Patents Examined by George F. Lesmes
  • Waterborne coating compositions having improved smoothness
    Patent number: 5684072
    Abstract: A waterborne coating composition having improved smoothness is provided which contains a polymeric film-forming resin in aqueous medium and from about 0.1 percent to about 10 percent by weight based on total weight of resin solids of at least one material having the following structure: ##STR1## where n is an integer that is at least 1, R.sup.1 is hydrogen or lower alkyl having 1 to 10 carbon atoms, R.sup.2 is a divalent organic radical, and R.sup.3 is an alkyl, aryl, or alkylaryl group having 1 to 20 carbon atoms.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: November 4, 1997
    Assignee: PPG Industries, Inc.
    Inventors: Daniel E. Rardon, Roxalana L. Martin, Dennis L. Faler, James E. Poole
  • Method for forming resist pattern by irradiating a resist coating on a substrate, contacting the resist with organic solvent vapor and removing the irradiated portion
    Patent number: 5683857
    Abstract: A method for forming a resist pattern which comprises irradiating an active light ray to a resist obtained by coating a photosensitive resin composition containing a compound capable of generating an acid due to irradiation of the active light ray and a silyloxy compound in a binder resin on a substrate through a pattern mask to decompose the silyloxy compound due to the acid generated at the irradiation region to form a silanol compound, and after removing the silanol compound, removing a film at the photosensitive region due to an oxygen plasma, a removal of said silanol compound being conducted by bringing the film after irradiation of the active light ray into contact with volatile organic solvent vapor having a boiling photosensitive composition.
    Type: Grant
    Filed: August 1, 1996
    Date of Patent: November 4, 1997
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masamitsu Shirai, Masahiro Tsunooka, Kanji Nishijima
  • Cured thermosets and glass-reinforced composites from unsaturated polyetherester resins
    Patent number: 5684086
    Abstract: Polymer blends of unsaturated polyetherester resins and dicyclopentadiene polyester resins give single-phase, cured thermosets having high tensile and flexural strength. The thermosets exhibit a single glass-transition temperature within the range of about 70.degree. C. to about 150.degree. C. The synergism resulting from polymer blending provides a cost-effective way to improve the strength properties of cured polyetherester thermosets, and coincidentally, gives a way to improve the flexibility and toughness of cured DCPD polyester thermosets. Glass-reinforced thermosets made from polyetherester resin blends show exceptional structural fatigue resistance.
    Type: Grant
    Filed: July 28, 1995
    Date of Patent: November 4, 1997
    Assignee: ARCO Chemical Technology, Inc.
    Inventors: Lau S. Yang, Keith G. Johnson
  • Desensitizing solution for offset printing
    Patent number: 5681686
    Abstract: This invention relates to a desensitizing solution for offset printing which is used for desensitizing an original plate for offset printing. The desensitizing solution of the present invention contains a basic aluminum chloride and/or its derivatives and glucosamine and/or its derivatives. This desensitizing solution can be used in combination with a desensitizing solution for offset printing which consists of phytic acid and its derivatives as the principal components.
    Type: Grant
    Filed: March 27, 1996
    Date of Patent: October 28, 1997
    Assignee: Iwatsu Electric Co., LTD
    Inventors: Hirotsuga Saito, Hayato Hyakutake, Mamoru Kidachi
  • Imaging element comprising a photopolymerizable composition
    Patent number: 5681683
    Abstract: The present invention provides an imaging element comprising on a hydrophilic base a hydrophobic photopolymerizable composition capable of being irradiated with actinic light through the support and/or through the front and containing a photopolymerizable composition characterized in that a water-swellable barrier layer comprising at least one non-proteinic water-soluble film-forming polymer is located between said hydrophilic base and said hydrophobic photopolymerizable composition, contiguous to the hydrophilic base and is coated at a ratio of 0.01 to 2.0 g/m2, said water-swellable barrier layer being capable of being peeled off of said hydrophilic base by dry development.
    Type: Grant
    Filed: November 22, 1995
    Date of Patent: October 28, 1997
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Eddie Daems, Joan Vermeersch, Marc Van Damme, Luc Leenders, Thomas Nouwen, Hendrik Kokelenberg
  • Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition
    Patent number: 5677112
    Abstract: A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.
    Type: Grant
    Filed: July 29, 1996
    Date of Patent: October 14, 1997
    Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electric Industries Co., Ltd.
    Inventors: Fumiyoshi Urano, Keiji Oono, Hiroshi Matsuda, Masayuki Endo, Satoshi Kobayashi
  • Non-tacky photoimageable electrodepositable photoresist composition
    Patent number: 5674660
    Abstract: An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid.
    Type: Grant
    Filed: June 30, 1994
    Date of Patent: October 7, 1997
    Assignee: PPG Industries, Inc.
    Inventors: Kurt G. Olson, Michael G. Sandala, Steven R. Zawacky, Charles F. Kahle, II, Masayuki Nakajima
  • Printing of reflective sheeting
    Patent number: 5672381
    Abstract: A weather resistant sign and a method of printing a sign including the steps of providing a sign component and an image definition, applying dry toner powder to surface portions corresponding to the image definition, and fusing the applied toner. Preferably, the fused toner is protected from weather by a transparent protective layer. A toner composition and a computer program for printing are also disclosed.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: September 30, 1997
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: J. Sundar Rajan
  • Polyfunctional vinyl ether compound and photoresist resin composition containing the same
    Patent number: 5672463
    Abstract: A polyfunctional vinyl ether compound represented by formula (I): ##STR1## wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, or a cycloalkyl group; Q each independently represents --OH or a group represented by the formula --OROCH.dbd.CH.sub.2, wherein R represents an alkylene group having from 1 to 12 carbon atoms, the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) being from 10/90 to 90/10; and A each independently represents a divalent hydrocarbon group having from 1 to 30 carbon atoms.
    Type: Grant
    Filed: October 20, 1995
    Date of Patent: September 30, 1997
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Shigeo Hozumi, Shinichiro Kitayama, Hiroya Nakagawa
  • Method for transferring color images onto both sides of a transfer material
    Patent number: 5672452
    Abstract: An image-forming method is disclosed. A color toner image formed on an electrostatic latent image carrier is transferred onto one surface of a transfer material and fixed on the transfer material by a fixing means through heating and melting. An other color toner image formed on the electrostatic latent image carrier is transferred onto an other surface opposite to the color toner-fixed surface of the transfer material and fixed, thereby forming color images fixed on both surfaces of the transfer material. The color toner forming the color images contains toner particles directly obtained by suspension polymerization, and the toner particles contain wax.
    Type: Grant
    Filed: July 10, 1995
    Date of Patent: September 30, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Kanbayashi, Takashige Kasuya, Tatsuya Nakamura, Tatsuhiko Chiba, Koji Inaba
  • Anionic waterborne polyurethane dispersions
    Patent number: 5672653
    Abstract: Anionic waterborne polyurethane dispersions made using hydroxyl terminated polybutadiene resins and use of the dispersions to make films and adhesives.
    Type: Grant
    Filed: May 13, 1996
    Date of Patent: September 30, 1997
    Assignee: Elf Atochem North America, Inc.
    Inventors: Kurt C. Frisch, Bhikhubhai P. Suthar, Han X. Xiao
  • Method of lithography using reticle pattern blinders
    Patent number: 5667918
    Abstract: An improved reticle pattern for semiconductor lithography systems that utilize partially coherent or off-axis illumination includes blinder structures located adjacent to the exterior features of the reticle pattern. The blinder structures protect the exterior features from light that is scattered from large low resolution areas of the reticle in a defocus mode of the lithography system. This protects the exterior features projected onto a semiconductor wafer from degradation and improves the resolution, contrast and depth of focus of the lithographic system. In an illustrative embodiment, the reticle pattern is formed as a simple grating in which the exterior features of the grating are protected from image degradation by blinder structures formed as one or more solid blinder lines.
    Type: Grant
    Filed: June 27, 1995
    Date of Patent: September 16, 1997
    Assignee: Micron Technology, Inc.
    Inventors: Steve K. Brainerd, J. Brett Rolfson
  • Charging member, electrophotographic apparatus and charging method using the same
    Patent number: 5669047
    Abstract: A charging member for electrophotography comprising a surface layer, wherein the surface layer comprises a resin and an alkali metal salt contained therein.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: September 16, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masami Okuda, Hisami Tanaka, Junichi Kishi, Hiroyuki Ohmori, Takashi Koyama, Masafumi Hisamura
  • Electrophotography carrier having domains dispersed in a matrix resin with a dispersion assistant interposed
    Patent number: 5665508
    Abstract: This invention relates to a developer for electrophotography comprising:a domain resin phase containing specified additives,a matrix resin phase containing specified additives anda dispersion assistant,the matrix resin having a low compatibility with the domain resin, and the dispersion assistant having a compatibility with both of the domain resin and matrix resin and an Izod impact value higher than the matrix resin.
    Type: Grant
    Filed: July 29, 1994
    Date of Patent: September 9, 1997
    Assignee: Minolta Camera Kabushiki Kaisha
    Inventors: Sanji Inagaki, Shoichi Tsuge, Mineyuki Sako, Kenzo Toya, Takashi Akazawa
  • Positive charge type organic photoconductive layer
    Patent number: 5665503
    Abstract: A positive charge type organic photoconductor in which the surface of the photoconductor having a film thickness of from 10 to 30 .mu.m and containing at least from 15 to 40% by weight of a phthalocyanine type photoconductive compound in a resin binder, is treated with a reactive monomer or oligomer capable of extinguishing ionic active and radical active parts.
    Type: Grant
    Filed: August 12, 1994
    Date of Patent: September 9, 1997
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Sei Tsunoda, Toshio Kobayashi, Shigeo Tsuda, Kikuo Hayama, Hiromi Yamada
  • Resin-coated carrier for electrophotographic developer
    Patent number: 5665507
    Abstract: A magnetic particle brush developing carrier used for electrostatic latent image developing is disclosed, comprising a magnetic particle having a surface coating comprising two kinds of fluoro-type resins, with one of the resins having a higher critical surface tension than the other. The carrier maintains its triboelectric properties even after extended use, it reaches charge saturation after a short period of triboelectrification, and it has excellent charge stability against environmental change.
    Type: Grant
    Filed: March 31, 1994
    Date of Patent: September 9, 1997
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Masahiro Takagi, Masahito Shinoki, Takayoshi Aoki
  • Radiation-sensitive composition containing a resole resin, a novolac resin an infrared absorber and a triazine and use thereof in lithographic printing plates
    Patent number: 5663037
    Abstract: A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a haloalkyl-substituted s-triazine and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
    Type: Grant
    Filed: September 26, 1995
    Date of Patent: September 2, 1997
    Assignee: Eastman Kodak Company
    Inventors: Neil Frederick Haley, Steven Leo Corbiere
  • Light-sensitive resin composition
    Patent number: 5663212
    Abstract: A light-sensitive resin composition which can be developed in an alkaline aqueous solution and has an excellent image-forming performance and a sufficient UV absorbance after an image formation is disclosed. The light-sensitive resin composition includes (1) a photopolymerization initiator or a photopolymerization initiator system, (2) an addition-polymerizable monomer having an ethylenically unsaturated double bond, (3) a high molecular binder which is soluble in an alkaline aqueous solution and insoluble in water, and (4) at least one of the compounds which substantially do not absorb light in a specified UV region and which, when subjected to treatment with an aqueous alkali solution and/or to heating, are capable of absorbing light in that region and have substantially no absorption in the visible region.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: September 2, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yuichi Wakata, Morimasa Sato, Ken Iwakura, Yuuichi Fukushige
  • Microlithographic structure with an underlayer film comprising a thermolyzed azide
    Patent number: 5663036
    Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
    Type: Grant
    Filed: December 13, 1994
    Date of Patent: September 2, 1997
    Assignee: International Business Machines Corporation
    Inventors: Willard Earl Conley, James Thomas Fahey, Wayne Martin Moreau, Ratnam Sooriyakumaran, Kevin Michael Welsh
  • Method of forming micropatterns
    Patent number: 5658711
    Abstract: A relatively thick metal oxide film of 100 nm or more is formed in the exposed portion of a resist film by supplying water and a metal alkoxide thereto, and then evaporating the alcohol generated by the supply of metal alkoxide to form a precise resist pattern from the metal oxide film. Water is absorbed into the exposed portion of the resist film in which the acid has been generated and the water is diffused deeper into the surface thereof. The growth of the metal oxide film proceeds toward the interior of the resist film. The water absorbed by the resist film is prevented from being evaporated, thereby forming a metal oxide film with a sufficiently large thickness to withstand dry etching.
    Type: Grant
    Filed: November 29, 1995
    Date of Patent: August 19, 1997
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takahiro Matsuo, Kazuhiro Yamashita, Masayuki Endo, Masaru Sasago