Abstract: A learned model generating method includes: acquiring learning data; and generating a learned model for estimating a factor of an abnormality of a processing target substrate after processing using a processing fluid by performing machine learning of the learning data. The learning data includes a feature quantity and abnormality factor information. The abnormality factor information represents a factor of an abnormality of a learning target substrate after processing using the processing fluid. The feature quantity includes first feature quantity information representing a feature of a time transition of section data in time series data representing a physical quantity of an object used by a substrate processing device that processes the learning target substrate using the processing fluid. The first feature quantity information is represented using times.

Abstract: A silicon etching solution includes a mixed solution comprising a quaternary alkylammonium hydroxide and water and further comprises a compound represented by the following formula (1): R1O—(CmH2mO)n—R2??(1) wherein R1 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, R2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, m is an integer of 2 to 6, and n is 1 or 2.

Abstract: A data processing method includes a step of obtaining evaluated values of the time-series data by comparing the time-series data with reference data, a step of classifying the evaluated values into a plurality of levels, a step of displaying an evaluation result screen including a display area including a first graph showing an occurrence rate of each level of the evaluated values, the evaluation result screen including the display area with respect to each of the two or more processing units. A history screen displaying a history in which the evaluated values have been obtained and a trend screen including graphs showing temporal change in the evaluated values in addition to the evaluation result screen is hierarchically displayed. A mark is attached at a position corresponding to a processing result selected in the history screen in a graph in the trend screen.

Abstract: A substrate processing method that includes a processing liquid supplying step which supplies a processing liquid to a surface of a substrate, a processing film forming step in which the processing liquid on the surface of the substrate is solidified or cured to form a processing film that holds removal objects present on the surface of the substrate, and a removing step in which a removing liquid is supplied to the surface of the substrate to thereby remove the processing film from the surface of the substrate in a state that the removal objects are held by the processing film. The processing liquid contains a dissolution component which dissolves at least one of a front layer of the substrate and the removal objects as a dissolution object. The processing liquid supplying step includes a dissolution step which partially dissolves the dissolution object by the dissolution component in the processing liquid supplied to the surface of the substrate.

Abstract: Disclosed is a printing apparatus in which web paper is transported to a printing face contact roller in a swirling form while a direction thereof is turned by first to fourth turning rollers. Heating units are arranged so as to face a printing face of the web paper between the two first and second turning rollers, between the two third and fourth turning rollers, and between the fourth turning roller and the printing face contact roller individually. Such arrangement can achieve a compact drying mechanism. The heating units each directly heat inks on the printing face, and thus do not overheat the web paper. Moreover, the heating units are not directed upward. This avoids contact of the web paper to a front side face of each of the heating units when the web paper slackens.

Abstract: A substrate processing apparatus includes a substrate holding device, a brush arm, a plurality of brush devices, a brush storage device, and a brush liquid supply system. The tip portion of the brush arm is configured as a brush holder to which the brush device can be attached and detached. A substrate held by the substrate holding device is cleaned with the brush device. The brush storage device stores unprocessed brush devices. The used brush device is removed from the brush holder. An unprocessed brush device stored in the brush storage device is attached to the brush holder. The brush storage device is configured so that a cleaning surface of the stored brush device is maintained in a state of being wetted with a processing liquid supplied from the brush liquid supply system.

Abstract: A chuck pin includes a holding portion and a fixing portion and holds a substrate. The holding portion has an inner circumferential surface and an outer circumferential surface capable of abutting against the substrate. The inner circumferential surface of the holding portion is formed with a protruding portion that protrudes inward. The fixing portion includes a pressing portion, a pressed portion, and an urging portion, and detachably fixes the holding portion. The pressing portion has a side wall portion in which a first opening portion is formed. The pressed portion has a side wall portion in which a second opening portion is formed. The urging portion urges the pressing portion in a rotation direction with respect to the pressed portion. The protruding portion formed on the inner circumferential surface of the holding portion is sandwiched between the pressing portion and the pressed portion at the first and second opening portions.

Abstract: A substrate is held in a horizontal attitude by a substrate holder. At a processing position, a lower surface of the substrate held by the substrate holder is cleaned by a lower-surface brush. The lower-surface brush is cleaned by a brush cleaner at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below a processing position. The lower-surface brush is lifted and lowered by a lower-surface brush lifting-lowering driver between the processing position and the waiting position.

Abstract: A technique for making the amount of ink to be calculated appropriate in accordance with the amount of ink to be ejected from heads is provided. An inkjet printing apparatus includes a supply tank, a return tank, a first connecting pipe, a second connecting pipe, a head, a pressure-difference producer, an ejection-amount predictor, and a pressure controller. The first connecting pipe transfers ink in the supply tank to the return tank. The second connecting pipe returns ink in the return tank to the supply tank. The head is interposed in the first connecting pipe. The pressure-difference producer sends ink from the supply tank to the return tank through the first connecting pipe. The ejection-amount predictor predicts the amount of ink to be ejected at a time to come after the present time from the head.

Abstract: A substrate processing method is provided. The substrate processing method includes: (S7) supplying a water repellent agent (SMT) to a substrate (W); (S11) supplying dilute isopropyl alcohol (dIPA) to the substrate (W) after the supplying a water repellent agent (SMT), the dilute isopropyl alcohol (dIPA) being obtained by diluting isopropyl alcohol; and (S12) drying the substrate (W) after the supplying dilute isopropyl alcohol (dIPA).

Abstract: An image capturing apparatus includes a stage on which an object is placed, an image capturer, and a controller that relatively moves the stage within a predetermined plane with respect to the image capturer to move a unit image capturing region, and simultaneously causes the image capturer to perform image capturing a plurality of times. The image capturer includes a light source, an objective lens having an optical axis in a direction intersecting the predetermined plane, a multifocal diffractor that generates a plurality of rays of diffracted light including a ray of diffracted light of 0 order from incident light entering through the objective lens, the plurality of rays of diffracted light having focusing positions being different from each other, and an image capturing member that receives each of the plurality of rays of diffracted light in each of a plurality of segment regions defined in a light receiving surface.

Abstract: A substrate cleaning apparatus includes an upper holding device holding an outer peripheral end of a substrate, and a lower surface brush contacting a lower surface of the substrate to clean the lower surface. The lower surface brush moves between a contact position where the lower surface brush contacts the lower surface of the substrate held by the upper holding device and a separation position where the lower surface brush is separated from the substrate held by the upper holding device by a certain distance. At the separation position, the lower surface brush rotates at a first rotation speed. At the contact position, the lower surface brush rotates at a second rotation speed higher than the first rotation speed at a time point when the lower surface brush contacts the lower surface and a time point when the lower surface brush is separated from the lower surface.

Abstract: A printing system includes a coating device, a printing device, and a controller. The coating device applies a processing liquid to a base material by bringing a coating roller with the processing liquid adhering thereto into contact with the transported base material. The printing device performs printing on a surface of the base material to which the processing liquid has been applied. The controller includes a contact-start-position identifier, an inappropriate-printing-area setter, and a print controller. The contact-start-position identifier identifies a contact start position of the base material in which the coating roller and the base material start to come in contact with each other. The inappropriate-printing-area setter sets, as the inappropriate printing area, an area of the base material that has a predetermined length in a transport direction from the contact start position. The print controller stops the printing device from performing printing on the inappropriate printing area.

Abstract: The technique provided enables, when first ink is precured and second ink is ejected thereon, ensuring sufficient adhesion of the second ink via a primer. A printer includes a transport mechanism, a primer ejection head, a second light irradiator, a white-ink ejection head, a color-ink ejection head, and a controller. The controller controls the amount of primer ejected to a unit region of a continuous base material by the primer ejection head, the amount of white ink ejected thereto by the white-ink ejection head, and the amount of color ink ejected thereto by the color-ink ejection head. The controller determines a first primer amount based on the amount of white ink and determines a second primer amount based on the amount of color ink. The controller then determines an ultimate primer amount based on the sum of the first primer amount and the second primer amount.

Abstract: A vector acquisition method includes: inputting, into a learned model, at least one piece of text including at least two of a plurality of words obtained by dividing a compound, the compound being a word divisible into the plurality of words; outputting, from the learned model, an adjusted vector corresponding to at least one of the words obtained by dividing the compound in the input piece of text; and acquiring a compound vector corresponding to the compound using the adjusted vector output from the learned model. Classification accuracy of vectors corresponding to words can thereby be enhanced.

Abstract: A light diffusion plate made of quartz and provided with a plurality of recessed spherical surfaces is placed on an upper chamber window so as to be in opposed relation to a central portion of a semiconductor wafer. Flashes of light emitted from flash lamps and passing by the side of the light diffusion plate impinge upon a peripheral portion of the semiconductor wafer. On the other hand, flashes of light emitted from the flash lamps and entering the light diffusion plate are diverged by the recessed spherical surfaces. Part of the light entering the light diffusion plate is diffused toward the peripheral portion of the semiconductor wafer. As a result, this increases the amount of light impinging upon the peripheral portion of the semiconductor wafer, and decreases the amount of light impinging upon the central portion of the semiconductor wafer.

Abstract: An image display method according to this invention includes obtaining an image set including a plurality of stained images, the plurality of stained images being obtained by imaging a multiple immunostained tissue specimen, a registration processing being performed for mutual registration for the plurality of stained images, and switching and displaying the stained images included in the image set on a screen in accordance with a predetermined switch rule with a result of the registration processing reflected. An image includes at least one of the stained images and a graphical user interface for receiving an operation input from a user for editing the switch rule being displayed on the screen. The switch rule is changed and set according to the operation input. The image is displayed on the screen in accordance with the changed and set switch rule.

Abstract: A semiconductor wafer held by a holding part in a chamber is irradiated and heated with halogen light emitted from a plurality of halogen lamps. A cylindrical louver and an annular light-shielding member, both made of opaque quartz, are provided between the halogen lamps and the semiconductor wafer. The outer diameter of the light-shielding member is smaller than the inner diameter of the louver. Light emitted from the halogen lamps and passing through a clearance between the inner wall surface of the louver and the outer circumference of the light-shielding member is applied to a peripheral portion of the semiconductor wafer where a temperature drop is likely to occur. On the other hand, light travelling toward an overheat region that has a higher temperature than the other region and appears in the surface of the semiconductor wafer when only a louver is installed is blocked off by the light-shielding member.

Abstract: First and second concentration measurement parts (415, 425) are provided in first and second supply liquid lines (412, 422) in which first and second supply liquids flow, respectively. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second supply liquid lines, respective one ends of first and second branch lines (51, 52) are connected to respective positions on the upstream side of the concentration measurement parts. The other ends of the first and second branch lines are connected to a mixing part (57), and by mixing the first and second supply liquids, a processing liquid is generated. Respective flow rate adjustment parts (58) of the first and second branch lines are controlled on the basis of respective measured values of the first and second concentration measurement parts so that the dissolved concentration of the gas in the processing liquid can become a set value.

Abstract: A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step, and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.