Patents Assigned to Showa Denko K.K.
  • Publication number: 20220230774
    Abstract: Provided are a transparent conducting film laminate to which a curl generated during a heating step and after the heating step can be controlled, and a method for processing the same. A transparent conducting film laminate comprises a transparent conducting film 20 and a carrier film 10 stacked thereon, wherein the transparent conducting film 20 comprises a transparent resin film 3, transparent conducting layer 4, and an overcoat layer 5 stacked in this order, the transparent resin film 3 having a thickness T1 of 5 to 25 ?m and being made of an amorphous cycloolefin-based resin, the carrier film 10 is releasably stacked on the other main face, the face opposite to the face having the transparent conducting layer 4, of the transparent resin film 3 with an adhesive agent layer 2 therebetween, and a protection film 1 has a thickness T2 which is 5 times or more of the thickness T1 of the transparent resin film 3 and is 150 ?m or less, and is made of polyester having an aromatic ring in its molecular backbone.
    Type: Application
    Filed: December 24, 2019
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Shigeru YAMAKI, Shuhei YONEDA
  • Publication number: 20220227697
    Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass% of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of acetonitrile and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of acetonitrile/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.
    Type: Application
    Filed: December 23, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
  • Publication number: 20220228273
    Abstract: A device for producing fluorine gas has a first flow path configured to send a fluid from the inside of an electrolytic cell through a mist removal unit configured to remove mist from the fluid to a fluorine gas selection unit and a second flow path configured to send the fluid from the inside of the electrolytic cell to the fluorine gas selection unit without passing through the mist removal unit and has a flow path switching unit configured to switch a flow path through which the fluid flows depending on the average particle size of the mist measured by an average particle size measurement unit. The second flow path has a clogging suppression mechanism configured to suppress clogging of the second flow path by the mist.
    Type: Application
    Filed: December 3, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Katsumi MIKAMI, Yohsuke FUKUCHI, Hiroshi KOBAYASHI
  • Publication number: 20220230888
    Abstract: A dry etching method which includes a dry etching step in which an etching gas containing a halogen fluoride, which is a compound of bromine or iodine and fluorine, is brought into contact with a member to be etched (12) having an etching object, which is an object to be etched by the etching gas, thereby etching the etching object without using plasma. The etching object contains at least one metal selected from among titanium, indium, and tin. Also disclosed is a production method for manufacturing a semiconductor element using the dry etching method as well as a cleaning method for cleaning an inner surface of a chamber of a semiconductor element manufacturing apparatus using the dry etching method.
    Type: Application
    Filed: February 8, 2021
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventor: Kazuma MATSUI
  • Publication number: 20220227691
    Abstract: A method for producing an alcohol by hydrating an olefin using a heteropolyacid catalyst is provided, in which an alcohol having high product purity can be stably produced over a long period of time. The method is for producing an alcohol by supplying a raw material mixture comprising water and an olefin having a carbon atom number of X, wherein X is an integer of 2 to 5, to a reactor and subjecting them to a hydration reaction in a gas phase using a solid acid catalyst on which a heteropolyacid or a salt thereof is supported to obtain a reaction product, wherein the content of an impurity olefin having a carbon atom number of Y, wherein Y is an integer of 2 to 6 and Y and X are different, contained in the raw material mixture is 700 mol ppm or less.
    Type: Application
    Filed: March 25, 2021
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Masafumi KOYANO, Toshihiro KIMURA, Gen INOUE
  • Publication number: 20220228272
    Abstract: A method for producing fluorine gas including electrolyzing an electrolyte in an electrolytic cell, measuring the current efficiency of fluorine gas production in the electrolyzing, and sending a fluid generated in the inside of the electrolytic cell in the electrolyzing the electrolyte, from the inside to the outside of the electrolytic cell through a flow path. In the sending, the flow path in which the fluid flows is switched in accordance with the current efficiency measured in the measuring the current efficiency, such that the fluid is sent to a first flow path that sends the fluid to a first outside when the current efficiency measured in the measuring the current efficiency is not less than a predetermined reference value, or the fluid is sent to a second flow path that sends the fluid to a second outside when the current efficiency is less than the predetermined reference value.
    Type: Application
    Filed: December 11, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Katsuaki TO, Yohsuke FUKUCHI, Hiroshi KOBAYASHI
  • Publication number: 20220226358
    Abstract: A mixture of inositol derivatives in which a sugar is bonded to inositol includes an inositol derivative (A10) in which total sugars bonded to one inositol molecule is 10 or more in terms of monosaccharide units. In addition, a mixture of inositol derivatives in which a sugar is bonded to inositol includes 5% by mass or more of an inositol derivative (A7), in which total sugars bonded to one inositol molecule is 7 or more in terms of monosaccharide units, with respect to a total amount of inositol derivatives (100% by mass).
    Type: Application
    Filed: April 6, 2022
    Publication date: July 21, 2022
    Applicant: Showa Denko K.K.
    Inventors: Ichiro FUJITA, Shinji YAMAKI, Yuko NAKAGAMI
  • Publication number: 20220227104
    Abstract: A laminate including a metallic base material, a first nickel-containing plating film layer formed on the metallic base material, a gold plating film layer formed on the first nickel-containing plating film layer, a second nickel-containing plating film layer formed on the gold plating film layer, and a nickel fluoride film layer formed on the second nickel-containing plating film layer. Also disclosed is a method for producing the laminate as well as a constituent member of a semiconductor production device including the laminate.
    Type: Application
    Filed: August 11, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Akira FURUYA, Tadaaki KOJIMA, Hiroshi SUZUKI, Fumiaki NAKA
  • Publication number: 20220227976
    Abstract: One embodiment of the present invention relates to a chloroprene copolymer latex, a method for producing a chloroprene copolymer latex, a chloroprene copolymer latex composition, and a molded article or dipped product of a chloroprene copolymer rubber. The chloroprene copolymer latex is a latex of a chloroprene copolymer including monomer units derived from 2-chloro-1,3-butadiene (chloroprene) and monomer units derived from 2-methyl-1,3-butadiene, wherein the tetrahydrofuran insoluble content in the chloroprene copolymer is 20% by mass or less, and the proportion of the monomer units derived from 2-methyl-1,3-butadiene is 10 to 27 mol % in the chloroprene copolymer.
    Type: Application
    Filed: October 23, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Shu KANEKO, Masahiro OGAWA, Akira SHIBUYA
  • Publication number: 20220228266
    Abstract: A laminate including a metallic base material, a nickel-containing plating film layer formed on the metallic base material, and a gold plating film layer formed on the nickel-containing plating film layer, in which pinholes in the gold plating film layer are sealed with a fluorinated passive film having a thickness of 8 nm or greater. Also disclosed is a constituent member of a semiconductor production device including the laminate and a method for producing the laminate.
    Type: Application
    Filed: September 11, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Akira FURUYA, Tadaaki KOJIMA, Hiroshi SUZUKI
  • Publication number: 20220228084
    Abstract: This method for producing a lubricating oil composition includes: a step of dissolving fullerenes in a base oil mainly composed of a multiply alkylated cyclopentane oil or an ionic liquid containing an imide as a negative ion to obtain a fullerene solution; and a step of producing fullerenes adduct by subjecting the above-described fullerene solution to a heat treatment in a non-oxidizing atmosphere.
    Type: Application
    Filed: April 23, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Ryuji MONDEN, Kunio KONDO
  • Publication number: 20220228018
    Abstract: To provide an aqueous composition for aqueous coating that contains a polymerized substance of a N-vinyl carboxylic acid amide and that dries efficiently when used to produce a coating substance. A composition for aqueous coating liquid, comprising at least a copolymer of a N-vinyl carboxylic acid amide monomer and a monomer of a salt of an unsaturated carboxylic acid, and water, in which the molar ratio between the N-vinyl carboxylic acid amide monomer and the monomer of a salt of an unsaturated carboxylic acid is 7.0:93.0 to 93.0:7.0, and the weight-average molecular weight of the copolymer is 15,000 to 2,500,000.
    Type: Application
    Filed: May 18, 2020
    Publication date: July 21, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Atsushi SUGAWARA, Jun KONISHI
  • Patent number: 11390949
    Abstract: A SiC chemical vapor deposition apparatus is provided, including: a furnace body inside of which a growth space is formed; and a mounting table which is positioned on a lower portion of the growth space and has a mounting surface on which a SiC wafer is mounted, in which the furnace body is separated into a plurality of members in a vertical direction substantially orthogonal to the mounting table, the plurality of members includes a first portion and a second portion, the first portion includes a protruding part that protrudes in an outer peripheral direction, the second portion includes a hook part on which the protruding part is hung, and the first portion and the second portion are connected to each other by hanging the hook part on the protruding part.
    Type: Grant
    Filed: November 29, 2019
    Date of Patent: July 19, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Yoshikazu Umeta, Hironori Atsumi
  • Publication number: 20220223397
    Abstract: A method for measuring the concentration of fluorine gas (F2) contained in a halogen fluoride-containing gas using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer, the method including, before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.
    Type: Application
    Filed: November 12, 2020
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventor: Atsushi SUZUKI
  • Publication number: 20220220063
    Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer including 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation, and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of methyl ethyl ketone and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product, wherein a mass ratio of methyl ethyl ketone/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.
    Type: Application
    Filed: December 23, 2020
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
  • Publication number: 20220219982
    Abstract: There is provided a method for producing high-purity bromine pentafluoride while leaving a less amount of an unreacted fluorine gas. The method for producing bromine pentafluoride includes a reaction step of feeding a bromine-containing compound, which is at least one of a bromine gas and bromine trifluoride, and a fluorine gas to a reactor to give a (fluorine atom):(bromine atom) molar ratio, that is, F/Br of 3.0 or more and 4.7 or less and reacting the bromine-containing compound and the fluorine gas to each other to obtain a reaction mixture containing bromine pentafluoride and bromine trifluoride; and a separation step of separating bromine pentafluoride and bromine trifluoride in the reaction mixture from each other.
    Type: Application
    Filed: September 10, 2020
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventor: Kazuma MATSUI
  • Publication number: 20220223482
    Abstract: A SiC epitaxial wafer including a high-concentration epitaxial layer having an impurity concentration of 1×1018 cm?3 or more, and the number or positions of basal plane dislocations included in the high-concentration epitaxial layer have been identified
    Type: Application
    Filed: March 29, 2022
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshitaka Nishihara, Koji Kamei
  • Publication number: 20220221790
    Abstract: A highly-sensitive photosensitive resin composition contains a coloring agent, and can inhibit a coating from coming off in a development step. The photosensitive resin composition according to an embodiment of the present invention contains a binder resin (A), a compound (B) having a triazine ring and represented by formula (1), a radiation-sensitive compound (C), and a coloring agent (D) selected from the group consisting of black dyes and black pigments. In formula (1), R1, R2, and R3 each independently represent a hydroxy group, an alkyl group having 1-5 carbon atoms, an alkenyl group having 2-6 carbon atoms, an alkenyl ether group having 2-6 carbon atoms, an optionally substituted amino group, a halogenated alkyl group, a sulfide group, a mercapto group, a phenyl group, a phenyl ether group, a halogeno group, a naphthyl group, a pyridyl group, a biphenyl group, a morpholino group, a fluorene group, or a carbazole group.
    Type: Application
    Filed: January 30, 2020
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventor: Yoshikazu ARAI
  • Publication number: 20220220064
    Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of toluene and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of toluene/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.
    Type: Application
    Filed: December 23, 2020
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
  • Publication number: 20220220387
    Abstract: Provided is impregnated pitch having a high fixed carbon content despite being petroleum-based pitch. The method for producing impregnated pitch for graphite electrode production according to one embodiment includes heat treatment of ethylene bottom oil and distillation of the heat-treated product to remove low-boiling-point compounds.
    Type: Application
    Filed: January 21, 2021
    Publication date: July 14, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Nobuhiro NISHI, Keisuke OTA, Yoshikuni OKUMURA