Abstract: Disclosed is a light emitting apparatus including: first and second substrates having light transmissive property and flexibility arranged to face each other; a plurality of light emitting element groups arranged along a predetermined straight line between the first and second substrates and each of the light emitting element groups includes a first light emitting element and a second light emitting element; and a conductor pattern formed on the first substrate and including respective individual line patterns individually connected to the first and second light emitting elements and a common line pattern commonly connected to the first and second light emitting elements. The individual line patterns are routed to one side and the other side of the straight line centered on at least a part of the common line pattern.

Abstract: Embodiments of a display device including barrier layer coated quantum dots and a method of making the barrier layer coated quantum dots are described. Each of the barrier layer coated quantum dots includes a core-shell structure and a hydrophobic barrier layer disposed on the core-shell structure. The hydrophobic barrier layer is configured to provide a distance between the core-shell structure of one of the quantum dots with the core-shell structures of other quantum dots that are in substantial contact with the one of the quantum dots. The method for making the barrier layer coated quantum dots includes forming reverse micro-micelles using surfactants and incorporating quantum dots into the reverse micro-micelles. The method further includes individually coating the incorporated quantum dots with a barrier layer and isolating the barrier layer coated quantum dots with the surfactants of the reverse micro-micelles disposed on the barrier layer.

Abstract: A system-in-package includes a package substrate that at least partially surrounds an embedded radio-frequency integrated circuit chip and a processor chip mated to a redistribution layer. A wide-band phased-array antenna module is mated to the package substrate with direct interconnects from the radio-frequency integrated circuit chip to antenna patches within the antenna module. Additionally, fan-out antenna pads are also coupled to the radio-frequency integrated circuit chip.

Abstract: A light emitting element, used behind a display, comprises LED chips emitting blue light and separated red and green phosphor layers on the LED chip, the layers receiving the emitted blue light and respectively converting the same into precise colors for the display. A portion of the light directly from the LED chip is also combined with the converted light and passed on as lighting for the display. Partial absorption of green light by the red phosphor and red light by the green phosphor, occurring when the red and green phosphor layers are overlapped, is avoided. Light conversion efficiency of the green and red phosphor layers is thereby improved. A light emitting assembly, a display device, and a method for making the light emitting assembly are also disclosed.

Abstract: The present disclosure provides a pixel array and a fabrication method thereof. The pixel array includes a plurality of gate lines and a plurality of data lines which are arranged intersected and insulated and a pixel unit disposed at a position where each of the plurality of gate lines and each of the plurality of data lines are intersected. The pixel unit includes a thin film transistor (TFT). The width-to-length ratios of channels of the TFTs are sequentially increased in such a manner that the width-to-length ratios of the channels of the TFTs in the pixel units positioned in a same row (and/or a same column) are sequentially increased along a scanning direction of the gate line coupled to gate electrodes of the TFTs in the same row (and/or along a data writing direction of the data line coupled to the source electrodes of the TFTs in the same column).

Abstract: Microelectromechanical sensor with an out-of-plane detection has a cross sensitivity in a first direction in the plane with a value of ST, the sensor comprising a support, a mass suspended from the support by beams stressed by bending, in such a way that the inertial mass is capable of moving with respect to the support about an axis of rotation contained in a plane of the sensor, a stress gauge suspended between the mass and the support. The bending beams have a dimension tf in the out-of-plane direction and the mass has a dimension tM in the out-of-plane direction such that t f = 3 4 ? ( t M - 2 ? l arm ? S T ) . Larm is the distance between the centre of gravity of the mass and the centre of the bending beams projected onto the first direction.

Abstract: A method, comprises: providing a laminar support member, having a front surface, arranging on the front surface at least one semiconductor die having a front surface and a back surface, with the back surface thereof towards the front surface of the support member and with the front surface thereof having die pads, arranging at the front surface of the support member sidewise of the at least one semiconductor die a plurality of electrically-conductive bodies, the electrically-conductive bodies arranged at respective recesses in the support member, wherein the electrically-conductive bodies protrude from the plane away from the front surface of the support member, providing a filling of molding material over the laminar support member between the at least one semiconductor die and the electrically-conductive bodies, and providing electrically-conductive lines between selected ones of the die pads of the semiconductor die and selected ones of the plurality of electrically-conductive bodies.

Abstract: A display device may include a hole, a display element, a switching element, a groove, a planarization layer, and a cover layer. The switching element may be electrically connected to the display element. The encapsulation layer may cover the display element. The groove may be located between the hole and the display element. A portion of the planarization layer may be located between a first edge of the planarization layer and a second edge of the planarization and may be located in the groove. The first edge of the planarization layer may be located closer to the display element than the second edge of the planarization layer. The cover layer may at least partially cover the first edge of the planarization layer.

Abstract: This disclosure relates to a pixel defining structure, a display panel, a method of manufacturing the same, and a display device. The pixel defining structure includes: a first pixel defining layer with a first opening, located on a substrate, wherein the first pixel defining layer includes a first portion formed by a first hydrophilic-hydrophobic material and a second portion formed by a second hydrophilic-hydrophobic material, projections of the first portion and the second portion on a surface of the substrate are substantially not overlapped, a side surface of the first pixel defining layer facing the first opening includes a first side surface formed by the first hydrophilic-hydrophobic material and a second side surface formed by the second hydrophilic-hydrophobic material, and the first hydrophilic-hydrophobic material has a different hydrophilicity and hydrophobicity from that of the second hydrophilic-hydrophobic material.

Abstract: An electronic component includes a part incorporating a transistor provided with a control electrode and with first and second electrodes. The electronic component includes first, second, and third electrical connection terminals extending on a connection face of the part incorporating the transistor, the first electrical connection terminal being electrically linked with the first electrode, the second electrical connection terminal being electrically linked with the second electrode and the third electrical connection terminal being electrically linked with the control electrode. The electronic component includes a first set of electrically conductive fingers and a second set of electrically conductive fingers, the fingers of the first and second sets of fingers being interdigitated, at the level of the connection face, to form at least a part of a capacitive component. The fingers of the first set of fingers are electrically linked to the first electrical connection terminal.

Abstract: Disclosed are a display device and a method of manufacturing a display device. The method of a display device according to an exemplary embodiment of the present disclosure includes: a first transferring step of transferring a plurality of LEDs disposed on a wafer onto a plurality of donors; and a second transferring step of transferring the plurality of LEDs transferred onto the plurality of donors onto a display panel, in which in the second transferring step, an area where one of the plurality of donors overlaps the display panel partially overlaps an area where the other one of the plurality of donors overlaps the display panel. Therefore, the plurality of LEDs having different wavelengths is uniformly transferred to reduce a boundary caused by the difference in wavelengths and improve color uniformity.

Abstract: A light emitting semiconductor (LES) device having desirable thermal performance characteristics is disclosed. The LES device includes an insulating substrate layer having a plurality of vias formed therein and at least one LES chip mounted on the insulating substrate layer, with each of the LES chips(s) including an active surface including a light emitting area configured to emit light therefrom and a back surface positioned on a top surface of the insulating substrate layer and including connection pads thereon. A conductor layer is positioned on a bottom surface of the insulating substrate layer and in the vias, the conductor layer in direct contact with the connection pads of the LES chip(s) so as to be electrically and thermally connected thereto. An encapsulant is positioned adjacent the top surface of the insulating substrate layer and surrounding at least part of the LES chip(s), the encapsulant comprising a light transmitting material.

Abstract: Provided is a semiconductor apparatus capable of enhancing the withstand voltage while suppressing the enlargement of the chip area. Provided is semiconductor apparatus including: a first terminal to which a high frequency signal is supplied; a second terminal from which the high frequency signal is output; first, second and third switch elements electrically connected in series between the first terminal and the second terminal; a first capacitor provided between the first terminal and a first node between the first switch element and the second switch element; and a second capacitor provided between the first terminal and a second node between the second switch element and the third switch element, in which the capacitance of the first capacitor is greater than the capacitance of the second capacitor.

Abstract: Provided herein is a module for packaging semiconductors comprising: at least one PDC comprising parallel internal electrodes of alternating polarity with a paraelectric dielectric between adjacent internal electrodes wherein the paraelectric dielectric has a permittivity above 10 to no more than 300; and wherein the PDC forms a capacitor couple with at least one semiconductor.

Abstract: A chip package is provided. the chip package includes a substrate having an upper surface, a lower surface, and a sidewall surface that is at an edge of the substrate. The substrate includes a sensing device adjacent to the upper surface of the substrate to sense a light source. The chip package also includes a first color filter layer disposed on the upper surface of the substrate to shield the light source. The first color filter layer includes an opening, so that the first color filter layer surrounds the sensing device via the opening. In addition, the chip package includes a redistribution layer disposed on the lower surface of the substrate. A method of forming the chip package is also provided.

Abstract: A method for fabricating a stacked nanosheet semiconductor device includes forming nanosheet stacks including alternating silicon layers and silicon germanium layers on a substrate. The method includes patterning a gate structure on the nanosheet stacks and forming a source and drain on the stacks. The method further includes growing a first epitaxial layer on the source and drain. The method includes etching an interlayer dielectric on the first epitaxial layer. The method includes etching a portion of the first epitaxial layer forming a channel and growing a second epitaxial layer and etching a portion of the interlayer etching a portion of the first liner, forming a pFET. The method includes forming an nFET. The method includes the pFET and the nFET being disposed adjacent to one another vertically and a drain of the pFET and a drain of the nFET being electrically connected.

Abstract: A silicon carbide semiconductor device has a rectangle-shaped active region in which a main current flows, and a termination region surrounding the active region in a plan view. The device includes a silicon carbide semiconductor substrate of a first conductivity type, a first semiconductor layer of the first conductivity type on the front surface of the substrate, a second semiconductor layer of a second conductivity type, at a surface at the first semiconductor layer, a first semiconductor region of the first conductivity type, selectively provided in the second semiconductor layer, the second semiconductor region disposed from a periphery of the active region to reach the termination region, and extending along each of directions of four sides of the active region. At the four sides of the active region, a cross-sectional structure of each layer and each region of the device is identical to one another.

Abstract: A semiconductor device in which reliability and production yield are improved by reducing or preventing the spreading of cracks that may occur in the die sawing process, and a method for fabricating the same are provided. The semiconductor device includes a substrate which includes a first chip region and a scribe lane region surrounding the first chip region, a first low-k insulating film, which includes a first insulating material having a dielectric constant lower than silicon oxide, on the substrate in the first chip region, a wiring structure, which includes a second low-k insulating film including the first insulating material and a first wiring pattern in the second low-k insulating film, on the substrate in the scribe lane region, and a first protective insulating film, which includes a second insulating material different from the first insulating material, between the first low-k insulating film and the wiring structure.

Abstract: A packaged assembly and a method of producing the packaged assembly is disclosed. The packaged assembly includes a redistribution layer (RDL), an integrated circuit (IC), one or more memory modules, and an interposer comprising a plurality of vias from a list of through-silicon-vias (TSVs), through-mold-via (TMVs), and plated-through-hold-via (PTHs). In some implementations, the IC is electrically and mechanically attached to a first side of the RDL. In some implementations, the one or more memory modules and the interposer are disposed on a second side of the RDL. The packaged assembly also includes a mold having a mold material encapsulating the IC, the one or more memory modules, the interposer, and the RDL to form the packaged assembly. In some implementations, the IC is electrically conductively connected an external circuit board via a series of electrical connections between the IC, the RDL, the vias, and the external circuit board.

Abstract: Embodiments of the present invention are directed to forming a wrap-around contact (WAC) for a vertical field effect transistor (VFET). In a non-limiting embodiment of the invention, a top spacer is formed on a surface of a gate. A sacrificial spacer is formed on the top spacer. A source/drain region is formed over the top spacer and between sidewalls of the sacrificial spacer. The sacrificial spacer can be replaced with a wrap-around contact. The source/drain region can include a first material, the sacrificial spacer can include a second material, and the second material can be selected such that the second material can be etched selective to the first material.