Abstract: Transistor structures for a transistor may include a first source-drain region, a second source-drain region, and a channel region between the first and second source-drain regions overlapped by a gate structure. Transistor structures may be formed in a well of a first doping type. Isolation structures having the first doping type may be formed within the well. A lightly doped implant region of a second doping type for each of the source-drain regions may be formed within the well and separated from the isolation structures. A heavily doped surface implant region of the first doping type may extend across the surface of the well and cover the lightly doped implant region of each source-drain region. The surface implant region may be formed by patterning or by a blanket implantation process across the transistor structures.

Abstract: A semiconductor die includes a semiconductor device fabricated in a substrate. The substrate has a front side, a back side, and an inclined sidewall extending from the back side to the front side. A contact pad is connected to the semiconductor device. The contact pad is embedded in an inter dielectric layer (IDL) disposed in the front side. The contact pad has a contact pad edge with a surface aligned along the inclined sidewall. A redistribution layer (RDL) is disposed on the inclined sidewall. The RDL is physically and electrically connected to the contact pad directly through the surface of the contact pad edge aligned along the inclined sidewall.

Abstract: A package includes an optical sensor die. The optical sensor die has an optically active surface area (OASA) disposed on a front side of a substrate. A glass cover is disposed above the OASA and attached to the front side the substrate by a dam material. A through-substrate via (TSV) extends from an opening at a back side of the substrate toward a front side of the substrate. The TSV has a stepped bottom surface at the front side of the substrate. The TSV provides access for electrical connections between the back side of the substrate and the front side of the substrate.

Abstract: A package includes a semiconductor die attached to a substrate and a molded body encapsulating the semiconductor die. The molded body is a six-sided rectangular box-like structure and at least a corner portion of the molded body formed by two adjacent sides is devoid of molding material reducing a size and a weight of the molded body.

Abstract: An image sensor may be implemented using a stitched image sensor die. The stitched image sensor die may be formed from a step and repeat exposure process using a set of tiles in a reticle set. Multiple instantiations of a same circuitry block on a given tile may be patterned and formed on the image sensor die. The image sensor die may include circuitry configured to enable testing of one or more instantiations of the same circuitry block. The image sensor die may include memory circuitry for storing indications of a functional instantiation of the multiple instances and may use the functional instantiation for normal operation.

Abstract: An image sensor may include an image sensor pixel array, row control circuitry, and column readout circuitry. The array may include first and second sets of active pixels that are configured in different manners or controlled by the row control circuitry and column readout circuitry in different manners. The array may include optically black pixels that have photosensitive elements shield from incident light. The optically black pixels may be configured to generate first and second sets of black level signals adapted to both the first and second sets of active pixels. The corresponding sets of black level signals may be used to better reduce noise in corresponding sets of image signals generated by the first and second sets of active pixels.

Abstract: An imaging device may include single-photon avalanche diodes (SPADs). The single-photon avalanche diodes may be arranged in a one-dimensional or two-dimensional array in a SPAD-based semiconductor device. The SPAD-based semiconductor device may also include a transparent cover glass that is formed over the array of SPADs. Each line of SPADs within the SPAD-based semiconductor device may be covered by a respective light spreading lens. The light spreading lens may be formed as a groove in an upper surface of the transparent cover glass. The light spreading lens may have a uniform cross-section along its length. The light spreading lens may be formed as a convex lens on an upper or lower surface of the transparent cover glass.

Abstract: A semiconductor package may include a line array of single-photon avalanche diodes (SPADs). The line array of single-photon avalanche diodes may be split between multiple silicon dice. Each silicon die may be overlapped by at least one lens to focus light away from gaps between the dice and towards the single-photon avalanche diodes. There may be one single-photon avalanche diode for each silicon die or multiple single-photon avalanche diodes for each silicon die. When there are multiple single-photon avalanche diodes for each silicon die, lenses may be formed over only the edge single-photon avalanche diodes.

Abstract: Semiconductor devices made by forming hard mask pillars on a surface of a substrate, forming sacrificial spacers on a first side of each hard mask pillar and a second side of each hard mask pillar. The open gaps may be formed between adjacent sacrificial spacers. The semiconductor devices may also be formed by etching the hard mask pillars to form pillar gaps, etching gate trenches into the substrate through the open gaps and the pillar gaps, forming a gate electrode within the gate trenches, implanting channels and sources in the substrate below the sacrificial spacers, forming an insulator layer around the sacrificial spacers, etching the sacrificial spacers to form contact trenches within the substrate, and filling the contact trenches with a conductive material to form contacts.

Abstract: Provided herein is a digital communications bus suitable for automotive applications, along with bus controllers and sensors that use the bus and its associated communication methods. One illustrative sensor includes: a clock signal generator; a bus interface coupled to differential signal conductors to detect periodic synchronization pulses from a bus controller; and a controller that aligns a clock signal from the clock signal generator with the periodic synchronization pulses. The bus interface sends digital data between the periodic synchronization pulses to the bus controller using the clock signal to control symbol transitions.

Abstract: An imaging system may include a plurality of SPAD pixels. Each SPAD pixel may have a SPAD on a first die and reset, quench, and readout circuitry on a second die. The circuitry for a SPAD pixel on the second die may include stacked-transistor structures configured to operate in a high voltage domain and may include readout circuitry configured to operate in a low voltage domain. The stacked-transistor structures may include p-type transistors formed at a same n-type substrate well and sharing a same bulk connection. The stacked-transistor structures may also include n-type transistors formed at a same p-type substrate well and sharing a same bulk connection.

Abstract: In a general aspect, a method can include forming well region of one conductivity type in a semiconductor region of another conductivity type An interface between the well region and the semiconductor region can define a diode junction at a depth below an upper surface of the semiconductor region. The method can further include forming at least one dielectric region in the semiconductor region. A dielectric region of the at least one dielectric region can have an upper surface that is disposed in the well region at a depth in the semiconductor region that is above the depth of the diode junction; and a lower surface that is disposed in the semiconductor region at a depth in the semiconductor region that is the same depth as the diode junction or below the depth of the diode junction.

Abstract: In some aspects, the techniques described herein relate to a diode including: a substrate of a first conductivity type; a semiconductor layer of the first conductivity type disposed on the substrate, the semiconductor layer including a drift region; a shield region of a second conductivity type disposed in the semiconductor layer adjacent to the drift region; a surface region of the first conductivity type disposed in a first portion of the drift region adjacent to the shield region, the surface region having a doping concentration that is greater than a doping concentration of a second portion of the drift region adjacent to the surface region, the second portion of the drift region excluding the surface region; and a Schottky material disposed on: at least a portion of the shield region; the surface region in the first portion of the drift region; and the second portion of the drift region.

Abstract: A CMTI circuit includes a first detector that receives one or more output signals from an oscillator and a first enable signal and generates a first detection signal when the received output signals are determined to be substantially not oscillating at a first time. The CMTI circuit further includes a first activation signal generator that generates a first activation signal in response to the first detection signal to resume oscillation of the output signals.

Abstract: A semiconductor package may include a line array of single-photon avalanche diodes (SPADs). The line array of single-photon avalanche diodes may be split between multiple silicon dice. The silicon dice may have a staggered arrangement, with prisms on the package lid redirecting incident light to the silicon dice. The silicon dice may alternate between a first side of the package substrate and a second side of the package substrate. The prisms may alternate between a first structure that redirects incident light to the first side of the package substrate and a second structure that redirects incident light to the second side of the package substrate. The silicon dice may overlap to allow satisfactory alignment between the silicon dice and the prisms.

Abstract: According to an aspect, a method for fabricating an image sensor package to define a gap height includes coupling an image sensor die to a substrate, forming a plurality of pillar members on the image sensor die, dispensing a bonding material on the image sensor die, contacting a transparent member with the bonding material such that a height of the pillar members defines a gap height between an active region of the image sensor die and the transparent member, and curing the bonding material to couple the transparent member to the image sensor die.

Abstract: A multifaceted capillary that can be used in a wire-bonding machine to create a multi-segment wire-bond is disclosed. The multifaceted capillary is shaped to apply added pressure and thickness to an outer segment of the multi-segment wire-bond that is closest to the wire loop. The added pressure eliminates a gap under a heel portion of the multi-segment wire-bond and the added thickness increases a mechanical strength of the heel portion. As a result, a pull test of the multi-segment wire-bond may be higher than a single-segment wire-bond and the multi-segment wire-bond may resist cracking, lifting, or breaking.

Abstract: A sensor device coupled to a communication interface bus, the sensor device includes: a current source having a first terminal operable to receive a supply current, a second terminal operable to provide a supply current, and a control terminal, wherein an operating voltage is supplied by a current through the current source; a voltage clamp having a first terminal coupled to the second terminal of the current source, a second terminal coupled to a power supply terminal, and an output terminal operable to provide a current sense signal; and a control circuit having an input terminal coupled to the output terminal of the voltage clamp and an output terminal coupled to the control terminal of the current source operable to provide an adjustment signal responsive to the current sense signal, wherein the current source is configured to adjust the current through the current source responsive to the adjustment signal.

Abstract: Implementations of semiconductor packages may include: a semiconductor die having a first side and a second side; one or more bumps included on the first side of the wafer, the bumps comprising a first layer having a first metal and a second layer including a second metal. The first layer may have a first thickness and the second layer may have a second thickness. The semiconductor package may also have a mold compound encapsulating all the semiconductor die except for a face of the one or more bumps.

Abstract: Various embodiments of the present technology may provide methods and systems for position stabilization. The methods and systems for position stabilization may be integrated within an electronic device. An exemplary system may include a driver circuit responsive to a gyro sensor and a feedback signal from an actuator. The driver circuit may be configured to calibrate a gain applied to a drive signal based on the posture of the electronic device.