Patents Examined by Connie P. Johnson
  • Patent number: 8703390
    Abstract: A method of making a flexographic printing sleeve form includes the steps of forming a sleeve body by providing one or more at least partially cured uniform layers on a sleeve carrier; forming a relief image on the sleeve body by imagewise jetting a curable jetting fluid; and optionally overall post-curing; characterized in that between formation of the sleeve body and formation of the relief image no polishing or grinding is performed.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: April 22, 2014
    Assignee: Agfa Graphics NV
    Inventors: Luc Leenders, Eddie Daems
  • Patent number: 8652756
    Abstract: A positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted fluorescein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate with excellent pattern profile after light exposure, adhesion, implantation characteristics onto a non-planar substrate, and in addition, ion implantation resistance at the time of ion implantation; and to provide a patterning process.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: February 18, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Daisuke Kori
  • Patent number: 8623586
    Abstract: A method for applying a light-blocking material onto an imagewise exposed lithographic printing plate is disclosed. The exposed plate comprises on a substrate a photosensitive layer having hardened areas and non-hardened areas (for negative plate) or solubilized areas and non-solubilized areas (for positive plate). The non-hardened or solubilized areas of said photosensitive layer are removable with ink and/or fountain solution on a lithographic press. The light-blocking material is applied to the plate preferably from a solution or dispersion containing such material. The application of the light-blocking material prevents at least a portion of the room light in a certain wavelength (such as ultraviolet) range from reaching the photosensitive layer, thus allowing improved room light stability of the exposed plate.
    Type: Grant
    Filed: February 25, 2009
    Date of Patent: January 7, 2014
    Inventor: Gary Ganghui Teng
  • Patent number: 8617793
    Abstract: A waterless planographic printing plate precursor is capable of plate inspection without a post-dyeing step, capable of being handled in a light room and excellent in coloring matter fixing in silicone rubber layer. The waterless planographic printing plate precursor has at least a photosensitive layer or heat sensitive layer and a silicone rubber layer on a substrate, which is a waterless planographic printing plate precursor characterized in that a color pigment is contained in the above-mentioned silicone rubber layer, and it is possible to obtain a more excellent effect by further incorporating, in the above-mentioned silicone rubber layer, a pigment dispersant containing an organic complex compound comprising of a metal and an organic compound. Furthermore, when aluminum and/or titanium is contained as the above-mentioned metal, a more excellent effect can be obtained.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: December 31, 2013
    Assignee: Toray Industries, Inc.
    Inventors: Akihiro Iihara, Mitsuru Suezawa, Masuichi Eguchi
  • Patent number: 8507181
    Abstract: A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound copolymerizable with the free radical polymerizable group of (i) and comprising at least one functional group with pKs<5.
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: August 13, 2013
    Inventors: Christopher D. Simpson, Bernd Strehmel, Harald Baumann, Ulrich Fiebag, Mathias Jarek
  • Patent number: 8501385
    Abstract: A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: August 6, 2013
    Assignee: JSR Corporation
    Inventors: Yusuke Anno, Kouichi Fujiwara, Makoto Sugiura, Gouji Wakamatsu
  • Patent number: 8476401
    Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by the following formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): in the formula (1), L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.
    Type: Grant
    Filed: September 6, 2005
    Date of Patent: July 2, 2013
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Akifumi Ueda
  • Patent number: 8476473
    Abstract: A compounds represented by the Formula (I) or the Formula (I?). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q?1 to Q?4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
    Type: Grant
    Filed: September 1, 2009
    Date of Patent: July 2, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Nobuo Ando, Mitsuhiro Hata
  • Patent number: 8455174
    Abstract: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.
    Type: Grant
    Filed: October 28, 2010
    Date of Patent: June 4, 2013
    Assignee: Georgia Tech Research Corporation
    Inventors: Paul A. Kohl, Sue Ann Bidstrup-Allen, Clifford Lee Henderson
  • Patent number: 8426101
    Abstract: A photosensitive composition containing a compound having a specific structure as described in the specification, a pattern-forming method using the photosensitive composition and the compound having a specific structure used in the photosensitive composition.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: April 23, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Kenji Wada, Hiromi Kanda
  • Patent number: 8415082
    Abstract: A resist composition including a base material component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure, the acid generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a hetero atom; R1 represents a divalent linking group; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms; n represents an integer of 1 to 3; and Z represents an organic cation (exclusive of an amine ion and a quaternary ammonium ion) having a valence of n.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: April 9, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshiyuki Utsumi, Takehiro Seshimo
  • Patent number: 8409780
    Abstract: A heat-sensitive negative-working lithographic printing plate precursor comprising: a support having a hydrophilic surface or which is provided with a hydrophilic layer; and an image-recording layer comprising hydrophobic thermoplastic polymer particles, an infrared light absorbing dye and a dye; wherein said dye has a specified structure and a most bathochromic light absorption peak between 451 nm and 750 nm.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: April 2, 2013
    Assignee: AGFA Graphics NV
    Inventors: Paul Callant, Hieronymus Andriessen, Alexander Williamson
  • Patent number: 8409781
    Abstract: Disclosed are: a composition for forming a resist protection film, which shows less damage to a resist film, can form a good, rectangular resist pattern, and can be used regardless of the structure of a resin used in a resist composition; and a method for forming a resist pattern by using the composition. Specifically, disclosed are: a composition for forming a resist protection film, which comprises (a) an alkali-soluble polymer and (b) an ether-based solvent; and a method for forming a resist pattern by using the composition.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: April 2, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Keita Ishiduka, Toshikazu Takayama
  • Patent number: 8399173
    Abstract: The present invention provides a resist composition prepared by dissolving components in an organic solvent containing ethyl lactate, which suppresses deterioration of sensitivity with time and also has required lithographic characteristics, and a method for forming a resist pattern. The resist composition is prepared by dissolving a resin component (A) which exhibits changeable alkali solubility under an action of an acid, an acid generator component (B) which generates an acid upon exposure, an amine (D) and acetic acid in an organic solvent (S) containing ethyl lactate.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: March 19, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Shoichi Fujita, Kazuyuki Nitta, Tomoharu Takahashi, Hirokazu Ozaki
  • Patent number: 8394570
    Abstract: A sulfonium salt has formula (1) wherein R1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R2, R3, and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: March 12, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Takeshi Kinsho, Satoshi Watanabe, Youichi Ohsawa
  • Patent number: 8357484
    Abstract: A multilayer dry film resist includes two or more organic films which can be patterned; the multilayer dry film resist includes a base substrate, a first organic film disposed on the base substrate, and a second organic film disposed on the first organic film and including a photosensitizer.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: January 22, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Kyoung-keun Son, Min Kang, Byoung-joo Kim
  • Patent number: 8344088
    Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: January 1, 2013
    Assignee: Honeywell International Inc.
    Inventors: Joseph T. Kennedy, Teresa Baldwin-Hendricks
  • Patent number: 8338556
    Abstract: A patterned composite ferroelectric layer, having ferroelectric electronic properties, on a substrate. Individual layers are each made of metal acrylate compounds, a photoinitiator compound and an acrylate crosslinking compound. The individual layers are stacked on the substrate to form a composite layer. A photomask is formed on the composite layer. Unmasked areas of the composite layer are irradiated with ultraviolet light. A solvent removes non-irradiated areas of the composite layer from the substrate. The patterned composite layer is heated in an oxygen atmosphere to cause a chemical reaction among the metal acrylate compounds and oxygen, a patterned composite ferroelectric layer being formed on the substrate.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: December 25, 2012
    Assignee: The United States of America as Represented by the Secretary of the Navy
    Inventor: Thomas Kirk Dougherty
  • Patent number: 8329376
    Abstract: A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, and substantially removing the acid catalyst from the reaction mixture, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively. The composition is effective in minimizing the occurrence of pattern defects after lithography and is shelf stable.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: December 11, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsutomu Ogihara, Takafumi Ueda, Motoaki Iwabuchi
  • Patent number: 8323872
    Abstract: A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: December 4, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takeru Watanabe, Yuji Harada