Abstract: The present invention relates to an ion trap mass spectrometer using a cold electron source, in a production of a portable mass spectrometer, in which a microchannel plate (MCP) module is used, initial electrons are induced by injecting ultraviolet photons emitted from an ultraviolet diode to a front surface of the MCP module, electron beams amplified from the electrons are amplified using a channeltron electron multiplier (CEM), the amplified electron beams are accurately adjusted and injected into an ion trap, thus increasing the amplification rate, and since a quadrupole field is used as an ion filter which returns the initially injected electrons to the inside of an ion trap mass separator, the ionization rate increases.

Abstract: Provided is a stereo imaging apparatus that generates X-rays from a plurality of different focal positions and that acquires a plurality of X-ray images from an X-ray detector, the stereo imaging apparatus including X-ray generation controlling means for controlling irradiated areas of X-rays so that an irradiated area in a detection area of the X-ray detector based on X-rays applied from a first focal position is included in an irradiated area in the detection area based on X-rays applied from a second focal position.

Abstract: A method for time-resolved tomosynthesis imaging for a moving object includes moving an imaging device having an x-ray source and an x-ray detector around the moving object and recording raw image data for a temporal series of tomosynthesis images. The method also includes reconstructing the temporal series of tomosynthesis images from the raw image data. While the imaging device is being moved, a motion speed of the imaging device is matched to a speed, at which the moving object is moving.

Abstract: A specimen holder is configured to hold, during a sample preparation procedure carried out using first and second sample preparation apparatuses, a semiconductor device to be analyzed using an electron microscope. The specimen holder includes a holding portion having a support configured to support the semiconductor device; and a supporting portion configured to releasable support the holding portion. The supporting portion includes an engaging element configured to couple the specimen holder into the first and second sample preparation apparatuses during the sample preparation procedure, and a guide configured to enable the holding portion to slide within the guide and vary a position of the holding portion with respect to the supporting portion.

Abstract: Provided is an ion generating apparatus. The ion generating apparatus includes opposed electrodes connected to a high-frequency power supply, and hence, even in a case where a cathode filament is broken, hydride gas can be ionized to generate hydrogen ion. Thus, a fluorine compound deposited in a source housing is reduced in vacuum, and gas containing fluorine generated due to the above-mentioned reduction reaction is discharged with a vacuum pump.

Abstract: An electronic cassette for radiographic imaging includes a radiation imaging detector for detecting X-rays from an object and creating an X-ray image of the object. A battery supplies the radiation imaging detector with power. A power receiver wirelessly receives power from a wireless power transmission apparatus for charging the battery. A housing is formed from an electrical conductor, for containing the radiation imaging detector and the power receiver. A path opening is formed in the housing, and disposed between the power receiver and the wireless power transmission apparatus. A cover device is formed from a material having electrical insulating property and thermal conductivity, for closing the path opening, and conducting heat of the power receiver to the housing for dissipation. Preferably, the cover device contains synthetic resin. Also, a profile line of the path opening is at least partially curved.

Abstract: A plasma light source apparatus is provided. The plasma light source apparatus includes a chamber, a laser generating part, and a curved mirror. The chamber includes a plasma source gas for generating laser induced plasma. The laser generating part is spaced apart from the chamber and generates a hollow laser beam. The curved mirror is disposed between the chamber and the laser generating part. The curved mirror is configured to reflect and to condense the generated hollow laser beam into the chamber to generate the laser induced plasma in the chamber, and to reflect light emitted from the generated laser induced plasma.

Abstract: Provided is a charged particle beam device provided with: a charged particle source; an objective lens for focusing a charged particle beam emitted from the charged particle source onto a sample; a detector for detecting a secondary charged particle emitted from the sample; a probe capable of coming into contact with the sample; a gas nozzle for emitting conductive gas to the sample; and a control unit for controlling the drive of the probe and gas emission from the gas nozzle, wherein before bringing the probe into contact with the sample after applying the charged particle beam to the sample to machine the sample, the control unit emits gas toward a machining position from the gas nozzle and applies the charged particle beam to form a conductive film on a machining portion of the sample, and the charged particle beam device is provided with a contact detection unit for determining that the conductive film formed on the machining portion and the probe have come into contact with each other.

Abstract: A droplet generation system for use with a laser produced plasma (LPP) extreme ultraviolet (EUV) source plasma chamber is described. During EUV generation, oscillations can occur as a function of droplet time-of-flight within the plasma chamber. To reduce these oscillations, a droplet controller adjusts the rate at which droplets are generated which, in turn, dictates the droplet time-of-flight. The droplets are a result of coalescence of generated microdroplets such that the rate at which the droplets are generated is dictated by a frequency of a signal used to generate the microdroplets. This adjustment can be a modulation of a baseline droplet frequency. In some instances, the modulation function may be a sinusoid or implemented as a pseudo-random switch.

Abstract: One embodiment disclosed relates to an apparatus for reflection electron beam lithography. The apparatus includes an electron source, a patterned electron reflector generator structure, a stage, a demagnifying electron lens, and an ExB separator. The ExB separator configured to bend a trajectory of the electron beam towards the dynamic pattern generator structure. The patterned electron reflector structure is configured to reflect select portions of the electron beam so as to form a patterned electron beam. The ExB separator is further configured to allow the patterned electron beam to pass straight through towards the demagnifying electron lens. The demagnifying electron lens is configured to demagnify the patterned electron beam and project the demagnified patterned electron beam onto the target substrate. The apparatus disclosed herein has a straight projection axis and substantially reduces the electron beam path by a factor of three-to-one (compared to a prior apparatus which uses a magnetic prism).

Abstract: A cross-section processing-and-observation method, including a cross-section exposure step in which a sample is irradiated with a focused ion beam to expose a cross-section of the sample, and a cross-sectional image acquisition step in which the cross-section is irradiated with an electron beam to acquire a cross-sectional image of the cross-section. The cross-section exposure step and the cross-sectional image acquisition step are repeatedly performed along a predetermined direction of the sample at a setting interval to acquire multiple cross-sectional images of the sample. The method also includes a specific observation target detection step in which a predetermined specific observation target from the cross-sectional image acquired a the cross-sectional image acquisition step is detected.

Abstract: A particle beam detector is disclosed. The particle beam detector can include a particle beam receiving portion configured to convert particle beam energy to heat, and a plurality of temperature measuring devices disposed about the particle beam receiving portion. A location of a particle beam on the particle beam receiving portion can be determined by a temperature difference between at least two of the plurality of temperature measuring devices.

Abstract: A UVC radiation system for producing decontaminated air which flows into the surroundings of the system while blocking UVC radiation from entering the surrounding environment. In one embodiment, the system comprises a first housing forming a first air chamber and having multiple side walls each having one or more UVC lamps adjacent thereto. Each side wall has air vent openings in a pattern which confronts substantially the entire length of the one or more adjacent lamps. A second housing surrounds the first housing and lamps and forms a second air chamber having one or more walls containing an air filter to permit air to flow through the filter into the surrounding environment and to prevent UVC radiation from entering the environment.

Abstract: A system comprises an electron beam directed toward a three-dimensional object with one tilting angle and at least two azimuth angles, a detector configured to receive a plurality of scanning electron microscope (SEM) images from the three-dimensional object and a processor configured to calculate a height and a sidewall edge of the three-dimensional object.

Abstract: In various embodiments, a fluid is treated by flowing the fluid through a flow cell having (i) a fluid entry, (ii) a fluid exit, (iii) a treatment region disposed between the fluid entry and exit, and (iv) an interior surface reflective to ultraviolet (UV) light, and diffusively reflecting UV light emitted from one or more UV light sources to illuminate the treatment region substantially uniformly, thereby treating the fluid.

Abstract: A charged particle beam apparatus includes an electron beam irradiation unit that irradiates a sample with electron beams along a first irradiation axis. A rotation stage holds the sample and has a rotation axis in a direction perpendicular to the first irradiation axis. An ion beam irradiation unit irradiates the sample with ion beams along a second irradiation axis that is substantially parallel to the rotation axis to process the sample into a needle shape. A detection unit detects at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams or the electron beams, and a gaseous ion beam irradiation unit irradiates the sample with gaseous ion beams.

Abstract: A mask-image-taking-time calculating section 36 (i) sets a first imaging-time, in a first mask image, in accordance with X-ray imaging-conditions, and (ii) calculates a second imaging-time, in mask images from the second, for a mask image to be taken next in accordance with the imaging-time and brightness of the mask image taken previously such that average brightness of the mask image taken previously and a mask image to be taken next is target brightness. A live-image-taking-time calculating section 38 calculates an imaging-time for a live image in accordance with an actual imaging-time for the mask image having X-rays applied thereto from an X-ray irradiating device in accordance with the first or second imaging-time. An image processor 6 calculates a subtraction image by difference between a reference mask image obtained through averaging two or more mask images taken in accordance with the first or second imaging-time and the live image.

Abstract: A multi charged particle beam writing apparatus includes a divided shot data generation unit to generate, for each shot of multi beams of charged particle beams, data for plural times of divided shots such that irradiation for one shot of each beam is divided into plural times of divided shots each having a different irradiation time, an individual blanking system to provide blanking control individually for each of multi beams, based on the data for plural times of divided shots, an elastic rate correction value acquisition unit to acquire, for each of plural times of divided shots, an elastic rate correction value for correcting an elastic rate of an image of the whole multi beams, depending upon the number of ON-beams of the multi beams, and a lens to correct, for each divided shot, the elastic rate of the image of the whole multi beams by using the correction value.

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

Abstract: A single-chip scanning probe microscope is disclosed, wherein the microscope includes an isothermal two-dimensional scanner and a cantilever that includes an integrated strain sensor and a probe tip. The scanner is operative for scanning a probe tip about a scanning region on a sample while the sensor measures tip-sample interaction forces. The scanner, cantilever, probe tip, and integrated sensor can be fabricated using the backend processes of a conventional CMOS fabrication process. In addition, the small size of the microscope system, as well as its isothermal operation, enable arrays of scanning probe microscopes to be integrated on a single substrate.