuclease is formulated together with a polymerase enzyme in an appropriate reaction mixture such that amplification of DNA occurs in a methylation specific manor. Quantitative DNA amplification at selected loci can be used to determine the level of methylation. Kits and reagents for performing such methods are also provided.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: July 27, 2021
    Assignee: ZYMO RESEARCH CORPORATION
    Inventors: Xiyu Jia, Onyinyechi Chimaokereke, Lam Nguyen
  • Patent number: 11075127
    Abstract: Disclosed are methods of and apparatuses and systems for depositing a film in a multi-station deposition apparatus. The methods may include: (a) providing a substrate to a first station of the apparatus, (b) adjusting the temperature of the substrate to a first temperature, (c) depositing a first portion of the material on the substrate while the substrate is at the first temperature in the first station, (d) transferring the substrate to the second station, (e) adjusting the temperature of the substrate to a second temperature, and (f) depositing a second portion of the material on the substrate while the substrate is at the second temperature, such that the first portion and the second portion exhibit different values of a property of the material. The apparatuses and systems may include a multi-station deposition apparatus and a controller having control logic for performing one or more of (a)-(f).
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: July 27, 2021
    Assignee: Lam Research Corporation
    Inventors: Seshasayee Varadarajan, Aaron R. Fellis, Andrew John McKerrow, James Samuel Sims, Ramesh Chandrasekharan, Jon Henri
  • Patent number: 11075573
    Abstract: A method for moving a stage includes coupling a stage mover to the stage, and directing current to the stage mover with a control system. The stage mover includes a magnet array and a conductor array positioned adjacent to the magnet array. The conductor array includes a first layer of coils and a second layer of coils, with the first layer of coils being closer to the magnet array than the second layer of coils. The control system directs current to the first layer of coils and the second layer of coils independently. Further, the control system directs more current to the first layer of coils than the second layer of coils during a movement step to reduce the power consumption.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: July 27, 2021
    Assignee: Nikon Research Corporation of America
    Inventors: Neyram Hemati, Michael B. Binnard
  • Patent number: 11069535
    Abstract: Methods of depositing tungsten into high aspect ratio features using a dep-etch-dep process integrating various deposition techniques with alternating pulses of surface modification and removal during etch are provided herein.
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: July 20, 2021
    Assignee: Lam Research Corporation
    Inventors: Chiukin Steven Lai, Keren Jacobs Kanarik, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang, Michael Wood, Michal Danek
  • Patent number: 11066426
    Abstract: Disclosed herein is a method of making a porous molecular structure from a solution comprising an insoluble metal containing material and a ligand-providing material. In some embodiments, the porous molecular structure can be a Metal-Organic Framework (MOF). Ionic metal salts are the most common type of metal source for MOF production, but dissolution of metal salts complicates solvent recycling and creates corrosion and oxidation issues through evolved nitrate and chloride anions. Elucidating information that leads toward more efficient production of these versatile nanomaterials, while extending the knowledge base of how MOFs form during reaction, is critical to advancing MOF materials into large-scale use. Disclosed herein are improved methods for controlled synthesis of porous molecular structures such as MOFs comprising a solution-based synthesis with insoluble metallic precursor.
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: July 20, 2021
    Assignee: GEORGIA TECH RESEARCH CORPORATION
    Inventors: Jayraj Nayan Joshi, Colton Michael Moran, Krista S. Walton
  • Patent number: 11070929
    Abstract: Low-cost hearing aid platforms that are customizable for specific user needs are disclosed. An exemplary hearing aid platform includes an electret microphone, an amplifier, a capacitor, a printable circuit board (PCB), an audio output, and a housing for the components. The hearing aid platform may comprise customizable gain settings and safety features such as automatic gain control. In some embodiments, the hearing aid platform may connect to headphones. In some embodiments, the hearing aid platform may connect to a bone transducer. Devices described herein also may include housings that are customizable for a user's needs and/or personality.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: July 20, 2021
    Assignee: GEORGIA TECH RESEARCH CORPORATION
    Inventors: M. Saad Bhamla, Soham Sinha
  • Patent number: 11065654
    Abstract: A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: July 20, 2021
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Mark Kawaguchi, Gregory Blachut
  • Patent number: 11065435
    Abstract: A blood pump includes a blood supply mechanism; a motor having a stator, a rotor and a shaft; a base body; a casing; a fixed side slide member having a first slide surface and fixed to the base body; and a rotary side slide member. A second insertion hole allows the shaft to pass therethrough is in the rotary side slide member. The shaft is fitted into the second insertion hole between the fixed side slide member and the blood supply mechanism. The second slide surface is slidable on the first slide surface in contact with the first slide surface by rotating together with the blood supply mechanism and the shaft A center of the core is at a position more to a +z direction side than a center (CM) of a permanent magnet.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: July 20, 2021
    Assignee: SUN MEDICAL TECHNOLOGY RESEARCH CORPORATION
    Inventors: Hideki Kanebako, Takayuki Miyakoshi, Naofumi Miyajima
  • Patent number: 11069553
    Abstract: A substrate support for a substrate processing system includes a baseplate, a bond layer provided on the baseplate, and a ceramic layer arranged on the bond layer. The ceramic layer includes a first region and a second region located radially outward of the first region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: July 20, 2021
    Assignee: Lam Research Corporation
    Inventors: Alexander Matyushkin, John Patrick Holland, Harmeet Singh, Alexei Marakhtanov, Keith Gaff, Zhigang Chen, Felix Kozakevich
  • Patent number: 11062897
    Abstract: Methods and apparatuses for etching metal-doped carbon-containing materials are provided herein. Etching methods include using a mixture of an etching gas suitable for etching the carbon component of the metal-doped carbon-containing material and an additive gas suitable for etching the metal component of the metal-doped carbon-containing material and igniting a plasma to selectively remove metal-doped carbon-containing materials relative to underlayers such as silicon oxide, silicon nitride, and silicon, at high temperatures. Apparatuses suitable for etching metal-doped carbon-containing materials are equipped with a high temperature movable pedestal, a plasma source, and a showerhead between a plasma generating region and the substrate.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: July 13, 2021
    Assignee: Lam Research Corporation
    Inventors: Yongsik Yu, David Wingto Cheung, Kirk J. Ostrowski, Nikkon Ghosh, Karthik S. Colinjivadi, Samantha Tan, Nathan Musselwhite, Mark Naoshi Kawaguchi
  • Patent number: 11060074
    Abstract: The present invention provides polymer brush constructs, for example, surfaces decorated with hyaluronan polymers, and methods of making the same. The constructs are useful as functional materials for numerous applications, e.g., as lubricants, implant coatings, bandages and other uses.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: July 13, 2021
    Assignee: Georgia Tech Research Corporation
    Inventors: Jennifer E. Curtis, M. G. Finn, Wenbin Wei, Jessica Faubel
  • Patent number: 11062920
    Abstract: The embodiments herein relate to methods and apparatus for performing ion etching on a semiconductor substrate, as well as methods for forming such apparatus. In some embodiments, an electrode assembly may be fabricated, the electrode assembly including a plurality of electrodes having different purposes, with each electrode secured to the next in a mechanically stable manner. Apertures may be formed in each electrode after the electrodes are secured together, thereby ensuring that the apertures are well-aligned between neighboring electrodes. In some cases, the electrodes are made from degeneratively doped silicon, and the electrode assembly is secured together through electrostatic bonding. Other electrode materials and methods of securing may also be used. The electrode assembly may include a hollow cathode emitter electrode in some cases, which may have a frustoconical or other non-cylindrical aperture shape. A chamber liner and/or reflector may also be present in some cases.
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: July 13, 2021
    Assignee: Lam Research Corporation
    Inventors: Ivan L. Berry, III, Thorsten Lill
  • Publication number: 20210210247
    Abstract: Embodiments of the present disclosure relate to atomic beam collimators and, more particularly, to miniaturized coplanar atomic beam collimators. In some examples, an atomic beam collimator may comprise an atomic channel disposed in a substrate. Additional atomic channels may be provided coplanar with the first atomic channel in the substrate. Some examples include a series of cascaded atomic channels, each cascaded atomic channel separated by a gap. The one or gaps may reduce the off-flux atoms in the output of the atomic collimator. In some examples, a system may comprise an atomic collimator, an atom source, and/or a micro-electromechanical system device. These component can be separate devices or can be incorporated into a common substrate.
    Type: Application
    Filed: May 17, 2019
    Publication date: July 8, 2021
    Applicant: Georgia Tech Research Corporation
    Inventors: Chandra RAMAN, Farrokh AYAZI
  • Patent number: 11056322
    Abstract: A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: July 6, 2021
    Assignee: Lam Research Corporation
    Inventors: Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee, Thorsten Lill
  • Patent number: 11056321
    Abstract: A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A contamination reducer includes a first plate that is arranged between the at least one terminal of the coil and the dielectric window.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: July 6, 2021
    Assignee: Lam Research Corporation
    Inventors: Maolin Long, Neema Rastgar, Alexander Miller Paterson
  • Patent number: 11056405
    Abstract: A method for controlling a semiconductor fabrication process includes determining a representative feature within a given area on a wafer. The representative feature has a critical dimension (CD) response to a specified process control parameter that is correlated to a CD response to the specified process control parameter of other features within the given area on the wafer. A CD adjustment is determined for the representative feature to achieve a target CD for the representative feature. The CD response to the specified process control parameter for the representative feature and the CD adjustment for the representative feature are used to determine an adjustment to the specified process control parameter that will drive a CD of the representative feature to the target critical dimension for the representative feature. A process controller is updated to implement the adjustment to the specified process control parameter during subsequent processing of another wafer.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: July 6, 2021
    Assignee: Lam Research Corporation
    Inventor: Marcus Musselman