Patents Examined by Hoa Q. Pham
  • Patent number: 11953055
    Abstract: A photographing step of obtaining an original image by photographing a part or all of a sliding surface using a camera is performed and then an imaging process of detecting machining marks on the original image is performed; a detecting step of obtaining a detection image is performed; and an evaluating step of estimating a difference of a rotation torque of the raceway ring member with respect to another raceway ring member on the basis of the detection image in a direction of relative rotation between the raceway ring member and the other raceway ring member when a rolling bearing is constituted by combining a raceway ring member with the other raceway ring member is performed.
    Type: Grant
    Filed: December 2, 2019
    Date of Patent: April 9, 2024
    Assignee: NSK LTD.
    Inventor: Hidekazu Suzuki
  • Patent number: 11955390
    Abstract: A semiconductor wafer evaluation method includes acquiring a reflection image as a bright-field image by receiving reflected light which is obtained when irradiating one surface side of a semiconductor wafer to be evaluated with light; acquiring a scattered image as a dark-field image by receiving scattered light which is obtained when irradiating the surface side of the semiconductor wafer with light; and obtaining a distance between a bright zone that is observed in the reflection image and a bright zone that is observed in the scattered image. The semiconductor wafer to be evaluated is a semiconductor wafer in which a chamfered surface is formed in a wafer outer peripheral edge section, and the method includes evaluating a shape of a boundary part between a main surface on the surface side irradiated with the light of the semiconductor wafer to be evaluated and a chamfered surface adjacent to the main surface.
    Type: Grant
    Filed: January 7, 2019
    Date of Patent: April 9, 2024
    Inventors: Takahiro Nagasawa, Yasuyuki Hashimoto, Hirotaka Kato
  • Patent number: 11949208
    Abstract: The present disclosure discloses a degassing-free underwater dissolved carbon dioxide detection device and a detection method. The degassing-free underwater dissolved carbon dioxide detection device includes a computer, which is used to provide the driving signal and controlling parameters for the power tuning unit; the computer is connected with a laser driving control module and the power tuning unit, respectively; the laser driving control module is connected with a laser; the laser is connected with a photo-isolator; the photo-isolator is connected with a thulium-doped fiber vertical-cavity laser system; the thulium-doped fiber vertical-cavity laser system is connected with a photoacoustic cell system through a fiber collimator; the photoacoustic cell system is connected with a pre-amplifier circuit and a lock-in amplifier in sequence, and the lock-in amplifier is connected with the computer.
    Type: Grant
    Filed: November 10, 2021
    Date of Patent: April 2, 2024
    Assignee: Ocean University Of China
    Inventors: Fupeng Wang, Rui Liang, Qingsheng Xue, Jinghua Wu, Xijie Hao
  • Patent number: 11940739
    Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
    Type: Grant
    Filed: December 27, 2021
    Date of Patent: March 26, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
  • Patent number: 11914303
    Abstract: The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source which emits coherent light, an illumination optical unit which produces a diffraction-limited light spot on the mask from the coherent light of the at least one light source, a scanning device, by use of which it is possible to implement a scanning movement of the diffraction-limited light spot relative to the mask, a sensor unit, and an evaluation unit for evaluating the light that is incident on the sensor unit and has come from the mask, an output coupling element for coupling out a portion of the coherent light emitted by the at least one light source, and an intensity sensor for capturing the intensity of this output coupled portion.
    Type: Grant
    Filed: June 11, 2021
    Date of Patent: February 27, 2024
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Ruoff, Heiko Feldmann, Ulrich Matejka, Thomas Thaler, Sascha Perlitz, Shao-Chi Wei, Joerg Frederik Blumrich, Markus Deguenther
  • Patent number: 11898969
    Abstract: A method and an apparatus for the surface quality inspection of the external surface of at least one component for inhalers or vaporizers, in particular a cartomizer for electronic cigarettes, verifies whether there are surface imperfections on the external surface of the components.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: February 13, 2024
    Inventor: Carlo Zaniboni
  • Patent number: 11898249
    Abstract: A method of processing a substrate according to a PECVD process is described. Temperature profile of the substrate is adjusted to change deposition rate profile across the substrate. Plasma density profile is adjusted to change deposition rate profile across the substrate. Chamber surfaces exposed to the plasma are heated to improve plasma density uniformity and reduce formation of low quality deposits on chamber surfaces. In situ metrology may be used to monitor progress of a deposition process and trigger control actions involving substrate temperature profile, plasma density profile, pressure, temperature, and flow of reactants.
    Type: Grant
    Filed: February 13, 2023
    Date of Patent: February 13, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang, Juan Carlos Rocha-Alvarez, Thomas Nowak, Jianhua Zhou, Ramprakash Sankarakrishnan, Amit Kumar Bansal, Jeongmin Lee, Todd Egan, Edward W. Budiarto, Dmitriy Panasyuk, Terrance Y. Lee, Jian J. Chen, Mohamad A. Ayoub, Heung Lak Park, Patrick Reilly, Shahid Shaikh, Bok Hoen Kim, Sergey Starik, Ganesh Balasubramanian
  • Patent number: 11898949
    Abstract: By irradiating target liquid L containing fine bubbles with ultrasonic waves from an ultrasonic irradiation device 102, the fine bubbles in the target liquid L is reduced. By irradiating the target liquid L with ultrasonic waves, fine bubbles in the target liquid L can be reduced effectively. By using ultrasonic waves, bubbles with small diameters, particularly fine bubbles, can be effectively reduced, so that fine bubbles in the target liquid L can be efficiently reduced.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: February 13, 2024
    Assignees: Shimadzu Corporation, National Institute of Technology and Evaluation, Fine Bubble Industries Association
    Inventors: Seika Ohuchi, Mitsuru Tanaka, Haruo Shimaoka
  • Patent number: 11885751
    Abstract: A testing device for detecting defects of transparent test specimens, in particular of ophthalmological lenses, has an illumination device for transilluminating test specimens to be examined and with an image acquisition device for imaging the test specimen transilluminated by the illumination device. The illumination device includes a plurality of linearly adjustable light sources for generating a stripe pattern. To capture the stripe pattern, the acquisition duration of the image acquisition device can be adjusted in such a way that the light emitted by each of the light sources is detected as a light stripe. Further, the disclosure relates to a testing method for detecting a defect of a transparent specimen.
    Type: Grant
    Filed: September 18, 2023
    Date of Patent: January 30, 2024
    Assignee: Carl Zeiss Vision International GmbH
    Inventors: Marc Flemming, Hannes Scheibe, Dominik Wiedemann, Alexander Friedl, Daniel Schoebel
  • Patent number: 11885612
    Abstract: An apparatus for three-dimensional measurement of an object includes a trigger configured to obtain image information from a measurement camera and to trigger, in dependence on image content of the image information, a measurement output or an evaluation of the image information by an evaluator for determining measurement results. Further, a respective method and a respective computer program are described.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: January 30, 2024
    Inventors: Jens Döge, Christoph Hoppe, Willi Neudeck
  • Patent number: 11879774
    Abstract: The invention provides a light indicator (100) for use in evaluating melanopsin active radiation in a flux of light, the light indicator (100) comprising a first light indicator element (110) comprising a first light reflective element (112) and a second light indicator element (120) comprising a second light reflective element (122), the light reflecting elements (112,122) having different wavelength dependencies of the spectral reflectivity, wherein the light reflecting elements (112,122) are selected to provide the same intensity of reflected light of two or more different types of light irradiating on the light indicator elements (110,120), wherein the two or more different types of light have different spectral power distributions in the visible wavelength range but having the same ratios of the melanopic flux and the luminous flux, wherein the ratio of the melanopic flux and the luminous flux of light is defined as MEF = 1.
    Type: Grant
    Filed: September 2, 2019
    Date of Patent: January 23, 2024
    Assignee: SIGNIFY HOLDING B.V.
    Inventors: Marcel Lucassen, Tobias Borra, Dragan Sekulovski
  • Patent number: 11877527
    Abstract: In one aspect, a system for controlling the operation of an agricultural implement may include a ground-engaging tool configured to engage soil within a field such that the tool creates a field material cloud aft of the tool as the implement is moved across the field. Furthermore, the system may include an imaging device configured to capture image data associated with the field material cloud created by the ground-engaging tool. Moreover, a controller of the disclosed system may be configured to identify a plurality of field material units within the field material cloud based on the image data captured by the imaging device. Additionally, the controller may be configured to determine a characteristic associated with the identified plurality of field material units.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: January 23, 2024
    Assignee: CNH Industrial America LLC
    Inventors: Douglas James Rylander, Trevor Stanhope
  • Patent number: 11879765
    Abstract: A measurement apparatus for weight measuring composite sheet including a sheet material having a second material thereon as a coating and/or as embedded particles therein. The apparatus includes an x-ray sensor for providing an x-ray signal from x-ray irradiating the composite sheet and an infrared (IR) sensor for providing an IR signal from IR irradiating the composite sheet. A computing device is coupled to receive the x-ray signal and the IR signal that includes a processor having an associated memory for implementing an algorithm, where the algorithm uses the x-ray signal and the IR signal to compute a plurality of weights selected from a weight of the sheet material, a weight of the second material, and a total weight of the composite sheet.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: January 23, 2024
    Inventors: Tobias Nebel, Sebastien Tixier, Michael Kon Yew Hughes, Gertjan Hofman, Paul Mounter
  • Patent number: 11867597
    Abstract: A method for making a plasmonic mushroom array includes: forming a plurality of metal nano-islands each having nanometer-range dimensions on a surface of a glass substrate; and subjecting to the glass substrate having the plurality of metal nano-islands formed thereon to reactive ion etching such that the plurality of metal nano-islands are converted to a plurality of mushroom-shaped structures each having a metal cap supported by a pillar made of a material of the glass substrate and each having dimensions smaller than the dimensions of the nano-islands, the plurality of mushroom-shaped structures being arranged in a substantially regular pattern with intervals smaller than average intervals between the nano-islands, thereby forming the plurality of nano-scale mushroom-shaped structures on the glass substrate that can exhibit localized surface plasmon resonance.
    Type: Grant
    Filed: February 22, 2022
    Date of Patent: January 9, 2024
    Inventors: Nikhil Bhalla, Amy Shen Fried, Kang-Yu Chu
  • Patent number: 11867603
    Abstract: A mold sensor is configured with an enclosed chamber in which a nutrient-treated substrate is positioned. The mold sensor includes an optical sensor that is configured to measure optical properties in the enclosed chamber. A controller operates the optical sensor and is programmed to detect a presence of mold growing in the chamber based on the optical properties measured by the optical sensor.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 9, 2024
    Assignee: Robert Bosch GmbH
    Inventors: Seow Yuen Yee, Franz Laermer, Christian Peters, Oliver Peters, Robert Duerichen, Ning Wang, Thomas Rocznik
  • Patent number: 11867818
    Abstract: A method for performing a simultaneous location and mapping of a scanner device includes detecting a set of lines in a point cloud, and identifying a semantic feature based on the set of lines. The method further includes assigning a first scan position of the scanner device in the surrounding environment at the present time t1 as a landmark, and linking the landmark with the portion of the map. The method further includes determining that the scanner device has moved, at time t2, to the scan position that was marked as the landmark based on identifying said semantic feature in another scan-data. In response, a second scan position at time t2 is determined. Also, a displacement vector is determined for the map based on a difference between the first scan position and the second scan position. Subsequently, a revised second scan position is computed based on the displacement vector.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: January 9, 2024
    Assignee: FARO Technologies, Inc.
    Inventors: Mark Brenner, Aleksej Frank, Ahmad Ramadneh, Oliver Zweigle
  • Patent number: 11860084
    Abstract: The present invention relates to an analytical method that includes providing a sample potentially containing a chiral analyte that can exist in stereoisomeric forms, and providing a probe selected from the group consisting of metal salts. The sample is contacted with the probe under conditions that permit coordination of the probe to the analyte, if present in the sample; and, based on any coordination that occurs, the absolute configuration of the analyte in the sample, and/or the concentration of the analyte in the sample, and/or the enantiomeric composition of the analyte in the sample is/are determined.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: January 2, 2024
    Inventors: Christian Wolf, Zeus A. O. De Los Santos, Ciaran Lynch
  • Patent number: 11852593
    Abstract: In an embodiment, a system includes: a broadband light source; a wafer with a first side facing the broadband light source; a first light sensor configured to detect reflected light from the broadband light source emanating from the first side; a second light sensor configured to detect emergent light emanating from a second side of the wafer opposite the first side, wherein the emergent light originates from the broadband light source; and a detector module configured to analyze the reflected light and the emergent light to identify wafer defects.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nai-Han Cheng, Hsing-Piao Hsu
  • Patent number: 11852524
    Abstract: An optical measurement apparatus having an improved light intensity detection performance is provided. The optical measurement apparatus includes a light receiving element capable of converting a light intensity of light to be analyzed into an electrical signal; an input terminal to which the electrical signal is input; a first amplifier and a nonlinear element configuring a logarithmic amplifier; offset resistors; a switch unit; and a controller. An inverting input terminal of the first amplifier is electrically connected to the input terminal. The offset resistors have different resistance values. The switch unit can switch an offset resistor electrically connected between the voltage source and the input terminal, of the offset resistors. An offset current is input to the input terminal by the offset resistor electrically connected between the voltage source and the input terminal. The controller measures the light intensity based on an output voltage value of the first amplifier.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: December 26, 2023
    Assignees: YOKOGAWA ELECTRIC CORPORATION, Yokogawa Test & Measurement Corporation
    Inventor: Atsushi Horiguchi
  • Patent number: 11835447
    Abstract: A method for measuring a characteristic of a thin film is disclosed. The method includes a) obtaining a measured spectrum from a target region on the substrate by using a spectroscopic ellipsometer, b) obtaining a physical model capable of obtaining an estimated parameter value related to the characteristic of the thin film through regression analysis of the measured spectrum, c) obtaining a machine learning model capable of obtaining a reference parameter value related to the characteristic of the thin film by using the measured spectrum, and d) obtaining an integrated model which uses an integrated error function capable of considering both of a first error function and a second error function, and obtaining an optimum parameter value through regression analysis of the integrated model.
    Type: Grant
    Filed: August 8, 2023
    Date of Patent: December 5, 2023
    Inventor: Tae Dong Kang