Patents Examined by Hoa Q. Pham
  • Patent number: 10809378
    Abstract: A triangulation sensing system includes a projection axis configuration and an imaging axis configuration. The projection axis configuration includes a triangulation light source (e.g. an incoherent source) and a variable focus lens (VFL) that is controlled to rapidly periodically modulate a triangulation light focus position (TLFP) along a Z axis over a focus position scan range, to provide a corresponding triangulation light extended focus range (TLEFR) that supports accurate measurement throughout. In some implementations, the triangulation system may be configured to provide the best measurement accuracy for a workpiece region of interest (WROI) by exposing its triangulation image only when the scanned TLFP temporarily coincides with the WROI Z height. In some implementations, the triangulation system may be configured to limit various measurement operations to using only an operational pixel subset of a detector that receives image light from the WROI, in order to shorten the measurement time.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: October 20, 2020
    Assignee: Mitutoyo Corporation
    Inventors: Paul Gerard Gladnick, Joseph Daniel Tobiason
  • Patent number: 10801838
    Abstract: An instrument for dynamically observing the evolution behavior of the slope topography. The dual hosts emit parallel, equal-height and overlapped laser planes from different directions, and project the laser planes onto a slope landform. The image acquisition device shoots the slope landform with the projected laser lines at an angle perpendicular to the laser-planes. Then a video screenshot can be formed and imported into a computer to form a three-dimensional map. Finally, the volume, slope gradient and other parameters of the slope body can be obtained. As the knobs on the mechanically micro-adjustable host of the topography meter are turned, the laser-planes can become precisely equidistant and parallel. A novel topography meter is disclosed, which can conveniently calibrate the spacing and angle of the linear lasers and accurately observe all landforms including the local deep trenches on an eroding slope.
    Type: Grant
    Filed: April 8, 2018
    Date of Patent: October 13, 2020
    Assignee: DALIAN UNIVERSITY OF TECHNOLOGY
    Inventors: Xiangzhou Xu, Wenzhao Guo, Hongwu Zhang, Lu Gao, Xingyang Zhao
  • Patent number: 10804124
    Abstract: A wafer processing tool is capable of detecting wafer warpage. The wafer processing tool includes a wafer holder on which a wafer is held and at least one sensor set. The at least one sensor set is disposed above the wafer or under the wafer, and a projection of each of the at least one sensor set on the wafer radially extending from a center of the wafer to an edge of the wafer. The at least one sensor set is configured to scan an entire surface of the wafer so as to measure warpage of the wafer while the wafer holder and the at least one sensor set are rotatable relative to each other.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: October 13, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chao-Hsiung Yeh, Hsuan Chang, Jen-Ti Wang, Chin-Tsan Chen, Kuo-Fong Chuang
  • Patent number: 10794838
    Abstract: A device for detecting a defect of a laser welding cover lens includes a coaxial light source configured to emit collimating detection light, wherein the direction of the detection light is perpendicular to a preset horizontal direction; a half transparent and half reflecting mirror arranged above the coaxial light source to reflect the detection light to a preset position; a reflecting mirror configured to reflect light from the half transparent and half reflecting mirror to the cover lens; an industrial camera parallel to the half transparent and half reflecting mirror and the reflecting mirror and configured to receive incident light from the detection light to obtain a detection image, wherein the incident light is reflected by the cover lens and passes through the reflecting mirror and the half transparent and half reflecting mirror; and a processor configured to determine whether there exists a bad point on the cover lens.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: October 6, 2020
    Assignee: ISVISION (TIANJIN) TECHNOLOGY CO., LTD
    Inventors: Meng Lv, Mengyu Guo, Lei Guo, Xiaopeng Wu, Xianyong Chen
  • Patent number: 10792877
    Abstract: Provided is a validation tool and a method for validating optical equipment that is used for measuring a plurality of characteristics of one or more tyre components during winding application of said tyre components around a tyre building drum, wherein a first tyre component of the one or more tyre components includes a first characteristic of the plurality of characteristics which, after measuring, is overlapped by the same or another tyre component of the one or more tyre components including a second characteristic of the plurality of characteristics, wherein the validation tool is provided with a first reference element that is arranged to represent the first characteristic and a second reference element that is arranged to represent the second characteristic, wherein the second reference element is offset with respect to the first reference element to at least partially expose the first reference element.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: October 6, 2020
    Assignee: VMI HOLLAND B.V.
    Inventors: Mattheus Jacobus Kaagman, Jeroen Smeenk, Niels Tielenburg, John Van De Vrugt
  • Patent number: 10793954
    Abstract: A method of processing a substrate according to a PECVD process is described. Temperature profile of the substrate is adjusted to change deposition rate profile across the substrate. Plasma density profile is adjusted to change deposition rate profile across the substrate. Chamber surfaces exposed to the plasma are heated to improve plasma density uniformity and reduce formation of low quality deposits on chamber surfaces. In situ metrology may be used to monitor progress of a deposition process and trigger control actions involving substrate temperature profile, plasma density profile, pressure, temperature, and flow of reactants.
    Type: Grant
    Filed: May 10, 2018
    Date of Patent: October 6, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang, Juan Carlos Rocha-Alvarez, Thomas Nowak, Jianhua Zhou, Ramprakash Sankarakrishnan, Amit Kumar Bansal, Jeongmin Lee, Todd Egan, Edward Budiarto, Dmitriy Panasyuk, Terrance Y. Lee, Jian J. Chen, Mohamad A. Ayoub, Heung Lak Park, Patrick Reilly, Shahid Shaikh, Bok Hoen Kim, Sergey Starik, Ganesh Balasubramanian
  • Patent number: 10788420
    Abstract: A gas analyzer has a probe member attachable to a flow path wall of a flow path through which an analyte gas flows and an analytical member having a second connection portion detachably attached to a first connection portion located at a base end. The probe member has a reflective portion and a measurement area defined therein for introducing the analyte gas. The analytical member has a light emission portion and a light reception portion. The light emission portion irradiates measurement light toward the measurement area, the reflection portion reflects the measurement light incident on the measurement area, and the light reception portion receives the measurement light reflected by the reflection portion. The probe member has a window portion isolating the measurement area from outside of the base end side and transmitting the measurement light.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: September 29, 2020
    Assignee: YOKOGAWA ELECTRIC CORPORATION
    Inventor: Junichi Matsuo
  • Patent number: 10782123
    Abstract: A measurement apparatus includes a measuring probe, a power supply provided to the measuring probe, a first communication circuit supplied power from the power supply and configured to perform communication of a type-1 signal via a first communication, the type-1 signal containing information regarding measurement performed in the measuring probe, and a second communication circuit supplied power from the power supply and configured to perform communication of a type-2 signal via a second communication, the type-2 signal containing information regarding power supply performed in the power supply, the second communication being more reliable than the first communication.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: September 22, 2020
    Assignee: DMG MORI CO., LTD.
    Inventor: Tomoaki Yamada
  • Patent number: 10782247
    Abstract: An embodiment provides a method for measuring particles on a wafer surface, the method including: disposing and rotating a wafer on a stage; irradiating a laser in a first region of a center of a surface of the rotating wafer, a second region between the first region and a third region, and the third region at an edge thereof; and measuring a laser reflected from the first to third regions of the wafer, wherein a second output of the laser irradiated in the second region is larger than a first output of the laser irradiated in the first region and a third output of the laser irradiated in the third region is larger than the second output of the laser irradiated in the second region.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: September 22, 2020
    Assignee: SK SILTRON CO., LTD.
    Inventors: Kang San Kim, Jae Deog Lee
  • Patent number: 10782124
    Abstract: The invention relates to measurement technology and is intended for measuring the shape, the internal dimensions and the flexibility of shoes. The proposed measurement method consists in using probes with indicators, which create tension on the measured surface. A camera and a flat marking band are used for tracing the shape of the internal surface of a shoe. On the basis of the sum of the images, a three-dimensional model of the internal surface of the tested shoe is made, and the flexibility properties are determined by scanning the object with different forces. A device comprises a body, a camera mounted therein, two or more probes with indicators, and a flat marking band. The invention makes it possible to increase accuracy and to reduce the labor intensiveness and time of measurements.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: September 22, 2020
    Assignee: LIMITED LIABILITY COMPANY “FITTIN”
    Inventors: Grigory Vladimirovich Chuyko, Ivan Sergeevich Shedrin, Egor Andreevich Revkov, Natalja Demjanovna Grishko, Viktor Valerevich Posmetev, Dmitry Mihajlovich Kanin, Leonid Dmitrievich Buhtojarov
  • Patent number: 10773478
    Abstract: A testing device includes a positioning assembly and a testing assembly. The positioning assembly positions a workpiece. The testing assembly tests the workpiece. The positioning assembly includes a mounting seat defining a receiving slot for receiving and positioning the workpiece. The mounting seat includes a first positioning surface and a second positioning surface. The positioning assembly includes a side pusher configured to move toward the receiving slot. The side pusher includes a first pushing surface and a second pushing surface. When the side pusher is driven to move toward the receiving slot, the first pushing surface and the second pushing surface push two surfaces of the workpiece to make opposite two surfaces of the workpiece come in contact with the first positioning surface and the second positioning surface to position the workpiece in the receiving slot.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: September 15, 2020
    Assignee: TRIPLE WIN TECHNOLOGY (SHENZHEN) CO. LTD.
    Inventor: Ying-Quan Zhao
  • Patent number: 10765793
    Abstract: A spectroscopic detection system includes a sensor configured to reflect light of a first wavelength associated with a presence of a reference substance on the sensor and configured to reflect light of a second wavelength associated with a presence of a monitored substance on the sensor, wherein the monitored substance flows to the sensor from a circulating fluid. The spectroscopic detection system further includes a detector that has first and second channels for respectively receiving the light of the first and second wavelengths reflected from the sensor and one or more processors in electrical communication with the detector and configured to identify an excess condition of the monitored substance with respect to the circulating fluid based on a ratio of a second amount of the light of the second wavelength received at the detector to a first amount of the light of the first wavelength received at the detector.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: September 8, 2020
    Assignee: Fresenius Medical Care Holdings, Inc.
    Inventors: Harshavardhana Reddy Mallipalli, Philip Scott James, Ethan Lee Zimbra, Kerissa Adams, Troy Dayton, Jon F. Moss
  • Patent number: 10768109
    Abstract: A method of forming a chemical sensor includes forming a dielectric layer on an electrode. A carbon nanotube film is deposited on the dielectric layer. The carbon nanotube film is patterned into strips.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: September 8, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ali Afzali-Ardakani, Abram L. Falk, Damon B. Farmer, Shu-Jen Han, George S. Tulevski
  • Patent number: 10768095
    Abstract: An optical sensor includes a light emitter configured to irradiate a surface of an object with a plurality of non-parallel light beams, a light detector configured to detect a plurality of light beams that have been reflected within the object and have returned to the surface from a plurality of directions, a recording unit configured to store pre-calculated results of a plurality of models having different optical properties and physical structures, and a calculating unit configured to calculate a light amount ratio of the plurality of reflected light beams, and estimate an optical property of the object based on the calculated light amount ratio and the pre-calculated results.
    Type: Grant
    Filed: July 9, 2019
    Date of Patent: September 8, 2020
    Assignees: Ricoh Company, Ltd, ADVANCED TELECOMMUNICATIONS RESEARCH INSTITUTE INTERNATIONAL
    Inventors: Yoichiro Takahashi, Takeaki Shimokawa, Toshihiro Ishii
  • Patent number: 10758926
    Abstract: A fluid dispensing system and a method of controlling a fluid dispensing system are disclosed. The fluid dispensing system includes a source of a fluid, a dispensing nozzle, and a spray system. The spray system supplies fluid from the source of fluid to the dispensing nozzle using system parameters for the spray system. The spray system and dispensing nozzle are configured to dispense the fluid as a stream or spray as an actual fluid pattern according to one or more first system parameters that are intended to produce a first fluid pattern. A camera is configured to capture one or more images of the actual fluid pattern dispensed from the dispensing nozzle. A controller is operatively connected to the spray system and the camera.
    Type: Grant
    Filed: November 3, 2016
    Date of Patent: September 1, 2020
    Assignee: Nordson Corporation
    Inventors: Per Orla-Jensen, Timothy Girvin, Gareth De Sanctis, Kenneth S. Espenschied, Patrick T. Hogan
  • Patent number: 10753730
    Abstract: Method for analyzing surface waviness of tooth flanks of a gearwheel, comprising measuring two or more teeth of the gearwheel, wherein a deviation of their tooth flank geometry from the setpoint geometry is measured along at least one measuring path on each of the teeth; measuring at least one further tooth, wherein a deviation of its tooth flank geometry from the setpoint geometry is measured along at least one partial measuring path whose length is less than the length of the measuring path; and/or measuring at least one further tooth, wherein a deviation of the tooth flank geometry from the setpoint geometry is measured by touching at least one point on the tooth flank; associating a rotational angle with each measured value and determining a geometrically captured order spectrum by order analysis of the deviations plotted over the rotational angle, wherein one or more compensation and/or interpolation functions are determined.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: August 25, 2020
    Assignee: Klingelnberg GmbH
    Inventor: Georg Mies
  • Patent number: 10746646
    Abstract: A fluid analyzer includes an optical source and detector defining a beam path of an optical beam, and a fluid flow cell on the beam path defining an interrogation region in a fluid channel in which the optical beam interacts with fluids. One or more flow-control devices conduct a particle in a fluid through the fluid channel. A motion system moves the interrogation region relative to the fluid channel in response to a motion signal, and a controller (1) generates the motion signal having a time-varying characteristic, (2) samples an output signal from the optical detector at respective intervals of the motion signal during which the interrogation region contains and does not contain the particle, and (3) determines from output signal samples a measurement value indicative of an optically measured characteristic of the particle.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: August 18, 2020
    Assignee: Redshift Bioanalytics, Inc.
    Inventors: Matthias Wagner, Charles McAlister Marshall, Donald Kuehl, Jeffrey Guasto
  • Patent number: 10746628
    Abstract: The disclosure discloses a method of measuring optical parameters of a polarizer and a measuring device. The polarizer includes a compensation film and a PVA layer. The measuring method includes the following steps. In the first state, providing an incident linearly polarized light sequentially to pass through the compensation film and the PVA layer, acquiring a first measurement parameter and a second measurement parameter when the brightness of the light emitted from the polarizer is lowest and is highest. In the second state, providing the incident linearly polarized light sequentially to pass through the PVA layer and the compensation film, acquiring a third measurement parameter and a fourth measurement parameter when the brightness of the light emitted from the polarizer is lowest and is highest; and acquiring optical parameters of the compensation film and/or the PVA layer in the polarizer according to one or more of the above measurement parameters.
    Type: Grant
    Filed: January 18, 2018
    Date of Patent: August 18, 2020
    Assignee: HUIZHOU CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Bo Hai
  • Patent number: 10739261
    Abstract: A magneto-plasmonic nanostructure is disclosed. The structure includes a substrate, and a magneto-plasmonic stack, comprising a nano-sized plasmonic resonator, a nanomagnet, and a capping layer, wherein the nano-sized plasmonic resonator is configured to receive circularly polarized light at an intensity to thereby increase normal component of plasmon-generated opto-magnetic field, HOM,z, at least at the interface of one of i) the nano-sized plasmonic resonator and the nanomagnet, or ii) the nanomagnet and the capping layer, whereby the HOM,z direction is perpendicular to the rotational direction of the circularly polarized light and the nanomagnets in the magneto-plasmonic stack switches its magnetic moment in response to a change of the HOM,z direction in response to a change of the rotational direction of the circularly polarized light.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: August 11, 2020
    Assignee: Purdue Research Foundation
    Inventors: Aveek Dutta, Vladimir M. Shalaev, Alexandra Boltasseva, Esteban E. Marinero-Caceres
  • Patent number: 10732106
    Abstract: Apparatus and associated methods relate to a gas detection apparatus including a main optical element configured to: (1) direct a first portion of light emitted from a light generating element (after the first portion of light has interacted with a target medium) to a primary detector via a second optical element, and (2) direct a second portion of light emitted from the light generating element to a reference detector via a third optical element. In various examples, the main optical element may be a reflector such as a mirror. The light generating element may, for example, be a red, green, and blue (RGB) light emitting diode(s) (LED(s)). The optical train may, for example, have a single/unitary molded transparent acrylic construction and internal reflective surfaces. A gas detection apparatus may standardize the optical path used by the light generating element and the primary/reference detectors, advantageously providing for reliable operation.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: August 4, 2020
    Assignee: Honeywell International Inc.
    Inventor: Richard Gorny