Abstract: A printing plate for electrophotographic type plate making having a photoconductive layer on an electrically conductive support. The photoconductive layer includes an organic photoconductive compound and a binding resin containing a copolymer including an acrylic acid ester or methacrylic acid ester having an aromatic ring and a vinyl polymerizable monomer having one to three acidic functional groups.

Abstract: For producing fine printing patterns on large serigraphical printing frames it is possible to apply an exposure through correspondingly large film areas, but it is cheaper to make use of a successive line-by-line exposure with the use of a modulated light or laser beam, which is caused to sweep across an emulsion coated printing frame surface from an oscillating deflection mirror. The beam (20), in its outermost positions, will be directed obliquely towards the surface (14), and if the latter changes its distance from the oscillating mirror (48) the exposure lines (16) will thus be correspondingly shorter or longer, whereby the printing pattern may be distorted.

Abstract: The present invention relates to a radiation-sensitive resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer binder. The copolymer binder comprises (meth)acrylic/(meth)acrylate copolymer.

Abstract: A method for manufacturing a substrate having electrically conductive circuits on its surface, window-shaped films on the electrically conducive circuits and a frame-shaped film at the regions not occupied with the window-shaped films, includes the steps of:(a) coating the surface of a transparent substrate with a photoresist composition to cover the electrically conductive circuits-carrying surface of the substrate, followed by forming a photoresist film,(b) superposing a photomask on the surface of the photoresist film formed in step (a) and exposing the thus mask-superposed photoresist film to light,(c) subjecting the substrate obtained in step (b) to development,(d) subjecting the photoresist film left in step (c) to heat-treatment, second exposure to light or no treatment,(e) subjecting the substrate passed the steps (a) to electro-deposition using the electrically conductive circuits on the substrate as one electrode to form electro-deposition coating films,(f) eliminating the photoresist film having be

Abstract: A developing solution comprising (A) at least one aromatic hydrocarbon having a boiling point of from 150.degree. to 300.degree. C.; (B) at least one alcohol represented by the following formula (I):R.sup.1 OH (I)wherein R.sup.1 represents an aliphatic or alicyclic alkyl group having from 5 to 12 carbon atoms, --C.sub.n H.sub.2n Ar, --(C.sub.m H.sub.2m O).sub.p C.sub.q H.sub.2q+1, a furfuryl group or a hydrogenated furfuryl group, an alkyl group substituted by an acyl group or an epoxy group, or --CH.sub.2 CH.sub.2 (OCH.sub.2 CH.sub.2).sub.r OR.sup.2 ; in which Ar represents an aromatic group; n represents an integer of from 1 to 3; m represents an integer of from 2 to 6; p represents 1 or 2; q represents 0 or an integer of from 1 to 4; R.sup.2 represents a hydrogen atom or an alkyl group; and r represents 0, 1 or 2; and (C) at least one compound represented by the following formula (II): ##STR1## wherein R.sup.3 and R.sup.

Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system, the weight percentages being based on the total weight of components A)-C).

Abstract: A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.

Abstract: A photosensitive polymer-containing system containing: (a) an energy sensitive polymer having a linear hydrocarbyl backbone and pendant peptide groups with free-radically polymerizable functionality attached thereto; (b) a vinyl-halomethyl-s-triazine capable of free-radical generation upon excitation with electromagnetic radiation having a wavelength of from about 330 to 500 nm; (c) an organic acid having a pKa of from about 1.8 to 5.5; (d) a leuco dye; and (e) a binder. A colorant may optionally be added. The photosensitive systems exhibit an increased shelf-life and excellent photosensitivity.

Abstract: A transfer recording medium comprising a substrate and a distributed layer of image forming elements, and an image forming method using the recording medium are provided. The distributed layer comprises first and second image forming elements. The first image forming elements comprise at least two species of different coloring characteristics which are capable of decreasing their transferabilities when provided with at light and heat energy under respectively prescribed at least two energy application conditions corresponding to the coloring characteristics. The second image forming element is capable of decreasing its transferability under any one of the at least two energy application conditions.

Abstract: The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution containing metal ion contaminants. The process is especially useful for treating photoresist compositions.

Abstract: A photosensitive lithographic printing plate requiring no fountain solution is described, which comprises a support having provided thereon a photopolymerizable photosensitive layer and a silicone rubber layer in this order, wherein the photopolymerizable photosensitive layer contains at least one photopolymerizable monomer represented by the following formula (I) and a photopolymerization initiator: ##STR1## The monomer represented by formula (I) is described in detail in the specification. Furthermore, a process for producing a photosensitive lithographic printing plate requiring no fountain solution is also described, which comprises the steps of soaking the above-described photosensitive lithographic printing plate requiring no fountain solution in water or an organic solvent mainly comprising water, and removing the silicon rubber layer to form an image while soaking the plate.

Abstract: A novel capsule toner is provided, comprising a core and a shell covering the core, wherein the shell is made of a substance capable of producing radical and there is attached to the surface of said shell a polymer comprising as monomer component a quaternary ammonium salt-containing vinyl monomer represented by formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or methyl group; R.sub.2, R.sub.3 and R.sub.4 each represents a hydrogen atom, a C.sub.1-5 alkyl group or a benzyl group; Y represents --CO.sub.2 -- or --CONH--; n represents an integer 1 to 7; and X.sup.- represents an anion containing -COO.sup.- group, --SO.sub.3.sup.- group or --SO.sub.4.sup.- group in the structure.

Abstract: Low optical density magnetic fluid which is a stable dispersion of fine magnetic particles. A method of forming the stable dispersion which includes providing an ion exchange resin, loading the ion exchange resin with an ion capable of forming a magnetic phase, treating the loaded resin to form magnetic particles and micronizing the resin and magnetic particles in a fluid to form an aqueous stable colloid. The invention provides submicron particles and submicron particles which are dispersed in an aqueous colloid. A method of forming the stable dispersion which includes providing an ion exchange resin, loading the ion exchange resin with an ion, treating the loaded resin to form nanoscale particles. Fluidizing the resin and particles to form an aqueous stable colloid. A method of forming magnetic materials having tunable magnetic properties and the magnetic materials formed thereby.

Abstract: An amine compound-containing, but cyanogen-free, desensitizing solution for offset printing, characterized by containing phytic acid (inositol hexaphosphate) and/or a metal and/or ammonium salts of phytic acid, and at least one selected from the group consisting of amine compounds represented by the following general formulae (1) and (2); a carboxylic acid or carboxylate containing (3); an urea (5) and/or an urethane (6) containing (4); an amide compound represented by (8) and/or an imide compound (9), each containing an amino group (7); and a heterocyclic compound at least one nitrogen atom and having an inorganic/organic value of 0.1 to 4.0 inclusive.

Abstract: A method for manufacturing a substrate having electrically conductive circuits on the surface of a transparent substrate, window-shaped coating films on the electrically conductive circuits and a frame-shaped, functional coating film at the regions not occupied with the window-shaped coating films, includes the steps of:(a) coating the surface of a transparent substrate with a photoresist composition to cover the circuits-carrying surface of the substrate, followed by forming a photoresist coating film,(b) superposing a photomask on the surface of the photoresist coating film formed through step (a) and exposing the thus masked photoresist coating film to light,(c) subjecting the substrate formed through steps (a) and (b) to development, and eliminating the photoresist coating film in the frame-shaped part,(d) subjecting the photoresist coating film left in step (c) to heat-treatment,(e) coating the substrate obtained through steps (a) to (d) in this order with a negative photoresist composition containing a

Abstract: The invention relates to novel maleimide copolymers which, in addition to structural units derived from certain maleimide derivatives defined more precisely in the present patent application, comprises recurring structural units selected from the structural units of the formulae (Ia) and (Ib) ##STR1## where A is a direct single bond or a divalent group of the formula --O--;R.sub.0 and R.sub.1, independently of one another, are each a hydrogen atom, a C.sub.1 -C.sub.6 alkyl group or an aryl group having 6 to 14 ring carbon atoms;R.sub.2 is a radical of the formula ##STR2## in which R is a tert-alkyl radical having 4 to 19 carbon atoms,[T] is a C.sub.1 -C.sub.6 alkylene group or an arylene group having 6 to 14 ring carbon atoms, and p is the number 2, 3 or 4; orA together with R.sub.2 is a group of the formula ##STR3## and where, furthermore, R.sub.3 and R.sub.4, independently of one another, are each a hydrogen atom, a halogen atom, a C.sub.1 -C.sub.6 alkyl group or a C.sub.1 -C.sub.

Abstract: A radiation sensitive resin composition which comprises (A) a copolymer represented by the following general formula and (B) a radiation sensitive acid generator and, if necessary, (C) an alkali-soluble resin: ##STR1## wherein R represents a hydrogen atom or a methyl group and m and n are integers representing the numbers of the respective recurring units and satisfying the relations 0.1.gtoreq.m/(m+n)<0.6 and 0.4<n/(m+n).ltoreq.0.9. Said radiation sensitive resin composition is excellent in resolution and pattern profile and also excellent in sensitivity and developability and is useful as a chemically amplified resist good in contrast and heat resistance.

Abstract: An electrophotographic photoconductor having superior electrical properties and image quality which are not affected by the external environment is provided. The photoconductor includes an intermediate layer formed between a conductive substrate and a photosensitive layer. The intermediate layer is a hardened film containing as its main components melamine resin, aromatic carboxylic acid and/or aromatic carboxylic anhydride, and fixed iodine. Alternatively, the intermediate layer is composed of normal-butylated melamine resin, acid and/or an acid equivalent, and fixed iodine. The film thickness of the intermediate layer according to the present invention need not be as thin as in the prior art. An intermediate layer of such a thickness can cover various defects on the surface of the conductive substrate, and a uniform photosensitive layer with few film defects can be formed on the intermediate layer.

Abstract: A backside textured papermaking belt is disclosed which is comprised of a framework and a reinforcing structure. The framework has a first surface which defines the paper-contacting side of the belt, a second surface opposite the first surface, and conduits which extend between first and second surfaces of the belt. The first surface of the framework has a paper side network formed therein which defines the conduits. The second surface of the framework has a backside network with passageways that provide surface texture irregularities in the backside network. The papermaking belt is made by applying a coating of photosensitive resinous material to a reinforcing structure which has opaque portions, and then exposing the photosensitive resinous material to light of an activating wavelength through a mask which has transparent and opaque regions and also through the reinforcing structure.

Abstract: A process for the formation of a patterned resist image upon a substrate comprises the steps of: (i) mechanically applying a layer of a suspension of a powdered solid photocurable material in a liquid carrier to the substrate; (ii) drying the resultant layer by evaporation of the liquid carrier and reflowing the powder, under the action of heat, to give a coherent film; (iii) imagewise exposing the dried film to radiation through a patterned mask whereby portions of the film exposed to radiation are cured; and (iv) subsequently developing the exposed film by removing unexposed portions thereof with an appropriate solvent.