Patents Assigned to TSMC NANJING COMPANY, LIMITED
  • Publication number: 20220366118
    Abstract: A method is provided and includes several operations: forming a first group of macros in a first region, wherein the first group of macros are aligned with a first boundary of a channel that is coupled thereto through pins of the first group of macros; forming a second group of macros in the first region to align with a second boundary of the channel that is coupled thereto through pins of the second group of macros, wherein the first and second groups of macros are coupled to a first register; and forming a third group of macros in a second region different from the first region. A first macro and a second macro that are in the third group of macros are aligned with the first and second boundaries respectively. The third group of macros are coupled to a second register different from the first register.
    Type: Application
    Filed: July 27, 2022
    Publication date: November 17, 2022
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED
    Inventors: Yi-Lin CHUANG, Shi-Wen TAN, Song LIU, Shih-Yao LIN, Wen-Yuan FANG
  • Publication number: 20220366121
    Abstract: A method includes the following operations: identifying a layer of a first layout based on a first violation generated on the layer; generating a metal density value associated with the layer; when the metal density value is larger than or equal to a preset value, classifying the first violation into a first class corresponding to routing congestions of the first layout; when the first violation is classified into the first class, assigning, to the first violation, a first operation of a plurality of first pre-stored operations corresponding to the first class; and performing the first operation to the first layout to generate a second layout.
    Type: Application
    Filed: July 27, 2022
    Publication date: November 17, 2022
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED
    Inventors: Yi-Lin CHUANG, Song LIU, Pei-Pei CHEN, Heng-Yi LIN, Shih-Yao LIN, Chin-Hsien WANG
  • Patent number: 11481536
    Abstract: A method includes the following operations: receiving design rule violations of a first layout; classifying, according to first chip features of the first layout, a first violation of the design rule violations into a first class of predefined classes; generating a first vector array for at least one of the first chip features of the first layout, that is associated with the first violation; selecting, according to the first vector array, first operations from pre-stored operations; generating a second layout based on the first layout and the first operations.
    Type: Grant
    Filed: December 8, 2020
    Date of Patent: October 25, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED
    Inventors: Yi-Lin Chuang, Song Liu, Pei-Pei Chen, Heng-Yi Lin, Shih-Yao Lin, Chin-Hsien Wang
  • Publication number: 20220335988
    Abstract: A memory device includes a local input/output circuit and a main input/output circuit. The local input/output circuit is configured to generate a first local write signal based on a first global write signal and a second global write signal, and configured to transmit the first local write signal to a plurality of first bit lines. The main input/output circuit include a first latch and logic elements. The first latch is configured to generate a first bit write mask signal based on a clock signal. The logic elements are configured to generate the first global write signal and the second global write signal based on the clock signal and the first bit write mask signal.
    Type: Application
    Filed: June 29, 2022
    Publication date: October 20, 2022
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC Nanjing Company Limited, TSMC China Company Limited
    Inventors: He-Zhou WAN, Xiu-Li YANG, Pei-Le LI, Ching-Wei WU
  • Publication number: 20220335992
    Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.
    Type: Application
    Filed: July 5, 2022
    Publication date: October 20, 2022
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li YANG, He-Zhou WAN, Mu-Yang YE, Lu-Ping KONG, Ming-Hung CHANG
  • Patent number: 11469743
    Abstract: An integrated circuit includes a first time delay circuit, a second time delay circuit, and a master-slave flip-flop having a gated input circuit and a transmission gate. The first time delay circuit has a first input configured to receive a first clock signal and having a first output configured to generate a second clock signal. The second time delay circuit has a second input configured to receive the second clock signal and having a second output configured to generate a third clock signal. The transmission gate is configured to receive the first clock signal and the second clock signal to control a transmission state of the transmission gate. The gated input circuit is configured to have an input transmission state controlled by the third clock signal at the second output of the second time delay circuit.
    Type: Grant
    Filed: April 29, 2021
    Date of Patent: October 11, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY, LIMITED
    Inventors: Huaixin Xian, Qingchao Meng, Yang Zhou, Shang-Chih Hsieh
  • Patent number: 11469170
    Abstract: A semiconductor device includes a substrate, an active region, an isolation structure, a first metal line, gate structure, source/drain region, a source/drain contact, and a second metal line. The active region protrudes from a top surface of the substrate. The isolation structure is over the substrate and laterally surrounds the active region. The first metal line is in the isolation structure. The gate structure is over the active region. The source/drain region is in the active region. The source/drain contact is over the active region and is electrically connected to the source/drain region. The second metal line is over the gate structure and the source/drain contact, in which the second metal line vertically overlaps the first metal line.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: October 11, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Zhang-Ying Yan, Xin-Yong Wang
  • Patent number: 11456292
    Abstract: A semiconductor device includes a substrate, a first gate structure, a second gate structure, a third gate structure, and a first source/drain region. The first, second, and third gate structures are above the substrate and arranged in a first direction. The first, second, and third gate structures extend in a second direction different from the first direction, and the second gate structure is between the first and third gate structures. The first source/drain region is between the first and third gate structures, and the first source/drain region is at one end of the second gate structure.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: September 27, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xin-Yong Wang, Yang Zhou, Liu Han
  • Patent number: 11456744
    Abstract: A multi-bit level-shifter (MBLS) includes two or more input circuits correspondingly configured to operate in a first voltage domain. The MBLS also includes two or more single bit level shifters (SBLSs) electrically coupled correspondingly to the two or more input circuits, and correspondingly configured to operate in a second voltage domain. The MBLS also includes a control circuit configured to toggle each of the two or more SBLSs between a normal mode and a standby mode according to a toggle-control signal received from the control circuit.
    Type: Grant
    Filed: June 15, 2021
    Date of Patent: September 27, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY, LIMITED
    Inventors: Jing Ding, Zhang-Ying Yan, Qingchao Meng, Yi-Ting Chen
  • Patent number: 11450367
    Abstract: A circuit includes a selection circuit configured to receive a first address from a first port and a second address from a second port, a first latch circuit coupled to the selection circuit and configured to output each of the first address and the second address received from the selection circuit, a decoder, and a control circuit. The control circuit is configured to generate a plurality of signals configured to cause the decoder to decode each of the first address and the second address.
    Type: Grant
    Filed: February 23, 2021
    Date of Patent: September 20, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC CHINA COMPANY, LIMITED, TSMC NANJING COMPANY, LIMITED
    Inventors: XiuLi Yang, Ching-Wei Wu, He-Zhou Wan, Kuan Cheng, Luping Kong
  • Patent number: 11450557
    Abstract: A method of making a dual damascene interconnect includes operations of depositing a metal hardmask over a dielectric layer; etching a metal hardmask opening in the metal hardmask to expose a top surface of the dielectric layer; etching at least one interconnect opening in the dielectric layer, to expose a top surface of a base conductive layer; modifying a sidewall of the metal hardmask opening; and depositing a conductive material in the metal hardmask opening and the at least one interconnect opening.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: September 20, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY, LIMITED
    Inventors: Min Han Hsu, Chun-Chang Chen, Jung-Chih Tsao
  • Patent number: 11443096
    Abstract: A method is provided in the present disclosure. The method includes several operations: generating a floor plan having multiple macros for an integrated circuit; adjusting the macros according to a channel area interposed between the pins; separating the macros by a channel width of the channel area; and adjusting, in accordance with correlations between the macros and multiple registers, the macros in the floor plan.
    Type: Grant
    Filed: October 15, 2020
    Date of Patent: September 13, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED
    Inventors: Yi-Lin Chuang, Shi-Wen Tan, Song Liu, Shih-Yao Lin, Wen-Yuan Fang
  • Patent number: 11424237
    Abstract: A memory device includes a first plurality of program lines of a first group, a second plurality of program lines of a second group, and a plurality of address lines. The second plurality of program lines are disposed next to and are parallel to the first plurality of program lines. The plurality of address lines are coupled to the first plurality of program lines and the second plurality of program lines respectively. The plurality of address lines are twisted and are intersected with the first plurality of program lines and the second plurality of program lines in a layout view. At least two adjacent program lines of the first plurality of program lines or the second plurality of program lines have lengths different from each other. A method is also disclosed herein.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: August 23, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Yuan Ma, Ke-Liang Shang, Xin-Yong Wang
  • Patent number: 11417601
    Abstract: A device includes a transistor, an insulating structure, a buried conductive line, and a buried via. The transistor is above a substrate and includes a source/drain region and a source/drain contact above the source/drain region. The insulating structure is above the substrate and laterally surrounds the transistor. The buried conductive line is in the insulating structure and spaced apart from the transistor. The buried via is in the insulating structure and interconnects the transistor and the buried conductive line. A height of the buried conductive line is greater than a height of the source/drain contact.
    Type: Grant
    Filed: June 23, 2020
    Date of Patent: August 16, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xin-Yong Wang, Liu Han, Li-Chun Tien, Chih-Liang Chen
  • Publication number: 20220254404
    Abstract: A memory device includes a word line driver. The word line driver is coupled through word lines to an array of bit cells. The word line driver includes a first driving circuit, a second driving circuit and a modulating circuit. The first driving circuit and the second driving circuit are configured to select a word line. The modulating circuit is coupled through the selected word line to the first driving circuit and the second driving circuit, and is configured to modulate at least one signal transmitted through the selected word line. The first driving circuit and the second driving circuit are further configured to charge the selected word line to generate a first voltage signal and a second voltage signal at two positions of the selected word line. The first voltage signal is substantially the same as the second voltage signal. A method is also disclosed herein.
    Type: Application
    Filed: March 22, 2021
    Publication date: August 11, 2022
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC Nanjing Company Limited, TSMC China Company Limited
    Inventors: He-Zhou WAN, Xiu-Li YANG, Mu-Yang YE, Yan-Bo SONG
  • Publication number: 20220246182
    Abstract: A circuit includes a first inverter, a second inverter, a first header circuit and a second header circuit. The first inverter is configured to convert a first global write signal into a first local write signal transmitted to a complement bit line. The second inverter is configured to convert a second global write signal into a second local write signal transmitted to a bit line. The first header circuit connects or disconnects a power terminal of the first inverter with a positive reference voltage supply in response to a write enable signal and the second global write signal. The second header circuit connects or disconnects a power terminal of the second inverter with the positive reference voltage supply in response to a write enable signal and the first global write signal.
    Type: Application
    Filed: February 23, 2021
    Publication date: August 4, 2022
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC Nanjing Company Limited, TSMC China Company Limited
    Inventors: He-Zhou WAN, Xiu-Li YANG, Pei-Le LI, Ching-Wei WU
  • Patent number: 11404553
    Abstract: A semiconductor device includes a source/drain region, a body region, a first gate structure, and a second gate structure. The source/drain region and the body region are in a substrate. The first and second gate structures are above the substrate. The source/drain region and the body region are on opposite sides of the first gate structure. The second gate structure is spaced apart from the first gate structure. The source/drain region, the body region, and the first gate structure are on a same side of the second gate structure.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: August 2, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xin-Yong Wang, Liu Han
  • Patent number: 11398261
    Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: July 26, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li Yang, He-Zhou Wan, Mu-Yang Ye, Lu-Ping Kong, Ming-Hung Chang
  • Patent number: 11393509
    Abstract: A circuit includes a first inverter, a second inverter, a first header circuit and a second header circuit. The first inverter is configured to convert a first global write signal into a first local write signal transmitted to a complement bit line. The second inverter is configured to convert a second global write signal into a second local write signal transmitted to a bit line. The first header circuit connects or disconnects a power terminal of the first inverter with a positive reference voltage supply in response to a write enable signal and the second global write signal. The second header circuit connects or disconnects a power terminal of the second inverter with the positive reference voltage supply in response to a write enable signal and the first global write signal.
    Type: Grant
    Filed: February 23, 2021
    Date of Patent: July 19, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: He-Zhou Wan, Xiu-Li Yang, Pei-Le Li, Ching-Wei Wu
  • Patent number: 11379643
    Abstract: A method executed at least partially by a processor includes creating a plurality of groups of paths from a plurality of paths in an integrated circuit (IC) layout diagram. Each group among the plurality of groups has a dominant feature among a plurality of features of the plurality of paths. The dominant features of the plurality of groups are different from each other. The method further includes testing at least one path in a group among the plurality of groups. The method also includes, in response to the testing indicating that the at least one path fails, modifying at least one of the IC layout diagram, at least a portion of at least one library having cells included in the IC layout diagram, or a manufacturing process for manufacturing an IC corresponding to the IC layout diagram.
    Type: Grant
    Filed: December 15, 2020
    Date of Patent: July 5, 2022
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY, LIMITED
    Inventors: Ankita Patidar, Sandeep Kumar Goel, Yun-Han Lee