Patents Assigned to Tokuyama Corporation
  • CRUSHED POLYCRYSTALLINE SILICON LUMPS AND METHOD FOR PRODUCING SAME
    Publication number: 20230294996
    Abstract: A polycrystalline silicon crushed lump has a surface metal concentration of 15.0 pptw or less, in which a copper concentration is 0.30 pptw or less in the surface metal concentration, and a total concentration of iron and zinc is 2.00 pptw or less in the surface metal concentration, and preferably an iron concentration is 1.25 pptw or less, and a zinc concentration is 0.75 pptw or less.
    Type: Application
    Filed: August 26, 2021
    Publication date: September 21, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Manabu Sakida, Shinichiro Koyanagi
  • SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICE AND METHOD FOR PROCESSING SILICON SUBSTRATE, EACH USING SAID ETCHING LIQUID
    Publication number: 20230295499
    Abstract: A silicon etching liquid which is characterized by containing a quaternary ammonium hydroxide represented by formula (1), a quaternary ammonium salt represented by formula (2) and water, and which is also characterized in that the concentration of the quaternary ammonium salt represented by formula (2) is more than 1% by mass but not more than 50% by mass. (1): R1R2R3R4N+·OH? (In formula (1), R1, R2, R3 and R4 may be the same groups or different groups, and each represents an optionally substituted alkyl group, aryl group or a benzyl group.) (2): R5R6R7R8N+·X? (In formula (2), R5, R6, R7 and R8 may be the same groups or different groups, and each represents an optionally substituted alkyl group having from 1 to 16 carbon atoms; and X represents BF4, a fluorine atom, a chlorine atom or a bromine atom.
    Type: Application
    Filed: July 29, 2021
    Publication date: September 21, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Yoshiki SEIKE, Manami OSHIO, Seiji TONO
  • COMPOUND FOR OPTICAL MATERIALS, CURABLE COMPOSITION, CURED BODY, AND OPTICAL ARTICLE
    Publication number: 20230286912
    Abstract: The present invention provides a novel compound for optical materials, and a curable composition, a cured body and an optical article containing the compound for optical materials. According to an embodiment, there is provided a compound for optical materials represented by Formula (Ia) below: In Formula (Ia), X1 and X2 are each NH, S, or O. R1 is a 1- to 30-valent organic residue. R3 is a group composed of a polymer having a repeating unit selected from the group consisting of —(CH2)mO—, —(CH2CH2O)—, —(CH(CH3)CH2O)—, —(CH2CH(CH3)O)—, — (C(?O)—CH2CH2CH2CH2CH2O)—, —(C(?O)—O—CH2CH2CH2CH2CH2O)—, and —(C(?O)—O—CH2CH2CH2CH2CH2CH2O)—, a random copolymer having at least two repeating units selected from the group, or a block copolymer having at least two repeating units selected from the group.
    Type: Application
    Filed: May 25, 2021
    Publication date: September 14, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Takao NOGUCHI, Katsuhiro MORI, Junji MOMODA
  • LAMINATE FOR CIRCUIT BOARD
    Publication number: 20230292433
    Abstract: The laminate for a circuit board of the present invention is a laminate including a metal nitride sintered board and a copper sheet, and the laminate has a size with a minimum length from a center of a plane to a peripheral edge of 50 mm or more, and has a void ratio X of 0.50% or less, which is a ratio of a total length LB of voids having a diameter of 1 µm or more confirmed in the vicinity of a bonding interface of the metal nitride sintered board and the copper sheet with respect to a measured length LI of the bonding interface, measured on a cut cross section obtained by cutting the laminate in a lamination direction. According to the present invention, a laminate that is excellent in heat radiation capability, has a feature that an etching solution used in patterning is difficult to remain at the bonding interface, and is excellent in reliability as a product can be provided.
    Type: Application
    Filed: July 30, 2021
    Publication date: September 14, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Eiki TSUSHIMA, Ryuji ISHIMOTO, Masakatsu MAEDA
  • SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICE AND METHOD FOR PROCESSING SILICON SUBSTRATE, EACH USING SAID ETCHING LIQUID
    Publication number: 20230287270
    Abstract: A silicon etching liquid which contains a quaternary ammonium hydroxide represented by formula (1), a quaternary ammonium iodide represented by formula (2), and water. (1): R11R12R13R14N+·OH? (In formula (1), each of R11, R12, R13 and R14 independently represents an aryl group, a benzyl group or an alkyl group having from 1 to 16 carbon atoms; and the alkyl group, the aryl group or the benzyl group may have a hydroxyl group.) (2): R21R22R23R24N+·I? (In formula (2), R21, R22, R23 and R24 may be the same groups or different groups, and each represents an optionally substituted aryl group, benzyl group or alkyl group having from 1 to 10 carbon atoms.
    Type: Application
    Filed: July 29, 2021
    Publication date: September 14, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Yoshiki SEIKE, Manami OSHIO, Seiji TONO
  • PHOTOCHROMIC COMPOUND, PHOTOCHROMIC CURABLE COMPOSITION, CURED BODY, LENS AND EYEGLASSES
    Publication number: 20230280500
    Abstract: The present invention aims to provide a photochromic compound capable of exhibiting photochromic properties regardless of matrix, and the compound is stably dispersed without aggregation in a process of molding (curing) an optical base material. According to the present invention, a polymer photochromic compound, which has a block polymeric group of an oligomeric chain group having relatively favorable compatibility with a solid matrix and an oligomeric chain group having poor compatibility with a solid matrix, forms a nano- to micro-phase separation structure in a solid matrix. The compound does not rely on the solid matrix, its dispersibility is improved and aggregation is prevented or reduced, whereby excellent photochromic properties can be exhibited.
    Type: Application
    Filed: August 4, 2021
    Publication date: September 7, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Masayuki MIYAZAKI, Katsuhiro MORI, Junji MOMODA
  • ADHESIVE COMPOSITION, LAMINATE AND OPTICAL ARTICLE COMPRISING THE LAMINATE
    Publication number: 20230272252
    Abstract: To provide an adhesive composition capable of firmly bonding polymer sheets together, comprising: (I) 100 parts by mass of an end-unreactive urethane urea resin; and (III) 4.0 to 20 parts by mass of a polyisocyanate compound having at least two isocyanate groups in the molecule, wherein the polyisocyanate compound (III) contains (IIIA) a polyisocyanate compound having an isocyanate group bonded to secondary carbon and (IIIB) a polyisocyanate compound having 4 to 30 carbon atoms in the molecule other than the component (IIIA), and the amount of the component (IIIB) is 10 to 500 parts by mass based on 100 parts by mass of the component (IIIA).
    Type: Application
    Filed: April 18, 2023
    Publication date: August 31, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Katsuhiro MORI, Toshimitsu HIRAREN, Junji MOMODA
  • Method and apparatus for producing halogen oxyacid solution
    Patent number: 11738997
    Abstract: The present invention provides industrially advantageous production method and production apparatus, with respect to production of a halogen oxyacid solution. There is solved by a method for producing a halogen oxyacid solution, comprising continuously supplying an organic alkaline solution and halogen to a static mixer and mixing them, to thereby continuously obtain a halogen oxyacid generated.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: August 29, 2023
    Assignee: TOKUYAMA CORPORATION
    Inventors: Takayuki Negishi, Takafumi Shimoda, Akihiro Saito, Naoki Matsuda, Kenichi Kakizono, Takeshi Kawano, Masayuki Moriwaki
  • POLYFUNCTIONAL QUATERNARY AMMONIUM SALT OF SULFONIC ACID HAVING ACTIVE-HYDROGEN GROUPS
    Publication number: 20230265053
    Abstract: The polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt of the present invention is a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt having at least two active hydrogen groups in a molecule, and the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt has a quaternary ammonium salt skeleton of the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that includes an imidazole skeleton. According to the present invention, a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that is excellent in solubility and dispersibility in a polyurethane (urea) resin raw material, and a high effect of the hydrophilization of a polyurethane (urea) resin can be provided.
    Type: Application
    Filed: May 27, 2021
    Publication date: August 24, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Yasutomo SHIMIZU, Takayoshi KAWASAKI
  • CURABLE COMPOSITION AND CURED BODY OF SAME
    Publication number: 20230260669
    Abstract: The present invention provides: a curable composition which contains a bismuth compound, wherein a phosphoric acid ester having a (meth)acryloyl group is bonded to bismuth, and a nitrile compound having a radically polymerizable carbon-carbon double bond; a cured body which is obtained by curing this curable composition; a multilayer body which is composed of the above-described cured body and a cured body that is obtained by curing a photochromic curable composition; and a radiation protective material which is formed of the above-described cured body or the above-described multilayer body.
    Type: Application
    Filed: July 13, 2021
    Publication date: August 17, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Takayoshi Kawasaki, Junji Takenaka, Junji Momoda
  • TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRODUCING THE SAME
    Publication number: 20230257887
    Abstract: Provided is a treatment liquid for a semiconductor with ruthenium, containing a hypobromite ion. Also provided is a treatment liquid for a semiconductor with ruthenium, containing at least a bromine-containing compound, an oxidizing agent, a basic compound, and water which are added and mixed, wherein the liquid has the bromine-containing compound added in an amount of 0.01 mass % or more and less than 2 mass % as a bromine element content with respect to the total mass of the liquid, has the oxidizing agent added in an amount of 0.1 mass % or more and 10 mass % or less with respect to the total mass, and has a pH of 8 or more and 14 or less. Further provided is a method of producing a treatment liquid for a semiconductor with ruthenium, including a step of mixing a bromine-containing compound with a solution containing a hypochlorous acid compound and a basic compound.
    Type: Application
    Filed: April 26, 2023
    Publication date: August 17, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Tomoaki SATO, Yuki KIKKAWA, Takafumi SHIMODA, Takayuki NEGISHI
  • PHOTOCHROMIC HYDROXYURETHANE COMPOUND
    Publication number: 20230242809
    Abstract: A photochromic hydroxyurethane compound of the present invention is characterized in that, on condition of having at least one photochromic moiety as the photochromic minimal unit in a molecule, it has a hydroxyurethane constitutional unit represented by Formula (1): —X—O—CO—NH—??(1) In the formula, X is an oxygen-containing chain organic group having a hydroxyl group as a substituent, or a hydrogen atom in the hydroxyl group is substituted by any one of (A): a photochromic group having the photochromic moiety; (B): a polymerization reactive group having a polymerizable substituent; (C) an alkyl group having 1 to 10 carbon atoms; (D) a cycloalkyl group having 3 to 10 carbon atoms; or (E): an aryl group having 6 to 14 carbon atoms (each of the groups (C)-(E) can be bonded to an oxygen atom derived from the hydroxyl group via the oxygen-containing chain organic group).
    Type: Application
    Filed: October 9, 2020
    Publication date: August 3, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Masayuki MIYAZAKI, Junji TAKENAKA, Junji MOMODA, Katsuhiro MORI
  • PHOTOCHROMIC COMPOUND AND CURABLE COMPOSITION CONTAINING THE PHOTOCHROMIC COMPOUND
    Publication number: 20230242808
    Abstract: A photochromic compound of the present invention comprises at least two monovalent photochromic basic structure groups PC including a T-type photochromic moiety, the photochromic basic structure groups being bonded to an organic group having a non-SO aromatic ring containing neither a sulfur atom nor an oxygen atom.
    Type: Application
    Filed: October 14, 2020
    Publication date: August 3, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Masayuki MIYAZAKI, Junji TAKENAKA, Srinivas VENU, Junji MOMODA, Katsuhiro MORI
  • METHOD FOR PURIFYING ORGANIC COMPOUND AND METHOD FOR PRODUCING ORGANIC COMPOUND
    Publication number: 20230234975
    Abstract: The present invention provides a method for purifying an organic compound, by which an organic compound having a reduced lead content is obtained from an organic compound that contains a lead component as an impurity. In this method for purifying an organic compound, the organic compound that contains a lead component is irradiated with ultraviolet light, and the lead component is subsequently removed from the organic compound. The present invention also provides a method for producing an organic compound, said method comprising purification of the organic compound by means of the above-described method for purifying an organic compound.
    Type: Application
    Filed: May 12, 2021
    Publication date: July 27, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Shota Honda, Takashi Nishiyama, Takenori Isomura
  • METHOD FOR WASHING ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE, METHOD FOR PRODUCING ALUMINUM NITRIDE SINGLE CRYSTAL LAYERED BODY, AND METHOD FOR PRODUCING ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE, AND ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE
    Publication number: 20230227997
    Abstract: A method for washing an aluminum nitride single crystal substrate, the aluminum nitride single crystal substrate including: an aluminum-polar face; and a nitrogen-polar face opposite to the aluminum-polar face, the method including: (a) scrubbing a surface of the nitrogen-polar face.
    Type: Application
    Filed: August 4, 2021
    Publication date: July 20, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Masayuki FUKUDA, Hiroshi FURUYA
  • LAMINATED POLISHING PAD
    Publication number: 20230211454
    Abstract: The CMP laminated polishing pad of the present invention includes at least a polishing layer and an under layer, wherein the under layer contains a resin obtained by polymerizing a polymerizable composition containing: (A) a polyrotaxane monomer having at least two polymerizable functional groups in a molecule; and (B) a polymerizable monomer other than the polyrotaxane monomer having at least two polymerizable functional groups in a molecule. According to the present invention, a polishing pad having not only good wear resistance but also excellent polishing characteristics (high polishing rate, low scratch property, and high flatness) can be provided.
    Type: Application
    Filed: May 27, 2021
    Publication date: July 6, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Yasutomo SHIMIZU, Takayoshi KAWASAKI, Junji MOMODA, Mitsuki TOCHI
  • HOLLOW MICROBALLOONS
    Publication number: 20230203234
    Abstract: The hollow microballoons of the invention are hollow microballoons formed of a resin produced by polymerizing a polymerizing composition that contains a polyrotaxane monomer having at least two polymerizable functional groups in the molecule and a polymerizable monomer other than the polyrotaxane monomer having at least two polymerizable functional groups in the molecule. Using the hollow microballoons of the invention, a CMP polishing pad having excellent polishing characteristics and durability can be provided.
    Type: Application
    Filed: March 31, 2021
    Publication date: June 29, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Yasutomo SHIMIZU, Takayoshi KAWASAKI
  • TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM
    Publication number: 20230207329
    Abstract: Provided is a treatment liquid for a semiconductor with ruthenium including a ligand which coordinates to ruthenium, the treatment liquid is a treatment liquid for inhibiting a ruthenium-containing gas generated when contacting a semiconductor wafer including ruthenium with the treatment liquid in a semiconductor forming process. Also provided is an inhibitor for the generation of a ruthenium-containing gas, including a compound having a carbonyl group or a heterocyclic compound. Further provided is a treatment agent for a ruthenium-containing waste liquid, including a compound having a carbonyl group or a heterocyclic compound.
    Type: Application
    Filed: February 25, 2021
    Publication date: June 29, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Tomoaki SATO, Yuki KIKKAWA, Takafumi SHIMODA, Takayuki NEGISHI
  • Treatment liquid for semiconductor with ruthenium and method of producing the same
    Patent number: 11674230
    Abstract: Provided is a treatment liquid for a semiconductor with ruthenium, containing a hypobromite ion. Also provided is a treatment liquid for a semiconductor with ruthenium, containing at least a bromine-containing compound, an oxidizing agent, a basic compound, and water which are added and mixed, wherein the liquid has the bromine-containing compound added in an amount of 0.01 mass % or more and less than 2 mass % as a bromine element content with respect to the total mass of the liquid, has the oxidizing agent added in an amount of 0.1 mass % or more and 10 mass % or less with respect to the total mass, and has a pH of 8 or more and 14 or less. Further provided is a method of producing a treatment liquid for a semiconductor with ruthenium, including a step of mixing a bromine-containing compound with a solution containing a hypochlorous acid compound and a basic compound.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: June 13, 2023
    Assignee: TOKUYAMA CORPORATION
    Inventors: Tomoaki Sato, Yuki Kikkawa, Takafumi Shimoda, Takayuki Negishi
  • Aluminum nitride particles
    Patent number: 11661494
    Abstract: An aluminum nitride particle including at least a first truncated six-sided pyramid (1-a) and a second truncated six-sided pyramid (1-b), the aluminum nitride particle having a shape such that a lower base (3) of the first truncated six-sided pyramid (1-a) and a lower base (3) of the second truncated six-sided pyramid (1-b) face each other, the first truncated six-sided pyramid (1-a) and the second truncated six-sided pyramid (1-b) each having an upper base (2) with an area S1 of not less than 60 ?m2 and not more than 4800 ?m2, and each having a ratio (S1/S2) of the area S1 to an area S2 of the lower base (3) being not less than 0.5 and less than 1, the first truncated six-sided pyramid (1-a) and the second truncated six-sided pyramid (1-b) respectively having a height h1 and a height h2 each being not less than 5 ?m and not more than 20 ?m.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: May 30, 2023
    Assignee: TOKUYAMA CORPORATION
    Inventors: Akimasa Kuramoto, Yukihiro Kanechika