Abstract: An insulating layer structure for a semiconductor product. The insulating layer structure includes a device substrate, a supporting substrate and a thin film layer. The device substrate and the supporting substrate are silicon wafers. The thin film layer(s) is/are arranged on the device substrate or/and the supporting substrate. The device substrate and the supporting substrate are bonded together through the thin film layer arranged on at least one of the device substrate and the supporting substrate to form an integral multilayer SOI structure. The insulating layer structure formed by the present invention solves problems of serious spontaneous heating of an existing SOI device, severe warpage of an existing SOI structure caused by high-temperature annealing, a poor radio frequency characteristic and the like, and has a predictable relatively higher economic and social value.

Abstract: Power amplifiers in radio frequency circuits are typically implemented as heterojunction bipolar transistors. In applications such as in 5G systems, the circuits are expected to operate at very high speeds, e.g., up to 100 GHz. Also, a certain amount of output power should be maintained for stable operation. To achieve both high power and high speed, it is proposed to incorporate field plates in the heterojunction bipolar transistors to reduce electric field in the collector. This allows the breakdown voltage of the transistor to be high, which aids in power output. At the same time, the collector can be relatively thin, which aids in operation speed.

Abstract: According to one embodiment, a semiconductor device comprises a first terminal on a first surface of a substrate and a first semiconductor chip on the first surface of the substrate and including a second terminal. A first connector electrically connects the first terminal to the second terminal. A second semiconductor chip is on the first surface of the substrate. An adhesive resin is between the second semiconductor chip and the first surface. A portion of the first connector is embedded in the adhesive resin. The first semiconductor chip is spaced from the adhesive resin in a direction parallel to the first surface.

Abstract: A multi-gate active device includes a source region coupled to source contacts and a first drain region coupled to first drain contacts. The multi-gate active device also includes a first meshed silicide stop on the first drain region. The first meshed silicide stop surrounds the first drain contacts. The multi-gate active device further includes a first gate over a first channel between the source region and the first drain region.

Abstract: According to one general aspect, an apparatus may include a metal layer having a metal pitch between metal elements, and a gate electrode layer having a gate pitch between gate electrode elements, wherein the gate electrode pitch is a ratio of the metal pitch. The apparatus may include at least two power rails coupled, by via staples, with the metal layer, wherein the via staples at least partially overlap one or more of the gate electrode elements. The apparatus may include even and odd pluralities of standard cells, each respectively located in even/odd placement sites wherein portions of the standard cells that carry signals within the metal layer do not connect to the via staples.

Abstract: An imaging device includes a plurality of light-receiving elements arranged in a two-dimensional matrix shape. Each of the light-receiving elements includes a first electrode, a photoelectric conversion layer, and a second electrode. The photoelectric conversion layer has a laminated structure in which a first compound semiconductor layer having a first conductivity type and a second compound semiconductor layer having a second conductivity type that is a reverse conductivity type to the first conductivity type are laminated from a side of the first electrode. The second compound semiconductor layer has been removed in a region between the light-receiving elements. The first electrode and the first compound semiconductor layer are shared by the light-receiving elements. An impurity concentration of a first compound semiconductor layer near the first electrode is lower than that of a first compound semiconductor layer near the second compound semiconductor layer.

Abstract: A display panel is provided. The display panel includes a display region and a non-display region. The display region includes a first substrate, containing an N-type semiconductor layer including a plurality of protrusions and a plurality of light-emitting diodes. Each light-emitting diode includes an island-shaped structure. The island-shaped structure includes a protrusion, a light-emitting layer, and a P-type semiconductor layer. The display region also includes an N electrode and a plurality of P electrodes. The N electrode has a mesh structure, and the island-shaped structure is disposed in a mesh opening of the mesh structure. The N electrode is electrically connected to the N-type semiconductor layer. The plurality of P electrodes are disposed, in a one-to-one correspondence with the plurality of light-emitting diodes, on a side opposite to the N-type semiconductor layer. Each P electrode is electrically connected to the P-type semiconductor layer.

Abstract: Embodiments related to transistors and integrated circuits having aluminum indium phosphide subfins and germanium channels, systems incorporating such transistors, and methods for forming them are discussed.

Abstract: An integrated circuit (IC) device includes a substrate having a fin-type active region extending in a first direction, a gate structure intersecting the fin-type active region on the substrate, the gate structure extending in a second direction perpendicular to the first direction and parallel to a top surface of the substrate, source and drain regions on both sides of the gate structure, and a first contact structure electrically connected to one of the source and drain regions, the first contact structure including a first contact plug including a first material and a first wetting layer surrounding the first contact plug, the first wetting layer including a second material having a lattice constant that differs from a lattice constant of the first material by about 10% or less.

Abstract: Embodiments of the invention are directed to a method of forming a semiconductor device. A non-limiting example of the method includes forming a fin having a fin bottom region. A charged region is formed on a sidewall of the fin bottom region, wherein the charged region includes charged particles, and wherein the fin bottom region is formed from an undoped semiconductor material. The charged particles attract charge carriers in the fin bottom region toward and adjacent to the sidewall of the fin bottom region, wherein the charge carriers form a current path through the undoped semiconductor material of the fin bottom region.

Abstract: A memory device includes a memory cell, a logic device and a high voltage device formed on the same semiconductor substrate. Portions of the upper surface of the substrate under the memory cell and the high voltage device are recessed relative to the upper surface portion of the substrate under the logic device. The memory cell includes a polysilicon floating gate disposed over a first portion of a channel region of the substrate, a polysilicon word line gate disposed over a second portion of the channel region, a polysilicon erase gate disposed over a source region of the substrate, and a metal control gate disposed over the floating gate and insulated from the floating gate by a composite insulation layer that includes a high-K dielectric. The logic device includes a metal gate disposed over the substrate. The high voltage device includes a polysilicon gate disposed over the substrate.

Abstract: A semiconductor device includes a channel layer disposed over a substrate, a barrier layer disposed over the channel layer, a gate electrode disposed over the barrier layer, and a pair of source/drain electrodes disposed on opposite sides of the gate electrode. The pair of source/drain electrodes extend through at least portions of the barrier layer. The semiconductor device also includes a lining layer conformally disposed on bottom portions of the pair of source/drain electrodes.

Abstract: A semiconductor device is provided. The semiconductor device includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a dopant holding layer, a source/drain pair, and a gate. The channel layer is disposed over the substrate. The barrier layer is disposed over the channel layer. The compound semiconductor layer and the dopant holding layer are disposed over the barrier layer. The source/drain pair are disposed over the substrate and on both sides of the compound semiconductor layer. The gate is disposed over the compound semiconductor layer.

Abstract: Integrated chips and methods of forming the same include etching a first stack of layers in a first region and etching a second stack of layers in a second region. The first stack of layers includes a first semiconductor layer having a first thickness over a first sacrificial layer having a second thickness. Etching the first stack of layers removes the first sacrificial layer from the first stack of layers and creates a first gap. The second stack of layers includes a second semiconductor layer having a third thickness over a second sacrificial layer having a fourth thickness. Etching the second stack of layers removes the second sacrificial layer from the second stack of layers and to create a second gap. A dielectric material fills the first gap and the second gap.

Abstract: Disclosed are an encapsulation structure, a substrate and a display panel. The package structure includes an encapsulation layer and a transition layer, wherein the encapsulation layer includes a first encapsulation layer and a second encapsulation layer which are laminated with each other, the first encapsulation layer is located on a first main surface of the second encapsulation layer, the transition layer and the first encapsulation layer are juxtaposed on the first main surface, the first main surface includes a first region in contact with the first encapsulation layer and a second region in contact with the transition layer, the second region is located at an edge of the first main surface, and a bonding strength between the transition layer and the second encapsulation layer is greater than a bonding strength between the first encapsulation laver and the second encapsulation layer.

Abstract: Disclosed is an organic light-emitting display device capable of realizing a high resolution. The organic light-emitting display device includes a storage capacitor disposed on a substrate, which overlaps at least one transistor, with at least one buffer layer interposed therebetween, the at least one buffer layer disposed on the storage capacitor, and which includes a lower storage electrode and an upper storage electrode overlapping the lower storage electrode, with a storage buffer layer interposed therebetween, and a light-emitting diode connected to the transistor. One of the lower storage electrode and the upper storage electrode is formed to have the same line width and the same shape as the storage buffer layer, thereby ensuring a sufficient process margin and consequently realizing a high resolution and improving production yield.

Abstract: A semiconductor device with redistribution layers on partial encapsulation is disclosed and may include providing a carrier with a non-photosensitive protection layer, forming a pattern in the non-photosensitive protection layer, providing a semiconductor die with a contact pad on a first surface, and bonding the semiconductor die to the non-photosensitive protection layer such that the contact pad aligns with the pattern formed in the non-photosensitive protection layer. A second surface opposite to the first surface of the semiconductor die, side surfaces between the first and second surfaces of the semiconductor die, and a portion of a first surface of the non-photosensitive protection layer may be encapsulated with an encapsulant. The carrier may be removed leaving the non-photosensitive protection layer bonded to the semiconductor die. A redistribution layer may be formed on the contact pad and a second surface of the non-photosensitive protection layer opposite to the first surface.

Abstract: A standard cell of an IC includes a cell area including a transistor configured to determine a function of the standard cell; a first dummy area and a second dummy area respectively adjacent to two sides of the cell area in a first direction; and an active area extending in the first direction across the cell area, the first dummy area, and the second dummy area. The active area includes a first active area and a second active area spaced apart from each other in a second direction perpendicular to the first direction and extend parallel to each other in the first direction. At least one of the first active area and the second active area provided in the first dummy area is biased, and at least one of the first active area and the second active area provided in the second dummy area is biased.

Abstract: An integrated circuit device includes a substrate including a first device region and a second device region; a first fin separation insulating portion on the first device region; a pair of first fin-type active regions spaced from each other with the first fin separation insulating portion therebetween in the first device region and collinearly extending in a first horizontal direction; a second fin separation insulating portion extending in a second horizontal direction over the first device region and the second device region; and a pair of second fin-type active regions spaced from each other with the second fin separation insulating portion therebetween and collinearly extending in the first horizontal direction, wherein the first fin separation insulating portion and the second fin separation insulating portion vertically overlap each other.

Abstract: The present disclosure relates to a semiconductor device, and more particularly, to a junctionless/accumulation mode transistor with dynamic control and method of manufacturing. The circuit includes a channel region and a threshold voltage control on at least one side of the channel region, the threshold voltage control being configured to provide dynamic control of a voltage threshold, leakage current, and breakdown voltage of the circuit, wherein the threshold voltage control is a different dopant or material of a source region and a drain region of the circuit.