Abstract: A differential transistor (10, 25) includes a depletion mode transistor (15,30) that has a source connected to a source of an enhancement mode transistor (11,26). The gates of the depletion mode and enhancement mode transistors are driven differentially.

Abstract: An automatic reel changer (10) for a tape-and-reel handler is formed to automatically insert a carrier tape (15) from the tape-and-reel handler into an empty receiving reel (80), wind the carrier tape (15) onto the receiving reel (80), and apply a securing device to keep the carrier tape (15) fixedly attached to the receiving reel (80). The automatic reel changer (10) then removes the full receiving reel (80) and replaces it with another empty receiving reel (81) and continues the process.

Abstract: An integrated circuit package (60) has a substrate (12) with a first surface (51) for mounting a semiconductor die (20) and a second surface (52) defining a via (70). A lead (26) is formed by plating a conductive material to project outwardly from the second surface. The conductive material extends from the lead through the first via for coupling to the semiconductor die.

Abstract: A lead frame with a plurality of bump terminals is provided. Stamping an indentation into each lead in the lead frame forms the bump terminals. The bump terminals will be used as contact points in a completed semiconductor device.

Abstract: A method of making a semiconductor device 10 by forming a first dielectric layer 140 on a substrate, etching through the first dielectric layer to form a trench 150 having a channel region 135 on a sidewall 160 of the trench, and laterally removing a portion of the first dielectric layer adjacent to the sidewall of the trench above the channel region for defining a source region 280 of the semiconductor device.

Abstract: A method of forming a leadframe (10) provides blocking fulcrums (21,23) adjacent to the leads (12,13,14, and 15). During the process of encapsulating the leadframe (10), the blocking fulcrums (21,23) restrict encapsulating material from exiting the mold cavity and from attaching to the leads (12,13,14, and 15).

Abstract: A power supply system includes a non-linear section that provides an intermediate voltage. A linear section receives the intermediate voltage and generates the output voltage. The linear section forms a control signal that is used by the non-linear section to change the value of the intermediate voltage as the output voltage changes to keep the differential voltage across the linear section low.

Abstract: In one embodiment, a bipolar cell (31) includes a cell boundary (32) that defines a cell active area (33), a first array of bipolar transistors (41) is formed within the cell active area (33) and configured for a first function. The bipolar transistors (42) within the first array (41) are parallel to each other. The bipolar cell (31) further includes a second array of bipolar transistors (61) formed within the cell active area (33) and configured for a second function that is different than the first function. The bipolar transistors (62) within the second array (61) are parallel to each other and oriented in a different direction than the transistors (42) in the first array (41).

Abstract: An multi-stage error amplifier (22) of a power management system (10) is formed to insert a zero to compensate for a high frequency pole that could cause unstable outputs at some output current levels. The error amplifier (22) includes a feed-forward block (40) that isolates the capacitor (36) from other signal paths to facilitate low noise and high efficiency operation.

Abstract: A method of forming medium breakdown voltage vertical transistors (11) and lateral transistors (12, 13) on the same substrate (14) provides for optimizing the epitaxial layer (16) for the lateral transistors (12, 13). The vertical transistor (11) is formed in a well (18) that has a lower resistivity than the epitaxial layer (16) to provide the required low on-resistance for the vertical power transistor (11).

Abstract: A method for forming a direct chip attach (DCA) device (1) includes attaching a chip (3) to a lead frame (2). Conductive studs (22) are attached to bonding pads (13) on the chip (3) and a flag (18) on lead frame (2). The chip (3) and flag (18) are enclosed with an encapsulating layer (4), and openings (6) are formed in an upper surface (7) to expose conductive studs (22). In one embodiment, a masking layer (51) is applied to the lead frame (2), and the structure is then placed in an electroless plating apparatus (61). While in the plating apparatus (61), an injection device (66) injects plating solution (71) towards the upper surface (7) and openings (6) to enhance the formation of barrier layers (24) on the conductive studs (22). Solder bumps (9) are then attached to barrier layers (24) through the openings (6).

Abstract: A semiconductor device (20) has a first leadframe (200) with a first semiconductor die (70) electrically coupled to one of its leads. A second semiconductor die (130) is mounted to a second leadframe (300) that has a first lead (35, 150) electrically coupled to the second semiconductor die and a second lead (30, 35) mounted to the lead of the first leadframe.

Abstract: A differential amplifier (10, 60) is formed to have a propagation delay that varied responsively to a control signal received on a differential control signal input. The propagation delay is varied by changing the bias current of a pair of differential input transistor (11, 13).

Abstract: A MOSFET device (50) has a trench (60) extending from a major surface (56) of the device (50). Within the trench (60), a gate structure (62) is formed where the top surface (64) is below the major surface (56). Source regions (66,68) are formed along a vertical wall (84) inside of the trench (60). The source regions (66,68) have a horizontal component along the major surface (56) and a vertical component extending the vertical wall (84). The majority of the source regions (66,68) are formed along the vertical wall (84) within the trench (60). A typical aspect ratio of the vertical length of the source regions (66,68) to the horizontal width is greater than 3:1. An Inter-layer dielectric (ILD) layer (74) is formed on the gate structure (62) within the trench (60) below the major surface (56).

Abstract: A semiconductor structure (1), comprising a isolation region (5) formed on a semiconductor material (10). A pillar (15) is formed in the semiconductor material under the isolation region, where the pillar is capped with a first dielectric material (20) to form a void (16).

Abstract: In one embodiment, a compound semiconductor vertical FET device (11) includes a first trench (29) formed in a body of semiconductor material (13), and a second trench (34) formed within the first trench (29) to define a channel region (61). A doped gate region (59) is then formed on the sidewalls and the bottom surface of the second trench (34). Source regions (26) are formed on opposite sides of the double trench structure (28). Localized gate contact regions (79) couple individual doped gate regions (59) together. Contacts (84, 85, 87) are then formed to the localized gate contact regions (79), the source regions (26), and an opposing surface (21) of the body of semiconductor material (13). The structure provides a compound semiconductor vertical FET device (11, 41, 711, 712, 811, 812) having enhanced blocking capability and improved switching performance.

Abstract: An integrated circuit (100) includes high performance complementary bipolar NPN and PNP vertical transistors (10, 20). The NPN transistor is formed on a semiconductor substrate whose surface (24) is doped to form a PNP base region (28, 70). A film (32, 34, 30) is formed on the surface with an opening (42) over an edge of the base region. A first conductive spacer (48) is formed along a first sidewall (78) of the opening to define a PNP emitter region (67) within the base region. A second conductive spacer (47) is formed along a second sidewall (76) of the opening to define a PNP collector region (66).

Abstract: A method of forming a power device (10) includes forming a power transistor (27) and a pull-down transistor (28) on a semiconductor die (36). The pull-down transistor (28) is enabled to rapidly and predictably disable the power transistor (27). The pull-down transistor (28) remains enabled for a first time period during the enabling of the power transistor (27) to facilitate rapidly and predictably enabling the power transistor (27).

Abstract: A method of making a semiconductor device (10) includes depositing a first conductive layer (50) on a first surface (41) to control a channel (70) of the semiconductor device at a second surface (40) perpendicular to the first surface. The method further includes etching a first dielectric film (32) to form a gap (53) between the first surface and a control electrode (68) of the semiconductor device, and depositing a conductive material (56) in the gap to electrically connect the first conductive layer to the control electrode.

Abstract: In a dual power supply, a main power supply is shut down by providing a signal from an auxiliary power supply. To generate the shutdown signal, a load is temporarily applied to the output of the auxiliary power supply for a predetermined time. The application of the load is detected using a hysteretic comparator in the auxiliary power supply that remains in a high state for a time period that exceeds a reference time period, which is established by a timer circuit. In response to exceeding the reference time period, the shutdown signal is sent to the main power supply.