Patents Examined by George F. Lesmes
  • Patent number: 5714302
    Abstract: The present invention provides a printing method using a silver salt lithographic printing plate obtained by imagewise exposing a silver salt lithographic printing plate precursor comprising a support and, provided thereon, at least a silver halide emulsion layer and a physical development nuclei layer and then subjecting the exposed printing plate precursor to silver complex diffusion transfer development and using a dampening composition containing a nonionic surface-active agent represented by the following formula ?I!: ##STR1## wherein R represents an alkyl group of 1-9 carbon atoms, and n.sub.1 and n.sub.2 are mol numbers necessary for the polymer having an average molecular weight of 250 or more, and n.sub.1 /n.sub.2 is 0.5-2, and a polymer represented by the following formula ?II!: ##STR2## wherein m is a number which provides a number-average molecular weight of 2000-50000 for the polymer.
    Type: Grant
    Filed: February 23, 1996
    Date of Patent: February 3, 1998
    Assignee: Mitsubishi Paper Mills Limited
    Inventors: Jun Urasaki, Hideo Kiyoyama, Hiroyuki Kurokawa, Kazuhiko Ibaraki, Akio Yoshida
  • Patent number: 5714248
    Abstract: An imaging member comprised of a supporting substrate with a coating thereover and wherein the coating is comprised of resin, electrically conductive metal oxide particles, and insulative metal oxide particles, wherein each electrically conductive particle is substantially electrically isolated and separated from any other of the electrically conductive particles by the insulative particles.
    Type: Grant
    Filed: August 12, 1996
    Date of Patent: February 3, 1998
    Assignee: Xerox Corporation
    Inventor: Richard B. Lewis
  • Patent number: 5714289
    Abstract: A method for preparation of an electrophotographic printing plate which can provide a printing plate excellent in image qualities of plate-making and printing, and continuously produce such printing plates in a stable manner for a long period of time and which is suitable for a scanning exposure system using a laser beam.The method comprises forming a toner image by an electrophotographic process on a peelable transfer layer of an electrophotographic light-sensitive material which comprises an electrophotographic light-sensitive element a surface of which has releasability and the peelable transfer layer provided on the surface thereof which contains a thermoplastic resin capable of being removed upon a chemical reaction treatment, thermally transferring the toner image together with the transfer layer onto a support for a lithographic printing plate and removing the thermoplastic resin upon a treatment, for example, with an aqueous alkaline solution, whereby a printing plate is obtained.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: February 3, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Eiichi Kato, Sadao Osawa, Seishi Kasai
  • Patent number: 5712322
    Abstract: A composition of matter useful in the production of photoinitiator compositions, said compositions of matter comprising 100 parts by weight of camphorquinone and from 1 to 50 parts by weight of an anthraquinone compound having in the 2-position a substituent of the formula:--X--COR.sup.1 (1)wherein R.sup.1 represents an optionally substituted hydrocarbyl radical and X represents ##STR1## wherein R.sup.2 represents hydrogen or an optionally substituted hydrocarbyl radical.
    Type: Grant
    Filed: October 6, 1995
    Date of Patent: January 27, 1998
    Assignee: Zeneca Limited
    Inventors: Pushpito Kumar Ghosh, Iain Andrew Weddell, John Edward Yates
  • Patent number: 5712078
    Abstract: Acid sensitive polymeric compositions, and improved chemically amplified microlithographic resist compositions comprising the acid sensitive polymeric compositions, and methods for the preparation and use thereof are disclosed. The compositions comprise, in admixture, a polymeric binder, an acid labile moiety which provides selective aqueous base solubility upon cleavage, and a compound that generates acid upon exposure of the resist composition to imaging radiation. More particularly, the compositions have one or more acid labile ketal groups, which may be chemically linked to a polymeric resin or which may be incorporated into a separate component to form a dissolution inhibitor. Crosslinking of the polymer to produce a high molecular weight, nonpolar resin may also occur by ketal exchange. Upon exposure, molecular weight and polarity changes of the crosslinked resin produce high contrast during development.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 27, 1998
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Harold George Linde, Charles Arthur Whiting
  • Patent number: 5707781
    Abstract: The present invention relates a photopolymerizable composition which comprises:A) one or more ethylenically unsaturated, free-radical polymerizable monomers;B) one or more organic binders; andC) one or more photoinitiators, wherein the photoinitiator is an acyl or diacyl phosphine oxide, in combination with a fluorescent optical brightener;and a process for producing such a photopolymerizable composition.
    Type: Grant
    Filed: May 5, 1995
    Date of Patent: January 13, 1998
    Assignee: Bayer Corporation
    Inventor: Wojciech A. Wilczak
  • Patent number: 5707773
    Abstract: An aqueous developable photosensitive element comprising a support and a photosensitive layer provided thereon, said layer containing (a) an elastomeric microgel binder having an elastomeric core which can be crosslinked and a thermoplastic noncrosslinked shell, (b) an initiator, (c) an ethylenically unsaturated monomer or oligomer and optionally (d) a basic compound capable of neutralizing the acidic functionality and method of use to make an aqueous developable flexographic printing plate is described.
    Type: Grant
    Filed: November 27, 1995
    Date of Patent: January 13, 1998
    Assignees: E. I. Du Pont de Nemours and Company, Reichhold Chemicals
    Inventors: Jan Grossman, John Anthony Quinn, David William Swatton, Jose Antonio Briones, Paul Thomas Shea
  • Patent number: 5708053
    Abstract: The present invention relates to silica-filled rubber compositions and their method of processing. The rubber compositions contain a mixture of 10 to 150 phr of a particulate precipitated silica having dispersed thereon, from 1 to 20 percent by weight based upon the weight of the silica, of a silane-modified elastomer.
    Type: Grant
    Filed: August 15, 1996
    Date of Patent: January 13, 1998
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: George Jalics, Adel Farhan Halasa, David John Zanzig
  • Patent number: 5707784
    Abstract: A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines substance thereon, then exposing the chemically amplified resist, and furthermore, developing the chemically amplified resist after removing the amorphous polyolefines substance.
    Type: Grant
    Filed: December 5, 1995
    Date of Patent: January 13, 1998
    Assignees: Fujitsu Ltd., Nippon Zeon Co., Ltd.
    Inventors: Akira Oikawa, Hiroyuki Tanaka, Masayuki Oie, Hideyuki Tanaka, Nobunori Abe
  • Patent number: 5707776
    Abstract: Disclosed is a positive radiation-sensitive resist composition comprising polymer(s) of the following general formula (1) and a radiation-sensitive agent. ##STR1## Ra, Rb, Rc and Rd each are independently a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, or a cycloalkyl group; k is an integer of from 1 to 30; (1+n) is an integer of from 1 to 100; m is an integer of from 1 to 50; p1, p2 and p3 each are an integer of from 1 to 3; q1 is an integer of from 1 to 4. The resist composition has high resolution to give resist patterns with good profiles and has high heat resistance and good storage stability.
    Type: Grant
    Filed: May 10, 1995
    Date of Patent: January 13, 1998
    Assignee: Fuji Photo Film Co., LTD.
    Inventors: Yasumasa Kawabe, Tsukasa Yamanaka, Toshiaki Aoai
  • Patent number: 5708066
    Abstract: Acrylic compositions filled with alumina trihydrate with the mixed ester reaction product of propylene glycol methacrylate and phosphorus pentoxide have superior mechanical properties and ease of manufacture. In such acrylic compositions, the ester reaction product imparts superior properties by acting as a very effective coupling agent between the alumina trihydrate filler and the acrylic matrix.
    Type: Grant
    Filed: March 1, 1995
    Date of Patent: January 13, 1998
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Edward Daniel Otremba, Raymond Mitchell Friscia, Edward Francis McBride
  • Patent number: 5705320
    Abstract: The preservation of alignment marks and identification marks throughout the multitude of processing steps employed for the manufacture of integrated circuit chips often requires the inclusion of additional operations which impact production cost and product throughput. Current increased utilization of global planarization operations such as chemical-mechanical-polishing have forced the inclusion of additional window opening lithographic steps requiring additional masks and etch operations to keep these marks from being obscured. This invention provides a technique and a reticle design for clearing and preserving alignment and wafer identification marks through planarization and metallization levels with improved throughput and without the need for additional reticles to clear the marks. The alignment mark areas are exposed by a large clear-out window located in the frame area of the contact/via reticle while the wafer identification marks are accommodated in the same fashion by the metal pattern reticle.
    Type: Grant
    Filed: November 12, 1996
    Date of Patent: January 6, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shun-Liang Hsu, Shih-Shiung Chen
  • Patent number: 5705539
    Abstract: Polyketone polymers are cured by exposure to high energy radiation. Radiation sources include gamma radiation sources such as Co.sup.60 emitters as well as e-beam, ion and other commercially used sources of high energy radiation. The materials so produced are high molecular weight crosslinked polyketone polymers which exhibit enhanced mechanical and tribological properties.
    Type: Grant
    Filed: December 11, 1995
    Date of Patent: January 6, 1998
    Assignee: Shell Oil Company
    Inventors: Carl Edwin Ash, Narayana Mysore
  • Patent number: 5705176
    Abstract: Insecticidal bait composition for cockroaches and a related method of its use for the control of cockroach infestations. The composition contains boric acid in an amount between about 5 to about 40 wt. % based on the total weight of the composition together with an amount of attractant foodbaits for attracting the roaches to the composition so they will consume it. The preferred composition contains between about 30 and 35 wt. % boric acid and the foodbaits making up the remainder of the composition consist of crushed yellow onions and cane sugar each in an amount equal to about 12.5 wt. % of the remainder composition, and milk and flour each equal to about 37.5% of the remainder of the composition. The preferred composition has a gummy paste-like consistency and is particularly well-suited for application to cracks, crevices and other pest pathways.
    Type: Grant
    Filed: June 26, 1995
    Date of Patent: January 6, 1998
    Inventors: Billy J. Stapleton, Susie Stapleton
  • Patent number: 5702872
    Abstract: A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxy-phenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound.
    Type: Grant
    Filed: March 4, 1996
    Date of Patent: December 30, 1997
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Genji Imai, Naozumi Iwasawa, Tsuguo Yamaoka
  • Patent number: 5702870
    Abstract: A method of forming a metal interconnect structure for a CMOS integrated circuit provides for deposition of via metal prior to formation of an intermetal dielectric. After a submetal dielectric is deposited, lower metal and via metals are deposited. Gradient photolithography is used to define a via pattern and a lower metal pattern in a positive photoresist. After etching, the lower metal assumes the lower metal pattern and the via metal assumes the via pattern. A three-layer intermetal dielectric includes a spin-on glass sandwiched between two deposited silicon dioxide layers. The resulting structure is polished until at least some of the vias are exposed. Other vias can be exposed by via apertures that are define photolithographically. An upper metal layer is then deposited, filling the via apertures. The upper metal is then patterned to complete the interconnect structure. This method provides that via metal is insulated from spin-on glass moisture by the deposited oxide.
    Type: Grant
    Filed: September 9, 1996
    Date of Patent: December 30, 1997
    Assignee: VLSI Technology, Inc.
    Inventor: Hunter Barham Brugge
  • Patent number: 5700849
    Abstract: A photopolymerizable composition is disclosed, which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by the following formula (I): ##STR1## wherein the all symbols are defined in the disclosure, and a titanocene compound.
    Type: Grant
    Filed: February 23, 1996
    Date of Patent: December 23, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondo, Kazuo Fujita
  • Patent number: 5700474
    Abstract: A liquid bird aversion solution having methyl anthranilate in an amount of from 15 to 50% by weight of a total weight of the solution; d-limonene in an amount of from 10 to 50% by weight of a total weight of the solution; and isopropyl myristate in an amount of from 10 to 50% by weight of a total weight of the solution. The liquid solution is lighter than water and forms a thin liquid film on a surface of a source when applied to the source.
    Type: Grant
    Filed: September 19, 1996
    Date of Patent: December 23, 1997
    Assignee: PMC Specialties Group Inc.
    Inventors: Marvin F. Preiser, Peter F. Vogt
  • Patent number: 5698358
    Abstract: A process including providing a flexible substantially rectangular sheet having a first major exterior surface opposite and parallel to a second major exterior surface, removing or displacing material from the first major exterior surface adjacent and parallel to a first edge of the sheet to form a new first surface having an elongated, curvilinear "S" shaped profile when viewed in a direction parallel to the first edge, overlapping the new first surface and a second surface adjacent a second edge of the sheet whereby the first new surface contacts the second surface to form a mated surface region, the second surface being adjacent to or part of the second major exterior surface to form the sheet into a loop, the second edge being at an end of the sheet opposite from the first edge, and permanently joining the new first surface to the second surface into a seam to form a seamed belt of this invention.
    Type: Grant
    Filed: September 10, 1996
    Date of Patent: December 16, 1997
    Assignee: Xerox Corporation
    Inventor: Robert C. U. Yu
  • Patent number: 5698369
    Abstract: Disclosed is a photosensitive composition comprising a sulfonimide compound represented by formula (I):R.sub.1 --SO.sub.2 --NR.sub.3 --SO.sub.2 --R.sub.2 (I)wherein R.sub.1, R.sub.2 and R.sub.3 each represents an unsubstituted or substituted aromatic group or an unsubstituted or substituted alkyl group.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: December 16, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichi Kawamura, Fumikazu Kobayashi, Tsukasa Yamanaka