Abstract: A display device according to an embodiment of the present invention includes a display panel which has a display area having a pixel array part including a plurality of pixels, a frame area arranged on an outer peripheral side of the display area, and a driving part formation area having a driving part which drives the pixel array part. The display panel includes: a substrate; an organic light-emitting diode; an organic insulating film which is provided in the display area and the frame area, and has an opening in a light-emitting area of the organic light-emitting diode; and a first inorganic insulating film formed on an upper surface of the organic insulating film in the frame area. The organic insulating film includes a plurality of pieces of organic insulating film which are divided in the frame area.

Abstract: A tunnel field-effect transistor (TFET) is provided. In the TFET, a channel region (202) connects a source region (201) and a drain region (203); a pocket layer (204) and a gate oxide layer (205) are successively produced between the source region and a gate region (206); a metal layer (208) is produced in a first area in the source region, the first area is located on a side on which the source region is in contact with the pocket layer, and the pocket layer covers at least a part of the metal layer; and the pocket layer and a second area in the source region form a first tunnel junction of the TFET, and the pocket layer and the metal layer form a second tunnel junction of the TFET.

Abstract: A method of fabricating integrated circuits (ICs) includes depositing a dielectric liner layer on a substrate including a semiconductor surface having a plurality of IC die formed therein each including functional circuitry including a plurality of interconnected transistors. A thin film resistor (TFR) layer including chromium (Cr) is deposited on the dielectric liner layer. The substrate is loaded into a hardmask layer deposition tool that includes a plasma source. The TFR layer is in-situ plasma pre-treated including flowing at least one inert gas and at least one oxidizing gas while in the hardmask layer deposition tool. A hardmask layer is deposited after the plasma pre-treating while remaining in the hardmask layer deposition tool. A pattern is formed on the hardmask layer, and the hardmask layer and TFR layer are etched stopping in the dielectric liner layer to form at least one resistor from the defined TFR layer.

Abstract: A semiconductor device assembly having a semiconductor device attached to a substrate with a foil layer on a surface of the substrate. A layer of adhesive connects the substrate to a first surface of the semiconductor device. The semiconductor device assembly enables processing on the second surface of the semiconductor device. An energy pulse may be applied to the foil layer causing an exothermic reaction to the foil layer that releases the substrate from the semiconductor device. The semiconductor device assembly may include a release layer positioned between the foil layer and the layer of adhesive that connects the substrate to the semiconductor device. The heat generated by the exothermic reaction breaks down the release layer to release the substrate from the semiconductor device. The energy pulse may be an electric charge, a heat pulse, or may be applied from a laser.

Abstract: Provided is a method for forming a semiconductor structure. In embodiments of the invention, the method includes laterally forming a spacer on a side of the semiconductor structure. The method further includes performing a thermal anneal on the semiconductor structure. The method further includes performing an etch to remove materials formed by the thermal anneal.

Abstract: A light emitting device includes: a base comprising a first lead, a second lead, and a supporting member; a light emitting element mounted on the first lead; a protection element mounted on the second lead; a wire including a first end and a second end, wherein the first end is connected to an upper surface of the first lead, and the second end is connected to a first terminal electrode of the protection element; a resin frame located on an upper surface of the base, wherein the resin frame covers at least part of the protection element and surrounds the light emitting element and the first end of the wire; a first resin member surrounded by the resin frame and covering the light emitting element and the first end of the wire; and a second resin member covering the resin frame and the first resin member.

Abstract: A LTPS TFT comprises a substrate, and a buffer layer, a low temperature polysilicon layer, a source contact area, a drain contact area, a gate insulating layer, a gate layer, a dielectric layer, a source and a drain disposed on the substrate successively. The source contact area and the drain contact area are doped with metal ions individually. The source and the drain are connecting with the source and drain contact areas separately through the dielectric layer. The metal ions include at least one of Cu2+, Al3+, Mg2+, Zn2+ and Ni2+. A method of fabricating the LTPS TFT is also provided. An annealing is performed for driving individually metal ions of the insulation metal oxide layer into the source contact area and the drain contact area. Thus, the step of implanting p-type ions can be omitted, the procedure can be significantly simplified, and the manufacturing cost can be reduced.

Abstract: A method for manufacturing a semiconductor device having a shallow trench isolation structure includes providing a semiconductor substrate having first and second regions, multiple fins disposed on the first and second regions, and a hardmask layer on an upper surface of the fins, forming a first dielectric layer on the semiconductor substrate covering the fins, forming a first mask layer including an opening exposing a portion of the first dielectric layer between the first and second regions, implanting dopant ions into the exposed portion of the first dielectric layer, removing the first mask layer, and performing an etching process on the first dielectric layer to form a first isolation region between the first and second regions and a second isolation region between the fins. The doped portion has a reduced etch rate so that the thickness of the first isolation region is thicker than the second isolation region.

Abstract: Certain aspects of the present disclosure provide a memory device. One example memory device generally includes a first semiconductor region having a first region, a second region, and a third region, the second region being between the first region and the third region and having a different doping type than the first region and the third region. In certain aspects, the memory device also includes a first non-insulative region, a first insulative region being disposed between the first non-insulative region and the first semiconductor region. In certain aspects, the memory device may include a second non-insulative region, and a second insulative region disposed between the second region and the second non-insulative region, wherein the first insulative region and the second insulative region are disposed adjacent to opposite sides of the second region.

Abstract: The disclosure, which relates to a display device is created so that it can be integrated in a surface, providing in particular a seamless extension and an integrated appearance between the surface surrounding the display device and the display device itself and thus appears to the viewer of the display device as being part of a surface.

Abstract: A resin molded body with an RFIC package incorporated therein is insert-molded incorporating therein a metal core material and an RFIC element connected to the metal core material. The RFIC element includes a ceramic multi-layer substrate that incorporates therein a coil conductor, and an RFIC chip mounted on a mounting surface of the multi-layer substrate. The RFIC chip is connected to the coil conductor by nano-particle bonding or ultrasonic bonding. The coil conductor is coupled with the core material in a magnetic field coupling scheme.

Abstract: Methods of fabricating a semiconductor device are provided. The methods may include forming a lower mold layer on a substrate that includes first and second regions, forming first and second intermediate mold patterns on the first and second regions, respectively, forming first spacers on sidewalls of the first and second intermediate mold patterns, etching the lower mold layer to form first and second lower mold patterns on the first and second regions, respectively, and etching the substrate to form active patterns and dummy patterns on the first and second regions, respectively. A first distance between a pair of the first intermediate mold patterns may be greater than a second distance between a pair of the second intermediate mold patterns, and the second lower mold patterns may include at least one first merged pattern, whose width is substantially equal to the second distance.

Abstract: Dielets on flexible and stretchable packaging for microelectronics are provided. Configurations of flexible, stretchable, and twistable microelectronic packages are achieved by rendering chip layouts, including processors and memories, in distributed collections of dielets implemented on flexible and/or stretchable media. High-density communication between the dielets is achieved with various direct-bonding or hybrid bonding techniques that achieve high conductor count and very fine pitch on flexible substrates. An example process uses high-density interconnects direct-bonded or hybrid bonded between standard interfaces of dielets to create a flexible microelectronics package. In another example, a process uses high-density interconnections direct-bonded between native interconnects of the dielets to create the flexible microelectronics packages, without the standard interfaces.

Abstract: A method is presented for reducing contact resistance and parasitic capacitance. The method includes forming a plurality of fins over a semiconductor substrate, forming a bottom source/drain region between the plurality of fins, forming a bottom spacer over the bottom source/drain region, forming high-k metal gates over the bottom spacers, and forming a top spacer over the high-k metal gates. The method further includes forming an interlayer dielectric (ILD) over the top spacer, recessing the ILD to expose top sections of the plurality of fins, depositing an epitaxial material over each of the top sections of the plurality of fins, forming a dielectric film over the epitaxial material such that air-gaps are created between the top sections of the plurality of fins and recessing the dielectric film to expose top sections of the epitaxial material and to deposit a silicide metal liner and a conductive material thereon.

Abstract: An electroluminescent device, a method of manufacturing the same, and a display device including the same are disclosed. The electroluminescent device electroluminescent device includes a first electrode; a hole transport layer disposed on the first electrode; an emission layer disposed on the hole transport layer and including at least two light emitting particles; a first electron transport layer disposed on the emission layer and including at least two inorganic-organic composite particles; a second electron transport layer disposed on the first electron transport layer and including at least two inorganic oxide particles; and a second electrode disposed on the second electron transport layer, wherein the first electron transport layer has a lower work function than the second electron transport layer.

Abstract: An electronic device package includes a substrate, an electronic device, and a first packaging layer. The electronic device and the first packaging layer are disposed on the substrate and the electronic device is located between the substrate and the first packaging layer. The first packaging layer includes a first oxynitride layer and a second oxynitride layer, wherein the second oxynitride layer is located between the first oxynitride layer and the electronic device. A composition of the first oxynitride layer includes SiNx1Oy1, a composition of the second oxynitride layer includes SiNx2Oy2, and x1>x2.

Abstract: A resistive field plate including a spiral resistive element and meander resistive element is provided in an edge termination structure portion. The spiral resistive element is formed in a spiral planar layout, surrounding the periphery of a high-potential-side region to span from the high-potential-side region to a low-potential-side region. A spiral wire of the spiral resistive element includes a conductive film layer and a thin-film resistive layer connected to each other. The meander resistive element has ends positioned in the high-potential-side region and the low-potential-side region, and is provided in a meandering planar layout. The meander resistive element is provided at a same level as that of the thin-film resistive layer, and faces in the depth direction the conductive film layer of the spiral resistive element, sandwiching an interlayer insulating film therebetween. The conductive film layer of the spiral resistive element and the meander resistive element constitute a field plate.

Abstract: A method of fabricating a vertical field effect transistor including forming a first recess in a substrate; epitaxially growing a first drain from the first bottom surface of the first recess; epitaxially growing a second drain from the second bottom surface of a second recess formed in the substrate; growing a channel material epitaxially on the first drain and the second drain; forming troughs in the channel material to form one or more fin channels on the first drain and one or more fin channels on the second drain, wherein the troughs over the first drain extend to the surface of the first drain, and the troughs over the second drain extend to the surface of the second drain; forming a gate structure on each of the one or more fin channels; and growing sources on each of the fin channels associated with the first and second drains.

Abstract: A semiconductor module includes: a semiconductor chip; a package sealing the semiconductor chip; and a plurality of terminals connected to the semiconductor chip and protruding from the package, wherein the plurality of terminals includes a plurality of first terminals arranged side by side at a first pitch, and a plurality of second terminals arranged side by side at a second pitch, each terminal has a base portion, a tip portion narrower than the base portion, and a connection portion connecting the base portion and the tip portion, the connection portions of the plurality of first terminals are right-angled, and the connection portions of the plurality of second terminals are arc-shaped.

Abstract: In an edge termination structure portion, first and second JTE regions are disposed concentrically surrounding an active region. Between the first and second JTE regions, a p-type electric field relaxation region is disposed that includes a first subregion and a second subregion alternately and repeatedly arranged concentrically surround a periphery of the first JTE region. An average impurity concentration of the electric field relaxation region is higher that the impurity concentration of the first JTE region adjacent on the inner side and lower than the impurity concentration of the second JTE region adjacent on the outer side. First subregions have widths that decrease the farther outward they are arranged. Second subregions have widths that are substantially the same independent of position. The first subregions and the first JTE region have equal impurity concentrations. The second subregions and the second JTE region have equal impurity concentrations.