Patents Assigned to SCREEN Holdings Co., Ltd.
  • Patent number: 12008022
    Abstract: A data processing method includes: acquiring time series data; acquiring evaluation values; performing classification; and performing extraction. In the acquiring of the time series data, a plurality of time series data acquired by a substrate processing device are acquired. In the acquiring of the evaluation values, the evaluation values of the plurality of time series data are acquired. In the performing of classification, each of the plurality of time series data is classified into one of a plurality of classifications based on the evaluation value. In the performing of extraction, the time series data corresponding to one of the plurality of classifications is extracted as extracted time series data.
    Type: Grant
    Filed: December 31, 2020
    Date of Patent: June 11, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Hideji Naohara, Takashi Ikeuchi
  • Patent number: 12000036
    Abstract: Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a holding mechanism including a plurality of support pins configured to rotate between a holding position and a delivery position, a first magnetic part configured to rotate the support pins individually between the holding position and the delivery position by switching surrounding magnetic poles, and a second magnetic part configured to rotate the support pins individually to the holding position by constantly applying a magnetic field to the first magnetic part; and a switching mechanism configured to apply no magnetic field of a third magnetic part to the first magnetic part normally and apply a magnetic field of the third magnetic part to the first magnetic part to rotate the support pins individually to the delivery position only when the substrate is delivered.
    Type: Grant
    Filed: November 12, 2021
    Date of Patent: June 4, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Hirofumi Tonai
  • Patent number: 11999163
    Abstract: To provide an adjusting method for a printing apparatus, and the printing apparatus, capable of appropriately adjusting drive voltages of heads even when printing conditions are changed, this invention can appropriately acquire adjusted voltages of the heads even when printing conditions are changed. That is, according to this invention, a construction is configured to change an adjustable range of head drive voltages with a printing mode. This invention acquires the adjustable range corresponding to the printing mode set by referring to a table T1. Consequently, the adjusted voltages of the heads can be determined within the adjustable range suited to each printing mode.
    Type: Grant
    Filed: November 2, 2020
    Date of Patent: June 4, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventor: Seiya Nomura
  • Patent number: 11992006
    Abstract: An organ preservation system includes an organ container, an organ holder, a liquid supply tube, a drainage tube, and a pressure regulator. The organ container has a closed organ preservation space. The organ holder holds an organ in the organ preservation space. The liquid supply tube supplies a liquid to the organ. The drainage tube drains the liquid from the organ. The pressure regulator regulates air pressure in the organ preservation space. The organ container includes first to third connectors providing communication between the organ preservation space and an exterior space. The first, second, and third connectors are detachably connected to a liquid supply tube, a drainage tube, and a suction tube, respectively. When the organ is preserved ex vivo while being perfused with the liquid, the organ can be connected with ease to the tubes, and this ensures hermetical sealing of the space where the organ is preserved.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: May 28, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Hiroo Kasamatsu, Syuhei Yoshimoto
  • Patent number: 11996302
    Abstract: A substrate processing apparatus 100 includes a processing unit, a reservoir 31, a processing liquid pipe 32, a pump 34, a filter 35, a first flow rate section 36, a first return pipe 51, a first adjustment valve 52, a second return pipe 41, a branch supply pipe 16, a second flow rate section 42, and a controller. The first flow rate section 36 is placed in the processing liquid pipe 32 and measures a flow rate or pressure of the processing liquid flowing through the processing liquid pipe 32. The first adjustment valve 52 is placed in the first return pipe 51 and adjusts a flow rate of the processing liquid flowing through the first return pipe 51. The controller controls an opening degree of the first adjustment valve 52 based on the flow rate or the pressure of the processing liquid measured by the first flow rate section 36.
    Type: Grant
    Filed: March 18, 2022
    Date of Patent: May 28, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Tomoaki Aihara, Takahiro Yamaguchi, Jun Sawashima
  • Patent number: 11986853
    Abstract: A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mechanism. A removal liquid for dissolving the metal is supplied to a peripheral portion of the substrate by the metal removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.
    Type: Grant
    Filed: November 6, 2020
    Date of Patent: May 21, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Koji Kaneyama
  • Patent number: 11986867
    Abstract: A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: May 21, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Akira Horikoshi, Shohei Nakamura, Shigeru Takatsuji, Motohiro Kono, Takahiro Kimura, Kenji Kobayashi
  • Patent number: 11981147
    Abstract: A first printing unit and a second printing unit are supplied with ink from a first sub-tank and a second sub-tank, respectively. The first sub-tank and the second sub-tank are supplied with the ink from a first branch pipe and a second branch pipe, respectively. The first branch pipe is provided with a first valve, and the second branch pipe is provided with a second valve. A central control unit determines which one of the first sub-tank and the second sub-tank is to be preferentially supplied with ink based on at least one of the amount of remaining ink in each of the first sub-tank and the second sub-tank, and an estimated amount of consumption of ink in each of the first printing unit and the second printing unit, and controls the first valve and the second valve based on a result of the determination.
    Type: Grant
    Filed: February 19, 2021
    Date of Patent: May 14, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Tomohisa Mizuta, Mitsuru Tanemoto, Yuto Suzuki
  • Publication number: 20240133016
    Abstract: The disclosure relates to a method for etching a molybdenum feature, comprising the steps of: a) oxidizing a thickness portion of the molybdenum feature using a thermal oxidation process to form a thermal molybdenum oxide layer, and b) dissolving the thermal molybdenum oxide layer using a wet chemistry.
    Type: Application
    Filed: February 24, 2021
    Publication date: April 25, 2024
    Applicants: IMEC VZW, SCREEN HOLDINGS CO., LTD.
    Inventors: Antoine Pacco, Nakano Teppei
  • Patent number: 11967518
    Abstract: Disclosed are a substrate treating apparatus and a substrate reversing method. The substrate treating apparatus includes a supporting portion, a transport mechanism, and a reversing mechanism. The transport mechanism includes a first suction portion and a hand driving unit. The reversing mechanism includes a second suction portion and a rotation driving unit. When the transport mechanism transports a substrate to the supporting portion, the first suction portion is located above the substrate and sucks the substrate upward while causing gas to flow along a top face of the substrate, and the hand driving unit moves the first suction portion to the supporting portion. When the reversing mechanism receives the substrate from the supporting portion, the second suction portion is located above the substrate supported by the supporting portion and sucks the substrate upward while causing gas to flow along the top face of the substrate.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: April 23, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Yuichi Takayama
  • Patent number: 11958087
    Abstract: A substrate processing method is provided, which includes: a sulfuric acid immersing step of immersing a plurality of substrates in a sulfuric acid-containing liquid within a sulfuric acid vessel; a transporting step of taking out the substrates from the sulfuric acid vessel and transporting the substrates to an ozone gas treatment unit; and an ozone exposing step of exposing the substrates transported to the ozone gas treatment unit to an ozone-containing gas. The ozone gas treatment unit may include a gas treatment chamber which accommodates the substrates. The ozone exposing step may include the step of placing the substrates taken out of the sulfuric acid vessel in a treatment space within the gas treatment chamber to expose the substrates to the ozone-containing gas.
    Type: Grant
    Filed: August 22, 2022
    Date of Patent: April 16, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Kei Suzuki, Masaki Inaba
  • Patent number: 11961757
    Abstract: A substrate holding apparatus is used for a substrate processing apparatus for supplying the processing liquid to a substrate. The substrate holding apparatus includes a holding member, a ring member, and a rotation mechanism. The holding member holds the substrate in a horizontal attitude. The ring member is in a shape of a ring surrounding a peripheral edge of the substrate held by the holding member, and has an upper surface level with or positioned below a front surface of the substrate. The rotation mechanism rotates the holding member and the ring member about a rotation axis at rotation speeds different from each other and/or in rotational directions different from each other, the rotation axis being a vertical axis passing through the substrate held by the holding member.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: April 16, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Ryo Muramoto
  • Patent number: 11961744
    Abstract: In a chamber, first processing is performed as preliminary processing. After the first processing has been finished, the temperature in a predetermined target region in the chamber is measured with a thermographic camera. Then, whether or not to start second processing on a substrate is determined in accordance with the acquired measured temperature information. If it is determined as a result that the second processing can be started, the second processing is performed. In this case, the second processing on the substrate can be started, with the temperature of the target region in the chamber having reached its stability. Accordingly, the second processing can be performed uniformly on a plurality of substrates. That is, it is possible to reduce variations in processing caused by temperature environments in the chamber.
    Type: Grant
    Filed: February 1, 2019
    Date of Patent: April 16, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Eiji Fukatsu, Koji Hashimoto, Hiroyuki Fujiki, Masafumi Inoue
  • Patent number: 11955350
    Abstract: An upper flow passage 181 is connected to a buffer space 182. The upper flow passage 181 has a constant cross-sectional shape and a processing fluid flows as a laminar flow in the upper flow passage 181. On the other hand, the buffer space 182 has a larger flow passage cross-sectional area than the upper flow passage 181. Thus, the processing fluid flowing in the upper flow passage 181 is released at once into the wide buffer space 182, whereby the pressure of the processing fluid decreases. A backflow of the processing fluid from the buffer space 182 to the upper flow passage 181 is prevented due to this pressure difference and the magnitude of a flow passage resistance of the upper flow passage 181 viewed from the buffer space 182.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: April 9, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventor: Noritake Sumi
  • Patent number: 11948823
    Abstract: A substrate treating apparatus includes a carrier platform, a transport mechanism, and a controller. The carrier platform places a carrier thereon. The carrier includes a plurality of shelves arranged in an up-down direction. The shelves are each configured to place one substrate thereon in a horizontal posture. The transport mechanism is configured to transport a substrate to a carrier placed on the carrier platform. The controller controls the transport mechanism. The transport mechanism includes a hand and a hand driving unit. The hand supports a substrate. The hand driving unit moves the hand. The controller changes a height position of the hand when the hand is inserted between two of the shelves adjacent to each other in the up-down direction, depending on a shape of a substrate taken from or placed on one of the shelves by the transport mechanism.
    Type: Grant
    Filed: October 31, 2022
    Date of Patent: April 2, 2024
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Yuichi Takayama, Kazuhiko Nakazawa, Hiromichi Kaba, Toshihito Morioka, Takuya Sato
  • Publication number: 20240100712
    Abstract: A substrate cleaning device includes a chamber, a first processing part and a second processing part. The chamber forms a processing space including a first processing position and a second processing position. The first processing part performs a first process on a substrate disposed at the first processing position in the chamber. The second processing part performs a second process on the substrate disposed at the second processing position in the chamber. A main robot loads and unloads the substrate with respect to the substrate cleaning device by moving a hand holding the substrate. In addition, the main robot receives the substrate disposed at the first processing position by causing the hand to enter the processing space, transporting the substrate to the second processing position, and positioning the substrate.
    Type: Application
    Filed: September 14, 2023
    Publication date: March 28, 2024
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Nobuaki OKITA, Kazuki NAKAMURA, Yoshifumi OKADA
  • Patent number: 11938720
    Abstract: A printing apparatus for printing on printing media in a continuous business form. The apparatus includes a transport device, a detector for detecting a splice portion between the printing media transported by the transport device, a printing section for printing on the printing media transported by the transport device, a drying section for drying at a drying temperature the printing media printed in the printing section and transported by the transport device, and a controller for operating the transport device to reduce tension applied to the splice portion at least while the splice portion is located in the drying section.
    Type: Grant
    Filed: January 28, 2022
    Date of Patent: March 26, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Shoji Kakimoto, Mitsuru Tanemoto, Hideaki Onishi
  • Patent number: 11939179
    Abstract: The measured winding diameter values Ds1(d) corresponding to the conveying distance d are measured by measuring the diameter of the printing medium M wound on the unwinding roll 71 by the diameter sensor 77. The measured winding diameter values Ds1(d) are smoothed by the low-pass filter to extract the smoothed winding diameter values Ds_avg1(d). By calculating the value of the diameter based on the initial diameter value Do1, the thickness value Tm and the conveying distance of the printing medium M, the calculated winding diameter values Dc1(d) are calculated. An operation of calculating the difference Ddiff1(d) between the calculated winding diameter value Dc1(d) and the smoothed winding diameter value Ds_avg1(d) while compensating for the delay by the low-pass filter is performed whereby the differences Ddiff1(d) are calculated. The calculated winding diameter value Dc1(d) are corrected by the differences Ddiff1(d).
    Type: Grant
    Filed: February 9, 2021
    Date of Patent: March 26, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventor: Takashi Kamigiku
  • Patent number: 11938725
    Abstract: The N candidate timings Tc (I) from the first one to the N-th one which are arranged in chronological order with an interval of the cycle Cs in accordance with the transport speed V of the printing medium WP are set. When the I-th candidate timing Tc (I) is set outside the prohibition interval Pw with the (I?1)th output timing Td (I?1) as the starting point timing, the I-th candidate timing Tc (I) is determined as the I-th output timing Td (I). On the other hand, when the I-th candidate timing Tc (I) is set within the prohibition interval Pw with the (I?1)th output timing Td (I?1) as the starting point timing, a timing after the prohibition interval Pw is determined as the I-th output timing Td (I).
    Type: Grant
    Filed: January 28, 2022
    Date of Patent: March 26, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventor: Tomoyasu Okushima
  • Patent number: 11941105
    Abstract: Authentication information is acquired from a storage medium through near field communication in one authentication device. Whether the authentication information corresponds to one substrate processing apparatus at which the authentication device is provided is determined. In a case where the authentication information corresponds to the one substrate processing apparatus, access information is transmitted from the authentication device through near field communication. An instruction terminal receives the access information through near field communication. The instruction terminal accesses a maintenance instruction device based on the access information, whereby a maintenance screen is displayed on a display of the instruction terminal. The instruction terminal has an operation unit to be operated by a user in order to provide an instruction for performing a maintenance operation.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: March 26, 2024
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Shinichi Ogasawara, Shoji Kirita