Abstract: A crushed polycrystalline silicon lump is provided in which a surface metal concentration is 15.0 pptw or less and preferably 7.0 to 13.0 pptw, and in the surface metal concentration, a surface tungsten concentration is 0.9 pptw or less and preferably 0.40 to 0.85 pptw, and a surface cobalt concentration is 0.3 pptw or less and preferably 0.04 to 0.08 pptw.

Abstract: A method for producing halogen oxyacid, which includes a step of continuously supplying and mixing an organic alkali solution and a halogen and continuously collecting a reaction solution containing halogen oxyacid, and an production apparatus of halogen oxyacid, which includes a reactor, a means of supplying an organic alkali solution to the reactor, a means of supplying a halogen to the reactor, and a means of collecting a reaction solution for taking out the reaction solution from the reactor, in which the organic alkali solution and the halogen are continuously supplied by the means of supplying an organic alkali solution and the means of supplying a halogen, respectively, to the reactor so as to be mixed therein such that a solution containing halogen oxyacid is generated as a reaction solution, and the reaction solution is continuously collected by the means of collecting a reaction solution are provided.

Abstract: A liner for a teat cup of a milking device is provided. The liner has a cylindrical shape and including: a bore part in a cylindrical shell to form a space between an inner surface of the shell and the bore part, and elastically deformable; a mouthpiece part disposed at one end of the bore part and closing one end of the shell, and being configured to allow a teat to be inserted therethrough and provided with a vent; a short milk tube part disposed at the other end of the bore part, closing the other end of the shell, and allowing milk from the teat at the bore part to flow therethrough; and a groove shaped vent line on an inner surface of the liner and extending on the bore part from the vent.

Abstract: Provided are: a semiconductor treatment liquid containing a hypobromite ion, in which the concentration of the hypobromite ion is 0.1 ?mol/L or more and less than 0.001 mol/L; a RuO4 gas generation inhibitor containing an onium salt composed of an onium ion and a bromine-containing ion, in which the hypobromite ion concentration is 0.1 ?mol/L or more and less than 0.001 mol/L; and a method of producing a halogen oxyacid, the method including allowing a bromine salt, an organic alkali, and a halogen to react with each other to obtain the halogen oxyacid.

Abstract: A treatment liquid for cleaning a semiconductor wafer is a treatment liquid containing (A) a hypochlorite ion and (C) a solvent, in which pH at 25° C. is more than 7 and less than 12.0. A method for removing ruthenium and tungsten from a semiconductor wafer and cleaning the semiconductor wafer includes bringing the treatment liquid into contact with the semiconductor wafer containing ruthenium or tungsten is provided.

Abstract: Provided is a method for efficiently producing ferric citrate hydrate with high purity and various specific surface areas. The method for producing modified ferric citrate hydrate includes a step of bringing a solution containing water, citric acid, and ferric citrate as a material into contact with water-soluble organic solvent.

Abstract: A silicon etching solution includes a mixed solution comprising a quaternary alkylammonium hydroxide and water and further comprises a compound represented by the following formula (1): R1O—(CmH2mO)n—R2??(1) wherein R1 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, R2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, m is an integer of 2 to 6, and n is 1 or 2.

Abstract: Provided is a method of producing a quaternary alkyl ammonium hypochlorite solution with an excellent storage stability. Specifically, provided is a method of producing a quaternary alkyl ammonium hypochlorite solution, the method including: a preparation step in which a quaternary alkyl ammonium hydroxide solution is prepared and the concentration of amines in the quaternary alkyl ammonium hydroxide solution is set to 20 ppm by mass or less; and a reaction step in which the quaternary alkyl ammonium hydroxide solution is brought into contact with chlorine gas, wherein the concentration of carbon dioxide of a gas phase in the reaction step is 100 ppm by volume or less and the pH of a liquid phase in the reaction step is 10.5 or more.

Abstract: A ruthenium oxide gas absorbent liquid includes an organic alkali solution containing a ligand and/or an onium salt composed of an onium ion and an anion, at least part of which is a hydroxide ion, wherein the hydroxide ion has a concentration ranging from more than 1×10?7 mol/L to 6 mol/L or less.

Abstract: Provided is a treatment liquid for etching a transition metal on a semiconductor wafer, the treatment liquid comprising: (A) a hypohalite ion or periodate ion; and (B) an alkylammonium salt represented by the following Formula (1). (wherein a is an integer from 6 to 20, R1, R2, and R3 are independently a hydrogen atom or an alkyl group having carbon number from 1 to 20, and X? is a bromine-containing ion), and a method of etching a transition metal by bringing the treatment liquid for semiconductor wafers into contact with the transition metal used in a semiconductor formation process.

Abstract: A boron nitride powder having a voltage density of not less than +1 V/g as measured by a triboelectric charging test.

Abstract: A silicon core wire for depositing polycrystalline silicon is formed in a gate shape and includes a pair of vertical rod portions and a horizontal portion laterally connecting upper ends of the vertical rod portions, in which ends of the vertical rod portions and the horizontal portion are joined by welding, and a corner junction has a surface metallic concentration of 1 ppbw or less, more specifically, with an iron concentration of 0.2 ppbw or less, a chromium concentration of 0.1 ppbw or less, a nickel concentration of 0.05 ppbw or less, and a titanium concentration of 0.2 ppbw or less.

Abstract: Provided is an analysis method capable of qualitatively determining resins adhering to crushed polysilicon with high sensitivity and further capable of quantitatively determining the resins with high precision. The analysis method comprises removing organic volatile components from crushed polysilicon by heating, then raising a temperature of the crushed polysilicon in a stream of an inert gas, collecting resin decomposition products produced at the heating temperature, and analyzing decomposition products unique to the resins, to thereby identify the types of the resins adhering to the crushed polysilicon. Moreover, it is also possible to prepare a standard curve regarding each of the decomposition products unique to the resins and to determine an adhesion quantity of each of the adhering resins based on the standard curve.

Abstract: An aluminum nitride powder containing a very small amount of coarse particles. An aluminum nitride powder which provides a resin composition having high affinity for resins and high moisture resistance. The aluminum nitride powder has a volume average particle diameter D50 of 0.5 to 7.0 ?m in particle size distribution measured with a laser diffraction scattering particle size distribution meter, a D90/D50 ratio of 1.3 to 3.5 and a BET specific surface area of 0.4 to 6.0 m2/g and classified by removing coarse particles whose particle diameter is more than 5 times as large as D90. When resin paste obtained from this aluminum nitride powder and a resin is measured with a grind gauge, the upper limit particle diameter at which a streak is produced is not more than 5 times as large as D90.

Abstract: A process for reforming the fly ash, including the heating step that heats a raw fly ash powder containing the unburned carbon at a temperature of 780 to 1000° C. to decrease the amount of the unburned carbon contained in the raw fly ash powder; the classifying step that introduces the heat-treated fly ash containing the unburned carbon in decreased amounts obtained through the heating step into a classifying apparatus in the state of being heated at a high temperature so as to separate the fly ash into a coarse powder and a fine powder; the fine powder recovering step that recovers the fine powder of the heat-treated fly ash obtained through the classifying step by using a dust-collecting apparatus; and the milling step that mills the coarse powder of the heat-treated fly ash obtained through the classifying step until a 45 ?m sieve residue becomes not more than 34% by mass, and then recovers the milled powder.

Abstract: To provide a hexagonal boron nitride powder which contains agglomerates, has a maximum torque calculated by measuring in accordance with JIS-K-6217-4 of 0.20 to 0.50 Nm, a DBP absorption rate of 50 to 100 ml/100 g, a tap bulk density of 0.66 to 0.95 g/cm3 and reduced anisotropy of heat conduction and can provide high heat conductivity and dielectric strength to a resin composition produced by filling a resin therewith and a process for producing the powder by carrying out a reduction nitriding reaction using boron carbide.

Abstract: An ophthalmic medical device including a photochromic polymer having higher transparency under an inactive state through use of a photochromic monomer. An ophthalmic medical device according to one embodiment that includes a photochromic polymer obtained by polymerizing monomer components including a photochromic monomer and a lactam ring-containing monomer, wherein a content ratio of the lactam ring-containing monomer in the monomer components is from 10 wt % to 50 wt %. The ophthalmic medical device is typically a contact lens or an intraocular lens.

Abstract: A chromene compound having at least one indenonaphthopyran moiety which has a group forming a spiro ring together with the 13-position carbon atom and further an oligomer chain group selected from a polyalkylene oxide oligomer chain group having at least three recurring units and a polyester oligomer chain group having at least three recurring units, represented by the following formula and having reduced matrix dependence: wherein R1 and R2 are each a group which may have an oligomer chain group, the ring Z bonded to the 13-position carbon atom of the chromene compound is a Spiro ring group, and R3 and R4 are each an aryl group or heteroaryl group which may have an oligomer chain group. Preferably, the chromene compound has at least one oligomer chain group in the molecule.

Abstract: The present invention provides a coating method including: a step of supplying a coating agent to a surface of a lens base material; a spreading step of spreading the coating agent supplied to the surface by rotation of the lens base material; a first removal step of removing at least a part of a liquid pool of the coating agent generated on a peripheral edge portion and/or a side surface portion of the lens base material by rotation of the lens base material after the spreading step; and a second removal step of removing the liquid pool remaining on the peripheral edge portion and/or the side surface portion of the lens base material by bringing an adsorption member into contact with at least the side surface of the lens base material after the first removal step.

Abstract: The present invention provides a method including: a gas absorption step of bringing exhaust gas into contact with an aqueous solution containing alkaline carbonate, so that carbon dioxide gas in the exhaust gas is allowed to react therewith, thereby obtaining an aqueous solution containing alkaline bicarbonate; a gas recovery step of recovering a gas containing nitrogen gas and oxygen gas obtained as a result of the gas absorption step; a decomposition step of decomposing at least a part of the alkaline bicarbonate obtained in the gas absorption step into the alkaline carbonate and the carbon dioxide gas; a circulation step of circulating at least a part of the alkaline carbonate obtained in the decomposition step to the gas absorption step; and a carbon dioxide gas recovery step of bringing a gas containing the carbon dioxide gas obtained as a result of the decomposition step into contact with an aqueous solution, thereby recovering the carbon dioxide gas obtained in the decomposition step.