Patents Assigned to STMicroelectronic S.A.
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Patent number: 8878790Abstract: A microelectronic pressure sensor comprises a MOSFET transistor adapted with a mobile gate and a cavity between the mobile gate and a substrate. The sensor includes a gate actuator configured to move mobile gate in response to a pressure being exercised. A fingerprint recognition system includes a matrix of such sensors.Type: GrantFiled: July 10, 2008Date of Patent: November 4, 2014Assignee: STMicroelectronics S.A.Inventor: Nicolas Abele
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Publication number: 20140325181Abstract: A reconfigurable hierarchical computer architecture having N levels, where N is an integer value greater than one, wherein said N levels include a first level including a first computation block including a first data input, a first data output and a plurality of computing nodes interconnected by a first connecting mechanism, each computing node including an input port, a functional unit and an output port, the first connecting mechanism capable of connecting each output port to the input port of each other computing node; and a second level including a second computation block including a second data input, a second data output and a plurality of the first computation blocks interconnected by a second connecting means for selectively connecting the first data output of each of the first computation blocks and the second data input to each of the first data inputs and for selectively connecting each of the first data outputs to the second data output.Type: ApplicationFiled: July 11, 2014Publication date: October 30, 2014Applicant: STMicroelectronics S.A.Inventor: Joël Cambonie
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Patent number: 8867696Abstract: A fractional frequency divider including a frequency division unit for generating a reduced frequency timing signal having j pulses for every k pulses of an original timing signal, wherein j and k are each integers; and phase correction circuitry adapted to selectively shift each jth pulse of the reduced frequency timing signal by a first fixed time period.Type: GrantFiled: June 29, 2011Date of Patent: October 21, 2014Assignees: STMicroelectronics S.A., STMicroelectronics (Grenoble 2) SAS, Centre National de la Recherche ScientifiqueInventors: Nicolas Regimbal, Franck Badets, Yann Deval, Jean-Baptiste Begueret
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Patent number: 8867264Abstract: A device and a method for controlling an SRAM-type device, including: a bistable circuit and two switching circuits respectively connecting two access terminals of the bistable circuit to two complementary bit lines in a first direction, each switching circuit including a first switch and a second switch in series between one of the bit lines and one of the access terminals, the control terminal of the second switch being connected to a word control line in the first direction; and a third switch between the midpoint of the series connection and a terminal of application of a reference potential, a control terminal of the third switch being connected to the other one of the access terminals.Type: GrantFiled: February 14, 2011Date of Patent: October 21, 2014Assignees: STMicroelectronics S.A., STMicroelectronics (Crolles 2) SASInventors: Fady Abouzeid, Sylvain Clerc
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Patent number: 8847275Abstract: The component incorporates, in topological terms, a scalable number of triac structures in a concentric annular arrangement. The component can be used with an electronic device to protect against electrostatic discharges. For example, the components can be used to protect the input/output pad, the first power supply terminal, and the second power supply terminal of an integrated circuit against electrostatic discharges.Type: GrantFiled: March 12, 2013Date of Patent: September 30, 2014Assignee: STMicroelectronics S.A.Inventors: Jean Jimenez, Philippe Galy, Boris Heitz
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Publication number: 20140246723Abstract: A method for manufacturing a fin MOS transistor from an SOI-type structure including a semiconductor layer on a silicon oxide layer coating a semiconductor support, this method including the steps of: a) forming, from the surface of the semiconductor layer, at least one trench delimiting at least one fin in the semiconductor layer and extending all the way to the surface of the semiconductor support; b) etching the sides of a portion of the silicon oxide layer located under the fin to form at least one recess under the fin; and c) filling the recess with a material selectively etchable over silicon oxide.Type: ApplicationFiled: February 28, 2014Publication date: September 4, 2014Applicants: Commissariat à I'Énergie Atomique et aux Énergies Alternatives, STMicroelectronics S.A.Inventors: YVES MORAND, Romain Wacquez, Laurent Grenouillet, Yannick Le Tiec, Maud Vinet
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Patent number: 8822332Abstract: A method for forming gate, source, and drain contacts on a MOS transistor having an insulated gate including polysilicon covered with a metal gate silicide, this gate being surrounded with at least one spacer made of a first insulating material, the method including the steps of a) covering the structure with a second insulating material and leveling the second insulating material to reach the gate silicide; b) oxidizing the gate so that the gate silicide buries and covers the a silicon oxide; c) selectively removing the second insulating material; and d) covering the structure with a first conductive material and leveling the first conductive material all the way to a lower level at the top of the spacer.Type: GrantFiled: April 26, 2013Date of Patent: September 2, 2014Assignees: STMicroelectronics S.A., Commissariat à l'Énergie Atomique et aux Énergies AlternativesInventors: Heimanu Niebojewski, Yves Morand, Cyrille Le Royer, Fabrice Nemouchi
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Publication number: 20140233671Abstract: A device for generating a signal, including: a balun; and a circuit capable of summing up, on a first access terminal of the balun, currents representative of signals received on first input terminals of the device, and on a second access terminal of the balun, currents representative of signals received on second input terminals of the device.Type: ApplicationFiled: February 11, 2014Publication date: August 21, 2014Applicants: Institut Polytechnique de Bordeaux, STMicroelectronics S.A.Inventors: DIDIER BELOT, Yann Deval, Francois Rivet
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Publication number: 20140235186Abstract: A method for generating a radio frequency signal, wherein a signal to be transmitted is decomposed into a weighted sum of periodic basic signals of different frequencies.Type: ApplicationFiled: February 11, 2014Publication date: August 21, 2014Applicants: Institut Polytechnique de Bordeaux, STMicroelectronics S.A.Inventors: Didier Belot, Yann Deval, Francois Rivet
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Patent number: 8804300Abstract: A pump having: a cavity formed inside an insulating substrate, the upper part of the substrate being situated near the cavity having an edge; a conductive layer covering the inside of the cavity up to the edge and optionally covering the edge itself; a flexible membrane made of a conductive material placed above the cavity and resting against the edge; a dielectric layer covering the conductive layer or the membrane whereby insulating the portions of the conductive layer and of the membrane that are near one another; at least one aeration line formed in the insulating substrate that opens into the cavity via an opening in the conductive layer, and; terminals for applying a voltage between the conductive layer and the membrane.Type: GrantFiled: March 30, 2012Date of Patent: August 12, 2014Assignee: STMicroelectronics S.A.Inventor: Guillaume Bouche
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Publication number: 20140217520Abstract: A MOS transistor including, above a gate insulator, a conductive gate stack having a height, a length, and a width, this stack having a lower portion close to the gate insulator and an upper portion, wherein the stack has a first length in its lower portion, and a second length shorter than the first length in its upper portion.Type: ApplicationFiled: January 31, 2014Publication date: August 7, 2014Applicants: STMicroelectronics S.A., Commissariat à I'Énergie Atomique et aux Énergies Alternatives, STMicroelectronics (Crolles 2) SASInventors: Heimanu Niebojewski, Yves Morand, Cyrille Le Royer
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Patent number: 8799623Abstract: A reconfigurable hierarchical computer architecture having N levels, where N is an integer value greater than one, wherein said N levels include a first level including a first computation block including a first data input, a first data output and a plurality of computing nodes interconnected by a first connecting mechanism, each computing node including an input port, a functional unit and an output port, the first connecting mechanism capable of connecting each output port to the input port of each other computing node; and a second level including a second computation block including a second data input, a second data output and a plurality of the first computation blocks interconnected by a second connecting means for selectively connecting the first data output of each of the first computation blocks and the second data input to each of the first data inputs and for selectively connecting each of the first data outputs to the second data output.Type: GrantFiled: December 22, 2006Date of Patent: August 5, 2014Assignee: STMicroelectronics S.A.Inventor: Joël Cambonie
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Patent number: 8786708Abstract: A method for characterizing image sensor pixels arranged in an array, including the steps of: (a) illuminating a first portion of the array formed of pixels associated with a color filter of a first color; (b) measuring the detection performed by a central pixel of the first portion; (c) illuminating a second portion of the array formed of a central pixel associated with a color filter of a second color and of peripheral pixels associated with a color filter of the first color; (d) measuring the detection performed by the central pixel and the peripheral pixels of the second portion; (e) comparing the measurements of steps (b) and (d).Type: GrantFiled: November 28, 2011Date of Patent: July 22, 2014Assignee: STMicroelectronics S.A.Inventors: Jérôme Vaillant, Thomas Decroux, Clémence Mornet
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Patent number: 8782367Abstract: A circuit for controlling the access to at least one area of a memory accessible by a program execution unit, including a first instruction address input; at least one second data address input, the addresses coming from the execution unit; at least one function of correlation of these addresses; and at least one output of a bit for validating the fulfilling of conditions set by the correlation function.Type: GrantFiled: December 18, 2007Date of Patent: July 15, 2014Assignee: STMicroelectronics S.A.Inventors: Stéphan Courcambeck, Albert Martinez, Jean Nicolai, William Orlando
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Patent number: 8775697Abstract: A method and a circuit for checking data transferred between a circuit and a processing unit, in which: the data originating from the circuit transit through a first buffer element having a size which is a multiple of the size of data to be subsequently delivered over a bus of the processing unit; an address provided by the processing unit for the circuit is temporarily stored in a second element; and the content of the first element is compared with current data originating from the circuit, at least when they correspond to an address of data already present in this first element.Type: GrantFiled: October 18, 2008Date of Patent: July 8, 2014Assignees: Proton World International N.V., STMicroelectronics S.A.Inventors: Fabrice Romain, Jean-Louis Modave
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Publication number: 20140183685Abstract: An image sensor arranged inside and on top of a semiconductor substrate, having a plurality of pixels, each including: a photosensitive area, a read area, and a storage area extending between the photosensitive area and the read area; at least one first insulated vertical electrode extending in the substrate between the photosensitive area and the storage area; and at least one second insulated vertical electrode extending in the substrate between the storage area and the read area.Type: ApplicationFiled: December 30, 2013Publication date: July 3, 2014Applicants: Commissariat à I'Énergie Atomique et aux Énergies Atlernatives, STMicroelectronics S.A.Inventors: François Roy, Yvon Cazaux
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Patent number: 8759174Abstract: A method of fabricating a device, including the steps of forming a first silicon oxide layer within a first region of the device and a second silicon oxide layer within a second region of the device, implanting doping ions of a first type into the first region, implanting doping ions of a second type into the second region, and etching the first and second regions for a determined duration such that the first silicon oxide layer is removed and at least a part of the second silicon oxide layer remains.Type: GrantFiled: September 15, 2009Date of Patent: June 24, 2014Assignees: STMicroelectronics (Crolles 2) SAS, STMicroelectronics S.A., NXP B.V.Inventors: Markus Müller, Alexandre Mondot, Pascal Besson
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Patent number: 8759898Abstract: A non-volatile memory including at least first and second memory cells each including a storage MOS transistor with dual gates and an insulation layer provided between the two gates. The insulation layer of the storage transistor of the second memory cell includes at least one portion that is less insulating than the insulation layer of the storage transistor of the first memory cell.Type: GrantFiled: May 12, 2009Date of Patent: June 24, 2014Assignee: STMicroelectronics S.A.Inventor: Pascal Fornara
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Publication number: 20140167116Abstract: The present disclosure is directed to a method that includes exposing a surface of a silicon substrate in a first region between first and second isolation trenches, etching the silicon substrate in the first region to form a recess between the first and second isolation trenches,=; and forming a base of a heterojunction bipolar transistor by selective epitaxial growth of a film comprising SiGe in the recess.Type: ApplicationFiled: December 12, 2013Publication date: June 19, 2014Applicant: STMicroelectronics S.A.Inventors: Pascal Chevalier, Didier Celi, Jean-Pierre Blanc, Alain Chantre
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Publication number: 20140170834Abstract: A method for manufacturing a hybrid SOI/bulk substrate, including the steps of starting from an SOI wafer comprising a single-crystal semiconductor layer called SOI layer, on an insulating layer, on a single-crystal semiconductor substrate; depositing on the SOI layer at least one masking layer and forming openings crossing the masking layer, the SOI layer, and the insulating layer, to reach the substrate; growing by a repeated alternation of selective epitaxy and partial etching steps a semiconductor material; and etching insulating trenches surrounding said openings filled with semiconductor material, while encroaching inwards over the periphery of the openings.Type: ApplicationFiled: December 12, 2013Publication date: June 19, 2014Applicants: STMicroelectronics (Crolles 2) SAS, Commissariat à l'Énergie Atomique et aux Énergies Alternatives, STMicroelectronics, Inc., STMicroelectronics S.A.Inventors: Claire Fenouillet-Beranger, Stephane Denorme, Nicolas Loubet, Qing Liu, Emmanuel Richard, Pierre Perreau