Abstract: A semiconductor memory according to an embodiment includes first and second areas, an active region, a non-active region, a first stacked body, a plurality of first pillars, a first contact, a second stacked body, and a second contact. The active region includes part of each of the first and second areas. The non-active region includes part of each of the first and second areas. The second stacked body is in the non-active region. The second stacked body includes second insulators and second conductors which are alternately stacked. A second contact is in contact with a second conductor in a first interconnect layer and a second conductor in a second interconnect layer.

Abstract: According to one embodiment, a storage system performs a first allocation operation of allocating, for a first namespace, a plurality of first blocks included in the blocks of a nonvolatile memory. The storage system performs a read operation, a write operation or an erase operation on one of the first blocks in response to a command received from a host to read, write or erase the one first block, counts the total number of erase operations performed on the first blocks, and notifies the host of the counted number of erase operations in response to a command received from the host to obtain an erase count associated with the first namespace.

Abstract: A semiconductor memory device includes a first memory cell for storing data using at least three levels of threshold voltages, including a first level, a second level higher than the first level and a third level higher than the second level. A first word line is connected to the first memory cell. In writing of data to the first memory cell from a state where a threshold voltage of the first memory cell is the first level, a plurality of program operations and verify operations are performed, each program operation including applying a program voltage to the first word line, each verify operation including applying a read voltage lower than the program voltage. The program operations include a program operation for the second level and a program operation for the third level, and the verify operations include a verify operation for the second level, and do not include a verify operation for the third level.

Abstract: A memory system includes a nonvolatile memory and a controller configured to control the nonvolatile memory. The controller includes a processor, a storage circuit including a plurality of rewritable storage circuits that store timing data of a first timing information group which is settable by the processor, and a power source control circuit configured to trigger parallel execution of a plurality of power source control functions according to the timing data of the first timing information group read from the storage circuit.

Abstract: According to one embodiment, a memory system is connectable to a host. The memory system includes a nonvolatile memory and a controller. The nonvolatile memory includes a plurality of blocks. The controller is electrically coupled to the nonvolatile memory. The controller controls the nonvolatile memory. When receiving, from the host, a first command for changing a state of an allocated block to a reallocatable state in a case where a second command that is yet to be executed or being executed involving read of data from the allocated block has been received from the host, the controller changes the state of the allocated block to the reallocatable state after the second command is finished.

Abstract: According to one embodiment, a semiconductor memory device includes: a first memory cell; a second memory cell; a first word line; a second word line; and a first bit line. The device is configured to execute a first operation, a second operation, and a third operation to write data into the first memory cell. In the first operation, a first voltage is applied to the second word line. In the second operation, after the first operation, a second voltage higher than the first voltage is applied to the second word line. In the third operation, after the second operation, a third voltage higher than the second voltage is applied to the first word line, and a fourth voltage lower than both the second voltage and the third voltage is applied to the second word line.

Abstract: According to an embodiment, a magnetoresistive memory device includes a layer stack. The layer stack includes a first ferromagnet, an insulator on the first ferromagnet, and a second ferromagnet on the insulator. A nonmagnet is provided above the layer stack. A first conductor is provided on the nonmagnet. A hard mask is provided above the first conductor. The nonmagnet includes a material that is removed at a first etching rate against a first ion beam. The first conductor includes a material that is removed at a second etching rate against the first ion beam. The first etching rate is lower than the second etching rate.

Abstract: According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 ?m. The first surface includes an unevenness.

Abstract: According to one embodiment, a data storage apparatus includes a controller with a data protection function. The controller manages first and second personal identification data. The first personal identification data only includes authority to request inactivation of the data protection function. The second personal identification data includes authority to request inactivation of the data protection function and activation of the data protection function. The controller permits setting of the first personal identification data, when the second personal identification data is used for successful authentication and the first personal identification data is an initial value, or when the data protection function is in an inactive state.

Abstract: A memory system includes a nonvolatile memory including a plurality of blocks, in each of which a plurality of memory cells is arranged between bit lines and a source line, and a memory controller configured to control an operation of the nonvolatile memory. The memory controller is configured to issue a warming command to the nonvolatile memory when a temperature of the nonvolatile memory is lower than a first temperature, and the nonvolatile memory, in response to the warming command, causes current to flow through at least one bit line connected to memory cells of a first block.

Abstract: According to one embodiment, a memory system includes a nonvolatile memory, and a memory controller. Each of first storage regions of each of the nonvolatile memory includes a plurality of second storage regions. Each of pieces of first data includes pieces of second data as storage target data. Third data includes pieces of the second data that are selected one by one from each of the pieces of first data. The memory controller executes first decoding of decoding each of the pieces of first data on the basis of a first error correcting code generated by using the first data, and executes second decoding of decoding the third data including a bit of which reliability, which relates to each bit in each of the second storage regions that fail in the first decoding, is less than reliability of other bits on the basis of a second error correcting code.

Abstract: A method of producing a semiconductor memory device includes, when three directions crossing each other are set to first, second, and third directions, respectively, laminating a plurality of first laminates and a plurality of second laminates on a semiconductor substrate in the third direction. The method further includes forming ends of the plurality of first laminates in shapes of steps extending in the first direction, and forming ends of the plurality of second laminates in shapes of steps extending in both directions of the first direction and the second direction.

Abstract: A semiconductor memory includes memory cells, a word line and bit lines of the memory cells, sense amplifiers connected to the bit lines, respectively, and a controller. Each sense amplifier includes first, second, and third transistors. The third transistor has one end connected to each of the first and second transistors, and the other end connected to a corresponding bit line. During a read operation, at a first time of a first period during which the controller applies a first read voltage to the word line, the controller applies a first voltage higher than ground voltage to the first transistor, and a second voltage to the second transistor. Also, at the first time, a first sense amplifier applies a voltage to a first bit line through its first and third transistors, and a second sense amplifier applies a voltage to a second bit line through its second and third transistors.

Abstract: According to one embodiment, a semiconductor memory device includes: a first semiconductor layer including first to third portions which are arranged along a first direction and differ in position from one another in a second direction; a conductive layer including a fourth portion extending in the second direction and a fifth portion extending in the first direction; a first insulating layer between the fourth portion and the first semiconductor layer and between the fifth portion and the first semiconductor layer; a first contact plug coupled to the fourth portion; a second contact plug coupled to the first semiconductor layer in a region where the first insulating layer is formed; a first interconnect; and a first memory cell apart from the fifth portion in the first direction and storing information between the semiconductor layer and the first interconnect.

Abstract: A semiconductor device includes an insulating layer, a conductive member provided inside the insulating layer, a chip disposed on a first surface of the insulating layer and connected to the conductive member, and an electrode connected to the conductive member via a barrier layer. A resistivity of the barrier layer is higher than a resistivity of the conductive member. At least a portion of the electrode protrudes from a second surface of the insulating layer.

Abstract: According to one embodiment, a semiconductor memory device includes first and second memory cells; a first word line connected to the first and second memory cells; a first bit line connected to the first memory cell; a second bit line connected to the second memory cell; a first sense amplifier connected to the first bit line; a second sense amplifier connected to the second bit line; a voltage generation circuit; and a first row decoder which supplies a voltage to the first word line.

Abstract: A plasma treatment apparatus includes a discharge device generating plasma under atmospheric pressure, and a nonmetallic tube capable of advancing the plasma generated in the discharge device. The discharge device includes a discharge body with an internal space, and the plasma being generated in the internal space. The nonmetallic tube is connected to the discharge body, and includes a material different from a material of the discharge body. The plasma is released from the nonmetallic tube to an environment under atmospheric pressure.

Abstract: A semiconductor device includes a semiconductor layer, a charge storage layer provided on a surface of the semiconductor layer via a tunnel insulating film, and an electrode layer provided on a surface of the charge storage layer via a block insulating film. The tunnel insulating film includes a plurality of first silicon oxynitride films which are provided between the semiconductor layer and the charge storage layer. The tunnel insulating film further includes a silicon oxide film provided between the first silicon oxynitride films and/or a second silicon oxynitride film which is provided between the first silicon oxynitride films and has an oxygen concentration higher than an oxygen concentration in the first silicon oxynitride film.

Abstract: According to one embodiment, a memory system includes a semiconductor memory and a controller. The semiconductor memory includes first to fourth word lines and first to fourth memory cells. The controller is configured to issue first and second instructions. The controller is further configured to execute a first operation to obtain a first read voltage based on a threshold distribution of the first memory cell, and a second operation to read data from the second memory cell.

Abstract: According to one embodiment, a semiconductor memory device includes: a first interconnect layer including a first electrode that extends in a first direction and a second electrode that extends in a second direction and is in contact with one end of the first electrode; a second interconnect layer including a third electrode that is provided adjacently to the first electrode and a fourth electrode that is in contact with one end of the third electrode; a first semiconductor layer provided between the first electrode and the third electrode; a first charge storage layer provided between the first semiconductor layer and the first electrode; a second charge storage layer provided between the first semiconductor layer and the third electrode; and a first bit line provided above the first semiconductor layer and extending in the first direction.