Abstract: A method for manufacturing semiconductor chips (2, 3) having arranged thereon metallic shaped bodies (6), having the following steps: arranging a plurality of metallic shaped bodies (6) on a processed semiconductor wafer while forming a layer arranged between the semiconductor wafer and the metallic shaped bodies (6), exhibiting a first connection material (4) and a second connection material (5), and processing the first connection material (4) for connecting the metallic shaped bodies (6) to the semiconductor wafer without processing the second connecting material (5), wherein the semiconductor chips (2, 3) are separated either prior to arranging the metallic shaped bodies (6) on the semiconductor wafer or after processing the first connection material (4).

Abstract: A method for manufacturing a switch-mode converter includes forming a plurality of windings by coiling one or more conductors. Each of the windings is secured to one of a plurality of module bases arranged in a module array. At least one side of the array is encapsulated in a magnetic mold compound.

Abstract: A display device is provided. The display device includes a substrate, a plurality of signal lines disposed on the substrate, and a plurality of display units disposed on the substrate. At least one of the signal lines includes a main line, a plurality of first branch lines electrically connected to the main line, and a plurality of second branch lines electrically connected to the main line. At least one of the display units includes a plurality of main pads, a plurality of redundant pads, and a light-emitting device electrically connected to the main pads. At least one of the main pads is electrically connected to at least one first branch line, and at least one of the redundant pads is electrically connected to at least one second branch line.

Abstract: In conjunction with a replacement metal gate (RMG) process for forming a fin field effect transistor (FinFET), gate isolation methods and associated structures leverage the formation of distinct narrow and wide gate cut regions in a sacrificial gate. The formation of a narrow gate cut between closely-spaced fins can decrease the extent of etch damage to interlayer dielectric layers located adjacent to the narrow gate cut by delaying the deposition of such dielectric layers until after formation of the narrow gate cut opening. The methods and resulting structures also decrease the propensity for short circuits between later-formed, adjacent gates.

Abstract: A high-voltage semiconductor device has a main high-voltage switch device and a current-sense device for mirroring the current through the main high-voltage switch device. The main high-voltage switch device has a plurality of switch cells arranged to form a first array on a semiconductor substrate. Each switch cell has a first cell width. The current-sense device has a plurality of sense cells arranged to form a second array on the semiconductor substrate. Each sense cell has a second cell width larger than the first cell width. The switch cells and the sense cells share a common gate electrode and a common drain electrode.

Abstract: An object is to provide a semiconductor device with high aperture ratio or a manufacturing method thereof Another object is to provide semiconductor device with low power consumption or a manufacturing method thereof. A light-transmitting conductive layer which functions as a gate electrode, a gate insulating film formed over the light-transmitting conductive layer, a semiconductor layer formed over the light-transmitting conductive layer which functions as the gate electrode with the gate insulating film interposed therebetween, and a light-transmitting conductive layer which is electrically connected to the semiconductor layer and functions as source and drain electrodes are included.

Abstract: A method is presented for employing contact over active gate to reduce parasitic capacitance. The method includes forming high-k metal gates (HKMGs) between stacked spacers, the stacked spacers including a low-k dielectric lower portion and a sacrificial upper portion, forming a first dielectric over the HKMGs, forming first contacts to source/drain of a transistor between the HKMGs, and forming a second dielectric over the first contacts. The method further includes selectively removing the first dielectric to form second contacts to the HKMGs, selectively removing the second dielectric to form third contacts on top of the first contacts, removing the sacrificial upper portion of the stacked spacers, and depositing a third dielectric that pinches off the remaining first and second dielectrics to form air-gaps between the first contacts and the HKMGs.

Abstract: Methods/structures of joining package structures are described. Those methods/structures may include forming a metal formate on a surface of a first solder interconnect structure disposed on a first package substrate at a first temperature, and attaching a second solder interconnect structure disposed on a second package substrate to the first solder interconnect structure at a second temperature. The second temperature decomposes at least a portion of the metal formate and generates a hydrogen gas. The generated hydrogen gas removes an oxide from the second solder interconnect structure during joint formation at the second temperature.

Abstract: Reliability of a semiconductor module is improved. In a resin mold step of assembly of a semiconductor module, an IGBT chip, a diode chip, a control chip, a part of each of chip mounting portions are resin molded so that a back surface of each of the chip mounting portions is exposed from a back surface of a sealing body. After the resin molding, an insulating layer is bonded to the back surface of the sealing body so as to cover each back surface (exposed portion) of the chip mounting portions, and then, a TIM layer is bonded to an insulating layer. Here, a region of the TIM layer in a plan view is included in a region of the insulating layer.

Abstract: A display device includes a flexible substrate including a first surface and a second surface facing the first surface; a TFT array layer provided on the first surface; a display element layer provided on the TFT array layer; a first heat releasing layer provided on the second surface; a first protective layer provided on the same side as the second surface; a second heat releasing layer provided on the display element layer; and a second protective layer provided on the display element layer. The second heat releasing layer has a light transmittance of 90% or higher.

Abstract: An optoelectronic element includes an optoelectronic unit, a first metal layer, a second metal layer, a conductive layer and a transparent structure. The optoelectronic unit has a central line in a top view, a top surface, and a bottom surface. The second metal layer is formed on the top surface, and has an extension portion crossing over the central line and extending to the first metal layer. The conductive layer covers the first metal layer and the extension portion. The transparent structure covers the bottom surface without covering the top surface.

Abstract: Methods of packaging semiconductor devices and packaged semiconductor devices are disclosed. In some embodiments, a method of packaging a semiconductor device includes forming a dam structure on dies proximate edge regions of the dies. A molding material is disposed around the dies, and a top portion of the molding material and a top portion of the dam structure are removed.

Abstract: A method includes depositing a silicon layer, which includes first portions over a plurality of strips, and second portions filled into trenches between the plurality of strips. The plurality of strips protrudes higher than a base structure. The method further includes performing an anneal to allow parts of the first portions of the silicon layer to migrate toward lower parts of the plurality of trenches, and performing an etching on the silicon layer to remove some portions of the silicon layer.

Abstract: According to example embodiments, a vertical memory device includes a low resistance layer on a lower insulation layer, a channel layer on the low resistance layer, a plurality of vertical channels on the channel layer, and a plurality of gate lines. The vertical channels extend in a first direction that is perpendicular with respect to a top surface of the channel layer. The gate lines surround outer sidewalls of the vertical channels, and are stacked in the first direction and are spaced apart from each other.

Abstract: An electronic device has a first bus bar (conductor plate) connected to a first semiconductor device (semiconductor part) having a first power transistor; and a second bus bar (conductor plate) connected to a second semiconductor device (semiconductor part) having a second power transistor. The first and second bus bars have first portions facing each other with an insulating plate interposed therebetween and extending in a Z direction intersecting with an upper surface (main surface) of a board. The first bus bar has a second portion located between the first portion and a terminal (exposed portion) and extending in an X direction away from the second bus bar and a third portion located between the second portion and the terminal and extending in the X direction. An extension distance of the third portion in the Z direction is shorter than an extension distance of the second portion in the X direction.

Abstract: The power module includes: a ceramics substrate; a source electrode pattern, a drain electrode pattern, a source signal electrode pattern, and a gate signal electrode pattern respectively disposed on the ceramics substrate; a semiconductor device disposed on the drain electrode pattern, the semiconductor device comprising a source pad electrode and a gate pad electrode at a front surface side; a divided leadframe for source bonded to the source electrode pattern and the source pad electrode; and a divided leadframe for gate pad electrode bonded to a gate pad electrode. There is provided a power module having a simplified structure, fabricated through a simplified process, and capable of conducting a large current; and a fabrication method for such a power module.

Abstract: A semiconductor memory device includes a substrate including active regions, word lines in the substrate and each extending in a first direction parallel to an upper surface of the substrate, bit line structures connected to the active regions, respectively, and each extending in a second direction crossing the first direction, and spacer structures on sidewalls of respective ones of the bit line structures. Each of the spacer structures includes a first spacer, a second spacer, and a third spacer. The second spacer is disposed between the first spacer and the third spacer and includes a void defined by an inner surface of the second spacer. A height of the second spacer is greater than a height of the void.

Abstract: The present disclosure discloses a manufacturing method of a thin film transistor, including: forming a gate layer on a substrate; forming a gate insulating layer on the gate layer and the substrate; forming an active layer on the gate insulating layer; and simultaneously forming a source and a drain formed on the active layer by a combination of a chemical plating method and a lift-off method. In the present disclosure, the chemical plating method is combined with the lift-off method, so that the wet-etching method is not used for forming the source and the drain, and thus the IGZO at the channel is not required to be protected by the etching-stop-layer. Therefore, while simplifying the production process, but also can reduce costs.

Abstract: Described herein are microelectronics packages and methods for manufacturing the same. The microelectronics package may include a first die, a second die, and an integrated heat spreader. The integrated heat spreader may include a first surface. The first surface may define a first indentation located in between the first die and the second die.

Abstract: The disclosure, which relates to a display device is created so that it can be integrated in a surface, providing in particular a seamless extension and an integrated appearance between the surface surrounding the display device and the display device itself and thus appears to the viewer of the display device as being part of a surface.