Abstract: Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems, whose peculiarity consists in performing, on a same substrate, metrological alignment markings and processed alignment markings according to arrays of preset numerical size.

Abstract: Low optical density magnetic fluid which is a stable dispersion of fine magnetic particles. A method of forming the stable dispersion which includes providing an ion exchange resin, loading the ion exchange resin with an ion capable of forming a magnetic phase, treating the loaded resin to form magnetic particles and micronizing the resin and magnetic particles in a fluid to form an aqueous stable colloid. The invention provides submicron particles and submicron particles which are dispersed in an aqueous colloid. A method of forming the stable dispersion which includes providing an ion exchange resin, loading the ion exchange resin with an ion, treating the loaded resin to form nanoscale particles. Fluidizing the resin and particles to form an aqueous stable colloid. A method of forming magnetic materials having tunable magnetic properties and the magnetic materials formed thereby.

Abstract: Disclosed are thermoplastic resin compositions having improved heat resistance, e.g., IR soldering and HDT; increased ductility and flowability; and reduced flash. In particular, the thermoplastic resin compositions have at least one high heat amorphous resin, at least one polysulfide; and, optionally, at least one reinforcing filler and/or at least one polyolefin and/or at least one polyolefin compound and/or at least one polyepoxy compound. The high heat amorphous resin is preferably a polyetherimide and the polyolefin is preferably a high crystalline polyethylene. The compositions of the invention are particularly well suited for preparing no flash high heat electrical connectors.

Abstract: A method for forming a resist pattern by coating a primary photoresist pattern having a small thickness and then coating a secondary photoresist pattern over the primary photoresist pattern. Alternatively, the resist pattern is formed by coating a primary photoresist film, exposing the primary photoresist film to light to define a light-exposed region in the primary photoresist film, coating a secondary photoresist film over the primary photoresist film, exposing the secondary photoresist film to light to define a light-exposed region in the secondary photoresist film, and developing the resulting structure to form primary and secondary resist patterns. The method achieves an improvement in the contrast of light, thereby obtaining a resist pattern having a vertical profile.

Abstract: A resist pattern is formed on a substrate by forming a water-soluble resist film on the substrate, forming a contrast enhancing film on the resist film from a contrast enhancing composition comprising a specific arylnitrone compound of formula (1), pre-baking the resist film before or after formation of the contrast enhancing film, exposing the resist film to light through the contrast enhancing film, baking the films after exposure, removing the contrast enhancing film after the baking step, and developing the resist film. The process forms a resist pattern having a fully rectangular profile and an improved focus margin. The conventional apparatus can be utilized without substantial modification, achieving a cost reduction. ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 are independently an alkyl radical, an aryl radical or a hydrogen atom,R.sup.4 to R.sup.8 are independently an alkyl radical, a hydrogen atom or a carboxyl radical, at least one of R.sup.4 to R.sup.

Abstract: The invention concerns a method of forming a number of electric conductors at a very short distance from the end of depressions such as V-grooves on a substrate. In one configuration example, a film of PTFE or of a similar material is laminated over the entire surface of the substrate. Holes are etched in the film. The holes are metallized. Conductive paths are formed, which are electrically connected to the metallized holes. The film in the area of the grooves is removed by etching. In another configuration example, the grooves are temporarily filled with a photoresist and the conductive paths and contact surfaces are formed in accordance with a photolithographic method.

Abstract: An adhesive composition comprised of (A) a latex of a self-crosslinking, carboxyl group-containing highly saturated nitrile-conjugated diene copolymer rubber containing 0.3-10 wt. % of self-crosslinking monomer units, and (B) a resorcinol-formaldehyde resin. A composite comprised of a fibrous material, which has been treated with the adhesive composition, and a nitrile group-containing highly saturated copolymer rubber. This composite is useful for belts.

Abstract: A method is described for reducing light scatter in lithographically producing a resist feature wherein the dosage of light beyond the immediate periphery of the desired feature is subjected to a lower dosage of light than is required to properly define the edges of the resist feature. In addition, a mask is described which is partially opaque in those areas remote from the area delineating the desired feature.

Abstract: A method for curing a photosensitive resin composition includes use of an especially thin gauge protective cover film, preferably incorporating a coating to permit ease of removal after imaging. The method also uses a photosensitive resin composition incorporating a photospeed modified capping layer to selectively retard image growth during exposure. To eliminate undesirable defects in the cured photopolymer, a glass plate which had previously contacted and flattened the composition, is separated from the composition by at least 0.025 inches after partially curing the composition but prior to completely curing the composition. The partial cure of the composition is achieved by directing light to the composition from a source of actinic radiation positioned about 6 to 30 inches from the resin composition, where the actinic radiation has a wavelength of maximum intensity of about 365 to about 375 nm.

Abstract: A high capacitance storage node structure is created in a substrate by patterning a hybrid resist (12) to produce both negative tone (16) and positive tone (18) areas in the exposed region (14). After removal of the positive tone areas (18), the substrate (12) is etched using the unexposed hybrid resist (12) and negative tone area (16) as a mask. This produces a trench (22) in the substrate (12) with a centrally located, upwardly projecting protrusion (24). The capacitor (26) is then created by coating the sidewalls of the trench (22) and protrusion (24) with dielectric (28) and filling the trench with conductive material (30) such as polysilicon.

Abstract: The present invention provides a photosensitive resin composition wherein a sensitiveness of polysilane to photodegradation is improved and a time required for photodegradation is short. The photosensitive resin composition comprises:(a) a polysilane having a structure of the formula: ##STR1## ?wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, the same or different, are selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group, and m and n indicate an integer!,(b) a photoradical generator, and(c) an oxidizing agent. A method for forming a pattern using the photosensitive resin composition is also disclosed.

Abstract: A method of forming a high resolution metal pattern on a substrate. A temporary polyvinyl alcohol (10) layer underneath the photoresist layer (20) aids in removing the photoresist layer after plating. The photoresist is photodelineated in conventional manner to form a pattern (40). During photodelineation, the developing process for the resist does not completely remove the PVA (45) that lies directly under the removed resist, but instead reveals those portions of the polyvinyl alcohol layer. The substrate is then rinsed in a hot aqueous solution to effect removal of the revealed PVA portions, now exposing portions (40) of the substrate (15). Metal (50) is then electroplated to build up a metal circuitry pattern. The remaining portions of the photoresist and the PVA are then removed by a hot aqueous solution.

Abstract: Dyestuffs represented by the below-described formula (1), that is, dyestuffs formed of a chromophoric nucleus and a bisphenol introduced therein have excellent solubility in solvents and binder resins, and can provide color filters having excellent transmittance characteristics and durability. ##STR1## wherein Dye represents a chromophoric nucleus, X represents a direct bond or a divalent connecting group, R.sup.1 to R.sup.10 and n are defined with the provision that one of R.sup.9 and R.sup.10 has 3 or more carbon atoms.

Abstract: A controlled release capsule comprises a male plug (2) formed of a water swellable hydrogel which is engaged within a neck portion (4) of a female body (6). The capsule contains a pharmaceutically active material. In contact with an aqueous medium, such as in the gastrointestinal tract, the hydrogel plug swells and becomes disengaged from the body, thereby releasing the active material. In order to facilitate insertion of the male plug into the neck of the body, the body has a flared mouth portion (14) which is wider than the neck. The neck itself may be wider or narrower than the remainder of the body. A water-soluble cap (8) has detentes (18) which clip over the flared mouth portion so as to lock the cap thereto.

Abstract: A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.

Abstract: A method for forming a pattern using a multilayer resist including the steps of: coating a first lower resist layer on a substrate having a lower level region and an upper level region; selectively subjecting the upper level region to an over exposure using a mask; subjecting the first lower resist layer to a development process; coating a second lower resist layer on the first lower resist layer and the upper level region; forming an intermediate layer on the second lower resist layer; coating an upper resist layer on the intermediate layer; patterning the upper resist layer to form a predetermined upper resist pattern; transferring the upper resist pattern to the intermediate layer to form an intermediate pattern; and transferring the intermediate pattern to the first and second lower resist layers.

Abstract: A photopolymerizable composition comprising (a) at least one ethylenically unsaturated photopolymerizable compound, and (b) alkoxyphenyl-substituted bisacylphosphine oxides of the formula I ##STR1## in which R.sub.1 and R.sub.2 are identical or different and are a radical of the formula II ##STR2## in which R.sub.4 and R.sub.5 independently of one another are C.sub.1 -C.sub.12 alkyl or C.sub.1 -C.sub.12 alkoxy, andR.sub.6, R.sub.7 and R.sub.8 independently of one another are hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy or halogen,R.sub.3 is a radical of the formula III ##STR3## in which R.sub.9 is C.sub.1 -C.sub.20 alkyl, C.sub.2 -C.sub.20 alkyl, C.sub.5 -C.sub.6 cycloalkyl, phenyl, naphthyl, phenyl-C.sub.1 -C.sub.5 alkyl, C.sub.2 -C.sub.12 alkenyl, --CF.sub.3 or ##STR4## or R.sub.9 is a radical of the formula IV or V ##STR5## in which X is for example C.sub.1 -C.sub.16 alkylene, C.sub.4 -C.sub.12 alkenylene or is xylylene,R.sub.10 is for example hydrogen, C.sub.1 -C.sub.20 alkyl, C.sub.2 -C.

Abstract: A system is provided for inhibiting or suppressing the transmission and propagation of cracks between a supporting substrate and a finishing layer. The system is applicable for floorings, walls, counters and other surfaces where a relatively fragile finishing surface, such as tile, marble or natural stone disposed on a base material, such as concrete. The system includes a first adhesive layer disposed on the substrate, an isolating layer of a rubber and cork composite material disposed on the first adhesive layer, a second adhesive layer disposed over the isolating layer, and the finishing layer applied over the second adhesive layer. The isolating layer is preferably approximately 1.2 millimeters in thickness. The system inhibits or suppresses the transmission and propagation of cracks, fissures and the like that may develop over time from the substrate layer to the finishing layer.

Abstract: In accordance with the present invention, it has been discovered that a major reason for the failure to achieve successful in vivo transplantation in large mammalian species has been flaws associated with the design of microcapsules taught in the prior art, flaws in the method of making such microcapsules, and a lack of tests to determine if a given microcapsule will be successful. In accordance with the present invention, a number of functional properties which must be met by a microcapsule in order to achieve successful in vivo transplantation in large animal models have been identified. These properties include (i) a mechanically stable capsule core, (ii) a mechanically strong capsule membrane (i.e., the membrane must be of sufficient strength to prevent capsule disruption), (iii) the absence of excess exposed positively-charged PLL (which leads to fibrosis), and (iv) an adequate level of diffusion of the entrapped biologically active material out of the capsule.

Abstract: A stencil mask (10) has a membrane (14) under tensile stress and at least one pattern opening (22) formed through the membrane (14). A plurality of stress relief openings (30) are formed in the membrane for reducing stress-induced distortion of the membrane and the mask pattern. The stress relief openings (30) are positioned to relieve concentrations of stress within the membrane (14) such as those resulting from non-regularities within the pattern. In one embodiment, a screening material (56), less rigid than the membrane (14), is contained within the stress relief openings (30).