Patents Examined by George F. Lesmes
  • Patent number: 5698376
    Abstract: In a method of providing a resist pattern on a substrate surface, a layer of photoimageable composition is applied to a substrate, which photoimageable composition provides a tack-free surface. The photoimageable composition comprises:A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system (the weight percentages are based on the total weight of components A)-C)). The binder polymer A) comprises a backbone formed of between about 45 and about 65 mole percent of monomers which are selected from the group i) consisting of styrene, C.sub.1 14 C.sub.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: December 16, 1997
    Assignee: Morton International, Inc.
    Inventors: James J. Briguglio, Charles R. Keil, Vinai Ming Tara, Edward J. Reardon, Jr., Randall W. Kautz
  • Patent number: 5698285
    Abstract: An adhesive for use in producing an optical disk comprising two transparent substrates bonded to each other with a photocurable adhesive at respective bonding surfaces thereof and having an information recording layer formed on one or both of the bonding surfaces is disclosed, which is a composition comprising ingredient (A) shown below and a photopolymerization initiator comprising ingredient (B) and/or ingredient (C) shown below:(A) a radical-polymerizable vinyl compound,(B) an acylphosphine oxide compound represented by the general formula ##STR1## and (C) an .alpha.-aminoacetophenone compound represented by the following formula. ##STR2## With this adhesive, optical disk substrates having an extremely low light transmittance can be easily bonded to each other in a short time period without impairing their appearance.
    Type: Grant
    Filed: October 16, 1996
    Date of Patent: December 16, 1997
    Assignee: Three Bond Co., Ltd.
    Inventor: Kazuhiro Kojima
  • Patent number: 5698422
    Abstract: A toner composition comprised of a polyester resin with hydrophobic end groups, pigment, optional wax, optional charge additive, and optional surface additives.
    Type: Grant
    Filed: January 6, 1995
    Date of Patent: December 16, 1997
    Assignee: Xerox Corporation
    Inventors: Guerino G. Sacripante, Robert D. Bayley, Carol A. Fox, Thomas R. Hoffend, Bernard Grushkin
  • Patent number: 5698371
    Abstract: A photocurable composition useful in preparing water-developable, solid printing plates is prepared by blending a urethane (meth)acrylate prepolymer with a complexing polymer based on poly(vinyl pyrrolidone) composition. The resulting composition is suitably formulated with additional photoactive (meth)acrylate monomers or oligomers and photoinitiator for casting or extrusion on a substrate to form a flexographic printing plate. Following UV exposure of the plate through a negative, unexposed areas can be removed by washing with aqueous media, to give a plate with a desirable relief image. The use of the aqueous washout solution as opposed to organic solvents minimizes pollution problems. The use of the complexing polymer significantly reduces the cold flow of the uncured plate and both increases toughness and reduces tack of the cured plate.
    Type: Grant
    Filed: May 16, 1994
    Date of Patent: December 16, 1997
    Assignee: PT Sub, Inc.
    Inventors: Srinivas K. Mirle, Truc-Chi T. Huynh-Tran
  • Patent number: 5698370
    Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system, the weight percentages being based on the total weight of components A)-C).
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: December 16, 1997
    Assignee: Morton International, Inc.
    Inventors: Charles R. Keil, Randall William Kautz
  • Patent number: 5693373
    Abstract: A method of improving heat-seals for polyolefin polymers which are coated onto a paperboard substrate. The method obviates the need for use of a curable bonding agent. The materials are exposed to high energy radiation prior to formation of the heat seal to induce crosslinking of the poller and thereby increase the average molecular weight of same.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: December 2, 1997
    Assignee: International Paper Company
    Inventor: Joe L. Kinsey, Jr.
  • Patent number: 5693736
    Abstract: Polyurethanes which have olefinic double bonds and a content by mass of ethylene oxide units, incorporated via polyethylene glycol, of from 20 to 80% and which are obtainable by reacting (a) at least one organic polyisocyanate with (b) at least one polybutadiene derivative which is reactive toward isocyanates, and (c) if desired, one or more diols which contain, in addition, at least one further hydroxyl group or carboxyl group, and (d) a polyoxyalkylene glycol component having a molar mass of from 500 to 10,000 g/mol, wherein the ratio of NCO to OH equivalents, based on all the starting components (a) to (d), is from 0.5:1 to 1.2:1. The polyurethanes are useful, for example, as reactive emulsifiers.
    Type: Grant
    Filed: October 26, 1995
    Date of Patent: December 2, 1997
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Joachim Zoeller, Katja Thiergaertner
  • Patent number: 5693455
    Abstract: A stepped pattern is formed in a photoresist film (10) by heating the photoresist at a first temperature to soft bake it, and then applying a mask (10) that allows only a selected portion (15) of the photoresist to be heated. That portion of the photoresist film is then heated at a temperature sufficient to partially degrade the photoresist, and the mask is removed. Another portion (22) of the photoresist film is then exposed to ultraviolet light to degrade it more fully than in the earlier step. The photoresist film is then developed under conditions sufficient to completely remove the portion exposed to ultraviolet light, and to partially remove the portion heated using the mask, thereby creating a stepped feature in the photoresist film.
    Type: Grant
    Filed: July 6, 1995
    Date of Patent: December 2, 1997
    Assignee: Motorola, Inc.
    Inventors: Thomas J. Swirbel, Dale W. Dorinski
  • Patent number: 5693390
    Abstract: A surface-coated vessel or a surface-coated product having a hard coating layer is obtained, by coating a substrate of, for example, resin product with a resin composition for hard coating which comprises(a) a poly?(meth)acryloyloxyalkyl!(iso)cyanurate represented by the following general formula (1) or (2): ##STR1## wherein X.sup.1, X.sup.2 and X.sup.3 are each an acryloyl group, methacryloyl group, hydrogen atom or an alkyl group, with a proviso that at least two of them are (meth)acryloyl groups, and R.sup.1, R.sup.2 and R.sup.3 are each an oxyalkylene group or a polyoxyalkylene group;(b) a poly(meth)acrylated polyoxyalkane polyol;(c) a photopolymerization initiator consisting of 2-methyl-1-?4-(methylthio)phenyl!-2-morpholino-1-propanone;(d) a photopolymerization initiator based on thioxanthone;(e) a UV-absorber based on monohydroxybenzophenone;(f) an organic solvent.
    Type: Grant
    Filed: September 20, 1996
    Date of Patent: December 2, 1997
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Hajime Inagaki, Koji Yoshii
  • Patent number: 5690921
    Abstract: The hair fixing composition is in the form of an aqueous solution, foam or gel and contains from 0.1 to 5 percent by weight of one or more film-forming natural polymers, from 5 to 60 percent by weight of one or more water-soluble, halogen-free organic solvents, from 30 to 95% by weight water and from 0.05 to 2 percent by weight of one or more of the following compounds which are insoluble in water at room temperature but soluble in the composition: a C.sub.8 - to C.sub.20 -alkanediol, a C.sub.8 - to C.sub.20 -alkanetriol, a monoglyceride of saturated or unsaturated C.sub.12 - to C.sub.20 -fatty acids, a monodiglyceride of saturated or unsaturated C.sub.12 - to C.sub.20 -fatty acids, a C.sub.12 - to C.sub.20 -fatty alcohol ethoxylated with from 2 to 3 moles of ethylene oxide, a polysiloxane/polyether copolymer having a cloud point at a temperature of less than 20.degree. C., a polyoxyethylene/polyoxypropylene block polymer and a polyoxyethylene/polyoxybutylene block polymer.
    Type: Grant
    Filed: November 22, 1995
    Date of Patent: November 25, 1997
    Assignee: Wella Aktiengesellschaft
    Inventors: Gunther Lang, Thomas Clausen
  • Patent number: 5691394
    Abstract: A photopolymerizable composition is disclosed, comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by formula (I) and a titanocene compound. The photopolymerizable composition exhibits high sensitivity to active light rays over a wide region of from ultraviolet light to visible light.
    Type: Grant
    Filed: February 7, 1996
    Date of Patent: November 25, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Syunichi Kondo
  • Patent number: 5691100
    Abstract: A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.
    Type: Grant
    Filed: March 29, 1996
    Date of Patent: November 25, 1997
    Assignee: Hoechst Japan Limited
    Inventors: Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Klaus Przybilla, Natsumi Endo, Natsumi Suehiro, Hiroshi Okazaki
  • Patent number: 5691110
    Abstract: A process for enhancing the performance of resist polymers in lithographic processes for device fabrication is disclosed. The resist polymers contain acid labile functional groups. When these functional groups are removed and replaced by hydrogen, the polymer becomes more soluble in the aqueous base developer solutions used in lithographic processes. A portion of the acid-labile functional groups are cleaved from the polymer to obtain a resist polymer with increased sensitivity, improved adhesion, and reduced film shrinkage during post-exposure bake. The acid labile functional groups are cleaved by dissolving the polymer in a suitable solvent and subjecting the mixture to increased temperature until the desired number of acid labile functional groups are cleaved from the polymer. The polymer is then recovered from the mixture and employed as a resist in a lithographic process for device fabrication.
    Type: Grant
    Filed: July 20, 1994
    Date of Patent: November 25, 1997
    Assignee: Lucent Technologies Inc.
    Inventors: Michael Philip Bohrer, David Anton Mixon
  • Patent number: 5691117
    Abstract: It has been discovered that organic photoresists may be quickly, conveniently, and completely stripped using a hot hydrogen atmosphere. The substrates are preferably exposed to such atmosphere utilizing a hydrogen conveyor furnace. The gases from the furnace are burned to carbon dioxide and water thereby eliminating the need to dispose of a stripping agent.
    Type: Grant
    Filed: January 17, 1995
    Date of Patent: November 25, 1997
    Assignee: International Business Machines Corporation
    Inventors: Rebecca Christine Lutsic, James Richard Murray, David William Sissenstein, Jr.
  • Patent number: 5689785
    Abstract: A color image forming method which comprises forming a mono-color or multi-color toner image on an electrophotographic photoreceptor having a releasing surface by an electrophotographic process; forming a releasable transfer layer on the photoreceptor having the toner image formed thereon; transferring the toner image together with the transfer layer onto a primary receptor; and transferring the toner image together with the transfer layer from the primary receptor onto the final receiving material, and an apparatus for carrying out the image forming method.
    Type: Grant
    Filed: May 9, 1996
    Date of Patent: November 18, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Eiichi Kato, Sadao Osawa
  • Patent number: 5688632
    Abstract: This invention relates to a photosensitive polymer composition containing as essential components (A) a soluble polymer, (B) a photopolymerizable compound having an ethylenic double bond in the molecule there of and (C) a photopolymerization initiator, the soluble polymer comprising a water-soluble polymer and an alcohol-soluble polymer, the composition having a sea-and-islands structure comprising sea containing the water-soluble polymer as a main component and islands containing the alcohol-soluble polymer as a main component, and the islands are independently in the form of sphere or oval having a diameter of 0.1 to 20 microns.The photosensitive polymer composition affords a printing plate having high image reproducibility and water-developability and capable of withstanding the coating of an aqueous polymer according to a printing method.
    Type: Grant
    Filed: July 20, 1994
    Date of Patent: November 18, 1997
    Assignee: Toray Industries, Inc.
    Inventors: Shigetora Kashio, Katsutoshi Sasashita, Tomio Adachi
  • Patent number: 5688856
    Abstract: This invention is a process for producing stable polymer emulsions and latexes with an average particle size of less than one micron. The polymers are hydrogenated block copolymers of conjugated dienes and vinyl aromatic hydrocarbons which may or may not contain polar functionality. The process comprises making a polymer cement of the polymer and a blend of a non-aromatic solvent for the vinyl aromatic hydrocarbon block which is immiscible with water and a non-aromatic cosolvent, emulsifying the polymer cement by adding it to an aqueous phase containing at least one surfactant and removing the solvent, cosolvent and excess water.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: November 18, 1997
    Assignee: Shell Oil Company
    Inventors: David M. Austgen, Jr., Jeffrey G. Southwick, Bing Yang
  • Patent number: 5686214
    Abstract: An electrostatographic imaging member including at least one imaging layer capable of retaining an electrostatic latent image, a supporting substrate layer having an electrically conductive surface and an electrically conductive ground strip layer adjacent the electrostatographic imaging layer and in electrical contact with the electrically conductive surface, the electrically conductive ground strip layer comprising a homogeneous dispersion of conductive particles and solid organic particles in a film forming binder, the organic particles having a low surface energy and an average particle size less than the thickness of the strip layer. This imaging member may fabricated by ultrasonic welding techniques and may be employed in an electrostatographic imaging process.
    Type: Grant
    Filed: June 3, 1991
    Date of Patent: November 11, 1997
    Assignee: Xerox Corporation
    Inventor: Robert C. U. Yu
  • Patent number: 5684086
    Abstract: Polymer blends of unsaturated polyetherester resins and dicyclopentadiene polyester resins give single-phase, cured thermosets having high tensile and flexural strength. The thermosets exhibit a single glass-transition temperature within the range of about 70.degree. C. to about 150.degree. C. The synergism resulting from polymer blending provides a cost-effective way to improve the strength properties of cured polyetherester thermosets, and coincidentally, gives a way to improve the flexibility and toughness of cured DCPD polyester thermosets. Glass-reinforced thermosets made from polyetherester resin blends show exceptional structural fatigue resistance.
    Type: Grant
    Filed: July 28, 1995
    Date of Patent: November 4, 1997
    Assignee: ARCO Chemical Technology, Inc.
    Inventors: Lau S. Yang, Keith G. Johnson
  • Patent number: 5684072
    Abstract: A waterborne coating composition having improved smoothness is provided which contains a polymeric film-forming resin in aqueous medium and from about 0.1 percent to about 10 percent by weight based on total weight of resin solids of at least one material having the following structure: ##STR1## where n is an integer that is at least 1, R.sup.1 is hydrogen or lower alkyl having 1 to 10 carbon atoms, R.sup.2 is a divalent organic radical, and R.sup.3 is an alkyl, aryl, or alkylaryl group having 1 to 20 carbon atoms.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: November 4, 1997
    Assignee: PPG Industries, Inc.
    Inventors: Daniel E. Rardon, Roxalana L. Martin, Dennis L. Faler, James E. Poole