Abstract: A display panel including a drive substrate, a first LED structure, a second LED structure and a third LED structure that are disposed to be sequentially stacked and at least one electrical switching member. The at least one electrical switching member is disposed on a side of the third LED structure adjacent to the drive substrate. One of the electrical switching members is correspondingly connected to and disposed on one of the conductive pads. At least one of the first independent electrode, the second independent electrode, and the third independent electrode is connected to one of the electrical switching members through a through-hole.

Abstract: A passivation layer is formed over an interconnect structure. An opening is etched at least partially through the passivation layer. A first conductive layer is deposited over the passivation layer. The first conductive layer partially fills the opening. An insulator layer is deposited over the first conductive layer. The insulator layer partially fills the opening. A second conductive layer is deposited over the insulator layer. The second conductive layer completely fills the opening. A first conductive structure is formed that is electrically coupled to the first conductive layer. A second conductive structure is formed that is electrically coupled to the second conductive layer.

Abstract: Systems and methods for controlling one or more qubits in a quantum processor are disclosed. The system comprises a quantum processor comprising one or more spin-based qubits; and a dielectric resonator positioned in proximity to the quantum processor. The dielectric resonator provides a magnetic field. The quantum processor is positioned in a portion of the magnetic field provided by the resonator such that the portion of the magnetic field controls the spin transitions of the one or more spin-based qubits of the quantum processor.

Abstract: The object is to provide a technology for enabling reduction of adhesion of a bonding material to a particular electrode. A semiconductor device includes: a semiconductor element with a surface including a first electrode and a second electrode; a protective film formed on the surface of the semiconductor element and having insulating properties, the protective film exposing the first electrode and the second electrode; a metal lead electrode bonded to the first electrode exposed from the protective film; and a bonding material with which the first electrode exposed from the protective film is bonded to the metal lead electrode. The metal lead electrode includes an abutment portion being a protrusion abutting the protective film and blocking between the bonding material and the second electrode in a cross-sectional view.

Abstract: A semiconductor device with a novel structure is provided. The semiconductor device includes a first electrode, a transistor including a back gate, a capacitor including a pair of electrodes, and a first insulator that can have ferroelectricity between the back gate of the transistor and a semiconductor. The first insulator overlaps with the semiconductor with a second insulator therebetween. One of a source electrode and a drain of the transistor is electrically connected to the first electrode. The other of the source and the drain of the transistor is electrically connected to one electrode of the pair of electrodes. The pair of electrodes are each in contact with the first insulator and include a region where the pair of electrodes overlap with each other with the first insulator therebetween. As the first insulator, a ferroelectric is used.

Abstract: Disclosed is a chip-on-film package capable of preventing damage to a surface thereof. The chip-on-film package includes a flexible base film, a first metal wiring layer formed on a first surface of the base film, a first surface insulating layer formed on the first metal wiring layer, a semiconductor chip connected to the first metal wiring layer through an opening formed in the first surface insulating layer, and a spacer formed on the first surface insulating layer within a target area, which is an area within which the first surface insulating layer and a structure of a display panel contact each other. At least one groove is formed in the first surface insulating layer within the target area, and the spacer includes a first spacer filled in the groove.

Abstract: A semiconductor memory device includes a memory cell array having a three-dimensional structure, the memory cell array including a plurality of memory cells repeatedly arranged in a first lateral direction, a second lateral direction, and a vertical direction, wherein the first lateral direction and the second lateral direction are perpendicular to each other, and the vertical direction is perpendicular to each of the first lateral direction and the second lateral direction, wherein each of the plurality of memory cells includes two transistors including at a least portions of two word lines passing through the memory cell in the vertical direction and at least portions of two bit lines respectively on both sides of the two word lines in the first lateral direction, each of the two bit line extending along the second lateral direction, and each of the plurality of memory cells does not include a capacitor.

Abstract: The invention relates to an optoelectronic semiconductor layer sequence comprising:—an active layer for generating radiation, and—at least one filter layer configured to at least partially absorb the electromagnetic radiation generated by the active layer of wavelengths smaller than a predetermined cutoff wavelength. The invention also relates to an optoelectronic semiconductor device.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers, a dielectric spacer layer underlying the alternating stack, memory opening vertically extending through the alternating stack, and through the dielectric spacer layer, a memory opening fill structure located in the memory opening and including a dielectric core, a vertical semiconductor channel having a hollow portion which surrounds the dielectric core and a pillar portion which does not surround the dielectric core, and a memory film, and a source layer located under the dielectric spacer layer and contacting the pillar portion of the vertical semiconductor channel.

Abstract: A semiconductor structure including a semiconductor die, a component layer and a pseudo static random access memory (PSRAM) die is provided. The component layer is disposed on the surface of the semiconductor die, wherein the component layer includes an organic layer. The PSRAM die is disposed on the surface of the semiconductor die and is electrically connected to the semiconductor die. A manufacturing method of a semiconductor structure is also provided.

Abstract: A magnetoresistive random access memory (MRAM) includes a pillar structure having a bottom electrode, a magnetic tunnel junction (MTJ) and a top electrode disposed on the MTJ. The MTJ has a reference layer, a free layer and a tunnel barrier disposed between the reference layer and the free layer. The MTJ is disposed on the bottom electrode. The bottom electrode and the top electrode are recessed within a periphery of the MTJ to form a disrupted sidewall profile.

Abstract: A semiconductor device includes a stacked body including stacked insulating layers and stacked conductive layers; a cell plug; a connection contact structure; and a source layer coupled to the cell plug. The cell plug includes upper and lower portions, the connection contact structure includes a first connection contact disposed at substantially the same level as the lower portion of the cell plug, and a second connection contact disposed at substantially the same level as the upper portion thereof, a level at which the first and second connection contacts contact each other is substantially the same as a level at which the upper and lower portions of the cell plug contact each other, and a level of an uppermost portion of the second connection contact is higher than a level of a bottom surface of the source layer, and is lower than a level of a top surface thereof.

Abstract: An image sensor includes a substrate having an element separation pattern, a first active region, and a ground region, the ground region being separated from the first active region by the element separation pattern, a transfer transistor including a transfer gate electrode on the first active region, the transfer gate electrode being separated from the ground region by the element separation pattern, a photo diode within the substrate, the photo diode being spaced apart from the transfer gate electrode, and a contact on the ground region, the contact being configured to receive a ground voltage.

Abstract: A semiconductor memory device, and a method of manufacturing the semiconductor memory device, includes a gate stack, a pass gate overlapping a contact region of the gate stack and opening a cell array region of the gate stack, a doped semiconductor layer spaced apart from the pass gate and overlapping the cell array region of the gate stack, and an active pillar passing through the pass gate.

Abstract: A semiconductor device includes a trench formed in an element formation region of a semiconductor substrate, an insulating film formed on an inner wall of the trench, a p-type semiconductor portion embedded in a part of the trench via the insulating film, and an n-type semiconductor portion embedded in another part of the trench via the insulating film and provided so as to contact with the p-type semiconductor portion.

Abstract: A method of manufacturing a display apparatus is provided. The method includes forming a test area on a display substrate, irradiating a first laser to the test area and determining relative positions of the test area and a first irradiation area formed by irradiating the first laser to the test area, and correcting a position of a second laser irradiated to the display substrate based on the relative positions of the test area and the first irradiation area.

Abstract: A display device includes a display panel. The display panel includes a pixel, an encapsulation layer, and a connection electrode connecting a signal line and a pad electrode. The encapsulation layer includes an outer region in which a first inorganic encapsulation layer and the second inorganic encapsulation layer are in contact, and an inner region in which an organic encapsulation layer is disposed. A first connection electrode overlaps the outer region.

Abstract: A quantum device configured to be able to form an array of quantum dots, the device including for this: an active layer made of a semiconductor material; a plurality of first gates disposed along a plurality of rows; a plurality of second gates disposed along a plurality of columns perpendicular to the rows of the plurality of rows; a plurality of third gates, each third gate of the plurality of third gates being disposed at the intersection of one row of the plurality of rows and one column of the plurality of columns, each third gate being separated from the nearest third gates, on a row by a first gate and on a column by a second gate; the active layer including apertures over the entire thickness of the active layer disposed between the rows of the plurality of rows and the columns of the plurality of columns.

Abstract: The present disclosure provides a micro light-emitting element, method for manufacturing a micro light-emitting element, and a light-emitting device. The micro light-emitting element includes a DBR structure layer, including a DBR adhesive layer, a DBR reflective layer, and a DBR sacrificial layer, where the DBR adhesive layer, the DBR reflective layer, and the DBR sacrificial layer are sequentially stacked. Subsequent structural coverage of a DBR reflective layer is improved by means of the DBR adhesion layer. Density of film layers of the DBR sacrificial layer, the DBR reflective layer, and the DBR adhesive layer are sequentially increased, so that etching rates of the DBR sacrificial layer, the DBR reflective layer, and the DBR adhesive layer are sequentially decreased during etching, thereby forming an inverted trapezoidal through hole which comprises an inclined side wall by an etching process.

Abstract: Bipolar junction transistor (BJT) structures are provided. First and second well regions are formed over a dielectric layer. A plurality of first and second gate-all-around (GAA) field-effect transistors are formed over a first well region. A plurality of third GAA field-effect transistors are formed over the second well region. Source/drain features of the first and third GAA field-effect transistors and the second well region have a first conductivity type. Source/drain features of the second GAA field-effect transistors and the first well region have a second conductivity type that is different from the first conductivity type. A first PN junction of a first BJT device is formed between the source/drain features of the first GAA field-effect transistors and the first well region, and a second PN junction of the first BJT device is formed between the first well region and the second well region.