Abstract: A high voltage device includes a circuit board 12 surrounded by an enclosure 11, potting 13 to provide electrical insulation between the circuit board 12 and the enclosure 11, and a layer of material 14, having a different resistivity than a resistivity of the potting 13, dividing the potting into separate and discrete sections. The layer of material 14 can be multiple layers. Each layer 14 can have a voltage applied, and a voltage of any layer 14 closer to the circuit board 12 can have a higher absolute value than any layer 14 farther from the circuit board 12.

Abstract: This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

Abstract: To improve an apparatus reliability by applying a voltage suitable to a situation, a charged-particle-beam apparatus 1 of the present invention includes: a sample stage 25; an electrostatic chuck 30; and an electrostatic-chuck controlling unit 13, and generates an image of a sample 24 by irradiating the sample 24 held on the sample stage 25 by the electrostatic chuck 30 with an electron beam 16. The electrostatic-chuck controlling unit 13, when the electrostatic chuck 30 holds the sample 24, applies a preset initial voltage to a chuck electrode of the electrostatic chuck 30; determines whether or not the sample 24 is normally clamped to the electrostatic chuck 30; and increases the voltage applied to the chuck electrode until determining that the sample 24 is clamped normally to the electrostatic chuck 30 if determining that the sample 24 is not clamped normally to the electrostatic chuck 30.

Abstract: An X-ray imaging apparatus includes a diffraction grating that forms an interference pattern by diffracting X-rays emitted from an X-ray source, an absorption grating that shields a portion of the interference pattern, a detector that detects the X-rays emitted from the absorption grating, and a moving unit that changes relative positions of a sample object and the absorption grating. The moving unit changes the relative positions of the sample object and the absorption grating from first relative positions to second relative positions. The detector detects the X-rays at least when the sample object and the absorption grating are at the first relative positions and when the sample object and the absorption grating are at the second relative positions.

Abstract: An electrospray system comprises a liquid extraction surface sampling probe. The probe comprises a probe body having a liquid inlet and a liquid outlet, and having a liquid extraction tip. A solvent delivery conduit is provided for receiving solvent liquid from the liquid inlet and delivering the solvent liquid to the liquid extraction tip. An open liquid extraction channel extends across an exterior surface of the probe body from the liquid extraction tip to the liquid outlet. An electrospray emitter tip is in liquid communication with the liquid outlet of the liquid extraction surface sampling probe. A system for analyzing samples, a liquid junction surface sampling system, and a method of analyzing samples are also disclosed.

Abstract: An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.

Abstract: An ion trap mass spectrometer is provided, including: an electron emitter; an ion trap storing ions generated by ionization resulting from an impact with electrons emitted from the electron emitter; a secondary ion filter for blocking out secondary ions generated due to ions selectively released by the ion trap; and a detector detecting ions selectively released from the ion trap, wherein the electron emitter, the ion trap, the secondary ion filter, and the ion detector are arranged on the same axis, so that a pure mass spectrum can be measured by excluding the secondary ions which are causes of background noise signals in the procedure of detection of the ions by the ion trap mass spectrometer.

Abstract: Provided herein is methods of treating a medical implant and methods of using the same.

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

Abstract: It is expected to provide an ion generating apparatus and an ion presence determination method that can prevent the lower accuracy of the ion presence determination caused by the humidity effect. The ion generators are switched ON at the different timing, the electrical potential of the collecting electrode is measured to determine that the ion is present (or not present) when the voltage difference is larger (or smaller) than the threshold. A humidity detecting unit is arranged in a duct. The set threshold for the determination is based on the humidity of the humidity detecting unit, and the ion presence determination is not performed when the humidity is equal to or more than a predetermined humidity. When the determination representing no ion is obtained predetermined times, the warning is output for the users with a LED of a display, a buzzer of a controller or the like.

Abstract: A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.

Abstract: The invention concerns a method for multiplexed tandem mass spectrometry of a sample to be analyzed containing at least two precursors, wherein at least two simplified multiplexed MS-MS spectra are obtained each from at least two selected precursors of the sample, the method comprising: (d) for each selected precursor generating an individual MS-MS spectrum from the simplified multiplexed MS-MS spectrum by selecting fragment ions of the simplified multiplexed MS-MS spectrum, the fragment ions are potential fragment ions obtained from the precursor; (e) submitting each individual MS-MS spectrum of step (d) to a real and a decoy database searches using a scoring process without score threshold condition or low score threshold condition for identifying candidate precursors and their fragment ions; (f) producing real individual MS-MS spectra from identified candidate precursors resulting from the real database search of step (e); and producing decoy individual MS-MS spectra from identified candidate precursors re

Abstract: A sample stage (2) on which a sample (4) is placed can be reciprocally moved along a guide (5) by a driving mechanism (6). A cutter (9) which is moved in an X-Y plane by a driving mechanism (10) is placed at a sample cutting position (B). When the sample stage (2) is moved to the sample cutting position (B) and the cutter is driven with the height of the sample stage (2) being appropriately adjusted, an upper portion of the sample 4 is horizontally cut off with a predetermined thickness and a new sample analysis surface which was inside the sample 4 is exposed. Hence, by repeating a mass analysis for a predetermined measurement area at an analysis position (C) and a partial cutting of the sample 4 at the sample cutting position (B), it is possible to achieve a three-dimensional mass analysis imaging of the sample (4) without removing the sample (4) from the sample stage (2).

Abstract: Mass spectrometers and methods for measuring information about samples using mass spectrometry are disclosed.

Abstract: A method for irradiating a target volume includes defining a target region having a plurality of target points. The target points are individually approachable. The method includes defining a number of rescanning passes, in which the target region is scanned multiple times, such that the plurality of target points of the target region is approached variously often during the rescanning passes. At least some target points of the plurality of target points are not approached in all of the rescanning passes. The approaching of the plurality of target points is distributed among the rescanning passes such that for a target point of the plurality of target points that is not approached in all of the rescanning passes, at least one further rescanning pass, in which the target point is not approached, is located before a final rescanning pass, in which the target point is approached.

Abstract: There is provided a particle-beam energy changing apparatus that is capable of changing energy of a particle beam quickly and silently, in which a first energy changing unit and a second energy changing unit for changing energy of a particle beam passing therethrough by varying thicknesses of their attenuators attenuating the particle beam energy are arranged so that the particle beam passes through the first energy changing unit and the second energy changing unit; and the maximum attenuation amount by the first energy changing unit is set smaller than the maximum attenuation amount by the second energy changing unit.

Abstract: A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through.

Abstract: A method of analyzing a sample that includes applying a first set of energies at a first set of frequencies to a sample and applying, simultaneously with the applying the first set of energies, a second set of energies at a second set of frequencies, wherein the first set of energies and the second set of energies form a multi-mode coupling. The method further includes detecting an effect of the multi-mode coupling.

Abstract: A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.

Abstract: A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached.