Abstract: A method for manufacturing a structure comprising a first substrate comprising at least one electronic component likely to be damaged by a temperature higher than 400° C. and a semiconductor layer extending on the first substrate comprises: (a) providing a first bonding metal layer on the first substrate, (b) providing a second substrate comprising successively: a semiconductor base substrate, a stack of a plurality of semiconductor epitaxial layers, a layer of SixGe1-x, with 0?x?1 being located at the surface of said stack opposite to the base substrate, and a second bonding metal layer, (c) bonding the first substrate and the second substrate through the first and second bonding metal layers at a temperature lower than or equal to 400° C., and (d) removing a part of the second substrate so as to transfer the layer of SixGe1-x on the first substrate using a selective etching process.

Abstract: In one aspect an electronic device includes a substrate having one of a p-type doping or an n-type doping, a first well in the substrate, a second well in the substrate, a third well in the substrate between the first and second wells, a first terminal connected to the first well, a second terminal connected to the second well, an electrostatic discharge (ESD) clamp connected to the first and second terminals and a transient voltage source connected to the third well. A doping type of the first, second and third wells is the other one of the p-type or n-type doping. The ESD clamp is configured to clamp the first and second wells at a clamp voltage during an ESD event and the transient voltage source is configured to provide a voltage during the ESD event that is less than the clamp voltage.

Abstract: A package structure for power devices includes a heat dissipation insulating substrate, a plurality of power devices, a heat dissipation baseplate, and a thermal interface layer. The heat dissipation insulating substrate has a first surface and a second surface which are opposite to each other, and the power devices are coupled to the first surface of the heat dissipation insulating substrate. The heat dissipation baseplate is disposed at the second surface of the heat dissipation insulating substrate, wherein at least one of a surface of the heat dissipation baseplate and the second surface of the heat dissipation insulating substrate has at least one plateau, and the plateau is at least disposed within a projected area of the plurality of power devices. The thermal interface layer is disposed between the second surface of the heat dissipation insulating substrate and the surface of the heat dissipation baseplate.

Abstract: A power electronics module includes a substrate with a substrate metallization layer, which is separated into conducting areas for providing conducting paths for the power electronics module; a semiconductor switch chip bonded with a first power electrode to a first conducting area of the substrate metallization layer; a conductor plate bonded to a second power electrode of the semiconductor switch chip opposite to the first power electrode.

Abstract: Disclosed herein are dual gate trench shaped thin film transistors and related methods and devices. Exemplary thin film transistor structures include a non-planar semiconductor material layer having a first portion extending laterally over a first gate dielectric layer, which is over a first gate electrode structure, and a second portion extending along a trench over the first gate dielectric layer, a second gate electrode structure at least partially within the trench, and a second gate dielectric layer between the second gate electrode structure and the first portion.

Abstract: Micro light-emitting diode (LED) display fabrication and assembly are described. In an example, a micro-light emitting diode (LED) display panel includes a display backplane substrate having a plurality of metal bumps thereon. A plurality of LED pixel elements includes ones of LED pixel elements bonded to corresponding ones of the plurality of metal bumps of display backplane substrate. One or more of the plurality of LED pixel elements has a graphene layer thereon. The graphene layer is on a side of the one or more of the plurality of LED pixel elements opposite the side of the metal bumps.

Abstract: A phased array has a laminar substrate, a plurality of elements on the laminar substrate forming a patch phased array, and integrated circuits on the laminar substrate. Each integrated circuit is a high frequency integrated circuit configured to control receipt and/or transmission of signals by the plurality of elements in the patch phased array. In addition, each integrated circuit has a substrate side coupled with the laminar substrate, and a back side. The phased array also has a plurality of heat sinks. Each integrated circuit is coupled with at least one of the heat sinks. At least one of the integrated circuits has a thermal interface material in conductive thermal contact with its back side. The thermal interface material thus is between the at least one integrated circuit and one of the heat sinks. Preferably, the thermal interface material has a magnetic loss tangent value of between 0.5 and 4.5.

Abstract: The disclosure relates to the field of display technologies, and discloses a display panel and a method for fabricating the same, and the display panel includes: a base substrate, a pixel definition layer and a cathode layer arranged on one side of the base substrate successively, and a transparent electrically-conductive film arranged on the side of the cathode layer away from the base substrate, wherein the transparent electrically-conductive film is electrically connected with the cathode layer so that the transparent electrically-conductive film is in parallel to the cathode layer.

Abstract: The present disclosure relates to an array substrate, a method for manufacturing the same, a display panel, and a display device. The array substrate includes: a gate metal layer, disposed on the substrate and the gate metal layer including a grounding wire located in the peripheral region; a gate insulating layer, at least covering the gate metal layer; and a conductive layer structure, disposed over the gate insulating layer and including an auxiliary grounding wire located in the peripheral region, wherein the auxiliary grounding wire is connected to the grounding wire. The present disclosure can prevent ESD more effectively.

Abstract: In an embodiment, a quantum device includes a first set of protrusions formed on a substrate and a second set of protrusions formed on a qubit chip. In the embodiment, the quantum device includes a set of bumps formed on an interposer, the set of bumps formed of a material having above a threshold ductility at a room temperature range, wherein a first subset of the set of bumps is configured to cold weld to the first set of protrusions and a second subset of the set of bumps is configured to cold weld to the second set of protrusions.

Abstract: A method of batch soldering includes: forming a soldered joint between a metal region of a first semiconductor die and a metal region of a substrate using a solder preform via a soldering process which does not apply pressure directly to the first semiconductor die, the solder preform having a maximum thickness of 30 ?m and a lower melting point than the metal regions; setting a soldering temperature of the soldering process so that the solder preform melts and fully reacts with the metal region of the first semiconductor die and the metal region of the substrate to form one or more intermetallic phases throughout the entire soldered joint, each intermetallic phase having a melting point above the preform melting point and the soldering temperature; and soldering a second semiconductor die to the same or different metal region of the substrate, without applying pressure directly to the second semiconductor die.

Abstract: Transistors including semiconductor regions where operating current flows are provided above a substrate. Operating electrodes of conductive material having thermal conductivity higher than the semiconductor regions and contacting the semiconductor regions to conduct operating current to the semiconductor regions are disposed. A conductor pillar for external connection contains contact regions where the semiconductor regions and the operating electrodes contact, and is electrically connected to the operating electrodes. The contact regions are disposed in a first direction. Each contact region has a planar shape long in a second direction orthogonal to the first direction. A first average distance, obtained by averaging distances in the second direction from each end portion of the contact region in the second direction to an edge of the conductor pillar across the contact regions, exceeds an average distance value in a height direction from the contact region to a top surface of the conductor pillar.

Abstract: An apparatus is described. The apparatus includes a compute-in-memory (CIM) circuit for implementing a neural network disposed on a semiconductor chip. The CIM circuit includes a mathematical computation circuit coupled to a memory array. The memory array includes an embedded dynamic random access memory (eDRAM) memory array. Another apparatus is described. The apparatus includes a compute-in-memory (CIM) circuit for implementing a neural network disposed on a semiconductor chip. The CIM circuit includes a mathematical computation circuit coupled to a memory array. The mathematical computation circuit includes a switched capacitor circuit. The switched capacitor circuit includes a back-end-of-line (BEOL) capacitor coupled to a thin film transistor within the metal/dielectric layers of the semiconductor chip. Another apparatus is described. The apparatus includes a compute-in-memory (CIM) circuit for implementing a neural network disposed on a semiconductor chip.

Abstract: A method includes forming a dummy gate stack over a semiconductor substrate, wherein the semiconductor substrate is comprised in a wafer. The method further includes removing the dummy gate stack to form a recess, forming a gate dielectric layer in the recess, and forming a metal layer in the recess and over the gate dielectric layer. The metal layer has an n-work function. A portion of the metal layer has a crystalline structure. The method further includes filling a remaining portion of the recess with metallic materials, wherein the metallic materials are overlying the metal layer.

Abstract: An electrical connector assembly for connecting the CPU and the printed circuit board, includes an electrical connector and a back plate respectively mounted upon two opposite surfaces of the printed circuit board. A fastening seat partially surrounds the connector for securing a heat sink which is downwardly seated upon the CPU for heat dissipation. The back plate forms a plurality of securing studs extending through the fastening seat. The heat sink further includes a plurality of tubular securing nuts respectively surrounded by the corresponding coil springs and secured to the corresponding securing studs in an adjustable manner so as to impose the downward force upon the heat sink to urge the heat sink to abut downwardly against the CPU for heat dissipation of the CPU.

Abstract: The present invention is directed to a memory cell array comprising an array of magnetic memory elements arranged in rows and columns; a plurality of electrodes, each of which is formed adjacent to a respective one of the array of magnetic memory elements; a plurality of first conductive lines, each of which is connected to a respective row of the array of magnetic memory elements along a row direction; and a plurality of composite lines. Each composite line includes a volatile switching layer connected to a respective column of the plurality of electrodes along a column direction; an electrode layer formed adjacent to the volatile switching layer; and a second conductive line formed adjacent to the electrode layer. The dimension of the volatile switching layer may be substantially larger than the size of the magnetic memory element along the row direction.

Abstract: Some embodiments include an assembly having first and second pillars. Each of the pillars has an inner edge and an outer edge. A first gate is proximate a channel region of the first pillar. A second gate is proximate a channel region of the second pillar. A shield line is between the first and second pillars. First and second bottom electrodes are over the first and second pillars, respectively; and are configured as first and second angle plates. An insulative material is over the first and second bottom electrodes. The insulative material may be ferroelectric or non-ferroelectric. A top electrode is over the insulative material. Some embodiments include methods of forming assemblies.

Abstract: An array substrate includes first and second thin-film transistors formed on a base and spaced by a predetermined distance in a first direction that is parallel to the plane on which the base is located and set in parallel. The first thin-film transistor includes a first active layer, a first gate insulation layer, a first gate electrode, a first interlayer insulation layer, and first source/drain electrodes sequentially stacked on the base in a third direction that is perpendicular to the first direction. The first source/drain electrodes are electrically connected to the first active layer. The second thin-film transistor includes a second gate electrode, a second gate insulation layer, second source/drain electrodes, and a second active layer sequentially stacked on the base in the third direction. The first active layer and the first gate electrode are both formed of a poly-silicon material. The second active layer includes an oxide semiconductor material.

Abstract: Some embodiments of the present disclosure are directed to a device. The device includes a substrate comprising a silicon layer disposed over an insulating layer. The substrate includes a transistor device region and a radio-frequency (RF) region. An interconnect structure is disposed over the substrate and includes a plurality of metal layers disposed within a dielectric structure. A handle substrate is disposed over an upper surface of the interconnect structure. A trapping layer separates the interconnect structure and the handle substrate.

Abstract: The present disclosure relates to a semiconductor device and method of manufacturing the same. The semiconductor device includes a substrate and a through silicon via structure. The through silicon via is disposed in the substrate and includes an insulation layer and a plurality of conductive lines. The conductive lines are separated from each other by the insulation layer and extend from a top surface of the insulation layer to a bottom surface opposite to the top surface.