Abstract: A method for preparation of an electrophotographic printing plate which can provide a printing plate excellent in image qualities of plate-making and printing, and continuously produce such printing plates in a stable manner for a long period of time and which is suitable for a scanning exposure system using a laser beam.The method comprises forming a toner image by an electrophotographic process on a peelable transfer layer of an electrophotographic light-sensitive material which comprises an electrophotographic light-sensitive element a surface of which has releasability and the peelable transfer layer provided on the surface thereof which contains a thermoplastic resin capable of being removed upon a chemical reaction treatment, thermally transferring the toner image together with the transfer layer onto a support for a lithographic printing plate and removing the thermoplastic resin upon a treatment, for example, with an aqueous alkaline solution, whereby a printing plate is obtained.

Abstract: An imaging member comprised of a supporting substrate with a coating thereover and wherein the coating is comprised of resin, electrically conductive metal oxide particles, and insulative metal oxide particles, wherein each electrically conductive particle is substantially electrically isolated and separated from any other of the electrically conductive particles by the insulative particles.

Abstract: The present invention provides a printing method using a silver salt lithographic printing plate obtained by imagewise exposing a silver salt lithographic printing plate precursor comprising a support and, provided thereon, at least a silver halide emulsion layer and a physical development nuclei layer and then subjecting the exposed printing plate precursor to silver complex diffusion transfer development and using a dampening composition containing a nonionic surface-active agent represented by the following formula ?I!: ##STR1## wherein R represents an alkyl group of 1-9 carbon atoms, and n.sub.1 and n.sub.2 are mol numbers necessary for the polymer having an average molecular weight of 250 or more, and n.sub.1 /n.sub.2 is 0.5-2, and a polymer represented by the following formula ?II!: ##STR2## wherein m is a number which provides a number-average molecular weight of 2000-50000 for the polymer.

Abstract: Acid sensitive polymeric compositions, and improved chemically amplified microlithographic resist compositions comprising the acid sensitive polymeric compositions, and methods for the preparation and use thereof are disclosed. The compositions comprise, in admixture, a polymeric binder, an acid labile moiety which provides selective aqueous base solubility upon cleavage, and a compound that generates acid upon exposure of the resist composition to imaging radiation. More particularly, the compositions have one or more acid labile ketal groups, which may be chemically linked to a polymeric resin or which may be incorporated into a separate component to form a dissolution inhibitor. Crosslinking of the polymer to produce a high molecular weight, nonpolar resin may also occur by ketal exchange. Upon exposure, molecular weight and polarity changes of the crosslinked resin produce high contrast during development.

Abstract: A composition of matter useful in the production of photoinitiator compositions, said compositions of matter comprising 100 parts by weight of camphorquinone and from 1 to 50 parts by weight of an anthraquinone compound having in the 2-position a substituent of the formula:--X--COR.sup.1 (1)wherein R.sup.1 represents an optionally substituted hydrocarbyl radical and X represents ##STR1## wherein R.sup.2 represents hydrogen or an optionally substituted hydrocarbyl radical.

Abstract: Acrylic compositions filled with alumina trihydrate with the mixed ester reaction product of propylene glycol methacrylate and phosphorus pentoxide have superior mechanical properties and ease of manufacture. In such acrylic compositions, the ester reaction product imparts superior properties by acting as a very effective coupling agent between the alumina trihydrate filler and the acrylic matrix.

Abstract: An aqueous developable photosensitive element comprising a support and a photosensitive layer provided thereon, said layer containing (a) an elastomeric microgel binder having an elastomeric core which can be crosslinked and a thermoplastic noncrosslinked shell, (b) an initiator, (c) an ethylenically unsaturated monomer or oligomer and optionally (d) a basic compound capable of neutralizing the acidic functionality and method of use to make an aqueous developable flexographic printing plate is described.

Abstract: The present invention relates to silica-filled rubber compositions and their method of processing. The rubber compositions contain a mixture of 10 to 150 phr of a particulate precipitated silica having dispersed thereon, from 1 to 20 percent by weight based upon the weight of the silica, of a silane-modified elastomer.

Abstract: The present invention relates a photopolymerizable composition which comprises:A) one or more ethylenically unsaturated, free-radical polymerizable monomers;B) one or more organic binders; andC) one or more photoinitiators, wherein the photoinitiator is an acyl or diacyl phosphine oxide, in combination with a fluorescent optical brightener;and a process for producing such a photopolymerizable composition.

Abstract: Disclosed is a positive radiation-sensitive resist composition comprising polymer(s) of the following general formula (1) and a radiation-sensitive agent. ##STR1## Ra, Rb, Rc and Rd each are independently a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, or a cycloalkyl group; k is an integer of from 1 to 30; (1+n) is an integer of from 1 to 100; m is an integer of from 1 to 50; p1, p2 and p3 each are an integer of from 1 to 3; q1 is an integer of from 1 to 4. The resist composition has high resolution to give resist patterns with good profiles and has high heat resistance and good storage stability.

Abstract: A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines substance thereon, then exposing the chemically amplified resist, and furthermore, developing the chemically amplified resist after removing the amorphous polyolefines substance.

Abstract: Insecticidal bait composition for cockroaches and a related method of its use for the control of cockroach infestations. The composition contains boric acid in an amount between about 5 to about 40 wt. % based on the total weight of the composition together with an amount of attractant foodbaits for attracting the roaches to the composition so they will consume it. The preferred composition contains between about 30 and 35 wt. % boric acid and the foodbaits making up the remainder of the composition consist of crushed yellow onions and cane sugar each in an amount equal to about 12.5 wt. % of the remainder composition, and milk and flour each equal to about 37.5% of the remainder of the composition. The preferred composition has a gummy paste-like consistency and is particularly well-suited for application to cracks, crevices and other pest pathways.

Abstract: The preservation of alignment marks and identification marks throughout the multitude of processing steps employed for the manufacture of integrated circuit chips often requires the inclusion of additional operations which impact production cost and product throughput. Current increased utilization of global planarization operations such as chemical-mechanical-polishing have forced the inclusion of additional window opening lithographic steps requiring additional masks and etch operations to keep these marks from being obscured. This invention provides a technique and a reticle design for clearing and preserving alignment and wafer identification marks through planarization and metallization levels with improved throughput and without the need for additional reticles to clear the marks. The alignment mark areas are exposed by a large clear-out window located in the frame area of the contact/via reticle while the wafer identification marks are accommodated in the same fashion by the metal pattern reticle.

Abstract: Polyketone polymers are cured by exposure to high energy radiation. Radiation sources include gamma radiation sources such as Co.sup.60 emitters as well as e-beam, ion and other commercially used sources of high energy radiation. The materials so produced are high molecular weight crosslinked polyketone polymers which exhibit enhanced mechanical and tribological properties.

Abstract: A method of forming a metal interconnect structure for a CMOS integrated circuit provides for deposition of via metal prior to formation of an intermetal dielectric. After a submetal dielectric is deposited, lower metal and via metals are deposited. Gradient photolithography is used to define a via pattern and a lower metal pattern in a positive photoresist. After etching, the lower metal assumes the lower metal pattern and the via metal assumes the via pattern. A three-layer intermetal dielectric includes a spin-on glass sandwiched between two deposited silicon dioxide layers. The resulting structure is polished until at least some of the vias are exposed. Other vias can be exposed by via apertures that are define photolithographically. An upper metal layer is then deposited, filling the via apertures. The upper metal is then patterned to complete the interconnect structure. This method provides that via metal is insulated from spin-on glass moisture by the deposited oxide.

Abstract: A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxy-phenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound.

Abstract: A liquid bird aversion solution having methyl anthranilate in an amount of from 15 to 50% by weight of a total weight of the solution; d-limonene in an amount of from 10 to 50% by weight of a total weight of the solution; and isopropyl myristate in an amount of from 10 to 50% by weight of a total weight of the solution. The liquid solution is lighter than water and forms a thin liquid film on a surface of a source when applied to the source.

Abstract: A photopolymerizable composition is disclosed, which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by the following formula (I): ##STR1## wherein the all symbols are defined in the disclosure, and a titanocene compound.

Abstract: A photocurable composition useful in preparing water-developable, solid printing plates is prepared by blending a urethane (meth)acrylate prepolymer with a complexing polymer based on poly(vinyl pyrrolidone) composition. The resulting composition is suitably formulated with additional photoactive (meth)acrylate monomers or oligomers and photoinitiator for casting or extrusion on a substrate to form a flexographic printing plate. Following UV exposure of the plate through a negative, unexposed areas can be removed by washing with aqueous media, to give a plate with a desirable relief image. The use of the aqueous washout solution as opposed to organic solvents minimizes pollution problems. The use of the complexing polymer significantly reduces the cold flow of the uncured plate and both increases toughness and reduces tack of the cured plate.

Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system, the weight percentages being based on the total weight of components A)-C).