Abstract: The present invention provides a polishing composition that can be suitably used in polishing of polysilicon, and a polishing method using the polishing composition. The polishing composition contains a nitrogen-containing nonionic surfactant and abrasive grains and has a pH of 9 to 12. The content of the nitrogen-containing nonionic surfactant in the polishing composition is preferably 20 to 500 ppm. The abrasive grains contained in the polishing composition are preferably colloidal silica. The average primary particle diameter of the abrasive grains contained in the polishing composition is preferably 10 to 90 nm. The content of the abrasive grains in the polishing composition is preferably 1.0 to 5.0% by mass.

Abstract: A method provides a magnetic transducer including a first shield, a read sensor, and a second shield. The read sensor is between the first shield and the second shield. The read sensor has at least one pinned layer aligned with a sensor pinning direction. Providing the second shield includes depositing at least one of a first ferromagnetic layer, a second ferromagnetic and a pinning layer in the presence of a first magnetic field in a first direction non-orthogonal and non-parallel to the sensor pinning direction. A nonmagnetic spacer layer is between the first ferromagnetic layer and the second ferromagnetic layer. The pinning layer is adjacent to the second ferromagnetic layer. The first ferromagnetic layer is between the read sensor and the nonmagnetic spacer layer. The first ferromagnetic layer is coupled antiparallel with the second ferromagnetic layer.

Abstract: The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid silicon halide and liquid titanium dioxide precursor into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200° C. to about 1600° C. to produce titanium dioxide particles that are substantially encapsulated in silicon dioxide.

Abstract: The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising: reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid titanium dioxide precursor and a liquid or finely divided solid compound comprising a element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, and Pb, into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200° C. to about 1600° C. to produce titanium dioxide particles that are coated by the oxide formed from the element.

Abstract: Disclosed are corrosion resistant compositions and processes for the preparation thereof that involve the application of a plurality of layers comprised of at least one tetraalkoxysilane and at least one functionalized silane layer to a supporting substrate.

Abstract: A method for transfer of a two-dimensional material includes forming a spreading layer of a two-dimensional material on a substrate, the spreading layer having a monolayer. A stressor layer is formed on the spreading layer, and the stressor layer is configured to apply stress to a closest monolayer of the spreading layer. The closest monolayer is exfoliated by mechanically splitting the spreading layer wherein the closest monolayer remains on the stressor layer.

Abstract: In one aspect, a method of making non-covalently bonded carbon-titania nanocomposite thin films includes: forming a carbon-based ink; forming a titania (TiO2) solution; blade-coating a mechanical mixture of the carbon-based ink and the titania solution onto a substrate; and annealing the blade-coated substrate at a first temperature for a first period of time to obtain the carbon-based titania nanocomposite thin films. In certain embodiments, the carbon-based titania nanocomposite thin films may include solvent-exfoliated graphene titania (SEG-TiO2) nanocomposite thin films, or single walled carbon nanotube titania (SWCNT-TiO2) nanocomposite thin films.

Abstract: A method of etching exposed silicon-nitrogen-and-carbon-containing material on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor and an oxygen-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents react with the exposed regions of silicon-nitrogen-and-carbon-containing material. The plasma effluents react with the patterned heterogeneous structures to selectively remove silicon-nitrogen-and-carbon-containing material from the exposed silicon-nitrogen-and-carbon-containing material regions while very slowly removing selected other exposed materials. The silicon-nitrogen-and-carbon-containing material selectivity results partly from the presence of an ion suppression element positioned between the remote plasma and the substrate processing region. The ion suppression element controls the number of ionically-charged species that reach the substrate.

Abstract: The present invention relates to a method for manufacturing an X-ray/?-ray focusing optical system comprising the steps of: providing a capillary substrate; and sequentially accumulating a plurality of alternation layers, each consisting of an X-ray/?-ray opaque material and an X-ray/?-ray transparent material, on an inner surface of the capillary substrate in a Fresnel pattern by atomic layer deposition.

Abstract: Catalysts include five-membered nitrogen containing heterocyclic compounds as ligands for metal ions which have catalytic activity. The catalysts are used to electrolessly plate metal on metal clad and un-clad substrates.

Abstract: Slurry compositions and chemically activated CMP methods for polishing a substrate having a silicon carbide surface using such slurries. In such methods, the silicon carbide surface is contacted with a CMP slurry composition that comprises i) a liquid carrier and ii) a plurality of particles having at least a soft surface portion, wherein the soft surface portion includes a transition metal compound that provides a Mohs hardness <6, and optionally iii) an oxidizing agent. The oxidizing agent can include a transition metal. The slurry is moved relative to the silicon carbide comprising surface, wherein at least a portion of the silicon carbide surface is removed.

Abstract: A method for forming a dielectric film on a substrate by plasma-assisted deposition, includes: introducing a Si-containing process gas to a reaction space wherein a substrate having a surface with patterned recesses is placed; and applying RF power to the process gas in the reaction space to form a dielectric film on the surface by plasma reaction. The RF power is comprised of pulses of high-frequency RF power and pulses of low-frequency RF power, which overlap and are synchronized.

Abstract: A process to manufacture large coated detergent particles having perpendicular dimensions x, y and z, wherein x is from 0.2 to 2 mm, y is from 2.5 to 8 mm, and z is from 2.5 to 8 mm the particles being substantially the same shape and size as one another and the uncoated core particles comprising at least 50 wt % of soluble surfactant, the process comprising the steps of suspending uncoated core particles in a fluidized bed and spraying onto the core particles an aqueous slurry of sodium carbonate in admixture with 0.6 to 3 wt % sodium carboxy methyl cellulose and drying to form the coated particles.

Abstract: Certain embodiments are directed to methods, devices and systems designed to remove selected portions of a material to expose an underlying material or substrate. One or more electrical components may be coupled to the underlying substrate through an electrical contact. Kits and systems for producing electrical contacts are also provided.

Abstract: A coating head is constructed of a solvent feed mechanism connected to a forward side in a direction of movement of a coating solution feed mechanism, and a gas jet mechanism connected to a rearward side in the direction of movement. While moving the coating head relative to a substrate, a solvent is supplied onto the substrate from the solvent feed mechanism, then a coating solution is supplied onto a film of the solvent from the coating solution feed mechanism, and finally a gas is jetted to an uneven surface of the coating solution from the gas jet mechanism to smooth a thin film surface of the coating solution.

Abstract: A method for producing a coated material having an oxidizable metal-containing coating, including the step of applying to a base material (11) an oxidizable metal-containing coating fluid containing a particulate oxidizable metal, a carbon component, a thickener, and water using a coating apparatus (1) and a coating fluid preparation step in which a thickener solution prepared by dissolving the thickener in water, the particulate oxidizable metal, and the carbon component or an aqueous dispersion of the carbon component are put and mixed in a preparation tank (3) to prepare the oxidizable metal-containing coating fluid. In the coating fluid preparation step, the particulate oxidizable metal is added to the thickener solution.

Abstract: A method of making a multi-layer micro-wire structure includes providing a substrate with a plurality of micro-channels. First and second material compositions are provided. The first material composition is coated over the substrate and micro-channels and then removed from the substrate surface but not the micro-channels. The second material composition is coated over the substrate, in the micro-channels, and over the first materials, and then removed from the substrate surface but not the micro-channels. The first and second material compositions are cured in the micro-channels in a common step to form a cured first material layer and a cured second material layer in the micro-channels. The cured first material layer and the cured second material layer form an electrically conductive multi-layer micro-wire in each micro-channel.

Abstract: Methods of forming a pattern on a substrate include forming carbon-comprising material over a base material, and spaced first features over the carbon-comprising material. Etching is conducted only partially into the carbon-comprising material and spaced second features are formed within the carbon-comprising material which comprise the partially etched carbon-comprising material. Spacers can be formed along sidewalls of the spaced second features. The carbon-comprising material can be etched through to the base material using the spacers as a mask. Spaced third features can be formed which comprise the anisotropically etched spacers and the carbon-comprising material.

Abstract: A method for mechanical and/or optical functionalization of a transparent timepiece component, including: forming a body of methyl polymethacrylate, including a bottom surface and a mechanical and/or optically functionalized intermediate surface; coating the body with a layer made by injecting a second transparent polymerizable material into a cavity between a mold and the body or an intermediate body delimited by a complementary intermediate surface of a contact surface of a preceding mold, the last mold being the negative of the top surface of the component; polymerizing the second material therein; removing the component from the flexible mold by deformation of the mold. Hardness can be improved by UV irradiation of a component.

Abstract: An imprint method includes, in the peeling step of peeling a mold off the material layer to be transferred, a region-of-contact recognition operation of recognizing and determining a region of contact of the mold with the material layer to be transferred, a center-of-gravity locating operation of determining a center of gravity of a morphology of the thus recognized region of contact on the basis of that morphology, and a peeling operation of determining a point of force for applying peeling force to the mold or the imprinting substrate in relation to the center of gravity determined by the center-of-gravity locating operation, thereby acting the peeling force on the point of force.